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For: Yun S, Ding Y, Zhang Y, Christofides PD. Integration of feedback control and run-to-run control for plasma enhanced atomic layer deposition of hafnium oxide thin films. Comput Chem Eng 2021. [DOI: 10.1016/j.compchemeng.2021.107267] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/22/2022]
Number Cited by Other Article(s)
1
Machine learning-based run-to-run control of a spatial thermal atomic layer etching reactor. Comput Chem Eng 2022. [DOI: 10.1016/j.compchemeng.2022.108044] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/18/2022]
2
Yun S, Tom M, Ou F, Orkoulas G, Christofides PD. Multivariable run-to-run control of thermal atomic layer etching of aluminum oxide thin films. Chem Eng Res Des 2022. [DOI: 10.1016/j.cherd.2022.03.039] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
3
Multiscale computational fluid dynamics modeling of thermal atomic layer etching: Application to chamber configuration design. Comput Chem Eng 2022. [DOI: 10.1016/j.compchemeng.2022.107757] [Citation(s) in RCA: 4] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
4
Yun S, Tom M, Luo J, Orkoulas G, Christofides PD. Microscopic and data-driven modeling and operation of thermal atomic layer etching of aluminum oxide thin films. Chem Eng Res Des 2022. [DOI: 10.1016/j.cherd.2021.10.016] [Citation(s) in RCA: 5] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/03/2022]
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