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For: Decosterd L, Topka KC, Diallo B, Samelor D, Vergnes H, Senocq F, Caussat B, Vahlas C, Menu MJ. An innovative GC-MS, NMR and ESR combined, gas-phase investigation during chemical vapor deposition of silicon oxynitrides films from tris(dimethylsilyl)amine. Phys Chem Chem Phys 2021;23:10560-10572. [PMID: 33903868 DOI: 10.1039/d1cp01129d] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/31/2023]
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