Recent advances on benzylidene ketones as photoinitiators of polymerization

High-Performance Photoinitiating Systems for LED-Induced Photopolymerization

Currently, increasing attention has been focused on light-emitting diodes (LEDs)-induced photopolymerization. The common LEDs (e.g., LED at 365 nm and LED at 405 nm) possess narrow emission bands. Due to their light absorption properties, most commercial photoinitiators are sensitive to UV light and cannot be optimally activated under visible LED irradiation. Although many photoinitiators have been designed for LED-induced free radical polymerization and cationic polymerization, there is still the issue of the mating between photoinitiators and LEDs. Therefore, the development of novel photoinitiators, which could be applied under LED irradiation, is significant. Many photoinitiating systems have been reported in the past decade. In this review, some recently developed photoinitiators used in LED-induced photopolymerization, mainly in the past 5 years, are summarized and categorized as Type Ⅰ photoinitiators, Type Ⅱ photoinitiators, and dye-based photoinitiating systems. In addition, their light absorption properties and photoinitiation efficiencies are discussed.

Benzylidene Cyclopentanone Derivative Photoinitiator for Two-Photon Photopolymerization-Photochemistry and 3D Structures Fabrication for X-ray Application

Micron- and submicron-scale 3D structure realization nowadays is possible due to the two-photon photopolymerization (TPP) direct laser writing photolithography (DLW photolithography) method. However, the achievement of lithographic features with dimensions less than 100 nm is in demand for the fabrication of micro-optical elements with high curvature values, including X-ray microlenses. Spectroscopic and photochemical study of a photoinitiator (PI) based on a methyl methacrylate derivative of 2,5-bis(4-(dimethylamino)benzylidene) cyclopentanone was performed. Enhanced intersystem crossing in the methyl methacrylate derivative results in increased radical generation for the subsequent initiation of polymerization. A comprehensive study of the new photocompositions was performed, with particular emphasis on photochemical constants, the degree of photopolymerization, and topology. The optimal parameters for the fabrication of mechanically stable structures were determined in this research. The threshold dose parameters for lithography (radiation power of 5 mW at a speed of 180 µm/s) when trying to reach saturation values with a conversion degree of (35 ± 1) % were defined, as well as parameters for sub-100 nm feature fabrication. Moreover, the 45 nm feature size for elements was reached. Fabrication of X-ray lens microstructures was also demonstrated.