Catalytically Active Silicon Oxide Nanoclusters Stabilized in a Metal–Organic Framework

Generating Catalytic Sites in UiO-66 through Defect Engineering

UiO-66 is regarded as an epitome of metal-organic frameworks (MOFs) because of its stability. Defect engineering has been used as a toolbox to alter the performance of MOFs. UiO-66 is among the most widely explored MOFs because of its capability to bear a high number of defects without undergoing structural collapse. Several representative works in the field of MOF-based defect engineering are available based on UiO-66. In this review, more emphasis is given toward the construction of catalytic sites by engineering defects in UiO-66 as a representative including all the detailed synthesis procedures for inducing defects, and the characterization techniques used to analyze these defects in UiO-66 are discussed. Furthermore, a comprehensive review for the defects themselves and the support using defects in catalysis is provided to accentuate the importance of defect engineering.

Pyrene-based metal organic frameworks: from synthesis to applications

Pyrene is one of the most widely investigated aromatic hydrocarbons given to its unique optical and electronic properties. Hence, pyrene-based ligands have been attractive for the synthesis of metal-organic frameworks (MOFs) in the last few years. In this review, we will focus on the most important characteristics of pyrene, in addition to the development and synthesis of pyrene-based molecules as bridging ligands to be used in MOF structures. We will summarize the synthesis attempts, as well as the post-synthetic modifications of pyrene-based MOFs by the incorporation of metals or ligands in the structure. The discussion of promising results of such MOFs in several applications; including luminescence, photocatalysis, adsorption and separation, heterogeneous catalysis, electrochemical applications and bio-medical applications will be highlighted. Finally, some insights and future prospects will be given based on the studies discussed in the review. This review will pave the way for the researchers in the field for the design and development of novel pyrene-based structures and their utilization for different applications.

Atomic layer deposition SiO2 films over dental ZrO2 towards strong adhesive to resin

Atomic layer deposition (ALD) is a self-limiting nanoscale film deposition technology with the advantages of good stability, consistency and conformability. In this study, we proposed to deposit silica (SiO₂) films over dental zirconium-oxide (ZrO₂) by ALD for better SiO₂ films and higher bond strength between ZrO₂ and resin. To investigate the superiority of film deposited by ALD, other surface modification methods such as sol-gel, vapor phase hydrolysis and electrostatic self-assembly were compared in terms of the short-term and long-term bond strength between ZrO₂ and resin, measured by universal testing machine. Meanwhile, the surface morphology and chemical elemental analysis were characterized by scanning electron microscopy (SEM), energy dispersive spectrometer (EDS) and Fourier transform infrared spectroscopy (FTIR). Results showed that the SiO₂ films deposited by ALD or electrostatic self-assembly were uniform and consistent while sol-gel and vapor phase hydrolysis formed SiO₂ films with cracks or pores, changing the morphology of ZrO₂. ALD had the best results among all methods and increased the bond strength to 16.49 ± 1.60 MPa and 13.44 ± 1.63 MPa before and after aging respectively, which is expected to improve the long-term success rate of clinical dental ZrO₂ prostheses.

The Synthesis Science of Targeted Vapor-Phase Metal-Organic Framework Postmodification

The postmodification of metal organic frameworks (MOFs) affords exceedingly high surface area materials with precisely installed chemical features, which provide new opportunities for detailed structure-function correlation in the field of catalysis. Here, we significantly expand upon the number of vapor-phase postmodification processes reported to date through screening a library of atomic layer deposition (ALD) precursors, which span metals across the periodic table and which include ligands from four distinct precursor classes. With a large library of precursors and synthesis conditions, we discern trends in the compatibility of precursor classes for well-behaved ALD in MOFs (AIM) and identify challenges and solutions to more precise postsynthetic modification.

Metal–Organic Framework Hybrid Materials and Their Applications

The inherent porous nature and facile tunability of metal–organic frameworks (MOFs) make them ideal candidates for use in multiple fields. MOF hybrid materials are derived from existing MOFs hybridized with other materials or small molecules using a variety of techniques. This led to superior performance of the new materials by combining the advantages of MOF components and others. In this review, we discuss several hybridization methods for the preparation of various MOF hybrids with representative examples from the literature. These methods include covalent modifications, noncovalent modifications, and using MOFs as templates or precursors. We also review the applications of the MOF hybrids in the fields of catalysis, drug delivery, gas storage and separation, energy storage, sensing, and others.

Computational Design of Functionalized Metal-Organic Framework Nodes for Catalysis

Recent progress in the synthesis and characterization of metal-organic frameworks (MOFs) has opened the door to an increasing number of possible catalytic applications. The great versatility of MOFs creates a large chemical space, whose thorough experimental examination becomes practically impossible. Therefore, computational modeling is a key tool to support, rationalize, and guide experimental efforts. In this outlook we survey the main methodologies employed to model MOFs for catalysis, and we review selected recent studies on the functionalization of their nodes. We pay special attention to catalytic applications involving natural gas conversion.

Atomic Layer Deposition of Rhenium-Aluminum Oxide Thin Films and ReOx Incorporation in a Metal-Organic Framework

Methyltrioxorhenium (ReO₃Me) is introduced as the first rhenium atomic layer deposition (ALD) precursor and used to grow rhenium-aluminum oxide thin films in combination with trimethylaluminum (TMA-AlMe₃). The growth rate of the smooth Re-Al oxide films, with general stoichiometry Re_xAl_yO_3x, has been monitored by in situ quartz crystal microbalance (QCM) and ex situ ellipsometry, and found to be 3.2 Å/cycle. X-ray photoelectron spectroscopy (XPS) revealed the mixed valent composition of the film with Re(III) species being the main component. In addition, ReO₃Me has been successfully used to deposit rhenium oxide in NU-1000, a mesoporous zirconium-based metal-organic framework (MOF). The metalated MOF was found to retain porosity and crystallinity and to be catalytically active for ethene hydrogenation.