Sub-10 nm tunneling field-effect transistors based on monolayer group IV mono-chalcogenides

Enhanced electron transport and optical properties of experimentally synthesized monolayer Si9C15: a comprehensive DFT study for nanoelectronics and photocatalytic applications

Two-dimensional silicon-carbide (SixCy) materials stand out for their compatibility with current silicon-based technologies, offering unique advantages in nanoelectronics and photocatalysis. In this study, we employ density functional theory and nonequilibrium Green's function methods to investigate the electronic properties, electron transport characteristics, and optoelectronic qualities of experimentally synthesized monolayer Si9C15. Utilizing the modified deformation potential theory formula, we unveil Si9C15's significant directional anisotropy in electron mobility (706.42 cm2 V-1 s-1) compared to holes (432.84 cm2 V-1 s-1) in the a direction. The electrical transport calculations reveal that configurations with a 3 nm channel length demonstrate an ON state when biased, reaching a peak current of 150 nA. Moreover, this maximum current value escalates to 200 nA under tensile strain, marking an increase of approximately 100 times compared to the 5 nm channel, which remains in an OFF state. Si9C15 exhibits high light absorption coefficients (∼105 cm-1) and suitable band edge positions for water splitting at pH 0-7. Applying 1-5% tensile strain can tune the conduction band minimum and valence band maximum closer to the standard redox potentials, enhancing photocatalytic water splitting efficiency. Remarkably, under illumination at pH 0 and 7, Si9C15 can spontaneously catalyze water splitting, demonstrating its potential as a highly efficient photocatalyst. Our findings emphasize the importance of strain control and device length optimization for performance enhancement in nanoelectronics and renewable energy applications, positioning Si9C15 as a promising material for high-performance field-effect transistors and photocatalytic water splitting.

Stability of mechanically exfoliated layered monochalcogenides under ambient conditions

Monochalcogenides of groups III (GaS, GaSe) and VI (GeS, GeSe, SnS, and SnSe) are materials with interesting thickness-dependent characteristics, which have been applied in many areas. However, the stability of layered monochalcogenides (LMs) is a real problem in semiconductor devices that contain these materials. Therefore, it is an important issue that needs to be explored. This article presents a comprehensive study of the degradation mechanism in mechanically exfoliated monochalcogenides in ambient conditions using Raman and photoluminescence spectroscopy supported by structural methods. A higher stability (up to three weeks) was observed for GaS. The most reactive were Se-containing monochalcogenides. Surface protrusions appeared after the ambient exposure of GeSe was detected by scanning electron microscopy. In addition, the degradation of GeS and GeSe flakes was observed in the operando experiment in transmission electron microscopy. Additionally, the amorphization of the material progressed from the flake edges. The reported results and conclusions on the degradation of LMs are useful to understand surface oxidation, air stability, and to fabricate stable devices with monochalcogenides. The results indicate that LMs are more challenging for exfoliation and optical studies than transition metal dichalcogenides such as MoS2, MoSe2, WS2, or WSe2.

Transition from Schottky to ohmic contacts in the C31 and MoS2 van der Waals heterostructure

The utilization of conventional metal contacts has restricted the industrial implementation of two-dimensional channel materials. To address this issue, we conducted first-principles calculations to investigate the interface properties of C₃₁ and MoS₂ contacts. An ohmic contact and a low van der Waals barrier were found in the C₃₁/MoS₂ heterostructure. Our findings provide a promising new contact metal material for two-dimensional nanodevices based on MoS₂.

Promising ultra-short channel transistors based on OM2S (M = Ga, In) monolayers for high performance and low power consumption

It is hoped that two-dimensional (2D) semiconductors overcome the short channel effect and continue Moore's law. However, 2D material-based ultra-short channel devices still face the challenge of simultaneously achieving high-performance (HP) and low-power (LP) consumption. Here, we theoretically designed monolayer OM₂S (M = Ga, In)-based metal-oxide-semiconductor field-effect transistors (MOSFETs), considering the gate length from 1 to 5 nm, doping concentration and underlap structure. We found that in HP (LP) applications, the on-state current exceeds 1000 (500) μA μm^-1 under a 1 nm (2 nm) gate length, surpassing the needs of the International Technology Roadmap for Semiconductors (ITRS) in 2028. The subthreshold swing is close to the Boltzmann tyranny (60 mV dec^-1) even as the gate length shrinks to 2 nm. The energy-delay product is two orders lower than 1.02 × 10^-28 J s μm^-1, indicating extraordinary high-speed manipulation and low-energy expending. Therefore, monolayer OM₂S has great application in ultra-short scale devices with HP and LP consumption, and can be taken as a candidate to extend Moore's Law.

Tunneling transport of 2D anisotropic XC (X = P, As, Sb, Bi) with a direct band gap and high mobility: a DFT coupled with NEGF study

Direct bandgap and significant anisotropic properties are crucial and beneficial for nanoelectronic applications. In this work, through first-principles calculations, we investigate novel two-dimensional (2D) α-XC (X = P, As, Sb, Bi) materials, which possess a direct bandgap of 0.73 to 1.40 eV with remarkable anisotropic electronic properties. Intriguingly, 2D α-XC presents the highest electron mobility near 8 × 10³ cm² V^-1 s^-1 along the Γ-X direction. Moreover, the transfer characteristics of the 2D α-XC TFETs are thoroughly assessed through NEGF methods. AsC TFETs demonstrate an on-state current larger than 2.2 × 10³ μA μm^-1, which can satisfy the International Technology Roadmap for Semiconductors (ITRS) for high-performance requirements. In particular, the minimum value of subthreshold swing of devices is as low as 15 mV dec^-1, indicating excellent device switching characteristics. The relevant calculation results show that 2D α-XC monolayers could be a promising candidate in next-generation high-performance device applications.

Gas adsorption effects of monolayer GeSe in terms of anisotropic transport properties

Two-dimensional layered semiconducting material germanium selenide (GeSe) has attracted significant attention due to its environmental friendship, anisotropic electronic structures, and strong air-stability. To evaluate the candidacy of monolayer GeSe as a potential gas sensing material, the adsorption characteristics of various small gas molecules on monolayer GeSe are comprehensively studied combining density functional theory calculations and non-equilibrium Green's function formalism. The charge transfer reaction between gas molecules and monolayer GeSe leads to the marked change of the carrier density, which further affects the anisotropic transport characteristics of monolayer GeSe. The calculated band structures andI-Vcurves reveal distinctive responses of monolayer GeSe to the different gas molecules, and higher sensitivity of the monolayer GeSe in presence of SO₂, NH₃, NO₂gas molecules along the zigzag direction is obtained. These results suggest that monolayer GeSe along the zigzag direction has promising application in gas detector.

Two-Dimensional GeC2 with Tunable Electronic and Carrier Transport Properties and a High Current ON/OFF Ratio

In this study, we present that 2D tetrahex-GeC₂ materials possess novel electronic and carrier transport properties based on density functional theory computations combined with the nonequilibrium Green's function method. We show that under the 4% (-4%) in-plane expansion (compression) along the a-direction (b-direction) of the tetrahex-GeC₂ monolayer, the bandgap can be enlarged to a desirable 1.26 eV (1.32 eV), close to that of silicon. The carrier transport properties of both the sub-10 nm tetrahex-GeC₂ monolayer and the bilayer show strong anisotropy within the bias from -1 to 1 V. The current ON (a-direction)/OFF (b-direction) ratio amounts to 10⁵ for the tetrahex-GeC₂ monolayer. A striking negative differential conductance arises with the maximum I_peak/I_valley on the order of 10⁴ under the 4% uniaxial expansion along the b-direction of the tetrahex-GeC₂ monolayer. Overall, the 2D tetrahex-GeC₂ monolayer and bilayer possess highly tunable electronic and carrier transport properties under uniaxial strain, which can be exploited for potential applications in nanoelectronics.

Vortex-Oriented Ferroelectric Domains in SnTe/PbTe Monolayer Lateral Heterostructures

Heterostructures formed from interfaces between materials with complementary properties often display unconventional physics. Of especial interest are heterostructures formed with ferroelectric materials. These are mostly formed by combining thin layers in vertical stacks. Here the first in situ molecular beam epitaxial growth and scanning tunneling microscopy characterization of atomically sharp lateral heterostructures between a ferroelectric SnTe monolayer and a paraelectric PbTe monolayer are reported. The bias voltage dependence of the apparent heights of SnTe and PbTe monolayers, which are closely related to the type-II band alignment of the heterostructure, is investigated. Remarkably, it is discovered that the ferroelectric domains in the SnTe surrounding a PbTe core form either clockwise or counterclockwise vortex-oriented quadrant configurations. In addition, when there is a finite angle between the polarization and the interface, the perpendicular component of the polarization always points from SnTe to PbTe. Supported by first-principles calculation, the mechanism of vortex formation and preferred polarization direction is identified in the interaction between the polarization, the space charge, and the strain effect at the horizontal heterointerface. The studies bring the application of 2D group-IV monochalcogenides on in-plane ferroelectric heterostructures a step closer.

Sub-5 nm monolayer germanium selenide (GeSe) MOSFETs: towards a high performance and stable device

Two-dimensional (2D) black phosphorene (BP) field-effect transistors (FETs) show excellent device performance but suffer from serious instability under ambient conditions. Isoelectronic 2D germanium selenide (GeSe) shares many similar properties with 2D BP, such as high carrier mobility and anisotropy, but is stable under ambient conditions. Herein, we explore the quantum transport properties of sub-5 nm ML GeSe MOSFETs using first-principles quantum transport simulation. A p-type (zigzag-directed) device is superior to other types (n- and p-type armchair-directed and n-type zigzag-directed). The on-state current of p-type devices (zigzag-directed), even at a 1 nm gate-length, can fulfill the requirements of high-performance applications for the next decade in the International Technology Roadmap for Semiconductors (ITRS, 2013 version). To the best of our knowledge, these ML GeSe MOSFETs have the smallest gate-length that can fulfill the ITRS HP on-state current requirements among reported 2D material FETs.

Vertically stacked SnSe homojunctions and negative capacitance for fast low-power tunneling transistors

The two-dimensional (2D) vertical van der Waals (vdW) stacked homojunction is an advantageous configuration for fast low-power tunneling field effect transistors (TFETs). We simulate the device performance of the sub-10 nm vertical SnSe homojunction TFETs with ab initio quantum transport calculations. The vertically stacked device configuration has an effect of decreasing leakage current when compared with its planar counterpart due to the interrupted carrier transport path by the broken connection. A subthreshold swing over four decades (SS_{ave_4 dec}) of 44.2–45.8 mV dec⁻¹ and a drain current at SS = 60 mV dec⁻¹ (I₆₀) of 5–7 μA μm⁻¹ are obtained for the optimal vertical SnSe homojunction TFET with L_g = 10 nm at a supply voltage of 0.5–0.74 V. In terms of the device's main figures of merit (i.e., on-state current, intrinsic delay time, and power delay product), the vertical SnSe TFETs and NCTFETs outperform the 2022 and 2028 targets of the International Technology Roadmap for Semiconductors requirements for low-power application (2013 version), respectively.

The vertical SnSe homojunction TFETs and NCTFETs are potential candidates for fast low-power application.

Device performance limits and negative capacitance of monolayer GeSe and GeTe tunneling field effect transistors

Exploring the device performance limits is meaningful for guiding practical device fabrication. We propose archetype tunneling field effect transistors (TFETs) with negative capacitance (NC) and use the rigorous ab initio quantum transport simulation to explore the device performance limits of the TFETs based on monolayer (ML) GeSe and GeTe along with their NC counterparts. With the ferroelectric dielectric acting as a negative capacitance material, the device performances of both the ML GeSe and GeTe NCTFETs outperform their TFET counterparts, particularly for the on-state current (I_on). I_on of the optimal ML GeSe and GeTe TFETs fulfills the demands of the International Technology Roadmap for Semiconductors (ITRS 2015 version) for low power (LP) and high performance (HP) devices, at the “6/5” node range, while with the aid of 80 nm and 50 nm thickness of ferroelectric SrBi₂Nb₂O₉, both their NC counterparts extend the fulfillments at the “4/3” node range.

The ML GeSe and GeTe NCTFETs fulfill the ITRS low power and high performance devices, respectively, at the “4/3” node range.