Two-Dimensional Ordering in Block Copolymer Monolayer Thin Films upon Selective Solvent Annealing

Correlating Nanostructure, Optical and Electronic Properties of Nanogranular Silver Layers during Polymer-Template-Assisted Sputter Deposition

Tailoring the optical and electronic properties of nanostructured polymer-metal composites demonstrates great potential for efficient fabrication of modern organic optical and electronic devices such as flexible sensors, transistors, diodes, or photovoltaics. Self-assembled polymer-metal nanocomposites offer an excellent perspective for creating hierarchical nanostructures on macroscopic scales by simple bottom-up processes. We investigate the growth processes of nanogranular silver (Ag) layers on diblock copolymer thin film templates during sputter deposition. The Ag growth is strongly driven by self-assembly and selective wetting on the lamella structure of polystyrene-block-poly(methyl methacrylate). We correlate the emerging nanoscale morphologies with collective optical and electronic properties and quantify the difference in Ag growth on the corresponding homopolymer thin films. Thus, we are able to determine the influence of the respective polymer template and observe substrate effects on the Ag cluster percolation threshold, which affects the insulator-to-metal transition (IMT). Optical spectroscopy in the UV-vis regime reveals localized surface plasmon resonance for the metal-polymer composite. Their maximum absorption is observed around the IMT due to the subsequent long-range electron conduction in percolated nanogranular Ag layers. Using X-ray photoelectron spectroscopy and Fourier-transform infrared spectroscopy, we identify the oxidation of Ag at the acrylate side chains as an essential influencing factor driving the selective wetting behavior in the early growth stages. The results of polymer-templated cluster growth are corroborated by atomic force microscopy and field emission scanning electron microscopy.

Directed self-assembly of solvent-vapor-induced non-bulk block copolymer morphologies on nanopatterned substrates

We report a study on directed self-assembly (DSA) with solvent annealing to induce the formation of non-bulk block copolymer microdomains on chemical patterns. Ultrathin films of symmetric polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) display morphologies of PMMA dots, stripes, and PS hexagons with increasing exposure time to acetone vapor, a PMMA-selective solvent. All three nanostructures form long-range-ordered and registered arrays on striped chemical patterns with periods (LS) commensurate to the solvated PS-b-PMMA microdomain period (L0,s). Solvent annealing is shown to facilitate DSA on non-regular chemical patterns, on which the local periods are incommensurate to L0,s. DSA with feature density multiplication, via solvent annealing, is also demonstrated.

Blending and Morphology Control To Turn Hydrophobic SEBS Electrospun Mats Superhydrophilic

Thermoplastic elastomer SEBS, a triblock copolymer composed of styrene (S) and ethylene-co-butylene (EB) blocks, can be dissolved and processed by electrospinning to produce flexible nonwoven mats that can be interesting for applications like filtration or separation membranes. Controlling surface properties such as hydrophobicity/hydrophilicity is critical to achieving a desired performance. In this study, hydrophobic electrospun SEBS mats were obtained, following which an amphiphilic molecule (Pluronic F127) was solution-blended with SEBS prior to electrospinning, in a bid to produce a hydrophilic membrane. The result was a fast-spreading superhydrophilic mat with thinner fibers that preserved the flexibility of the SEBS. The morphologies of nonwoven mats, flat films (prepared by dip-coating using identical solutions) and of the surface of individual fibers were characterized using different microscopy techniques (optical, scanning electron microscopy and atomic force microscopy). Chemical analysis by X-ray photoelectron spectroscopy (XPS) revealed a large F127 concentration in the outermost surface layer. In addition, an analysis of dip-coated flat films revealed that for 20 wt % of F127, there was a change in the blend morphology from dispersed F127-rich regions in the SEBS matrix to an interconnected phase homogeneously distributed across the film that resembled grain boundaries of micellar crystals. Our results indicated that this morphology change at 20 wt % of F127 also occurred to some extent in the electrospun fibers and this, combined with the large surface area of the mats, led to a drastic reduction in the contact angle and fast water absorption, turning hydrophobic electrospun mats superhydrophilic.

Directed self-assembly of block copolymers: a tutorial review of strategies for enabling nanotechnology with soft matter

Self-assembly of soft materials is broadly considered an attractive means of generating nanoscale structures and patterns over large areas. However, the spontaneous formation of equilibrium nanostructures in response to temperature and concentration changes, for example, must be guided to yield the long-range order and orientation required for utility in a given scenario. In this review we examine directed self-assembly (DSA) of block copolymers (BCPs) as canonical examples of nanostructured soft matter systems which are additionally compelling for creating functional materials and devices. We survey well established and newly emerging DSA methods from a tutorial perspective. Special emphasis is given to exploring underlying physical phenomena, identifying prototypical BCPs that are compatible with different DSA techniques, describing experimental methods and highlighting the attractive functional properties of block copolymers overall. Finally we offer a brief perspective on some unresolved issues and future opportunities in this field.

Topologically Distinct Lamellar Block Copolymer Morphologies Formed by Solvent and Thermal Annealing

Solvent annealing produces ordered assemblies in thin films of block copolymers and, in contrast to uniform thermal annealing, can be used to tune the self-assembled morphology, control the domain orientation with respect to the substrate, and, as demonstrated here, reduce the defect density. The two-dimensional network topology of lamellae self-assembled by polystyrene-block-poly(methyl methacrylate) block copolymers in thin films was compared when processed by solvent and thermal annealing techniques. The mixed solvent annealing method described here reduced the overall defect density (e.g., dislocations with PMMA or PS cores) and thus the connectivity of the lamellar domains compared to thermal annealing; however, the long-range continuity of the networks was maintained and depended primarily on the copolymer composition. In addition, the persistence length of the lamellar domains for solvent annealed films was found to be 2-3 times that of the corresponding thermally annealed systems.

Size and space controlled hexagonal arrays of superparamagnetic iron oxide nanodots: magnetic studies and application

Highly dense hexagonally arranged iron oxide nanodots array were fabricated using PS-b-PEO self-assembled patterns. The copolymer molecular weight, composition and choice of annealing solvent/s allows dimensional and structural control of the nanopatterns at large scale. A mechanism is proposed to create scaffolds through degradation and/or modification of cylindrical domains. A methodology based on selective metal ion inclusion and subsequent processing was used to create iron oxide nanodots array. The nanodots have uniform size and shape and their placement mimics the original self-assembled nanopatterns. For the first time these precisely defined and size selective systems of ordered nanodots allow careful investigation of magnetic properties in dimensions from 50 nm to 10 nm, which delineate the nanodots are superparamagnetic, well-isolated and size monodispersed. This diameter/spacing controlled iron oxide nanodots systems were demonstrated as a resistant mask over silicon to fabricate densely packed, identical ordered, high aspect ratio silicon nanopillars and nanowire features.

Sub-10 nm feature size PS-b-PDMS block copolymer structures fabricated by a microwave-assisted solvothermal process

Block copolymer (BCP) microphase separation at surfaces might enable the generation of substrate features in a scalable, manufacturable, bottom-up fashion provided that pattern structure, orientation, alignment can be strictly controlled. A further requirement is that self-assembly takes place within periods of the order of minutes so that continuous manufacturingprocesses do not require lengthy pretreatments and sample storageleading to contamination and large facility costs. We report here microwave-assisted solvothermal (in toluene environments) self-assembly and directed self-assembly of a very low molecular weight cylinder-forming polystyrene-block-polydimethylsiloxane (PS-b-PDMS) BCP on planar and patterned silicon nitride (Si3N4) substrates. Good pattern ordering was achieved in the order of minutes. Factors affecting BCP self-assembly, notably anneal time and temperature were studied and seen to have significant effects. Graphoepitaxy to direct self-assembly in the BCP yielded promising results producing BCP patterns with long-range translational alignment commensurate with the pitch period of the topographic patterns. This rapid BCP ordering method is consistent with the standard thermal/solvent anneal processes.

Automatic hammering of nano-patterns on special polymer film by using a vibrating AFM tip

Complicated nano-patterns with linewidth less than 18 nm can be automatically hammered by using atomic force microscopy (AFM) tip in tapping mode with high speed. In this study, the special sample was thin poly(styrene-ethylene/butylenes-styrene) (SEBS) block copolymer film with hexagonal spherical microstructures. An ordinary silicon tip was used as a nano-hammer, and the entire hammering process is controlled by a computer program. Experimental results demonstrate that such structure-tailored thin films enable AFM tip hammering to be performed on their surfaces. Both imprinted and embossed nano-patterns can be generated by using a vibrating tip with a larger tapping load and by using a predefined program to control the route of tip movement as it passes over the sample's surface. Specific details for the fabrication of structure-tailored SEBS film and the theory for auto-hammering patterns were presented in detail.

Cyclical "flipping" of morphology in block copolymer thin films

We studied the kinetics of nanopattern evolution in (polystyrene-b-polyethylene oxide) diblock copolymer thin films. Using scanning force microscopy, a highly unexpected cylindrical flipping of morphology from normal to parallel to the film plane was detected during solvent annealing of the film (with average thickness of 30 nm) at high vapor pressure. Using an in situ time-resolved light scattering device combined with an environmental cell enabled us to obtain kinetic information at different vapor pressures. The data indicated that there is a threshold value for the vapor pressure necessary for the structural transition. We propose a swelling and deswelling mechanism for the orientation flipping of the morphology. The cyclic transition occurs faster in thick films (177 nm) where the mass uptake and solvent volume fraction is smaller and therefore the driving force for phase separation is higher. We induced a stronger segregation by confining the chains in graphoepitaxially patterned substrates. As expected, the cyclic transition occurred at higher rate. Our work is another step forward to understanding the structure evolution and also controlling the alignment of block copolymer nanocylinders independently of thickness and external fields.

AFM tip hammering nanolithography

Nanolithography at low cost and high speed is made possible by using a vibrating AFM tip in tapping-mode as a nanohammer to forge polystyrene-block-poly(ethylene/butylenes)-block-polystyrene triblock copolymer monolayer thin films after annealing to transform their microstructures from as-cast poorly ordered cylinders into well-ordered hexagonal spheres. Annealing is accomplished in cyclohexane vapor, a selective solvent for the majority poly(ethylene/butylenes) block. Experimental results demonstrate that such structure-tailored thin films enable macroscopic AFM tip writing to be performed in their surface; imprinted and embossed patterns can be generated with a sub-20-nm line-width resolution. In addition, it is found that the lithographic patterns generated can be erased within 5 min by thermal annealing at 70 degrees C, and if necessary the erasion process can be expedited by increasing the annealing temperature.