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Pula P, Leniart A, Majewski PW. Solvent-assisted self-assembly of block copolymer thin films. SOFT MATTER 2022; 18:4042-4066. [PMID: 35608282 DOI: 10.1039/d2sm00439a] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
Solvent-assisted block copolymer self-assembly is a compelling method for processing and advancing practical applications of these materials due to the exceptional level of the control of BCP morphology and significant acceleration of ordering kinetics. Despite substantial experimental and theoretical efforts devoted to understanding of solvent-assisted BCP film ordering, the development of a universal BCP patterning protocol remains elusive; possibly due to a multitude of factors which dictate the self-assembly scenario. The aim of this review is to aggregate both seminal reports and the latest progress in solvent-assisted directed self-assembly and to provide the reader with theoretical background, including the outline of BCP ordering thermodynamics and kinetics phenomena. We also indicate significant BCP research areas and emerging high-tech applications where solvent-assisted processing might play a dominant role.
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Affiliation(s)
- Przemyslaw Pula
- Department of Chemistry, University of Warsaw, Warsaw 02089, Poland.
| | - Arkadiusz Leniart
- Department of Chemistry, University of Warsaw, Warsaw 02089, Poland.
| | - Pawel W Majewski
- Department of Chemistry, University of Warsaw, Warsaw 02089, Poland.
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2
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Selkirk A, Prochukhan N, Lundy R, Cummins C, Gatensby R, Kilbride R, Parnell A, Baez Vasquez J, Morris M, Mokarian-Tabari P. Optimization and Control of Large Block Copolymer Self-Assembly via Precision Solvent Vapor Annealing. Macromolecules 2021; 54:1203-1215. [PMID: 34276069 PMCID: PMC8280752 DOI: 10.1021/acs.macromol.0c02543] [Citation(s) in RCA: 16] [Impact Index Per Article: 5.3] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/13/2020] [Revised: 01/07/2021] [Indexed: 01/08/2023]
Abstract
The self-assembly of ultra-high molecular weight (UHMW) block copolymers (BCPs) remains a complex and time-consuming endeavor owing to the high kinetic penalties associated with long polymer chain entanglement. In this work, we report a unique strategy of overcoming these kinetic barriers through precision solvent annealing of an UHMW polystyrene-block-poly(2-vinylpyridine) BCP system (M w: ∼800 kg/mol) by fast swelling to very high levels of solvent concentration (ϕs). Phase separation on timescales of ∼10 min is demonstrated once a thickness-dependent threshold ϕs value of ∼0.80-0.86 is achieved, resulting in lamellar feature spacings of over 190 nm. The threshold ϕs value was found to be greater for films with higher dry thickness (D 0) values. Tunability of the domain morphology is achieved through controlled variation of both D 0 and ϕs, with the kinetically unstable hexagonal perforated lamellar (HPL) phase observed at ϕs values of ∼0.67 and D 0 values of 59-110 nm. This HPL phase can be controllably induced into an order-order transition to a lamellar morphology upon further increase of ϕs to 0.80 or above. As confirmed by grazing-incidence small-angle X-ray scattering, the lateral ordering of the lamellar domains is shown to improve with increasing ϕs up to a maximum value at which the films transition to a disordered state. Thicker films are shown to possess a higher maximum ϕs value before transitioning to a disordered state. The swelling rate is shown to moderately influence the lateral ordering of the phase-separated structures, while the amount of hold time at a particular value of ϕs does not notably enhance the phase separation process. These large period self-assembled lamellar domains are then employed to facilitate pattern transfer using a liquid-phase infiltration method, followed by plasma etching, generating ordered, high aspect ratio Si nanowall structures with spacings of ∼190 nm and heights of up to ∼500 nm. This work underpins the feasibility of a room-temperature, solvent-based annealing approach for the reliable and scalable fabrication of sub-wavelength nanostructures via BCP lithography.
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Affiliation(s)
- Andrew Selkirk
- Advanced
Material and BioEngineering Research Centre (AMBER), Trinity College Dublin, The University of Dublin, Dublin 2, Ireland
- School
of Chemistry, Trinity College Dublin, The
University of Dublin, Dublin 2, Ireland
| | - Nadezda Prochukhan
- Advanced
Material and BioEngineering Research Centre (AMBER), Trinity College Dublin, The University of Dublin, Dublin 2, Ireland
- School
of Chemistry, Trinity College Dublin, The
University of Dublin, Dublin 2, Ireland
| | - Ross Lundy
- Advanced
Material and BioEngineering Research Centre (AMBER), Trinity College Dublin, The University of Dublin, Dublin 2, Ireland
- School
of Chemistry, Trinity College Dublin, The
University of Dublin, Dublin 2, Ireland
| | - Cian Cummins
- CNRS,
Bordeaux INP, LCPO, UMR 5629 and CNRS, Centre de Recherche Paul Pascal,
UMR 5031, Université de Bordeaux, Pessac F-33600, France
| | - Riley Gatensby
- Advanced
Material and BioEngineering Research Centre (AMBER), Trinity College Dublin, The University of Dublin, Dublin 2, Ireland
- School
of Chemistry, Trinity College Dublin, The
University of Dublin, Dublin 2, Ireland
| | - Rachel Kilbride
- Department
of Physics and Astronomy, University of
Sheffield, Sheffield S3 7RH, U.K.
| | - Andrew Parnell
- Department
of Physics and Astronomy, University of
Sheffield, Sheffield S3 7RH, U.K.
| | - Jhonattan Baez Vasquez
- Advanced
Material and BioEngineering Research Centre (AMBER), Trinity College Dublin, The University of Dublin, Dublin 2, Ireland
- School
of Chemistry, Trinity College Dublin, The
University of Dublin, Dublin 2, Ireland
| | - Michael Morris
- Advanced
Material and BioEngineering Research Centre (AMBER), Trinity College Dublin, The University of Dublin, Dublin 2, Ireland
- School
of Chemistry, Trinity College Dublin, The
University of Dublin, Dublin 2, Ireland
| | - Parvaneh Mokarian-Tabari
- Advanced
Material and BioEngineering Research Centre (AMBER), Trinity College Dublin, The University of Dublin, Dublin 2, Ireland
- School
of Chemistry, Trinity College Dublin, The
University of Dublin, Dublin 2, Ireland
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3
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Löfstrand A, Svensson J, Wernersson LE, Maximov I. Feature size control using surface reconstruction temperature in block copolymer lithography for InAs nanowire growth. NANOTECHNOLOGY 2020; 31:325303. [PMID: 32330916 DOI: 10.1088/1361-6528/ab8cef] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/12/2023]
Abstract
Here we present a method to control the size of the openings in hexagonally organized BCP thin films of poly(styrene)-block-poly(4-vinylpyridine) (PS-b-P4VP) by using surface reconstruction. The surface reconstruction is based on selective swelling of the P4VP block in ethanol, and its extraction to the surface of the film, resulting in pores upon drying. We found that the BCP pore diameter increases with ethanol immersion temperature. In our case, the temperature range 18 to 60 °C allowed fine-tuning of the pore size between 14 and 22 nm. A conclusion is that even though the molecular weight of the respective polymer blocks is fixed, the PS-b-P4VP pore diameter can be tuned by controlling temperature during surface reconstruction. These results can be used for BCP-based nanofabrication in general, and for vertical nanowire growth in particular, where high pattern density and diameter control are of importance. Finally, we demonstrate successful growth of indium arsenide InAs vertical nanowires by selective-area metal-organic vapor phase epitaxy (MOVPE), using a silicon nitride mask patterned by the proposed PS-b-P4VP surface reconstruction lithography method.
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4
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Sunday DF, Chen X, Albrecht TR, Nowak D, Delgadillo PR, Dazai T, Miyagi K, Maehashi T, Yamazaki A, Nealey PF, Kline RJ. The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography. CHEMISTRY OF MATERIALS : A PUBLICATION OF THE AMERICAN CHEMICAL SOCIETY 2020; 32:https://doi.org/10.1021/acs.chemmater.9b04833. [PMID: 33100517 PMCID: PMC7580231] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
The challenges of patterning next generation integrated circuits have driven the semiconductor industry to look outside of traditional lithographic methods in order to continue cost effective size scaling. The directed self-assembly (DSA) of block copolymers (BCPs) is a nanofabrication technique used to reduce the periodicity of patterns prepared with traditional optical methods. BCPs with large interaction parameters (χ eff), provide access to smaller pitches and reduced interface widths. Larger χ eff is also expected to be correlated with reduced line edge roughness (LER), a critical performance parameter in integrated circuits. One approach to increasing χ eff is blending the BCP with a phase selective additive, such as an Ionic liquid (IL). The IL does not impact the etching rates of either phase, and this enables a direct interrogation of whether the change in interface width driven by higher χ eff translates into lower LER. The effect of the IL on the layer thickness and interface width of a BCP are examined, along with the corresponding changes in LER in a DSA patterned sample. The results demonstrate that increased χ eff through additive blending will not necessarily translate to a lower LER, clarifying an important design criterion for future material systems.
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Affiliation(s)
- Daniel F. Sunday
- Materials Science and Engineering Division, National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, MD 20899
| | - Xuanxuan Chen
- Institute for Molecular Engineering, University of Chicago, 5801 S Ellis Ave, Chicago, IL 60637
| | | | | | | | - Takahiro Dazai
- Tokyo Ohka Kogyo, 1590 Tabata, Samukawa-Machi, Koza-Gun, Kanagawa 253-0114, Japan
| | - Ken Miyagi
- Tokyo Ohka Kogyo, 1590 Tabata, Samukawa-Machi, Koza-Gun, Kanagawa 253-0114, Japan
| | - Takaya Maehashi
- Tokyo Ohka Kogyo, 1590 Tabata, Samukawa-Machi, Koza-Gun, Kanagawa 253-0114, Japan
| | - Akiyoshi Yamazaki
- Tokyo Ohka Kogyo, 1590 Tabata, Samukawa-Machi, Koza-Gun, Kanagawa 253-0114, Japan
| | - Paul F. Nealey
- Institute for Molecular Engineering, University of Chicago, 5801 S Ellis Ave, Chicago, IL 60637
| | - R. Joseph Kline
- Materials Science and Engineering Division, National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, MD 20899
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5
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Zhu X, Bonnecaze RT, Truskett TM. Graphoepitaxy of hard spheres into square lattices. Colloids Surf A Physicochem Eng Asp 2020. [DOI: 10.1016/j.colsurfa.2019.124115] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/25/2022]
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6
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Bas AC, Shalabaeva V, Thompson X, Vendier L, Salmon L, Thibault C, Molnár G, Routaboul L, Bousseksou A. Effects of solvent vapor annealing on the crystallinity and spin crossover properties of thin films of [Fe(HB(tz)3)2]. CR CHIM 2019. [DOI: 10.1016/j.crci.2019.03.002] [Citation(s) in RCA: 9] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/21/2023]
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7
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Zhang Q, Matsuoka F, Suh HS, Beaucage PA, Xiong S, Smilgies DM, Tan KW, Werner JG, Nealey PF, Wiesner UB. Pathways to Mesoporous Resin/Carbon Thin Films with Alternating Gyroid Morphology. ACS NANO 2018; 12:347-358. [PMID: 29236479 DOI: 10.1021/acsnano.7b06436] [Citation(s) in RCA: 15] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/23/2023]
Abstract
Three-dimensional (3D) mesoporous thin films with sub-100 nm periodic lattices are of increasing interest as templates for a number of nanotechnology applications, yet are hard to achieve with conventional top-down fabrication methods. Block copolymer self-assembly derived mesoscale structures provide a toolbox for such 3D template formation. In this work, single (alternating) gyroidal and double gyroidal mesoporous thin-film structures are achieved via solvent vapor annealing assisted co-assembly of poly(isoprene-block-styrene-block-ethylene oxide) (PI-b-PS-b-PEO, ISO) and resorcinol/phenol formaldehyde resols. In particular, the alternating gyroid thin-film morphology is highly desirable for potential template backfilling processes as a result of the large pore volume fraction. In situ grazing-incidence small-angle X-ray scattering during solvent annealing is employed as a tool to elucidate and navigate the pathway complexity of the structure formation processes. The resulting network structures are resistant to high temperatures provided an inert atmosphere. The thin films have tunable hydrophilicity from pyrolysis at different temperatures, while pore sizes can be tailored by varying ISO molar mass. A transfer technique between substrates is demonstrated for alternating gyroidal mesoporous thin films, circumventing the need to re-optimize film formation protocols for different substrates. Increased conductivity after pyrolysis at high temperatures demonstrates that these gyroidal mesoporous resin/carbon thin films have potential as functional 3D templates for a number of nanomaterials applications.
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Affiliation(s)
- Qi Zhang
- Department of Materials Science and Engineering, Cornell University , Ithaca, New York 14850, United States
| | - Fumiaki Matsuoka
- Department of Materials Science and Engineering, Cornell University , Ithaca, New York 14850, United States
| | - Hyo Seon Suh
- Institute for Molecular Engineering, The University of Chicago , Chicago, Illinois 60637, United States
- Materials Science Division, Argonne National Laboratory , 9700 South Cass Avenue, Argonne, Illinois 60439, United States
| | - Peter A Beaucage
- Department of Materials Science and Engineering, Cornell University , Ithaca, New York 14850, United States
| | - Shisheng Xiong
- Institute for Molecular Engineering, The University of Chicago , Chicago, Illinois 60637, United States
- Materials Science Division, Argonne National Laboratory , 9700 South Cass Avenue, Argonne, Illinois 60439, United States
| | - Detlef-M Smilgies
- Cornell High Energy Synchrotron Source (CHESS), Cornell University , Ithaca, New York 14850, United States
| | - Kwan Wee Tan
- Department of Materials Science and Engineering, Cornell University , Ithaca, New York 14850, United States
- School of Materials Science and Engineering, Nanyang Technological University , Singapore 639798, Singapore
| | - Jörg G Werner
- Department of Materials Science and Engineering, Cornell University , Ithaca, New York 14850, United States
| | - Paul F Nealey
- Institute for Molecular Engineering, The University of Chicago , Chicago, Illinois 60637, United States
- Materials Science Division, Argonne National Laboratory , 9700 South Cass Avenue, Argonne, Illinois 60439, United States
| | - Ulrich B Wiesner
- Department of Materials Science and Engineering, Cornell University , Ithaca, New York 14850, United States
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8
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Zhang L, Liu L, Lin J. Well-ordered self-assembled nanostructures of block copolymer films via synergistic integration of chemoepitaxy and zone annealing. Phys Chem Chem Phys 2018; 20:498-508. [DOI: 10.1039/c7cp06261c] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
The integrated chemical template/zone annealing method has the capability to rapidly fabricate well-aligned and well-oriented nanostructures over a macroscopic area.
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Affiliation(s)
- Liangshun Zhang
- Shanghai Key Laboratory of Advanced Polymeric Materials
- State Key Laboratory of Bioreactor Engineering
- Key Laboratory for Ultrafine Materials of Ministry of Education
- School of Materials Science and Engineering
- East China University of Science and Technology
| | - Lingling Liu
- Shanghai Key Laboratory of Advanced Polymeric Materials
- State Key Laboratory of Bioreactor Engineering
- Key Laboratory for Ultrafine Materials of Ministry of Education
- School of Materials Science and Engineering
- East China University of Science and Technology
| | - Jiaping Lin
- Shanghai Key Laboratory of Advanced Polymeric Materials
- State Key Laboratory of Bioreactor Engineering
- Key Laboratory for Ultrafine Materials of Ministry of Education
- School of Materials Science and Engineering
- East China University of Science and Technology
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9
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Mun JH, Cha SK, Kim YC, Yun T, Choi YJ, Jin HM, Lee JE, Jeon HU, Kim SY, Kim SO. Controlled Segmentation of Metal Nanowire Array by Block Copolymer Lithography and Reversible Ion Loading. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2017; 13:1603939. [PMID: 28218488 DOI: 10.1002/smll.201603939] [Citation(s) in RCA: 9] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/24/2016] [Revised: 01/19/2017] [Indexed: 06/06/2023]
Abstract
Spatial arrangement of 1D nanomaterials may offer enormous opportunities for advanced electronics and photonics. Moreover, morphological complexity and chemical diversity in the nanoscale components may lead to unique properties that are hardly anticipated in randomly distributed homogeneous nanostructures. Here, controlled chemical segmentation of metal nanowire arrays using block copolymer lithography and subsequent reversible metal ion loading are demonstrated. To impose chemical heterogeneity in the nanowires generated by block copolymer lithography, reversible ion loading method highly specific for one particular polymer block is introduced. Reversibility of the metal ion loading enables area-selective localized replacement of metal ions in the self-assembled patterns and creates segmented metal nanowire arrays with different metallic components. Further integration of this method with shear aligning process produces high aligned segmented metal nanowire array with desired local chemical compositions.
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Affiliation(s)
- Jeong Ho Mun
- Department of Materials Science and Engineering, National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, KAIST, Daejeon, 34141, Republic of Korea
| | - Seung Keun Cha
- Department of Materials Science and Engineering, National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, KAIST, Daejeon, 34141, Republic of Korea
| | - Ye Chan Kim
- School of Energy and Chemical Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan, 44919, Republic of Korea
| | - Taeyeong Yun
- Department of Materials Science and Engineering, National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, KAIST, Daejeon, 34141, Republic of Korea
| | - Young Joo Choi
- Department of Materials Science and Engineering, National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, KAIST, Daejeon, 34141, Republic of Korea
| | - Hyeong Min Jin
- Department of Materials Science and Engineering, National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, KAIST, Daejeon, 34141, Republic of Korea
| | - Jae Eun Lee
- Department of Materials Science and Engineering, National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, KAIST, Daejeon, 34141, Republic of Korea
| | - Hyun Uk Jeon
- Department of Materials Science and Engineering, National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, KAIST, Daejeon, 34141, Republic of Korea
| | - So Youn Kim
- School of Energy and Chemical Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan, 44919, Republic of Korea
| | - Sang Ouk Kim
- Department of Materials Science and Engineering, National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, KAIST, Daejeon, 34141, Republic of Korea
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10
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Wang RY, Wang XY, Fan B, Xu JT, Fan ZQ. Microphase separation and crystallization behaviors of bi-phased triblock terpolymers with a competitively dissolved middle block. POLYMER 2017. [DOI: 10.1016/j.polymer.2017.04.024] [Citation(s) in RCA: 12] [Impact Index Per Article: 1.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/19/2022]
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11
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Segal-Peretz T, Ren J, Xiong S, Khaira G, Bowen A, Ocola LE, Divan R, Doxastakis M, Ferrier NJ, de Pablo J, Nealey PF. Quantitative Three-Dimensional Characterization of Block Copolymer Directed Self-Assembly on Combined Chemical and Topographical Prepatterned Templates. ACS NANO 2017; 11:1307-1319. [PMID: 28005329 DOI: 10.1021/acsnano.6b05657] [Citation(s) in RCA: 29] [Impact Index Per Article: 4.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/14/2023]
Abstract
Characterization of the three-dimensional (3D) structure in directed self-assembly (DSA) of block copolymers is crucial for understanding the complex relationships between the guiding template and the resulting polymer structure so DSA could be successfully implemented for advanced lithography applications. Here, we combined scanning transmission electron microscopy (STEM) tomography and coarse-grain simulations to probe the 3D structure of P2VP-b-PS-b-P2VP assembled on prepatterned templates using solvent vapor annealing. The templates consisted of nonpreferential background and raised guiding stripes that had PS-preferential top surfaces and P2VP-preferential sidewalls. The full 3D characterization allowed us to quantify the shape of the polymer domains and the interface between domains as a function of depth in the film and template geometry and offered important insights that were not accessible with 2D metrology. Sidewall guiding was advantageous in promoting the alignment and lowering the roughness of the P2VP domains over the sidewalls, but incommensurate confinement from the increased topography could cause roughness and intermittent dislocations in domains over the background region at the bottom of the film. The 3D characterization of bridge structures between domains over the background and breaks within domains on guiding lines sheds light on possible origins of common DSA defects. The positional fluctuations of the PS/P2VP interface between domains showed a depth-dependent behavior, with high levels of fluctuations near both the free surface of the film and the substrate and lower fluctuation levels in the middle of the film. This research demonstrates how 3D characterization offers a better understanding of DSA processes, leading to better design and fabrication of directing templates.
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Affiliation(s)
- Tamar Segal-Peretz
- Institute for Molecular Engineering, University of Chicago , 5640 South Ellis Avenue, Chicago, Illinois 60637, United States
- Department of Chemical Engineering, Technion - Institute of Technology , Haifa 3200003, Israel
| | - Jiaxing Ren
- Institute for Molecular Engineering, University of Chicago , 5640 South Ellis Avenue, Chicago, Illinois 60637, United States
| | - Shisheng Xiong
- Institute for Molecular Engineering, University of Chicago , 5640 South Ellis Avenue, Chicago, Illinois 60637, United States
| | - Gurdaman Khaira
- Institute for Molecular Engineering, University of Chicago , 5640 South Ellis Avenue, Chicago, Illinois 60637, United States
| | - Alec Bowen
- Institute for Molecular Engineering, University of Chicago , 5640 South Ellis Avenue, Chicago, Illinois 60637, United States
| | | | | | - Manolis Doxastakis
- Institute for Molecular Engineering, University of Chicago , 5640 South Ellis Avenue, Chicago, Illinois 60637, United States
| | - Nicola J Ferrier
- Institute for Molecular Engineering, University of Chicago , 5640 South Ellis Avenue, Chicago, Illinois 60637, United States
| | - Juan de Pablo
- Institute for Molecular Engineering, University of Chicago , 5640 South Ellis Avenue, Chicago, Illinois 60637, United States
| | - Paul F Nealey
- Institute for Molecular Engineering, University of Chicago , 5640 South Ellis Avenue, Chicago, Illinois 60637, United States
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12
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Wan X, Gao T, Zhang L, Lin J. Ordering kinetics of lamella-forming block copolymers under the guidance of various external fields studied by dynamic self-consistent field theory. Phys Chem Chem Phys 2017; 19:6707-6720. [DOI: 10.1039/c6cp08726d] [Citation(s) in RCA: 17] [Impact Index Per Article: 2.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 02/05/2023]
Abstract
We theoretically engineer a new scheme, which integrates a permanent field for pattern registration and a dynamic external field for defect annihilation, to direct the self-assembly of block copolymers.
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Affiliation(s)
- Xiaomin Wan
- Shanghai Key Laboratory of Advanced Polymeric Materials
- State Key Laboratory of Bioreactor Engineering
- Key Laboratory for Ultrafine Materials of Ministry of Education
- School of Materials Science and Engineering
- East China University of Science and Technology
| | - Tong Gao
- Shanghai Key Laboratory of Advanced Polymeric Materials
- State Key Laboratory of Bioreactor Engineering
- Key Laboratory for Ultrafine Materials of Ministry of Education
- School of Materials Science and Engineering
- East China University of Science and Technology
| | - Liangshun Zhang
- Shanghai Key Laboratory of Advanced Polymeric Materials
- State Key Laboratory of Bioreactor Engineering
- Key Laboratory for Ultrafine Materials of Ministry of Education
- School of Materials Science and Engineering
- East China University of Science and Technology
| | - Jiaping Lin
- Shanghai Key Laboratory of Advanced Polymeric Materials
- State Key Laboratory of Bioreactor Engineering
- Key Laboratory for Ultrafine Materials of Ministry of Education
- School of Materials Science and Engineering
- East China University of Science and Technology
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13
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Cetintas M, Kamperman M. Self-assembly of PS-b-PNIPAM-b-PS block copolymer thin films via selective solvent annealing. POLYMER 2016. [DOI: 10.1016/j.polymer.2016.08.033] [Citation(s) in RCA: 16] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
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14
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Majewski PW, Yager KG. Rapid ordering of block copolymer thin films. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2016; 28:403002. [PMID: 27537062 DOI: 10.1088/0953-8984/28/40/403002] [Citation(s) in RCA: 58] [Impact Index Per Article: 7.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/23/2023]
Abstract
Block-copolymers self-assemble into diverse morphologies, where nanoscale order can be finely tuned via block architecture and processing conditions. However, the ultimate usage of these materials in real-world applications may be hampered by the extremely long thermal annealing times-hours or days-required to achieve good order. Here, we provide an overview of the fundamentals of block-copolymer self-assembly kinetics, and review the techniques that have been demonstrated to influence, and enhance, these ordering kinetics. We discuss the inherent tradeoffs between oven annealing, solvent annealing, microwave annealing, zone annealing, and other directed self-assembly methods; including an assessment of spatial and temporal characteristics. We also review both real-space and reciprocal-space analysis techniques for quantifying order in these systems.
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Affiliation(s)
- Pawel W Majewski
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY, USA. Department of Chemistry, University of Warsaw, Warsaw, Poland
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15
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Xiong S, Wan L, Ishida Y, Chapuis YA, Craig GSW, Ruiz R, Nealey PF. Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via Solvent Annealing. ACS NANO 2016; 10:7855-65. [PMID: 27482932 DOI: 10.1021/acsnano.6b03667] [Citation(s) in RCA: 24] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/26/2023]
Abstract
Directed self-assembly (DSA) of block copolymers (BCPs) is a leading strategy to pattern at sublithographic resolution in the technology roadmap for semiconductors and is the only known solution to fabricate nanoimprint templates for the production of bit pattern media. While great progress has been made to implement block copolymer lithography with features in the range of 10-20 nm, patterning solutions below 10 nm are still not mature. Many BCP systems self-assemble at this length scale, but challenges remain in simultaneously tuning the interfacial energy atop the film to control the orientation of BCP domains, designing materials, templates, and processes for ultra-high-density DSA, and establishing a robust pattern transfer strategy. Among the various solutions to achieve domains that are perpendicular to the substrate, solvent annealing is advantageous because it is a versatile method that can be applied to a diversity of materials. Here we report a DSA process based on chemical contrast templates and solvent annealing to fabricate 8 nm features on a 16 nm pitch. To make this possible, a number of innovations were brought in concert with a common platform: (1) assembling the BCP in the phase-separated, solvated state, (2) identifying a larger process window for solvated triblock vs diblock BCPs as a function of solvent volume fraction, (3) employing templates for sub-10-nm BCP systems accessible by lithography, and (4) integrating a robust pattern transfer strategy by vapor infiltration of organometallic precursors for selective metal oxide synthesis to prepare an inorganic hard mask.
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Affiliation(s)
- Shisheng Xiong
- Institute for Molecular Engineering, University of Chicago , Chicago, Illinois 60637, United States
| | - Lei Wan
- HGST, a Western Digital Company , San José, California 95135, United States
| | - Yoshihito Ishida
- Institute for Molecular Engineering, University of Chicago , Chicago, Illinois 60637, United States
| | - Yves-Andre Chapuis
- HGST, a Western Digital Company , San José, California 95135, United States
| | - Gordon S W Craig
- Institute for Molecular Engineering, University of Chicago , Chicago, Illinois 60637, United States
| | - Ricardo Ruiz
- HGST, a Western Digital Company , San José, California 95135, United States
| | - Paul F Nealey
- Institute for Molecular Engineering, University of Chicago , Chicago, Illinois 60637, United States
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