101
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Tse PL, Tian F, Mugica-Sanchez L, Rüger O, Undisz A, Möthrath G, Ronning C, Takahashi S, Lu JG. Microwave AC Resonance Induced Phase Change in Sb 2Te 3 Nanowires. NANO LETTERS 2020; 20:8668-8674. [PMID: 33205986 DOI: 10.1021/acs.nanolett.0c03421] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Scaling information bits to ever smaller dimensions is a dominant drive for information technology (IT). Nanostructured phase change material emerges as a key player in the current green-IT endeavor with low power consumption, functional modularity, and promising scalability. In this work, we present the demonstration of microwave AC voltage induced phase change phenomenon at ∼3 GHz in single Sb2Te3 nanowires. The resistance change by a total of 6-7 orders of magnitude is evidenced by a transition from the crystalline metallic to the amorphous semiconducting phase, which is cross-examined by temperature dependent transport measurement and high-resolution electron microscopy analysis. This discovery could potentially tailor multistate information bit encoding and electrical addressability along a single nanowire, rendering technology advancement for neuro-inspired computing devices.
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Affiliation(s)
- Pok Lam Tse
- Department of Chemical Engineering and Materials Science, University of Southern California, Los Angeles, California 90089, United States
| | - Fugu Tian
- Department of Electrical and Computer Engineering - Electrophysics, University of Southern California, Los Angeles, California 90089, United States
| | - Laura Mugica-Sanchez
- Department of Chemistry, University of Southern California, Los Angeles, California, CA 90089, United States
| | - Oliver Rüger
- Institute of Solid State Physics, Friedrich Schiller University Jena, 07743 Jena, Germany
| | - Andreas Undisz
- Otto Schott Institute of Materials Research, Friedrich Schiller University Jena, 07743 Jena, Germany
- Institute of Materials Science and Engineering, Technische Universität Chemnitz, 09125 Chemnitz, Germany
| | - George Möthrath
- Department of Physics and Astronomy, University of Southern California, Los Angeles, California 90089, United States
| | - Carsten Ronning
- Institute of Solid State Physics, Friedrich Schiller University Jena, 07743 Jena, Germany
| | - Susumu Takahashi
- Department of Chemistry, University of Southern California, Los Angeles, California, CA 90089, United States
- Department of Physics and Astronomy, University of Southern California, Los Angeles, California 90089, United States
| | - Jia Grace Lu
- Department of Electrical and Computer Engineering - Electrophysics, University of Southern California, Los Angeles, California 90089, United States
- Department of Physics and Astronomy, University of Southern California, Los Angeles, California 90089, United States
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102
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Wu E, Xie Y, Wang S, Wu C, Zhang D, Hu X, Liu J. Tunable and nonvolatile multibit data storage memory based on MoTe 2/boron nitride/graphene heterostructures through contact engineering. NANOTECHNOLOGY 2020; 31:485205. [PMID: 32707568 DOI: 10.1088/1361-6528/aba92b] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Heterostructures formed by stacking atomically thin two-dimensional materials are promising candidates for flash memory devices to achieve premium performances, due to the capability of effective carrier modulation and unique charge trapping behavior at the interfaces with atomic flatness. Here, we report a nonvolatile floating-gate flash memory based on MoTe2/h-BN/graphene van der Waals heterostructure, which possesses increased data storage capacity per cell and versatile tunability. The decent memory behavior of the device is enabled by the carriers stored in the floating gate of graphene layer, which tunnel through the dielectric layer of h-BN from the channel layer of MoTe2 under static-electrical field. Consequently, the developed memory device is capable to store 2 bits per cell by applying varied gate bias to implement multi-distinctive current levels. The device also exhibits remarkable erase/program current ratio of ∼105 with 1 µs switch speed and stable retention with estimated ∼30% charge loss after 10 yr. Furthermore, the memory device can operate in both p- and n-type modes through contact engineering, offering wide adaptability for emerging applications in electronic technologies, such as neuromorphic computing, data-adaptive energy efficient memory, and complex digital circuits.
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Affiliation(s)
- Enxiu Wu
- State Key Laboratory of Precision Measurement Technology and Instruments, School of Precision Instruments and Opto-electronics Engineering, Tianjin University, No. 92 Weijin Road, Tianjin 300072, People's Republic of China
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103
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Gaviria Rojas WA, Hersam MC. Chirality-Enriched Carbon Nanotubes for Next-Generation Computing. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2020; 32:e1905654. [PMID: 32255238 DOI: 10.1002/adma.201905654] [Citation(s) in RCA: 18] [Impact Index Per Article: 4.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/30/2019] [Revised: 11/10/2019] [Indexed: 05/06/2023]
Abstract
For the past half century, silicon has served as the primary material platform for integrated circuit technology. However, the recent proliferation of nontraditional electronics, such as wearables, embedded systems, and low-power portable devices, has led to increasingly complex mechanical and electrical performance requirements. Among emerging electronic materials, single-walled carbon nanotubes (SWCNTs) are promising candidates for next-generation computing as a result of their superlative electrical, optical, and mechanical properties. Moreover, their chirality-dependent properties enable a wide range of emerging electronic applications including sub-10 nm complementary field-effect transistors, optoelectronic integrated circuits, and enantiomer-recognition sensors. Here, recent progress in SWCNT-based computing devices is reviewed, with an emphasis on the relationship between chirality enrichment and electronic functionality. In particular, after highlighting chirality-dependent SWCNT properties and chirality enrichment methods, the range of computing applications that have been demonstrated using chirality-enriched SWCNTs are summarized. By identifying remaining challenges and opportunities, this work provides a roadmap for next-generation SWCNT-based computing.
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Affiliation(s)
- William A Gaviria Rojas
- Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA
| | - Mark C Hersam
- Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA
- Department of Chemistry, Northwestern University, Evanston, IL, 60208, USA
- Department of Electrical and Computer Engineering, Northwestern University, Evanston, IL, 60208, USA
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104
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Wu E, Xie Y, Wang S, Zhang D, Hu X, Liu J. Multi-level flash memory device based on stacked anisotropic ReS 2-boron nitride-graphene heterostructures. NANOSCALE 2020; 12:18800-18806. [PMID: 32970061 DOI: 10.1039/d0nr03965a] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Charge-trapping memory devices based on two-dimensional (2D) material heterostructures possess an atomically thin structure and excellent charge transport capability, making them promising candidates for next-generation flash memories to achieve miniaturized size, high storage capacity, fast switch speed, and low power consumption. Here, we report a nonvolatile floating-gate memory device based on an ReS2/boron nitride/graphene heterostructure. The implemented ReS2 memory device displays a large memory window exceeding 100 V, leading to an ultrahigh current ratio over 108 between programming and erasing states. The ReS2 memory device also exhibits an ultrafast switch speed of 1 μs. In addition, the device can endure hundreds of switching cycles and shows stable retention characteristics with ∼40% charge remaining after 10 years. More importantly, taking advantage of its anisotropic electrical properties, a single ReS2 flake can achieve direction-sensitive multi-level data storage to enhance the data storage density. On the basis of these characteristics, the proposed ReS2 memory device is potentially able to serve the entire memory device hierarchy, meeting the need for scalability, capacity, speed, retention, and endurance at each level.
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Affiliation(s)
- Enxiu Wu
- State Key Laboratory of Precision Measurement Technology and Instruments, School of Precision Instruments and Opto-electronics Engineering, Tianjin University, No. 92 Weijin Road, Tianjin, 300072, China.
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105
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Kim DS, Kim JE, Gill YJ, Park JW, Jang YJ, Kim YE, Choi H, Kwon O, Yeom GY. Reactive ion etching of an ovonic threshold switch (OTS) material using hydrogen-based plasmas for non-volatile phase change memories. RSC Adv 2020; 10:36141-36146. [PMID: 35517099 PMCID: PMC9056974 DOI: 10.1039/d0ra05321j] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/17/2020] [Accepted: 09/08/2020] [Indexed: 11/21/2022] Open
Abstract
Etch characteristics of ovonic threshold switch (OTS) materials composed of Ge-As-Te for a phase-change random access memory (PCRAM) has been investigated using reactive ion etching via hydrogen-based gases such as H2, CH4, NH3, CH4 + H2, and CH4 + NH3. Among the investigated hydrogen-based gases, NH3 showed the highest etching rate of about 0.52 nm s-1, but the formation of nitride compounds and the increased roughness were observed on the OTS surface by nitrogen. The use of other hydrogen-based gases such as CH4 and CH4 + H2 showed the deposition and low OTS etch rate, respectively, due to the presence of carbon in CH4. Even though H2 showed the better etch characteristics due to the no surface residues or compounds on the OTS surface related to carbon or nitrogen in the etch gases, the best OTS etch characteristics such as the second highest etch rate of 0.45 nm s-1, the lowest surface roughness of 0.21 nm, and no surface residues or compounds were observed with CH4 + NH3 due to the removal of carbon and nitrogen on the surface by the formation of volatile CN compounds while maintaining a high hydrogen atomic concentration in the plasma.
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Affiliation(s)
- Doo San Kim
- School of Advanced Materials Science and Engineering, Sungkyunkwan University Suwon 16419 Republic of Korea
| | - Ju Eun Kim
- School of Advanced Materials Science and Engineering, Sungkyunkwan University Suwon 16419 Republic of Korea
| | - You Jung Gill
- School of Advanced Materials Science and Engineering, Sungkyunkwan University Suwon 16419 Republic of Korea
| | - Jin Woo Park
- School of Advanced Materials Science and Engineering, Sungkyunkwan University Suwon 16419 Republic of Korea
| | - Yun Jong Jang
- School of Advanced Materials Science and Engineering, Sungkyunkwan University Suwon 16419 Republic of Korea
| | - Ye Eun Kim
- School of Advanced Materials Science and Engineering, Sungkyunkwan University Suwon 16419 Republic of Korea
| | - Hyejin Choi
- Process Development Team, Semiconductor R&D Center Samsung Electrics Co. Ltd Republic of Korea
| | - Oik Kwon
- Process Development Team, Semiconductor R&D Center Samsung Electrics Co. Ltd Republic of Korea
| | - Geun Young Yeom
- School of Advanced Materials Science and Engineering, Sungkyunkwan University Suwon 16419 Republic of Korea
- SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University Suwon 16419 Republic of Korea
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106
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Jia S, Li H, Gotoh T, Longeaud C, Zhang B, Lyu J, Lv S, Zhu M, Song Z, Liu Q, Robertson J, Liu M. Ultrahigh drive current and large selectivity in GeS selector. Nat Commun 2020; 11:4636. [PMID: 32934210 PMCID: PMC7493911 DOI: 10.1038/s41467-020-18382-z] [Citation(s) in RCA: 22] [Impact Index Per Article: 5.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/19/2020] [Accepted: 08/18/2020] [Indexed: 11/09/2022] Open
Abstract
Selector devices are indispensable components of large-scale nonvolatile memory and neuromorphic array systems. Besides the conventional silicon transistor, two-terminal ovonic threshold switching device with much higher scalability is currently the most industrially favored selector technology. However, current ovonic threshold switching devices rely heavily on intricate control of material stoichiometry and generally suffer from toxic and complex dopants. Here, we report on a selector with a large drive current density of 34 MA cm-2 and a ~106 high nonlinearity, realized in an environment-friendly and earth-abundant sulfide binary semiconductor, GeS. Both experiments and first-principles calculations reveal Ge pyramid-dominated network and high density of near-valence band trap states in amorphous GeS. The high-drive current capacity is associated with the strong Ge-S covalency and the high nonlinearity could arise from the synergy of the mid-gap traps assisted electronic transition and local Ge-Ge chain growth as well as locally enhanced bond alignment under high electric field.
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Affiliation(s)
- Shujing Jia
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China
- Key Laboratory of Microelectronic Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China
- University of Chinese Academy of Sciences, Beijing, 100029, China
| | - Huanglong Li
- Department of Precision Instrument, Tsinghua University, Beijing, 100084, China
- Chinese Institute for Brain Research, Beijing, 102206, China
| | - Tamihiro Gotoh
- Department of Physics, Graduate School of Science and Technology, Gunma University, Maebashi, 3718510, Japan
| | - Christophe Longeaud
- Group of Electrical Engineering of Paris, CNRS, Centrale Supelec, Paris Saclay and Sorbonne Universities, Plateau de Moulon, 91190, Gif sur Yvette, France
| | - Bin Zhang
- Analytical and Testing Center of Chongqing University, Chongqing, 401331, China
| | - Juan Lyu
- Department of Precision Instrument, Tsinghua University, Beijing, 100084, China
| | - Shilong Lv
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China
| | - Min Zhu
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China.
| | - Zhitang Song
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China.
| | - Qi Liu
- Key Laboratory of Microelectronic Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China.
| | - John Robertson
- Engineering Department, University of Cambridge, Cambridge, CB3 0FA, UK
| | - Ming Liu
- Key Laboratory of Microelectronic Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China
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107
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Lu Q, Sun F, Liu L, Li L, Wang Y, Hao M, Wang Z, Wang S, Zhang T. Biological receptor-inspired flexible artificial synapse based on ionic dynamics. MICROSYSTEMS & NANOENGINEERING 2020; 6:84. [PMID: 34567694 PMCID: PMC8433456 DOI: 10.1038/s41378-020-00189-z] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/11/2020] [Accepted: 06/11/2020] [Indexed: 05/06/2023]
Abstract
The memristor has been regarded as a promising candidate for constructing a neuromorphic computing platform that is capable of confronting the bottleneck of the traditional von Neumann architecture. Here, inspired by the working mechanism of the G-protein-linked receptor of biological cells, a novel double-layer memristive device with reduced graphene oxide (rGO) nanosheets covered by chitosan (an ionic conductive polymer) as the channel material is constructed. The protons in chitosan and the functional groups in rGO nanosheets imitate the functions of the ligands and receptors of biological cells, respectively. Smooth changes in the response current depending on the historical applied voltages are observed, offering a promising pathway toward biorealistic synaptic emulation. The memristive behavior is mainly a result of the interaction between protons provided by chitosan and the defects and functional groups in the rGO nanosheets. The channel current is due to the hopping of protons through functional groups and is limited by the traps in the rGO nanosheets. The transition from short-term to long-term potentiation is achieved, and learning-forgetting behaviors of the memristor mimicking those of the human brain are demonstrated. Overall, the bioinspired memristor-type artificial synaptic device shows great potential in neuromorphic networks.
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Affiliation(s)
- Qifeng Lu
- i-Lab, Key Laboratory of Multifunctional Nanomaterials and Smart Systems, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), 398 Ruoshui Road, 215123 Suzhou, PR China
| | - Fuqin Sun
- i-Lab, Key Laboratory of Multifunctional Nanomaterials and Smart Systems, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), 398 Ruoshui Road, 215123 Suzhou, PR China
| | - Lin Liu
- Department of Health and Environmental Sciences, Xi’an Jiaotong Liverpool University, 111 Ren’ai Road, 215123 Suzhou, PR China
| | - Lianhui Li
- i-Lab, Key Laboratory of Multifunctional Nanomaterials and Smart Systems, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), 398 Ruoshui Road, 215123 Suzhou, PR China
| | - Yingyi Wang
- Department of Health and Environmental Sciences, Xi’an Jiaotong Liverpool University, 111 Ren’ai Road, 215123 Suzhou, PR China
| | - Mingming Hao
- i-Lab, Key Laboratory of Multifunctional Nanomaterials and Smart Systems, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), 398 Ruoshui Road, 215123 Suzhou, PR China
| | - Zihao Wang
- i-Lab, Key Laboratory of Multifunctional Nanomaterials and Smart Systems, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), 398 Ruoshui Road, 215123 Suzhou, PR China
| | - Shuqi Wang
- i-Lab, Key Laboratory of Multifunctional Nanomaterials and Smart Systems, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), 398 Ruoshui Road, 215123 Suzhou, PR China
| | - Ting Zhang
- i-Lab, Key Laboratory of Multifunctional Nanomaterials and Smart Systems, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), 398 Ruoshui Road, 215123 Suzhou, PR China
- Center for Excellence in Brain Science and Intelligence Technology, Chinese Academy of Sciences, 200031 Shanghai, PR China
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108
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Yoon JG. A New Approach to the Fabrication of Memristive Neuromorphic Devices: Compositionally Graded Films. MATERIALS 2020; 13:ma13173680. [PMID: 32825397 PMCID: PMC7503965 DOI: 10.3390/ma13173680] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 07/15/2020] [Revised: 08/14/2020] [Accepted: 08/18/2020] [Indexed: 11/16/2022]
Abstract
Energy-efficient computing paradigms beyond conventional von-Neumann architecture, such as neuromorphic computing, require novel devices that enable information storage at nanoscale in an analogue way and in-memory computing. Memristive devices with long-/short-term synaptic plasticity are expected to provide a more capable neuromorphic system compared to traditional Si-based complementary metal-oxide-semiconductor circuits. Here, compositionally graded oxide films of Al-doped MgxZn1−xO (g-Al:MgZnO) are studied to fabricate a memristive device, in which the composition of the film changes continuously through the film thickness. Compositional grading in the films should give rise to asymmetry of Schottky barrier heights at the film-electrode interfaces. The g-Al:MgZnO films are grown by using aerosol-assisted chemical vapor deposition. The current-voltage (I-V) and capacitance-voltage (C-V) characteristics of the films show self-rectifying memristive behaviors which are dependent on maximum applied voltage and repeated application of electrical pulses. Endurance and retention performance tests of the device show stable bipolar resistance switching (BRS) with a short-term memory effect. The short-term memory effects are ascribed to the thermally activated release of the trapped electrons near/at the g-Al:MgZnO film-electrode interface of the device. The volatile resistive switching can be used as a potential selector device in a crossbar memory array and a short-term synapse in neuromorphic computing.
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Affiliation(s)
- Jong-Gul Yoon
- Department of Physics and Electronic Materials Engineering, University of Suwon, Gyeonggi-do 18323, Korea
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109
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Alimkhanuly B, Kim S, Kim LW, Lee S. Electromagnetic Analysis of Vertical Resistive Memory with a Sub-nm Thick Electrode. NANOMATERIALS (BASEL, SWITZERLAND) 2020; 10:nano10091634. [PMID: 32825304 PMCID: PMC7559638 DOI: 10.3390/nano10091634] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 07/17/2020] [Revised: 08/12/2020] [Accepted: 08/18/2020] [Indexed: 06/11/2023]
Abstract
Resistive random access memories (RRAMs) are a type of resistive memory with two metal electrodes and a semi-insulating switching material in-between. As the persistent technology node downscaling continues in transistor technologies, RRAM designers also face similar device scaling challenges in simple cross-point arrays. For this reason, a cost-effective 3D vertical RRAM (VRRAM) structure which requires a single pivotal lithography step is attracting significant attention from both the scientific community and the industry. Integrating an extremely thin plane electrode to such a structure is a difficult but necessary step to enable high memory density. In addition, experimentally verifying and modeling such devices is an important step to designing RRAM arrays with a high noise margin, low resistive-capacitive (RC) delays, and stable switching characteristics. In this work, we conducted an electromagnetic analysis on a 3D vertical RRAM with atomically thin graphene electrodes and compared it with the conventional metal electrode. Based on the experimental device measurement results, we derived a theoretical basis and models for each VRRAM design that can be further utilized in the estimation of graphene-based 3D memory at the circuit and architecture levels. We concluded that a 71% increase in electromagnetic field strength was observed in a 0.3 nm thick graphene electrode when compared to a 5 nm thick metal electrode. Such an increase in the field led to much lower energy consumption and fluctuation range during RRAM switching. Due to unique graphene properties resulting in improved programming behavior, the graphene-based VRRAM can be a strong candidate for stacked storage devices in new memory computing platforms.
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Affiliation(s)
- Batyrbek Alimkhanuly
- Department of Electronic Engineering, Kyung Hee University, Yongin City, Gyeonggi-do 17104, Korea; (B.A.); (S.K.)
| | - Sanghoek Kim
- Department of Electronic Engineering, Kyung Hee University, Yongin City, Gyeonggi-do 17104, Korea; (B.A.); (S.K.)
| | - Lok-won Kim
- Department of Computer Science, Kyung Hee University, Yongin City, Gyeonggi-do 17104, Korea
| | - Seunghyun Lee
- Department of Electronic Engineering, Kyung Hee University, Yongin City, Gyeonggi-do 17104, Korea; (B.A.); (S.K.)
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110
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Sebastian A, Le Gallo M, Khaddam-Aljameh R, Eleftheriou E. Memory devices and applications for in-memory computing. NATURE NANOTECHNOLOGY 2020; 15:529-544. [PMID: 32231270 DOI: 10.1038/s41565-020-0655-z] [Citation(s) in RCA: 298] [Impact Index Per Article: 74.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/16/2019] [Accepted: 02/10/2020] [Indexed: 05/02/2023]
Abstract
Traditional von Neumann computing systems involve separate processing and memory units. However, data movement is costly in terms of time and energy and this problem is aggravated by the recent explosive growth in highly data-centric applications related to artificial intelligence. This calls for a radical departure from the traditional systems and one such non-von Neumann computational approach is in-memory computing. Hereby certain computational tasks are performed in place in the memory itself by exploiting the physical attributes of the memory devices. Both charge-based and resistance-based memory devices are being explored for in-memory computing. In this Review, we provide a broad overview of the key computational primitives enabled by these memory devices as well as their applications spanning scientific computing, signal processing, optimization, machine learning, deep learning and stochastic computing.
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111
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Sun Y, Song C, Yin S, Qiao L, Wan Q, Liu J, Wang R, Zeng F, Pan F. Cluster-Type Filaments Induced by Doping in Low-Operation-Current Conductive Bridge Random Access Memory. ACS APPLIED MATERIALS & INTERFACES 2020; 12:29481-29486. [PMID: 32490665 DOI: 10.1021/acsami.0c07238] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Conductive bridge random access memory (CBRAM) is one of the most representative emerging nonvolatile memories in virtue of its excellent performance on speed, high-density integration, and power efficiency. Resistive switching behaviors in CBRAM involving the formation/rupture of metallic conductive filaments are dominated by cation migration and redox processes. It is all in the pursuit to decrease the operation current for low-power consumption and to enhance the current compliance-dependent reliability. Here, we propose a novel structure of Pt/TaOx:Ag/TaOx/Pt with nonvolatile switching at ∼1 μA and achieve a five-resistance-state multilevel cell operation under different compliance currents. Different from the nanocone-shaped filaments reported in traditional Ag top electrode devices, cluster-type filaments were captured in our memory devices, explaining the low-operation current-resistive switching behaviors. Meanwhile, Cu-doped counterpart devices also display similar operations. Such memory devices are more inclined to achieve low-power consumption and offer feasibility to large-scale memory crossbar integration.
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Affiliation(s)
- Yiming Sun
- Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
| | - Cheng Song
- Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
| | - Siqi Yin
- Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
| | - Leilei Qiao
- Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
| | - Qin Wan
- Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
| | - Jialu Liu
- Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
| | - Rui Wang
- Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
| | - Fei Zeng
- Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
| | - Feng Pan
- Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
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112
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Prasad B, Huang YL, Chopdekar RV, Chen Z, Steffes J, Das S, Li Q, Yang M, Lin CC, Gosavi T, Nikonov DE, Qiu ZQ, Martin LW, Huey BD, Young I, Íñiguez J, Manipatruni S, Ramesh R. Ultralow Voltage Manipulation of Ferromagnetism. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2020; 32:e2001943. [PMID: 32468701 DOI: 10.1002/adma.202001943] [Citation(s) in RCA: 11] [Impact Index Per Article: 2.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/20/2020] [Revised: 04/27/2020] [Accepted: 04/28/2020] [Indexed: 06/11/2023]
Abstract
Spintronic elements based on spin transfer torque have emerged with potential for on-chip memory, but they suffer from large energy dissipation due to the large current densities required. In contrast, an electric-field-driven magneto-electric storage element can operate with capacitive displacement charge and potentially reach 1-10 µJ cm-2 switching operation. Here, magneto-electric switching of a magnetoresistive element is shown, operating at or below 200 mV, with a pathway to get down to 100 mV. A combination of phase detuning is utilized via isovalent La substitution and thickness scaling in multiferroic BiFeO3 to scale the switching energy density to ≈10 µJ cm-2 . This work provides a template to achieve attojoule-class nonvolatile memories.
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Affiliation(s)
- Bhagwati Prasad
- Department of Materials Science and Engineering, University of California, Berkeley, CA, 94720, USA
| | - Yen-Lin Huang
- Department of Materials Science and Engineering, University of California, Berkeley, CA, 94720, USA
- Materials Sciences Division, Lawrence Berkeley Laboratory, Berkeley, CA, 94720, USA
| | - Rajesh V Chopdekar
- Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA
| | - Zuhuang Chen
- Department of Materials Science and Engineering, University of California, Berkeley, CA, 94720, USA
| | - James Steffes
- Institute of Materials Science, University of Connecticut, Storrs, CT, 06269, USA
| | - Sujit Das
- Department of Materials Science and Engineering, University of California, Berkeley, CA, 94720, USA
| | - Qian Li
- Department of Physics, University of California, Berkeley, CA, 94720, USA
| | - Mengmeng Yang
- Department of Physics, University of California, Berkeley, CA, 94720, USA
| | - Chia-Ching Lin
- Exploratory Integrated Circuits, Components Research, Intel Corp., Hillsboro, OR, 97124, USA
| | - Tanay Gosavi
- Exploratory Integrated Circuits, Components Research, Intel Corp., Hillsboro, OR, 97124, USA
| | - Dmitri E Nikonov
- Exploratory Integrated Circuits, Components Research, Intel Corp., Hillsboro, OR, 97124, USA
| | - Zi Qiang Qiu
- Department of Physics, University of California, Berkeley, CA, 94720, USA
| | - Lane W Martin
- Department of Materials Science and Engineering, University of California, Berkeley, CA, 94720, USA
- Materials Sciences Division, Lawrence Berkeley Laboratory, Berkeley, CA, 94720, USA
| | - Bryan D Huey
- Institute of Materials Science, University of Connecticut, Storrs, CT, 06269, USA
| | - Ian Young
- Exploratory Integrated Circuits, Components Research, Intel Corp., Hillsboro, OR, 97124, USA
| | - Jorge Íñiguez
- Materials Research and Technology Department, Luxembourg Institute of Science and Technology (LIST), Avenue des Hauts-Fourneaux 5, Esch-sur-Alzette, L-4362, Luxemburg
- Physics and Materials Science Research Unit, University of Luxembourg, 41 Rue du Brill, Belvaux, L-4422, Luxembourg
| | - Sasikanth Manipatruni
- Exploratory Integrated Circuits, Components Research, Intel Corp., Hillsboro, OR, 97124, USA
- Kepler Computing, Hillsboro, OR, 97124, USA
| | - Ramamoorthy Ramesh
- Department of Materials Science and Engineering, University of California, Berkeley, CA, 94720, USA
- Department of Physics, University of California, Berkeley, CA, 94720, USA
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113
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Xiang L, Zeng X, Xia F, Jin W, Liu Y, Hu Y. Recent Advances in Flexible and Stretchable Sensing Systems: From the Perspective of System Integration. ACS NANO 2020; 14:6449-6469. [PMID: 32479071 DOI: 10.1021/acsnano.0c01164] [Citation(s) in RCA: 33] [Impact Index Per Article: 8.3] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/27/2023]
Abstract
Biological signals generated during various biological processes are critically important for providing insight into the human physiological status. Recently, there have been many great efforts in developing flexible and stretchable sensing systems to provide biological signal monitoring platforms with intimate integration with biological surfaces. Here, this review summarizes the recent advances in flexible and stretchable sensing systems from the perspective of electronic system integration. A comprehensive general sensing system architecture is described, which consists of sensors, sensor interface circuits, memories, and digital processing units. The subsequent content focuses on the integration requirements and highlights some advanced progress for each component. Next, representative examples of flexible and stretchable sensing systems for electrophysiological, physical, and chemical information monitoring are introduced. This review concludes with an outlook on the remaining challenges and opportunities for future fully flexible or stretchable sensing systems.
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Affiliation(s)
- Li Xiang
- Key Laboratory for the Physics and Chemistry of Nanodevices, Center for Carbon-Based Electronics, Frontiers Science Center for Nano-optoelectronics, and Department of Electronics, Peking University, Beijing 100871, China
| | - Xiangwen Zeng
- Key Laboratory for the Physics and Chemistry of Nanodevices, Center for Carbon-Based Electronics, Frontiers Science Center for Nano-optoelectronics, and Department of Electronics, Peking University, Beijing 100871, China
| | - Fan Xia
- Key Laboratory for the Physics and Chemistry of Nanodevices, Center for Carbon-Based Electronics, Frontiers Science Center for Nano-optoelectronics, and Department of Electronics, Peking University, Beijing 100871, China
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing 100871, China
| | - Wanlin Jin
- Key Laboratory for the Physics and Chemistry of Nanodevices, Center for Carbon-Based Electronics, Frontiers Science Center for Nano-optoelectronics, and Department of Electronics, Peking University, Beijing 100871, China
| | - Youdi Liu
- Key Laboratory for the Physics and Chemistry of Nanodevices, Center for Carbon-Based Electronics, Frontiers Science Center for Nano-optoelectronics, and Department of Electronics, Peking University, Beijing 100871, China
| | - Youfan Hu
- Key Laboratory for the Physics and Chemistry of Nanodevices, Center for Carbon-Based Electronics, Frontiers Science Center for Nano-optoelectronics, and Department of Electronics, Peking University, Beijing 100871, China
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing 100871, China
- Hunan Institute of Advanced Sensing and Information Technology, Xiangtan University, Hunan 411105, China
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114
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Yao X, Klyukin K, Lu W, Onen M, Ryu S, Kim D, Emond N, Waluyo I, Hunt A, Del Alamo JA, Li J, Yildiz B. Protonic solid-state electrochemical synapse for physical neural networks. Nat Commun 2020; 11:3134. [PMID: 32561717 PMCID: PMC7371700 DOI: 10.1038/s41467-020-16866-6] [Citation(s) in RCA: 43] [Impact Index Per Article: 10.8] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/20/2020] [Accepted: 05/15/2020] [Indexed: 11/24/2022] Open
Abstract
Physical neural networks made of analog resistive switching processors are promising platforms for analog computing. State-of-the-art resistive switches rely on either conductive filament formation or phase change. These processes suffer from poor reproducibility or high energy consumption, respectively. Herein, we demonstrate the behavior of an alternative synapse design that relies on a deterministic charge-controlled mechanism, modulated electrochemically in solid-state. The device operates by shuffling the smallest cation, the proton, in a three-terminal configuration. It has a channel of active material, WO3. A solid proton reservoir layer, PdHx, also serves as the gate terminal. A proton conducting solid electrolyte separates the channel and the reservoir. By protonation/deprotonation, we modulate the electronic conductivity of the channel over seven orders of magnitude, obtaining a continuum of resistance states. Proton intercalation increases the electronic conductivity of WO3 by increasing both the carrier density and mobility. This switching mechanism offers low energy dissipation, good reversibility, and high symmetry in programming.
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Affiliation(s)
- Xiahui Yao
- Department of Nuclear Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA
| | - Konstantin Klyukin
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA
| | - Wenjie Lu
- Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA
| | - Murat Onen
- Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA
| | - Seungchan Ryu
- Department of Mechanical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA
| | - Dongha Kim
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA
| | - Nicolas Emond
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA
| | - Iradwikanari Waluyo
- National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, NY, 11973, USA
| | - Adrian Hunt
- National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, NY, 11973, USA
| | - Jesús A Del Alamo
- Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA.
| | - Ju Li
- Department of Nuclear Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA.
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA.
| | - Bilge Yildiz
- Department of Nuclear Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA.
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA.
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115
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Yoon C, Moon S, Shin C. Study of a hysteresis window of FinFET and fully-depleted silicon-on-insulator (FDSOI) MOSFET with ferroelectric capacitor. NANO CONVERGENCE 2020; 7:19. [PMID: 32483648 PMCID: PMC7264088 DOI: 10.1186/s40580-020-00230-x] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 02/17/2020] [Accepted: 05/12/2020] [Indexed: 06/11/2023]
Abstract
In this work, the measured electrical characteristics of a fully depleted silicon-on-insulator (FDSOI) device and fin-shaped field-effect transistor (FinFET), whose gate electrode is connected in series to the bottom electrode of a ferroelectric capacitor (FE-FDSOI/FE-FinFET), are experimentally studied. The hysteretic property in input transfer characteristic of those devices is desirable for memory device applications, so that the understanding and modulating the hysteresis window is a key knob in designing the devices. It is experimentally observed that the hysteresis window of FE-FDSOI/FE-FinFET is decreased with (i) increasing the area of the ferroelectric capacitor and/or (ii) decreasing the gate area of baseline FET. The way how to control the hysteresis window of FE-FDSOI/FE-FinFET is proposed and discussed in detail.
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Affiliation(s)
- Chankeun Yoon
- Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon, 16419, Korea
| | - Seungjun Moon
- Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon, 16419, Korea
| | - Changhwan Shin
- Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon, 16419, Korea.
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116
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Rahmani MK, Kim MH, Hussain F, Abbas Y, Ismail M, Hong K, Mahata C, Choi C, Park BG, Kim S. Memristive and Synaptic Characteristics of Nitride-Based Heterostructures on Si Substrate. NANOMATERIALS 2020; 10:nano10050994. [PMID: 32455892 PMCID: PMC7279537 DOI: 10.3390/nano10050994] [Citation(s) in RCA: 10] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 03/22/2020] [Revised: 05/16/2020] [Accepted: 05/16/2020] [Indexed: 11/16/2022]
Abstract
Brain-inspired artificial synaptic devices and neurons have the potential for application in future neuromorphic computing as they consume low energy. In this study, the memristive switching characteristics of a nitride-based device with two amorphous layers (SiN/BN) is investigated. We demonstrate the coexistence of filamentary (abrupt) and interface (homogeneous) switching of Ni/SiN/BN/n++-Si devices. A better gradual conductance modulation is achieved for interface-type switching as compared with filamentary switching for an artificial synaptic device using appropriate voltage pulse stimulations. The improved classification accuracy for the interface switching (85.6%) is confirmed and compared to the accuracy of the filamentary switching mode (75.1%) by a three-layer neural network (784 × 128 × 10). Furthermore, the spike-timing-dependent plasticity characteristics of the synaptic device are also demonstrated. The results indicate the possibility of achieving an artificial synapse with a bilayer SiN/BN structure.
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Affiliation(s)
- Mehr Khalid Rahmani
- School of Electronics Engineering, Chungbuk National University, Cheongju 28644, Korea; (M.K.R.); (M.I.); (C.M.)
| | - Min-Hwi Kim
- Inter-University Semiconductor Research Center (ISRC) and the Department of Electrical and Computer Engineering, Seoul National University, Seoul 08826, Korea; (M.-H.K.); (K.H.)
| | - Fayyaz Hussain
- Materials Simulation Research Laboratory (MSRL), Department of Physics, Bahauddin Zakariya University Multan Pakistan, Multan 60800, Pakistan;
| | - Yawar Abbas
- Department of Physics, Khalifa University, Abu Dhabi 127788, UAE;
| | - Muhammad Ismail
- School of Electronics Engineering, Chungbuk National University, Cheongju 28644, Korea; (M.K.R.); (M.I.); (C.M.)
| | - Kyungho Hong
- Inter-University Semiconductor Research Center (ISRC) and the Department of Electrical and Computer Engineering, Seoul National University, Seoul 08826, Korea; (M.-H.K.); (K.H.)
| | - Chandreswar Mahata
- School of Electronics Engineering, Chungbuk National University, Cheongju 28644, Korea; (M.K.R.); (M.I.); (C.M.)
| | - Changhwan Choi
- Division of Materials Science and Engineering, Hanyang University, Seoul 04763, Korea;
| | - Byung-Gook Park
- Inter-University Semiconductor Research Center (ISRC) and the Department of Electrical and Computer Engineering, Seoul National University, Seoul 08826, Korea; (M.-H.K.); (K.H.)
- Correspondence: (B.-G.P.); (S.K.)
| | - Sungjun Kim
- Division of Electronics and Electrical Engineering, Dongguk University, Seoul 04620, Korea
- Correspondence: (B.-G.P.); (S.K.)
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117
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Cheng Y, Cai D, Zheng Y, Yan S, Wu L, Li C, Song W, Xin T, Lv S, Huang R, Lv H, Song Z, Feng S. Microscopic Mechanism of Carbon-Dopant Manipulating Device Performance in CGeSbTe-Based Phase Change Random Access Memory. ACS APPLIED MATERIALS & INTERFACES 2020; 12:23051-23059. [PMID: 32340441 DOI: 10.1021/acsami.0c02507] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Carbon (C)-doped Ge2Sb2Te5 material is a potential candidate in phase change random access memory (PCRAM) because of its superb thermal stability and ultrahigh cycle endurance. Unfortunately, the role and distribution evolution of C-dopant is still not fully understood, especially in practical industrial devices. In this report, with the aid of advanced spherical aberration corrected transmission electron microscopy, the mechanism of microstructure evolution manipulated by C-dopant is clearly defined. The grain-inner C atoms distinctly increase cationic migration energy barriers, which is the fundamental reason for promoting the thermal stability of metastable face-centered-cubic phase and postponing its transition to the hexagonal structure. By current pulses stimulation, the stochastic grain-outer C clusters tend to aggregate in the active area by breaking C-Ge bonding; thus, grain growth and elemental segregation are effectively suppressed to improve device reliability, for example, lower SET resistance, shorter SET time, and enlarged RESET/SET ratio. In short, the visual distribution variations of C-dopant can manipulate the performance of the PCRAM device, having much broader implications for optimizing its microstructure transition and understanding C-doped material system.
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Affiliation(s)
- Yan Cheng
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
- Key Laboratory of Polar Materials and Devices (MOE), Department of Electronics, East China Normal University, Shanghai 200241, China
| | - Daolin Cai
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Yonghui Zheng
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
- Erich Schmid Institute of Materials Science, Austrian Academy of Science, Leoben 8700, Austria
| | - Shuai Yan
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Lei Wu
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Chao Li
- Key Laboratory of Polar Materials and Devices (MOE), Department of Electronics, East China Normal University, Shanghai 200241, China
| | - Wenxiong Song
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Tianjiao Xin
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Shilong Lv
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Rong Huang
- Key Laboratory of Polar Materials and Devices (MOE), Department of Electronics, East China Normal University, Shanghai 200241, China
| | - Hangbing Lv
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
| | - Zhitang Song
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Songlin Feng
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
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118
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Nandakumar SR, Le Gallo M, Piveteau C, Joshi V, Mariani G, Boybat I, Karunaratne G, Khaddam-Aljameh R, Egger U, Petropoulos A, Antonakopoulos T, Rajendran B, Sebastian A, Eleftheriou E. Mixed-Precision Deep Learning Based on Computational Memory. Front Neurosci 2020; 14:406. [PMID: 32477047 PMCID: PMC7235420 DOI: 10.3389/fnins.2020.00406] [Citation(s) in RCA: 31] [Impact Index Per Article: 7.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 12/11/2019] [Accepted: 04/03/2020] [Indexed: 11/29/2022] Open
Abstract
Deep neural networks (DNNs) have revolutionized the field of artificial intelligence and have achieved unprecedented success in cognitive tasks such as image and speech recognition. Training of large DNNs, however, is computationally intensive and this has motivated the search for novel computing architectures targeting this application. A computational memory unit with nanoscale resistive memory devices organized in crossbar arrays could store the synaptic weights in their conductance states and perform the expensive weighted summations in place in a non-von Neumann manner. However, updating the conductance states in a reliable manner during the weight update process is a fundamental challenge that limits the training accuracy of such an implementation. Here, we propose a mixed-precision architecture that combines a computational memory unit performing the weighted summations and imprecise conductance updates with a digital processing unit that accumulates the weight updates in high precision. A combined hardware/software training experiment of a multilayer perceptron based on the proposed architecture using a phase-change memory (PCM) array achieves 97.73% test accuracy on the task of classifying handwritten digits (based on the MNIST dataset), within 0.6% of the software baseline. The architecture is further evaluated using accurate behavioral models of PCM on a wide class of networks, namely convolutional neural networks, long-short-term-memory networks, and generative-adversarial networks. Accuracies comparable to those of floating-point implementations are achieved without being constrained by the non-idealities associated with the PCM devices. A system-level study demonstrates 172 × improvement in energy efficiency of the architecture when used for training a multilayer perceptron compared with a dedicated fully digital 32-bit implementation.
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Affiliation(s)
| | | | - Christophe Piveteau
- IBM Research - Zurich, Rüschlikon, Switzerland
- Department of Information Technology and Electrical Engineering, ETH Zurich, Zurich, Switzerland
| | - Vinay Joshi
- IBM Research - Zurich, Rüschlikon, Switzerland
- Engineering Department, King's College London, London, United Kingdom
| | | | - Irem Boybat
- IBM Research - Zurich, Rüschlikon, Switzerland
- Ecole Polytechnique Federale de Lausanne (EPFL), Institute of Electrical Engineering, Lausanne, Switzerland
| | - Geethan Karunaratne
- IBM Research - Zurich, Rüschlikon, Switzerland
- Department of Information Technology and Electrical Engineering, ETH Zurich, Zurich, Switzerland
| | - Riduan Khaddam-Aljameh
- IBM Research - Zurich, Rüschlikon, Switzerland
- Department of Information Technology and Electrical Engineering, ETH Zurich, Zurich, Switzerland
| | - Urs Egger
- IBM Research - Zurich, Rüschlikon, Switzerland
| | - Anastasios Petropoulos
- IBM Research - Zurich, Rüschlikon, Switzerland
- Department of Electrical and Computers Engineering, University of Patras, Rio Achaia, Greece
| | - Theodore Antonakopoulos
- Department of Electrical and Computers Engineering, University of Patras, Rio Achaia, Greece
| | - Bipin Rajendran
- Engineering Department, King's College London, London, United Kingdom
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119
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Liu B, Liu W, Li Z, Li K, Wu L, Zhou J, Song Z, Sun Z. Y-Doped Sb 2Te 3 Phase-Change Materials: Toward a Universal Memory. ACS APPLIED MATERIALS & INTERFACES 2020; 12:20672-20679. [PMID: 32283921 DOI: 10.1021/acsami.0c03027] [Citation(s) in RCA: 14] [Impact Index Per Article: 3.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
The disadvantages of high power consumption and slow operating speed hinder the application of phase-change materials (PCMs) for a universal memory. In this work, based on a rigorous experimental scheme, we synthesized a series of YxSb2-xTe3 (0 ≤ x ≤ 0.333) PCMs and demonstrated that Y0.25Sb1.75Te3 (YST) is an excellent candidate material for the universal phase-change memory. This YST PCM, even being integrated into a conventional T-shaped device, exhibits an ultralow reset power consumption of 1.3 pJ and a competitive fast set speed of 6 ns. The ultralow power consumption is attributed to the Y-reduced thermal and electrical conductivity, while the maintained crystal structure of Sb2Te3 and the grain refinement provide the competitive fast crystallization speed. This work highlights a novel way to obtain new PCMs with lower power consumption and competitive fast speed toward a universal memory.
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Affiliation(s)
- Bin Liu
- School of Materials Science and Engineering and Center for Integrated Computational Materials Engineering, International Research Institute for Multidisciplinary Science, Beihang University, Beijing 100191, China
| | - Wanliang Liu
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Zhen Li
- School of Materials Science and Engineering and Center for Integrated Computational Materials Engineering, International Research Institute for Multidisciplinary Science, Beihang University, Beijing 100191, China
| | - Kaiqi Li
- School of Materials Science and Engineering and Center for Integrated Computational Materials Engineering, International Research Institute for Multidisciplinary Science, Beihang University, Beijing 100191, China
| | - Liangcai Wu
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Jian Zhou
- School of Materials Science and Engineering and Center for Integrated Computational Materials Engineering, International Research Institute for Multidisciplinary Science, Beihang University, Beijing 100191, China
| | - Zhitang Song
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China
| | - Zhimei Sun
- School of Materials Science and Engineering and Center for Integrated Computational Materials Engineering, International Research Institute for Multidisciplinary Science, Beihang University, Beijing 100191, China
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120
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Understanding of Polarization-Induced Threshold Voltage Shift in Ferroelectric-Gated Field Effect Transistor for Neuromorphic Applications. ELECTRONICS 2020. [DOI: 10.3390/electronics9050704] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/17/2022]
Abstract
A ferroelectric-gated fin-shaped field effect transistor (Fe-FinFET) is fabricated by connecting a Pb(Zr0.2Ti0.8)O3-based ferroelectric capacitor into the gate electrode of FinFET. The ferroelectric capacitor shows coercive voltages of approximately −1.5 V and 2.25 V. The polarization-induced threshold voltage shift in the Fe-FinFET is investigated by regulating the gate voltage sweep range. When the maximum positive gate to source voltage is varied from 4 V to 2 V with a fixed starting negative gate to source voltage, the threshold voltage during the backward sweep is increased from approximately −0.60 V to 1.04 V. In the case of starting negative gate to source voltage variation from −4 V to −0.5 V with a fixed maximum positive gate to source voltage of 4 V, the threshold voltage during the forward sweep is decreased from 1.66 V to 0.87 V. Those results can be elucidated with polarization domain states. Lastly, it is observed that the threshold voltage is mostly increased/decreased when the positive/negative gate voltage sweep range is smaller/larger than the positive/negative coercive voltage, respectively.
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121
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Zahoor F, Azni Zulkifli TZ, Khanday FA. Resistive Random Access Memory (RRAM): an Overview of Materials, Switching Mechanism, Performance, Multilevel Cell (mlc) Storage, Modeling, and Applications. NANOSCALE RESEARCH LETTERS 2020; 15:90. [PMID: 32323059 PMCID: PMC7176808 DOI: 10.1186/s11671-020-03299-9] [Citation(s) in RCA: 99] [Impact Index Per Article: 24.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/19/2019] [Accepted: 03/17/2020] [Indexed: 05/10/2023]
Abstract
In this manuscript, recent progress in the area of resistive random access memory (RRAM) technology which is considered one of the most standout emerging memory technologies owing to its high speed, low cost, enhanced storage density, potential applications in various fields, and excellent scalability is comprehensively reviewed. First, a brief overview of the field of emerging memory technologies is provided. The material properties, resistance switching mechanism, and electrical characteristics of RRAM are discussed. Also, various issues such as endurance, retention, uniformity, and the effect of operating temperature and random telegraph noise (RTN) are elaborated. A discussion on multilevel cell (MLC) storage capability of RRAM, which is attractive for achieving increased storage density and low cost is presented. Different operation schemes to achieve reliable MLC operation along with their physical mechanisms have been provided. In addition, an elaborate description of switching methodologies and current voltage relationships for various popular RRAM models is covered in this work. The prospective applications of RRAM to various fields such as security, neuromorphic computing, and non-volatile logic systems are addressed briefly. The present review article concludes with the discussion on the challenges and future prospects of the RRAM.
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Affiliation(s)
- Furqan Zahoor
- Department of Electrical and Electronics Engineering, Universiti Teknologi Petronas, Seri Iskandar, Perak, 32610 Malaysia
| | - Tun Zainal Azni Zulkifli
- Department of Electrical and Electronics Engineering, Universiti Teknologi Petronas, Seri Iskandar, Perak, 32610 Malaysia
| | - Farooq Ahmad Khanday
- P.G. Department of Electronics and Instrumentation Technology, University of Kashmir, Srinagar, Jammu and Kashmir, 190005 India
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122
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Halter M, Bégon-Lours L, Bragaglia V, Sousa M, Offrein BJ, Abel S, Luisier M, Fompeyrine J. Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights. ACS APPLIED MATERIALS & INTERFACES 2020; 12:17725-17732. [PMID: 32192333 DOI: 10.1021/acsami.0c00877] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Neuromorphic computing architectures enable the dense colocation of memory and processing elements within a single circuit. This colocation removes the communication bottleneck of transferring data between separate memory and computing units as in standard von Neuman architectures for data-critical applications including machine learning. The essential building blocks of neuromorphic systems are nonvolatile synaptic elements such as memristors. Key memristor properties include a suitable nonvolatile resistance range, continuous linear resistance modulation, and symmetric switching. In this work, we demonstrate voltage-controlled, symmetric and analog potentiation and depression of a ferroelectric Hf0.57Zr0.43O2 (HZO) field-effect transistor (FeFET) with good linearity. Our FeFET operates with low writing energy (fJ) and fast programming time (40 ns). Retention measurements have been performed over 4 bit depth with low noise (1%) in the tungsten oxide (WOx) readout channel. By adjusting the channel thickness from 15 to 8 nm, the on/off ratio of the FeFET can be engineered from 1 to 200% with an on-resistance ideally >100 kΩ, depending on the channel geometry. The device concept is using earth-abundant materials and is compatible with a back end of line (BEOL) integration into complementary metal-oxide-semiconductor (CMOS) processes. It has therefore a great potential for the fabrication of high-density, large-scale integrated arrays of artificial analog synapses.
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Affiliation(s)
- Mattia Halter
- IBM Research GmbH-Zurich Research Laboratory, CH-8803 Rüschlikon, Switzerland
- Integrated Systems Laboratory, ETH Zurich, CH-8092 Zurich, Switzerland
| | - Laura Bégon-Lours
- IBM Research GmbH-Zurich Research Laboratory, CH-8803 Rüschlikon, Switzerland
| | - Valeria Bragaglia
- IBM Research GmbH-Zurich Research Laboratory, CH-8803 Rüschlikon, Switzerland
| | - Marilyne Sousa
- IBM Research GmbH-Zurich Research Laboratory, CH-8803 Rüschlikon, Switzerland
| | - Bert Jan Offrein
- IBM Research GmbH-Zurich Research Laboratory, CH-8803 Rüschlikon, Switzerland
| | - Stefan Abel
- IBM Research GmbH-Zurich Research Laboratory, CH-8803 Rüschlikon, Switzerland
| | - Mathieu Luisier
- Integrated Systems Laboratory, ETH Zurich, CH-8092 Zurich, Switzerland
| | - Jean Fompeyrine
- IBM Research GmbH-Zurich Research Laboratory, CH-8803 Rüschlikon, Switzerland
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123
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Lv Z, Wang Y, Chen J, Wang J, Zhou Y, Han ST. Semiconductor Quantum Dots for Memories and Neuromorphic Computing Systems. Chem Rev 2020; 120:3941-4006. [DOI: 10.1021/acs.chemrev.9b00730] [Citation(s) in RCA: 114] [Impact Index Per Article: 28.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/13/2022]
Affiliation(s)
- Ziyu Lv
- Institute of Microscale Optoelectronics, Shenzhen University, Shenzhen 518060, P. R. China
| | - Yan Wang
- Institute of Microscale Optoelectronics, Shenzhen University, Shenzhen 518060, P. R. China
| | - Jingrui Chen
- Institute for Advanced Study, Shenzhen University, Shenzhen 518060, P. R. China
| | - Junjie Wang
- Institute of Microscale Optoelectronics, Shenzhen University, Shenzhen 518060, P. R. China
| | - Ye Zhou
- Institute for Advanced Study, Shenzhen University, Shenzhen 518060, P. R. China
| | - Su-Ting Han
- Institute of Microscale Optoelectronics, Shenzhen University, Shenzhen 518060, P. R. China
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Luo Q, Cheng Y, Yang J, Cao R, Ma H, Yang Y, Huang R, Wei W, Zheng Y, Gong T, Yu J, Xu X, Yuan P, Li X, Tai L, Yu H, Shang D, Liu Q, Yu B, Ren Q, Lv H, Liu M. A highly CMOS compatible hafnia-based ferroelectric diode. Nat Commun 2020; 11:1391. [PMID: 32170177 PMCID: PMC7070068 DOI: 10.1038/s41467-020-15159-2] [Citation(s) in RCA: 43] [Impact Index Per Article: 10.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/30/2019] [Accepted: 02/19/2020] [Indexed: 11/29/2022] Open
Abstract
Memory devices with high speed and high density are highly desired to address the ‘memory wall’ issue. Here we demonstrated a highly scalable, three-dimensional stackable ferroelectric diode, with its rectifying polarity modulated by the polarization reversal of Hf0.5Zr0.5O2 films. By visualizing the hafnium/zirconium lattice order and oxygen lattice order with atomic-resolution spherical aberration-corrected STEM, we revealed the correlation between the spontaneous polarization of Hf0.5Zr0.5O2 film and the displacement of oxygen atom, thus unambiguously identified the non-centrosymmetric Pca21 orthorhombic phase in Hf0.5Zr0.5O2 film. We further implemented this ferroelectric diode in an 8 layers 3D array. Operation speed as high as 20 ns and robust endurance of more than 109 were demonstrated. The built-in nonlinearity of more than 100 guarantees its self-selective property that eliminates the need for external selectors to suppress the leakage current in large array. This work opens up new opportunities for future memory hierarchy evolution. Designing reliable, scalable and high speed computing systems remains a challenge. Here, the authors identify noncentrosymmetric orthorhombic phase in HZO film and demonstrate a CMOS compatible 3D Vertical HZO-based ferroelectric diode array with self-selective property and 20 ns of speed operation.
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Affiliation(s)
- Qing Luo
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics of the Chinese Academy of Sciences, No. 3 Beitucheng West Road, Chaoyang District, Beijing, 100029, China
| | - Yan Cheng
- Key Laboratory of Polar Materials and Devices (MOE), Department of Electronics, East China Normal University, 500 Dongchuan Road, Shanghai, 200241, China
| | - Jianguo Yang
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics of the Chinese Academy of Sciences, No. 3 Beitucheng West Road, Chaoyang District, Beijing, 100029, China
| | - Rongrong Cao
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics of the Chinese Academy of Sciences, No. 3 Beitucheng West Road, Chaoyang District, Beijing, 100029, China
| | - Haili Ma
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics of the Chinese Academy of Sciences, No. 3 Beitucheng West Road, Chaoyang District, Beijing, 100029, China
| | - Yang Yang
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics of the Chinese Academy of Sciences, No. 3 Beitucheng West Road, Chaoyang District, Beijing, 100029, China
| | - Rong Huang
- Key Laboratory of Polar Materials and Devices (MOE), Department of Electronics, East China Normal University, 500 Dongchuan Road, Shanghai, 200241, China
| | - Wei Wei
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics of the Chinese Academy of Sciences, No. 3 Beitucheng West Road, Chaoyang District, Beijing, 100029, China
| | - Yonghui Zheng
- Key Laboratory of Polar Materials and Devices (MOE), Department of Electronics, East China Normal University, 500 Dongchuan Road, Shanghai, 200241, China
| | - Tiancheng Gong
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics of the Chinese Academy of Sciences, No. 3 Beitucheng West Road, Chaoyang District, Beijing, 100029, China
| | - Jie Yu
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics of the Chinese Academy of Sciences, No. 3 Beitucheng West Road, Chaoyang District, Beijing, 100029, China
| | - Xiaoxin Xu
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics of the Chinese Academy of Sciences, No. 3 Beitucheng West Road, Chaoyang District, Beijing, 100029, China
| | - Peng Yuan
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics of the Chinese Academy of Sciences, No. 3 Beitucheng West Road, Chaoyang District, Beijing, 100029, China
| | - Xiaoyan Li
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics of the Chinese Academy of Sciences, No. 3 Beitucheng West Road, Chaoyang District, Beijing, 100029, China
| | - Lu Tai
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics of the Chinese Academy of Sciences, No. 3 Beitucheng West Road, Chaoyang District, Beijing, 100029, China
| | - Haoran Yu
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics of the Chinese Academy of Sciences, No. 3 Beitucheng West Road, Chaoyang District, Beijing, 100029, China
| | - Dashan Shang
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics of the Chinese Academy of Sciences, No. 3 Beitucheng West Road, Chaoyang District, Beijing, 100029, China
| | - Qi Liu
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics of the Chinese Academy of Sciences, No. 3 Beitucheng West Road, Chaoyang District, Beijing, 100029, China
| | - Bing Yu
- Xi'an UniIC Semiconductors Co., Ltd., 38 Gaoxin 6th Rd, High-Tech Industrial Development Zone, Xi'an, 710075, China
| | - Qiwei Ren
- Xi'an UniIC Semiconductors Co., Ltd., 38 Gaoxin 6th Rd, High-Tech Industrial Development Zone, Xi'an, 710075, China
| | - Hangbing Lv
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics of the Chinese Academy of Sciences, No. 3 Beitucheng West Road, Chaoyang District, Beijing, 100029, China.
| | - Ming Liu
- Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics of the Chinese Academy of Sciences, No. 3 Beitucheng West Road, Chaoyang District, Beijing, 100029, China.
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Xu J, Wu Y, Li Z, Liu X, Cao G, Yao J. Resistive Switching in Nonperovskite-Phase CsPbI 3 Film-Based Memory Devices. ACS APPLIED MATERIALS & INTERFACES 2020; 12:9409-9420. [PMID: 32011118 DOI: 10.1021/acsami.9b17680] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Because of their attractive photoelectrical properties, perovskite-phase, CsPbX3 (X = I, Br, or Cl) materials have recently gained attention for their applications in resistive switching (RS) memories. However, phase transition of the CsPbI3 from perovskite (cubic phase) to nonperovskite (orthorhombic phase) at room temperature is problematic; it remains a challenge to apply nonperovskite CsPbI3 in RS memories. In the present work, a polymethylmethacrylate (PMMA)-assisted deposition method for nonperovskite CsPbI3 is introduced to fabricate a composite film of CsPbI3 with PMMA (PMMA@CsPbI3) with a smooth surface morphology on fluorine-doped tin oxide (FTO) substrates. Devices with a Ag/PMMA@CsPbI3/FTO architecture show nonvolatile RS characteristics with an ON/OFF ratio around 102, endurance over 500 cycles, and a retention time of 103 s. Analyses suggested that a Schottky barrier at the Ag/PMMA@CsPbI3 interface and a bias-induced migration of Ag ions within the composite films are responsible for the RS operation. This is the first record for RS devices based on nonperovskite CsPbI3, and it may bring the future research on nonperovskite CsPbI3 applied in RS memory devices some new inspiration..
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Affiliation(s)
- Jia Xu
- State Key Laboratory of Alternate Electrical Power System with Renewable Energy Sources, Beijing Key Laboratory of Energy Safety and Clean Utilization , North China Electric Power University , Beijing 102206 , China
| | - Yanhong Wu
- State Key Laboratory of Alternate Electrical Power System with Renewable Energy Sources, Beijing Key Laboratory of Energy Safety and Clean Utilization , North China Electric Power University , Beijing 102206 , China
| | - Zhenzhen Li
- State Key Laboratory of Alternate Electrical Power System with Renewable Energy Sources, Beijing Key Laboratory of Energy Safety and Clean Utilization , North China Electric Power University , Beijing 102206 , China
| | - Xiaolong Liu
- State Key Laboratory of Alternate Electrical Power System with Renewable Energy Sources, Beijing Key Laboratory of Energy Safety and Clean Utilization , North China Electric Power University , Beijing 102206 , China
| | - Guozhong Cao
- Department of Material Science and Engineering , University of Washington , Seattle , Washington 98195-2120 , United States
| | - Jianxi Yao
- State Key Laboratory of Alternate Electrical Power System with Renewable Energy Sources, Beijing Key Laboratory of Energy Safety and Clean Utilization , North China Electric Power University , Beijing 102206 , China
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126
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Yen TJ, Chin A, Gritsenko V. High Performance All Nonmetal SiN x Resistive Random Access Memory with Strong Process Dependence. Sci Rep 2020; 10:2807. [PMID: 32071358 PMCID: PMC7028907 DOI: 10.1038/s41598-020-59838-y] [Citation(s) in RCA: 14] [Impact Index Per Article: 3.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/20/2019] [Accepted: 01/27/2020] [Indexed: 11/26/2022] Open
Abstract
All-nonmetal resistive random access memory (RRAM) with a N+-Si/SiNx/P+-Si structure was investigated in this study. The device performance of SiNx developed using physical vapor deposition (PVD) was significantly better than that of a device fabricated using plasma-enhanced chemical vapor deposition (PECVD). The SiNx RRAM device developed using PVD has a large resistance window that is larger than 104 and exhibits good endurance to 105 cycles under switching pulses of 1 μs and a retention time of 104 s at 85 °C. Moreover, the SiNx RRAM device developed using PVD had tighter device-to-device distribution of set and reset voltages than those developed using PECVD. Such tight distribution is crucial to realise a large-size cross-point array and integrate with complementary metal-oxide-semiconductor technology to realise electronic neurons. The high performance of the SiNx RRAM device developed using PVD is attributed to the abundant defects in the PVD dielectric that was supported by the analysed conduction mechanisms obtained from the measured current-voltage characteristics.
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Affiliation(s)
- Te Jui Yen
- Department of Electronics Engineering, National Chiao Tung University, Hsinchu, 300, Taiwan
| | - Albert Chin
- Department of Electronics Engineering, National Chiao Tung University, Hsinchu, 300, Taiwan.
| | - Vladimir Gritsenko
- Rzhanov Institute of Semiconductor Physics. Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia
- Novosibirsk State University, Pirogova street, 2, Novosobirsk, 630090, Russia
- Novosibirsk State Technical University, K. Marx Ave., 20, Novosibirsk, 630073, Russia
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127
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SLIM: Simultaneous Logic-in-Memory Computing Exploiting Bilayer Analog OxRAM Devices. Sci Rep 2020; 10:2567. [PMID: 32054872 PMCID: PMC7018944 DOI: 10.1038/s41598-020-59121-0] [Citation(s) in RCA: 191] [Impact Index Per Article: 47.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/19/2019] [Accepted: 01/24/2020] [Indexed: 11/24/2022] Open
Abstract
von Neumann architecture based computers isolate computation and storage (i.e. data is shuttled between computation blocks (processor) and memory blocks). The to-and-fro movement of data leads to a fundamental limitation of modern computers, known as the Memory wall. Logic in-Memory (LIM)/In-Memory Computing (IMC) approaches aim to address this bottleneck by directly computing inside memory units thereby eliminating energy-intensive and time-consuming data movement. Several recent works in literature, propose realization of logic function(s) directly using arrays of emerging resistive memory devices (example- memristors, RRAM/ReRAM, PCM, CBRAM, OxRAM, STT-MRAM etc.), rather than using conventional transistors for computing. The logic/embedded-side of digital systems (like processors, micro-controllers) can greatly benefit from such LIM realizations. However, the pure storage-side of digital systems (example SSDs, enterprise storage etc.) will not benefit much from such LIM approaches as when memory arrays are used for logic they lose their core functionality of storage. Thus, there is the need for an approach complementary to existing LIM techniques, that’s more beneficial for the storage-side of digital systems; one that gives compute capability to memory arrays not at the cost of their existing stored states. Fundamentally, this would require memory nanodevice arrays that are capable of storing and computing simultaneously. In this paper, we propose a novel ‘Simultaneous Logic in-Memory’ (SLIM) methodology which is complementary to existing LIM approaches in literature. Through extensive experiments we demonstrate novel SLIM bitcells (1T-1R/2T-1R) comprising non-filamentary bilayer analog OxRAM devices with NMOS transistors. Proposed bitcells are capable of implementing both Memory and Logic operations simultaneously. Detailed programming scheme, array level implementation, and controller architecture are also proposed. Furthermore, to study the impact of proposed SLIM approach for real-world implementations, we performed analysis for two applications: (i) Sobel Edge Detection, and (ii) Binary Neural Network- Multi layer Perceptron (BNN-MLP). By performing all computations in SLIM bitcell array, huge Energy Delay Product (EDP) savings of ≈75× for 1T-1R (≈40× for 2T-1R) SLIM bitcell were observed for edge-detection application while EDP savings of ≈3.5× for 1T-1R (≈1.6× for 2T-1R) SLIM bitcell were observed for BNN-MLP application respectively, in comparison to conventional computing. EDP savings owing to reduction in data transfer between CPU ↔ memory is observed to be ≈780× (for both SLIM bitcells).
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128
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Albano LGS, Vello TP, de Camargo DHS, da Silva RML, Padilha ACM, Fazzio A, Bufon CCB. Ambipolar Resistive Switching in an Ultrathin Surface-Supported Metal-Organic Framework Vertical Heterojunction. NANO LETTERS 2020; 20:1080-1088. [PMID: 31917590 DOI: 10.1021/acs.nanolett.9b04355] [Citation(s) in RCA: 25] [Impact Index Per Article: 6.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Memristors (MRs) are considered promising devices with the enormous potential to replace complementary metal-oxide-semiconductor (CMOS) technology, which approaches the scale limit. Efforts to fabricate MRs-based hybrid materials may result in suitable operating parameters coupled to high mechanical flexibility and low cost. Metal-organic frameworks (MOFs) arise as a favorable candidate to cover such demands. The step-by-step growth of MOFs structures on functionalized surfaces, called surface-supported metal-organic frameworks (SURMOFs), opens the possibility for designing new applications in strategic fields such as electronics, optoelectronics, and energy harvesting. However, considering the MRs architecture, the typical high porosity of these hybrid materials may lead to short-circuited devices easily. In this sense, here, it is reported for the first time the integration of SURMOF films in rolled-up scalable-functional devices. A freestanding metallic nanomembrane provides a robust and self-adjusted top mechanical contact on the SURMOF layer. The electrical characterization reveals an ambipolar resistive switching mediated by the humidity level with low-power consumption. The electronic properties are investigated with density functional theory (DFT) calculations. Furthermore, the device concept is versatile, compatible with the current parallelism demands of integration, and transcends the challenge in contacting SURMOF films for scalable-functional devices.
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Affiliation(s)
- Luiz G S Albano
- Brazilian Nanotechnology National Laboratory (LNNano) , Brazilian Center for Research in Energy and Materials (CNPEM) , 13083-970 Campinas , São Paulo , Brazil
| | - Tatiana P Vello
- Brazilian Nanotechnology National Laboratory (LNNano) , Brazilian Center for Research in Energy and Materials (CNPEM) , 13083-970 Campinas , São Paulo , Brazil
- Department of Physical Chemistry, Institute of Chemistry (IQ) , University of Campinas (UNICAMP) , 13084-862 Campinas , São Paulo , Brazil
| | - Davi H S de Camargo
- Brazilian Nanotechnology National Laboratory (LNNano) , Brazilian Center for Research in Energy and Materials (CNPEM) , 13083-970 Campinas , São Paulo , Brazil
- Postgraduate Program in Materials Science and Technology (POSMAT) , São Paulo State University (UNESP) , 17033-360 Bauru , São Paulo , Brazil
| | - Ricardo M L da Silva
- Brazilian Nanotechnology National Laboratory (LNNano) , Brazilian Center for Research in Energy and Materials (CNPEM) , 13083-970 Campinas , São Paulo , Brazil
- Postgraduate Program in Materials Science and Technology (POSMAT) , São Paulo State University (UNESP) , 17033-360 Bauru , São Paulo , Brazil
| | - Antonio C M Padilha
- Brazilian Nanotechnology National Laboratory (LNNano) , Brazilian Center for Research in Energy and Materials (CNPEM) , 13083-970 Campinas , São Paulo , Brazil
| | - Adalberto Fazzio
- Brazilian Nanotechnology National Laboratory (LNNano) , Brazilian Center for Research in Energy and Materials (CNPEM) , 13083-970 Campinas , São Paulo , Brazil
| | - Carlos C B Bufon
- Brazilian Nanotechnology National Laboratory (LNNano) , Brazilian Center for Research in Energy and Materials (CNPEM) , 13083-970 Campinas , São Paulo , Brazil
- Department of Physical Chemistry, Institute of Chemistry (IQ) , University of Campinas (UNICAMP) , 13084-862 Campinas , São Paulo , Brazil
- Postgraduate Program in Materials Science and Technology (POSMAT) , São Paulo State University (UNESP) , 17033-360 Bauru , São Paulo , Brazil
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129
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Chao Z, Sezginel KB, Xu K, Crouch GM, Gray AE, Wilmer CE, Bohn PW, Go DB, Fullerton-Shirey SK. Silver Nanofilament Formation Dynamics in a Polymer-Ionic Liquid Thin Film by Direct-Write. ADVANCED FUNCTIONAL MATERIALS 2020; 30:1907950. [PMID: 33828443 PMCID: PMC8022840 DOI: 10.1002/adfm.201907950] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/25/2019] [Indexed: 06/12/2023]
Abstract
Silver nanofilament formation dynamics are reported for an ionic liquid (IL)-filled solid polymer electrolyte prepared by a direct-write process using a conductive atomic force microscope (C-AFM). Filaments are electrochemically formed at hundreds of xy locations on a ~40 nm thick polymer electrolyte, polyethylene glycol diacrylate (PEGDA)/[BMIM]PF6. Although the formation time generally decreases with increasing bias from 0.7 to 3.0 V, an unexpected non-monotonic maximum is observed ~ 2.0 V. At voltages approaching this region of inverted kinetics, IL electric double layers (EDLs) becomes detectable; thus, the increased nanofilament formation time can be attributed to electric field screening which hinders silver electro-migration and deposition. Scanning electron microscopy confirms that nanofilaments formed in this inverted region have significantly more lateral and diffuse features. Time-dependent formation currents reveal two types of nanofilament growth dynamics: abrupt, where the resistance decreases sharply over as little as a few ms, and gradual where it decreases more slowly over hundreds of ms. Whether the resistance change is abrupt or gradual depends on the extent to which the EDL screens the electric field. Tuning the formation time and growth dynamics using an IL opens the range of accessible resistance states, which is useful for neuromorphic applications.
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Affiliation(s)
- Zhongmou Chao
- Department of Chemical and Petroleum Engineering, University of Pittsburgh, Pittsburgh, Pennsylvania 15261, United States
| | - Kutay B Sezginel
- Department of Chemical and Petroleum Engineering, University of Pittsburgh, Pittsburgh, Pennsylvania 15261, United States
| | - Ke Xu
- Department of Chemical and Petroleum Engineering, University of Pittsburgh, Pittsburgh, Pennsylvania 15261, United States
| | - Garrison M Crouch
- Department of Chemical and Biomolecular Engineering, University of Notre Dame, Notre Dame, Indiana 46556, United States
| | - Abigale E Gray
- Department of Chemical and Petroleum Engineering, University of Pittsburgh, Pittsburgh, Pennsylvania 15261, United States
| | - Christopher E Wilmer
- Department of Chemical and Petroleum Engineering, University of Pittsburgh, Pittsburgh, Pennsylvania 15261, United States
| | - Paul W Bohn
- Department of Chemical and Biomolecular Engineering, University of Notre Dame, Notre Dame, Indiana 46556, United States; Department of Chemistry and Biochemistry, University of Notre Dame, Notre Dame, Indiana 46556, United States
| | - David B Go
- Department of Chemical and Biomolecular Engineering, University of Notre Dame, Notre Dame, Indiana 46556, United States; Department of Aerospace and Mechanical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, United States
| | - Susan K Fullerton-Shirey
- Department of Chemical and Petroleum Engineering, University of Pittsburgh, Pittsburgh, Pennsylvania 15261, United States; Department of Electrical and Computer Engineering, University of Pittsburgh, Pittsburgh, Pennsylvania 15261, United States
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130
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Wei S, Wang F, Zou X, Wang L, Liu C, Liu X, Hu W, Fan Z, Ho JC, Liao L. Flexible Quasi-2D Perovskite/IGZO Phototransistors for Ultrasensitive and Broadband Photodetection. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2020; 32:e1907527. [PMID: 31867813 DOI: 10.1002/adma.201907527] [Citation(s) in RCA: 30] [Impact Index Per Article: 7.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/16/2019] [Revised: 12/08/2019] [Indexed: 06/10/2023]
Abstract
Organic-inorganic hybrid perovskites (PVKs) have recently emerged as attractive materials for photodetectors. However, the poor stability and low electrical conductivity still restrict their practical utilization. Owing to the quantum-well feature of two-dimensional (2D) Ruddlesden-Popper PVKs (2D PVKs), a promising quasi-2D PVK/indium gallium zinc oxide (IGZO) heterostructure phototransistor can be designed. By using a simple ligand-exchange spin-coating method, quasi-2D PVK fabricated on flexible substrates exhibits a desirable type-II energy band alignment, which facilitates effective spatial separation of photoexcited carriers. The device exhibits excellent photoresponsivity values of >105 A W-1 at 457 nm, and broadband photoresponse (457-1064 nm). By operating the device in the depletion regime, the specific detectivity is found to be 5.1 × 1016 Jones, which is the record high value among all PVK-based photodetectors reported to date. Due to the resistive hopping barrier in the quasi-2D PVK, the device can also work as an optoelectronic memory for near-infrared information storage. More importantly, the easy manufacturing process is highly beneficial, enabling large-scale and uniform quasi-2D PVK/IGZO hybrid films for detector arrays with outstanding ambient and operation stabilities. All these findings demonstrate the device architecture here provides a rational avenue to the design of next-generation flexible photodetectors with unprecedented sensitivity.
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Affiliation(s)
- Shali Wei
- Key Laboratory for Micro/Nano Optoelectronic Devices of Ministry of Education & Hunan Provincial Key Laboratory of Low-Dimensional Structural Physics and Devices, School of Physics and Electronics, Hunan University, Changsha, 410082, China
| | - Fang Wang
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200000, China
| | - Xuming Zou
- Key Laboratory for Micro/Nano Optoelectronic Devices of Ministry of Education & Hunan Provincial Key Laboratory of Low-Dimensional Structural Physics and Devices, School of Physics and Electronics, Hunan University, Changsha, 410082, China
| | - Liming Wang
- Key Laboratory for Micro/Nano Optoelectronic Devices of Ministry of Education & Hunan Provincial Key Laboratory of Low-Dimensional Structural Physics and Devices, School of Physics and Electronics, Hunan University, Changsha, 410082, China
| | - Chang Liu
- Key Laboratory for Micro/Nano Optoelectronic Devices of Ministry of Education & Hunan Provincial Key Laboratory of Low-Dimensional Structural Physics and Devices, School of Physics and Electronics, Hunan University, Changsha, 410082, China
| | - Xingqiang Liu
- Key Laboratory for Micro/Nano Optoelectronic Devices of Ministry of Education & Hunan Provincial Key Laboratory of Low-Dimensional Structural Physics and Devices, School of Physics and Electronics, Hunan University, Changsha, 410082, China
| | - Weida Hu
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200000, China
| | - Zhiyong Fan
- Department of Electronic and Computer Engineering, Hong Kong University of Science and Technology, Hong Kong SAR, 999077, China
| | - Johnny C Ho
- Department of Materials Science and Engineering, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong SAR, 999077, China
| | - Lei Liao
- Key Laboratory for Micro/Nano Optoelectronic Devices of Ministry of Education & Hunan Provincial Key Laboratory of Low-Dimensional Structural Physics and Devices, School of Physics and Electronics, Hunan University, Changsha, 410082, China
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131
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Fully hardware-implemented memristor convolutional neural network. Nature 2020; 577:641-646. [DOI: 10.1038/s41586-020-1942-4] [Citation(s) in RCA: 648] [Impact Index Per Article: 162.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/25/2018] [Accepted: 10/25/2019] [Indexed: 11/08/2022]
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132
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An artificial spiking afferent nerve based on Mott memristors for neurorobotics. Nat Commun 2020; 11:51. [PMID: 31896758 PMCID: PMC6940364 DOI: 10.1038/s41467-019-13827-6] [Citation(s) in RCA: 105] [Impact Index Per Article: 26.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/05/2019] [Accepted: 11/26/2019] [Indexed: 01/19/2023] Open
Abstract
Neuromorphic computing based on spikes offers great potential in highly efficient computing paradigms. Recently, several hardware implementations of spiking neural networks based on traditional complementary metal-oxide semiconductor technology or memristors have been developed. However, an interface (called an afferent nerve in biology) with the environment, which converts the analog signal from sensors into spikes in spiking neural networks, is yet to be demonstrated. Here we propose and experimentally demonstrate an artificial spiking afferent nerve based on highly reliable NbOx Mott memristors for the first time. The spiking frequency of the afferent nerve is proportional to the stimuli intensity before encountering noxiously high stimuli, and then starts to reduce the spiking frequency at an inflection point. Using this afferent nerve, we further build a power-free spiking mechanoreceptor system with a passive piezoelectric device as the tactile sensor. The experimental results indicate that our afferent nerve is promising for constructing self-aware neurorobotics in the future. Though artificial sensory systems based on electronic devices have been realized, further transformation of data into spikes is required for neural network optimization. Here, based on NbOx Mott memristors, the authors report artificial spiking afferent nerves for accessing spiking systems and demonstrate spiking mechanoreceptor systems.
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133
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Milo V, Malavena G, Monzio Compagnoni C, Ielmini D. Memristive and CMOS Devices for Neuromorphic Computing. MATERIALS (BASEL, SWITZERLAND) 2020; 13:E166. [PMID: 31906325 PMCID: PMC6981548 DOI: 10.3390/ma13010166] [Citation(s) in RCA: 26] [Impact Index Per Article: 6.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 11/28/2019] [Revised: 12/17/2019] [Accepted: 12/18/2019] [Indexed: 11/17/2022]
Abstract
Neuromorphic computing has emerged as one of the most promising paradigms to overcome the limitations of von Neumann architecture of conventional digital processors. The aim of neuromorphic computing is to faithfully reproduce the computing processes in the human brain, thus paralleling its outstanding energy efficiency and compactness. Toward this goal, however, some major challenges have to be faced. Since the brain processes information by high-density neural networks with ultra-low power consumption, novel device concepts combining high scalability, low-power operation, and advanced computing functionality must be developed. This work provides an overview of the most promising device concepts in neuromorphic computing including complementary metal-oxide semiconductor (CMOS) and memristive technologies. First, the physics and operation of CMOS-based floating-gate memory devices in artificial neural networks will be addressed. Then, several memristive concepts will be reviewed and discussed for applications in deep neural network and spiking neural network architectures. Finally, the main technology challenges and perspectives of neuromorphic computing will be discussed.
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Affiliation(s)
| | | | | | - Daniele Ielmini
- Dipartimento di Elettronica, Informazione e Bioingegneria, Politecnico di Milano and Italian Universities Nanoelectronics Team (IU.NET), Piazza L. da Vinci 32, 20133 Milano, Italy; (V.M.); (G.M.); (C.M.C.)
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134
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Towards spike-based machine intelligence with neuromorphic computing. Nature 2019; 575:607-617. [PMID: 31776490 DOI: 10.1038/s41586-019-1677-2] [Citation(s) in RCA: 319] [Impact Index Per Article: 63.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/23/2018] [Accepted: 07/09/2019] [Indexed: 11/08/2022]
Abstract
Guided by brain-like 'spiking' computational frameworks, neuromorphic computing-brain-inspired computing for machine intelligence-promises to realize artificial intelligence while reducing the energy requirements of computing platforms. This interdisciplinary field began with the implementation of silicon circuits for biological neural routines, but has evolved to encompass the hardware implementation of algorithms with spike-based encoding and event-driven representations. Here we provide an overview of the developments in neuromorphic computing for both algorithms and hardware and highlight the fundamentals of learning and hardware frameworks. We discuss the main challenges and the future prospects of neuromorphic computing, with emphasis on algorithm-hardware codesign.
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135
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Seo S, Lim J, Lee S, Alimkhanuly B, Kadyrov A, Jeon D, Lee S. Graphene-Edge Electrode on a Cu-Based Chalcogenide Selector for 3D Vertical Memristor Cells. ACS APPLIED MATERIALS & INTERFACES 2019; 11:43466-43472. [PMID: 31658414 DOI: 10.1021/acsami.9b11721] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Resistive memristors are considered to be key components in the hardware implementation of complex neuromorphic networks because of their simplicity, compactness, and manageable power dissipation. However, breakthroughs with respect to both the selector material technology and the bit-cost-effective three-dimensional (3D) device architecture are necessary to provide sufficient device density while maintaining the advantages of a two-terminal device. Despite substantial progress in the scaling of the memristor devices, the scaling potential of the selector materials remains unclear. A majority of the selector materials are unlikely to form conductive filaments, and the effect of the highly concentrated electrical fields on such materials is not well understood. In this study, the atomically thin graphene edge in a 3D vertical memory architecture is utilized to study the effect of highly focused electrical fields on a CuGeS chalcogenide selector layer. We demonstrate that additional interface resistance can improve the nonlinearity and reduce leakage current by almost three orders of magnitude; however, even a relatively low Cu+ ion density can adversely affect leakage because of the highly asymmetric electrode configuration. This study presents a meaningful step toward understanding the characteristics of mobile ions in solid chalcogenide electrolytes and the potential for ultrascaled selector devices.
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Affiliation(s)
- Shem Seo
- Semiconductor Device & Integration Laboratory, Department of Electronic Engineering , Kyunghee University , Yongin 17104 , Republic of Korea
| | - Jinho Lim
- Semiconductor Device & Integration Laboratory, Department of Electronic Engineering , Kyunghee University , Yongin 17104 , Republic of Korea
| | - Sunghwan Lee
- Semiconductor Device & Integration Laboratory, Department of Electronic Engineering , Kyunghee University , Yongin 17104 , Republic of Korea
| | - Batyrbek Alimkhanuly
- Semiconductor Device & Integration Laboratory, Department of Electronic Engineering , Kyunghee University , Yongin 17104 , Republic of Korea
| | - Arman Kadyrov
- Semiconductor Device & Integration Laboratory, Department of Electronic Engineering , Kyunghee University , Yongin 17104 , Republic of Korea
| | - Dasom Jeon
- Semiconductor Device & Integration Laboratory, Department of Electronic Engineering , Kyunghee University , Yongin 17104 , Republic of Korea
| | - Seunghyun Lee
- Semiconductor Device & Integration Laboratory, Department of Electronic Engineering , Kyunghee University , Yongin 17104 , Republic of Korea
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136
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Siemon A, Drabinski R, Schultis MJ, Hu X, Linn E, Heittmann A, Waser R, Querlioz D, Menzel S, Friedman JS. Stateful Three-Input Logic with Memristive Switches. Sci Rep 2019; 9:14618. [PMID: 31602003 PMCID: PMC6787102 DOI: 10.1038/s41598-019-51039-6] [Citation(s) in RCA: 12] [Impact Index Per Article: 2.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/30/2018] [Accepted: 09/19/2019] [Indexed: 11/29/2022] Open
Abstract
Memristive switches are able to act as both storage and computing elements, which make them an excellent candidate for beyond-CMOS computing. In this paper, multi-input memristive switch logic is proposed, which enables the function X OR (Y NOR Z) to be performed in a single-step with three memristive switches. This ORNOR logic gate increases the capabilities of memristive switches, improving the overall system efficiency of a memristive switch-based computing architecture. Additionally, a computing system architecture and clocking scheme are proposed to further utilize memristive switching for computation. The system architecture is based on a design where multiple computational function blocks are interconnected and controlled by a master clock that synchronizes system data processing and transfer. The clocking steps to perform a full adder with the ORNOR gate are presented along with simulation results using a physics-based model. The full adder function block is integrated into the system architecture to realize a 64-bit full adder, which is also demonstrated through simulation.
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Affiliation(s)
- A Siemon
- Institut für Werkstoffe der Elektrotechnik II (IWE II), RWTH Aachen University, Sommerfeldstr. 24, 52074, Aachen, Germany
- JARA-Fundamentals for Future Information Technology, Jülich, Germany
| | - R Drabinski
- Institut für Werkstoffe der Elektrotechnik II (IWE II), RWTH Aachen University, Sommerfeldstr. 24, 52074, Aachen, Germany
- JARA-Fundamentals for Future Information Technology, Jülich, Germany
| | - M J Schultis
- Department of Electrical and Computer Engineering, The University of Texas at Dallas, Richardson, 75080, Texas, USA
| | - X Hu
- Department of Electrical and Computer Engineering, The University of Texas at Dallas, Richardson, 75080, Texas, USA
| | - E Linn
- Institut für Werkstoffe der Elektrotechnik II (IWE II), RWTH Aachen University, Sommerfeldstr. 24, 52074, Aachen, Germany
- JARA-Fundamentals for Future Information Technology, Jülich, Germany
| | - A Heittmann
- Peter Grünberg Institut 10 (PGI-10) Forschungszentrum Jülich GmbH, Jülich, Germany
| | - R Waser
- Institut für Werkstoffe der Elektrotechnik II (IWE II), RWTH Aachen University, Sommerfeldstr. 24, 52074, Aachen, Germany
- JARA-Fundamentals for Future Information Technology, Jülich, Germany
- Peter Grünberg Institut 10 (PGI-10) Forschungszentrum Jülich GmbH, Jülich, Germany
- Peter Grünberg Institut 7 (PGI-7) Forschungszentrum Jülich GmbH, Jülich, Germany
| | - D Querlioz
- Centre de Nanosciences et de Nanotechnologies, CNRS, Univ. Paris-Sud, Université Paris-Saclay, Palaiseau, 91120, France
| | - S Menzel
- JARA-Fundamentals for Future Information Technology, Jülich, Germany.
- Peter Grünberg Institut 7 (PGI-7) Forschungszentrum Jülich GmbH, Jülich, Germany.
| | - J S Friedman
- Department of Electrical and Computer Engineering, The University of Texas at Dallas, Richardson, 75080, Texas, USA
- Centre de Nanosciences et de Nanotechnologies, CNRS, Univ. Paris-Sud, Université Paris-Saclay, Palaiseau, 91120, France
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137
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Graphene and two-dimensional materials for silicon technology. Nature 2019; 573:507-518. [PMID: 31554977 DOI: 10.1038/s41586-019-1573-9] [Citation(s) in RCA: 439] [Impact Index Per Article: 87.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/10/2018] [Accepted: 07/08/2019] [Indexed: 11/09/2022]
Abstract
The development of silicon semiconductor technology has produced breakthroughs in electronics-from the microprocessor in the late 1960s to early 1970s, to automation, computers and smartphones-by downscaling the physical size of devices and wires to the nanometre regime. Now, graphene and related two-dimensional (2D) materials offer prospects of unprecedented advances in device performance at the atomic limit, and a synergistic combination of 2D materials with silicon chips promises a heterogeneous platform to deliver massively enhanced potential based on silicon technology. Integration is achieved via three-dimensional monolithic construction of multifunctional high-rise 2D silicon chips, enabling enhanced performance by exploiting the vertical direction and the functional diversification of the silicon platform for applications in opto-electronics and sensing. Here we review the opportunities, progress and challenges of integrating atomically thin materials with silicon-based nanosystems, and also consider the prospects for computational and non-computational applications.
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138
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Adinolfi V, Cheng L, Laudato M, Clarke RC, Narasimhan VK, Balatti S, Hoang S, Littau KA. Composition-Controlled Atomic Layer Deposition of Phase-Change Memories and Ovonic Threshold Switches with High Performance. ACS NANO 2019; 13:10440-10447. [PMID: 31483611 DOI: 10.1021/acsnano.9b04233] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Chalcogenide compounds are the main characters in a revolution in electronic memories. These materials are used to produce ultrafast ovonic threshold switches (OTSs) with good selectivity and moderate leakage current and phase-change memories (PCMs) with excellent endurance and short read/write times when compared with state-of-the-art flash-NANDs. The combination of these two electrical elements is used to fabricate nonvolatile memory arrays with a write/access time orders of magnitude shorter than that of state-of-the-art flash-NANDs. These devices have a pivotal role for the advancement of fields such as artificial intelligence, machine learning, and big-data. Chalcogenide films, at the moment, are deposited by using physical vapor deposition (PVD) techniques that allow for fine control over the stoichiometry of solid solutions but fail in providing the conformality required for developing large-memory-capacity integrated 3D structures. Here we present conformal ALD chalcogenide films with control over the composition of germanium, antimony, and tellurium (GST). By developing a technique to grow elemental Te we demonstrate the ability to deposit conformal, smooth, composition-controlled GST films. We present a thorough physical and chemical characterization of the solids and an in-depth electrical test. We demonstrate the ability to produce both OTS and PCM materials. GeTe4 OTSs exhibit fast switching times of ∼13 ns. Ge2Sb2Te5 ALD PCMs exhibit a wide memory window exceeding two orders of magnitude, short write times (∼100 ns), and a reset current density as low as ∼107 A/cm2-performance matching or improving upon state-of-the-art PVD PCM devices.
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Affiliation(s)
- Valerio Adinolfi
- Intermolecular , 3011 North First Street , San Jose , California 95135 , United States
| | - Lanxia Cheng
- Intermolecular , 3011 North First Street , San Jose , California 95135 , United States
| | - Mario Laudato
- Intermolecular , 3011 North First Street , San Jose , California 95135 , United States
| | - Ryan C Clarke
- Intermolecular , 3011 North First Street , San Jose , California 95135 , United States
| | - Vijay K Narasimhan
- Intermolecular , 3011 North First Street , San Jose , California 95135 , United States
| | - Simone Balatti
- Intermolecular , 3011 North First Street , San Jose , California 95135 , United States
| | - Son Hoang
- Intermolecular , 3011 North First Street , San Jose , California 95135 , United States
| | - Karl A Littau
- Intermolecular , 3011 North First Street , San Jose , California 95135 , United States
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139
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Study on synthesis, characterization, and nonvolatile memory behavior of ferrocene-containing metallopolymers. J Organomet Chem 2019. [DOI: 10.1016/j.jorganchem.2019.04.025] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/24/2022]
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140
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Tizno O, Marshall ARJ, Fernández-Delgado N, Herrera M, Molina SI, Hayne M. Room-temperature Operation of Low-voltage, Non-volatile, Compound-semiconductor Memory Cells. Sci Rep 2019; 9:8950. [PMID: 31222059 PMCID: PMC6586817 DOI: 10.1038/s41598-019-45370-1] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/28/2018] [Accepted: 06/04/2019] [Indexed: 11/16/2022] Open
Abstract
Whilst the different forms of conventional (charge-based) memories are well suited to their individual roles in computers and other electronic devices, flaws in their properties mean that intensive research into alternative, or emerging, memories continues. In particular, the goal of simultaneously achieving the contradictory requirements of non-volatility and fast, low-voltage (low-energy) switching has proved challenging. Here, we report an oxide-free, floating-gate memory cell based on III-V semiconductor heterostructures with a junctionless channel and non-destructive read of the stored data. Non-volatile data retention of at least 104 s in combination with switching at ≤2.6 V is achieved by use of the extraordinary 2.1 eV conduction band offsets of InAs/AlSb and a triple-barrier resonant tunnelling structure. The combination of low-voltage operation and small capacitance implies intrinsic switching energy per unit area that is 100 and 1000 times smaller than dynamic random access memory and Flash respectively. The device may thus be considered as a new emerging memory with considerable potential.
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Affiliation(s)
- Ofogh Tizno
- Department of Physics, Lancaster University, Lancaster, LA1 4YB, UK
| | | | - Natalia Fernández-Delgado
- Department of Material Science, Metallurgical Engineering and Inorganic Chemistry, IMEYMAT, University of Cádiz, 11510, Puerto Real, Cádiz, Spain
| | - Miriam Herrera
- Department of Material Science, Metallurgical Engineering and Inorganic Chemistry, IMEYMAT, University of Cádiz, 11510, Puerto Real, Cádiz, Spain
| | - Sergio I Molina
- Department of Material Science, Metallurgical Engineering and Inorganic Chemistry, IMEYMAT, University of Cádiz, 11510, Puerto Real, Cádiz, Spain
| | - Manus Hayne
- Department of Physics, Lancaster University, Lancaster, LA1 4YB, UK.
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141
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Localised states and their capture characteristics in amorphous phase-change materials. Sci Rep 2019; 9:6592. [PMID: 31036924 PMCID: PMC6488676 DOI: 10.1038/s41598-019-43035-7] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/12/2018] [Accepted: 04/15/2019] [Indexed: 11/08/2022] Open
Abstract
As phase-change materials are poised to play a key role in next-generation computing systems, improving the current understanding of electrical transport in their amorphous phase can further strengthen their technological competitiveness. Even though the interaction of charge carriers with disorder-induced localised states largely affect the field-dependent conductivity, a clear link between electrical transport and specific features of the electronic density of states (DOS) could not be established yet due to a lack of knowledge of the capture characteristics of trap states. Here, we address this knowledge gap and employ modulated photocurrent spectroscopy (MPC) to investigate localised states in the frequently studied amorphous phase of Ge2Sb2Te5. Additionally, we present results on the DOS in the bandgap of amorphous AgIn-doped Sb2Te, which has not been subject to high-resolution DOS spectroscopy before. We find experimental evidence for clearly non-constant capture coefficients among a continuous spectrum of localised states in both studied materials. According to this observation especially in AgIn-doped Sb2Te, where no pronounced defect can be detected as main channel for carrier emission, we point out the necessity of modifying the current Poole-Frenkel-based transport modelling.
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142
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Abstract
Traditional Resistive Random Access Memory (RRAM) is a metal-insulator-metal (MIM) structure, in which metal oxide is usually used as an insulator. The charge transport mechanism of traditional RRAM is attributed to a metallic filament inside the RRAM. In this paper, we demonstrated a novel RRAM device with no metal inside. The N+-Si/SiOx/P+-Si combination forms a N+IP+ diode structure that is different from traditional MIM RRAM. A large high-resistance/low-resistance window of 1.9 × 104 was measured at room temperature. A favorable retention memory window of 1.2 × 103 was attained for 104 s at 85 °C. The charge transport mechanism of virgin, high- and low-resistance states can be well modeled by the single Shklovskii-Efros percolation mechanism rather than the charge transport in metallic filament. X-ray photoelectron spectroscopy demonstrated that the value of x in SiOx was 0.62, which provided sufficient oxygen vacancies for set/reset RRAM functions.
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143
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Solid-State Electrochemical Process and Performance Optimization of Memristive Materials and Devices. CHEMISTRY 2019. [DOI: 10.3390/chemistry1010005] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/17/2022] Open
Abstract
As an emerging technology, memristors are nanoionic-based electrochemical systems that retains their resistance state based on the history of the applied voltage/current. They can be used for on-chip memory and storage, biologically inspired computing, and in-memory computing. However, the underlying physicochemical processes of memristors still need deeper understanding for the optimization of the device properties to meet the practical application requirements. Herein, we review recent progress in understanding the memristive mechanisms and influential factors for the optimization of memristive switching performances. We first describe the working mechanisms of memristors, including the dynamic processes of active metal ions, native oxygen ions and other active ions in ECM cells, VCM devices and ion gel-based devices, and the switching mechanisms in organic devices, along with discussions on the influential factors of the device performances. The optimization of device properties by electrode/interface engineering, types/configurations of dielectric materials and bias scheme is then illustrated. Finally, we discuss the current challenges and the future development of the memristor.
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144
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Wang Y, Guo T, Liu G, Li T, Lv S, Song S, Cheng Y, Song W, Ren K, Song Z. Sc-Centered Octahedron Enables High-Speed Phase Change Memory with Improved Data Retention and Reduced Power Consumption. ACS APPLIED MATERIALS & INTERFACES 2019; 11:10848-10855. [PMID: 30810295 DOI: 10.1021/acsami.8b22580] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Phase change memory (PCM) with advantages of high operation speed, multilevel storage capability, spiking-time-dependent plasticity, etc., has wide application scenarios in both Von Neumann systems and neuromorphic systems. In the automotive application, intelligent system not only needs high efficiency to handle massive data processing but also good robustness to retain the existing data against high working temperature. In this work, Sc-doped GeTe is developed for PCM, which has achieved 120 °C data retention for 10 years, 6 ns operation speed, and 7 nJ low power consumption. The high data retention is attributed to the high coordination number of Sc and its strong bonds with Te atoms in the amorphous phase, which enhances the robustness of the atomic matrices. Sc-centered octahedrons in amorphous state provide a nucleation center, leading to fast crystallization. In the crystalline phase, Sc atoms occupy Ge vacancies to form a homogenous GeTe-like rhombohedral phase. The strong covalent-like Sc-Te bonds weaken the neighboring Ge-Te bonds, lowering energy for melting. Together with the increased energy efficiency originated from confined grain size, the reduced power consumption has been achieved. The improvements in data retention, speed, and power efficiency have made Sc-doped GeTe a promising candidate for high-performance automobile electronics application.
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Affiliation(s)
- Yong Wang
- State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology , Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences , Shanghai 200050 , China
- University of Chinese Academy of Sciences , Beijing 100049 , China
| | - Tianqi Guo
- State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology , Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences , Shanghai 200050 , China
- University of Chinese Academy of Sciences , Beijing 100049 , China
| | - Guangyu Liu
- State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology , Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences , Shanghai 200050 , China
- University of Chinese Academy of Sciences , Beijing 100049 , China
| | - Tao Li
- State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology , Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences , Shanghai 200050 , China
- University of Chinese Academy of Sciences , Beijing 100049 , China
| | - Shilong Lv
- State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology , Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences , Shanghai 200050 , China
| | - Sannian Song
- State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology , Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences , Shanghai 200050 , China
| | - Yan Cheng
- Key Laboratory of Polar Materials and Devices, Ministry of Education , East China Normal University , Shanghai 200062 , China
| | - Wenxiong Song
- State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology , Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences , Shanghai 200050 , China
| | - Kun Ren
- State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology , Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences , Shanghai 200050 , China
- College of Materials and Environmental Engineering , Hangzhou Dianzi University , Hangzhou , Zhejiang 310018 , China
| | - Zhitang Song
- State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology , Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences , Shanghai 200050 , China
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145
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Abstract
Gold, one of the noble metals, has played a significant role in human society throughout history. Gold's excellent electrical, optical and chemical properties make the element indispensable in maintaining a prosperous modern electronics industry. In the emerging field of stretchable electronics (elastronics), the main challenge is how to utilize these excellent material properties under various mechanical deformations. This review covers the recent progress in developing "softening" gold chemistry for various applications in elastronics. We systematically present material synthesis and design principles, applications, and challenges and opportunities ahead.
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Affiliation(s)
- Bowen Zhu
- Department of Chemical Engineering, Monash University, Clayton, Victoria 3800, Australia.
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146
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Zhang B, Fan F, Xue W, Liu G, Fu Y, Zhuang X, Xu XH, Gu J, Li RW, Chen Y. Redox gated polymer memristive processing memory unit. Nat Commun 2019; 10:736. [PMID: 30760719 PMCID: PMC6374435 DOI: 10.1038/s41467-019-08642-y] [Citation(s) in RCA: 40] [Impact Index Per Article: 8.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/19/2018] [Accepted: 01/23/2019] [Indexed: 11/22/2022] Open
Abstract
Memristors with enormous storage capacity and superior processing efficiency are of critical importance to overcome the Moore’s Law limitation and von Neumann bottleneck problems in the big data and artificial intelligence era. In particular, the integration of multifunctionalities into a single memristor promises an essential strategy of obtaining a high-performance electronic device that satisfies the nowadays increasing demands of data storage and processing. In this contribution, we report a proof-of-concept polymer memristive processing-memory unit that demonstrates programmable information storage and processing capabilities. By introducing redox active moieties of triphenylamine and ferrocene onto the pendants of fluorene skeletons, the conjugated polymer exhibits triple oxidation behavior and interesting memristive switching characteristics. Associated with the unique electrochemical and electrical behavior, the polymer device is capable of executing multilevel memory, decimal arithmetic operations of addition, subtraction, multiplication and division, as well as simple Boolean logic operations. Though designing conductive polymers for memory devices is attractive for future low-cost flexible electronics, a proof-of-concept device has yet to be realized. Here, the authors report a redox-gated polymer memristive processing unit with programmable multilevel storage and logic functionalities.
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Affiliation(s)
- Bin Zhang
- Key Laboratory for Advanced Materials, Institute of Applied Chemistry, School of Chemistry and Molecular Engineering, East China University of Science and Technology, Shanghai, 200237, China
| | - Fei Fan
- Key Laboratory for Advanced Materials, Institute of Applied Chemistry, School of Chemistry and Molecular Engineering, East China University of Science and Technology, Shanghai, 200237, China
| | - Wuhong Xue
- School of Chemistry and Chemical Engineering, Shanghai Jiao Tong University, Shanghai, 200240, China.,CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, Zhejiang, 315201, China.,Key Laboratory of Magnetic Molecules and Magnetic Information Materials of Ministry of Education, School of Chemistry and Materials Science, Shanxi Normal University, Linfen, Shanxi, 041004, China
| | - Gang Liu
- School of Chemistry and Chemical Engineering, Shanghai Jiao Tong University, Shanghai, 200240, China. .,CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, Zhejiang, 315201, China.
| | - Yubin Fu
- Center for Advancing Electronics Dresden (cfaed) & Department of Chemistry and Food Chemistry, Technische Universität Dresden, Dresden, 01062, Germany.
| | - Xiaodong Zhuang
- School of Chemistry and Chemical Engineering, Shanghai Jiao Tong University, Shanghai, 200240, China.,Center for Advancing Electronics Dresden (cfaed) & Department of Chemistry and Food Chemistry, Technische Universität Dresden, Dresden, 01062, Germany
| | - Xiao-Hong Xu
- Key Laboratory of Magnetic Molecules and Magnetic Information Materials of Ministry of Education, School of Chemistry and Materials Science, Shanxi Normal University, Linfen, Shanxi, 041004, China
| | - Junwei Gu
- Shaanxi Key Laboratory of Macromolecular Science and Technology, Department of Applied Chemistry, School of Science, Northwestern Polytechnical University, Xi'an, Shaanxi, 710072, China
| | - Run-Wei Li
- CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, Zhejiang, 315201, China
| | - Yu Chen
- Key Laboratory for Advanced Materials, Institute of Applied Chemistry, School of Chemistry and Molecular Engineering, East China University of Science and Technology, Shanghai, 200237, China.
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147
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Direct atomic identification of cation migration induced gradual cubic-to-hexagonal phase transition in Ge2Sb2Te5. Commun Chem 2019. [DOI: 10.1038/s42004-019-0114-7] [Citation(s) in RCA: 19] [Impact Index Per Article: 3.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/08/2022] Open
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148
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Manzetti S, Gabriel JCP. Methods for dispersing carbon nanotubes for nanotechnology applications: liquid nanocrystals, suspensions, polyelectrolytes, colloids and organization control. INTERNATIONAL NANO LETTERS 2019. [DOI: 10.1007/s40089-018-0260-4] [Citation(s) in RCA: 20] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/27/2022]
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149
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Danesi S, Alessandri I. Using optical resonances to control heat generation and propagation in silicon nanostructures. Phys Chem Chem Phys 2019; 21:11724-11730. [DOI: 10.1039/c8cp07573e] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
Integrated electronics, photonics and optoelectronics need full control of lattice reconstruction processes in silicon nanostructures at the nanoscale level.
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Affiliation(s)
- Stefano Danesi
- INSTM-UdR Brescia
- 25123 Brescia
- Italy
- Department of Mechanical and Industrial Engineering
- 25123 Brescia
| | - Ivano Alessandri
- INSTM-UdR Brescia
- 25123 Brescia
- Italy
- Department of Information Engineering
- University of Brescia
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150
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Gao S, Yi X, Shang J, Liu G, Li RW. Organic and hybrid resistive switching materials and devices. Chem Soc Rev 2019; 48:1531-1565. [DOI: 10.1039/c8cs00614h] [Citation(s) in RCA: 211] [Impact Index Per Article: 42.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/23/2022]
Abstract
This review presents a timely and comprehensive summary of organic and hybrid materials for nonvolatile resistive switching memory applications in the “More than Moore” era, with particular attention on their designing principles for electronic property tuning and flexible memory performance.
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Affiliation(s)
- Shuang Gao
- CAS Key Laboratory of Magnetic Materials and Devices
- Ningbo Institute of Materials Technology and Engineering
- Chinese Academy of Sciences
- Ningbo
- China
| | - Xiaohui Yi
- CAS Key Laboratory of Magnetic Materials and Devices
- Ningbo Institute of Materials Technology and Engineering
- Chinese Academy of Sciences
- Ningbo
- China
| | - Jie Shang
- CAS Key Laboratory of Magnetic Materials and Devices
- Ningbo Institute of Materials Technology and Engineering
- Chinese Academy of Sciences
- Ningbo
- China
| | - Gang Liu
- CAS Key Laboratory of Magnetic Materials and Devices
- Ningbo Institute of Materials Technology and Engineering
- Chinese Academy of Sciences
- Ningbo
- China
| | - Run-Wei Li
- CAS Key Laboratory of Magnetic Materials and Devices
- Ningbo Institute of Materials Technology and Engineering
- Chinese Academy of Sciences
- Ningbo
- China
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