Miao Y, Lee DT, de Mello MD, Ahmad M, Abdel-Rahman MK, Eckhert PM, Boscoboinik JA, Fairbrother DH, Tsapatsis M. Solvent-free bottom-up patterning of zeolitic imidazolate frameworks.
Nat Commun 2022;
13:420. [PMID:
35058452 PMCID:
PMC8776825 DOI:
10.1038/s41467-022-28050-z]
[Citation(s) in RCA: 9] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Academic Contribution Register] [Received: 08/10/2021] [Accepted: 12/21/2021] [Indexed: 11/20/2022] Open
Abstract
Patterning metal-organic frameworks (MOFs) at submicrometer scale is a crucial yet challenging task for their integration in miniaturized devices. Here we report an electron beam (e-beam) assisted, bottom-up approach for patterning of two MOFs, zeolitic imidazolate frameworks (ZIF), ZIF-8 and ZIF-67. A mild pretreatment of metal oxide precursors with linker vapor leads to the sensitization of the oxide surface to e-beam irradiation, effectively inhibiting subsequent conversion of the oxide to ZIFs in irradiated areas, while ZIF growth in non-irradiated areas is not affected. Well-resolved patterns with features down to the scale of 100 nm can be achieved. This developer-free, all-vapor phase technique will facilitate the incorporation of MOFs in micro- and nanofabrication processes.
There is a long-standing interest in the development of patterning process for porous materials. Here, the authors report a solvent-free bottom-up approach for the patterning of zeolitic imidazolate frameworks; well-resolved patterns with features down to the scale of 100 nm can be achieved.
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