Cao T, Zhang H, Yan B, Lu W, Cheng Y. Optical emission spectroscopy diagnostic and thermodynamic analysis of thermal plasma enhanced nanocrystalline silicon CVD process.
RSC Adv 2014. [DOI:
10.1039/c4ra01306a]
[Citation(s) in RCA: 14] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/04/2023] Open
Abstract
Optical emission spectroscopy and thermal equilibrium analysis were implemented to study the plasma enhanced chemical vapor deposition of nanocrystalline silicon.
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