Effect of the cap layer growth temperature on the Sb distribution in InAs/InSb/InAs sub-monolayer heterostructures for mid-infrared devices

Sub-monolayer (SML) deposition of InSb within InAs matrix by migration enhanced epitaxy tends to form type II SML nanostructures offering efficient light emission within the mid-infrared (MIR) range between 3 and 5 μm. In this work, we report on the Sb distribution in InSb/InAs SML nanostructures with InAs cap layers grown at temperatures lower than that associated with the under-grown InSb active layer. Analysis by transmission electron microscopy (TEM) in 002 dark field conditions shows that the reduction in the growth temperature of the InAs cap layer increases the amount of Sb deposited in the layers, in good agreement with the x-ray diffraction results. TEM micrographs also show that the layers are formed by random InSbAs agglomerates, where the lower cap temperature leads to a more continuous InSb layer. Quantitative atomic column resolved high angle annular dark field-scanning (S)TEM analyses also reveal atomic columns with larger composition of Sb for the structure with the lowest InAs cap layer temperature. The dependence of the Sb distribution on InAs cap growth temperature allows tuning the corresponding emission wavelength in the MIR range, as shown by the photoluminescence emission spectra.

Misfit dislocation free InAs/GaSb core-shell nanowires grown by molecular beam epitaxy

In this report, we present the growth and structural analyses of broken gap InAs/GaSb core-shell nanowires by molecular beam epitaxy using an Au-free approach. Depending on the shell growth temperature, two distinct growth regimes for the GaSb shells are identified resulting in conformal or tapered shells. Morphological analyses reveal a dodecagonal nanowire cross-section after GaSb shell growth. Detailed transmission electron microscope investigations from different zone axes confirm that the small lattice mismatch of 0.6% allows the deposition of 40 nm thick GaSb shells free of misfit dislocations. Additionally, an abrupt interface from InAs to GaSb is found. These nanowires are suitable for future devices such as TFETs.

Suppression of Bulk Defects in Antimonide Superlattice Infrared Photodiodes

While physical properties of ideal antimonide superlattices (ASL) indicate that they should significantly outperform mercury cadmium telluride (MCT) based infrared photodiodes for low dark current applications in the long and very long wave-infrared (LWIR and VLWIR), this potential has not yet been fully realized. Even though measured Auger and tunneling rates in ASL's are reduced as predicted, overall carrier lifetimes remain much shorter, and dark currents much higher than expected. The large carrier losses are the result of defects in the ASL structure, with contributions measured from large bulk defects and surface channels along mesa sidewalls, and the remaining component believed to be due to midgap states.

In this presentation we report on several studies of epitaxial growth parameters and their influence on defect formation. X-ray photoelectron spectroscopy analysis of oxide desorption from GaSb substrates shows the presence of both antimony and gallium oxides, along with their decomposition and desorption behavior with anneal temperature. A study of buffer growth shows that defect density and size are critically dependent on growth temperature, with an optimal growth window between 480 and 500 °C.. Side-by-side GaSb buffer growths on vicinal ((100) + 1 ° (111)) and flat (100) substrates show that while growing on vicinal material can suppress mound formation, it does not yield epilayers as flat as can be obtained on (100) substrates grown under optimal conditons. Finally, the ratio of As to In flux during superlattice growth can be used to tune the lattice parameter both above and below that of GaSb, with strain-related defects appearing when the mismatch reaches roughly 0.1%.

Morphological instability in InAs/GaSb superlattices due to interfacial bonds

Synchrotron x-ray diffraction is used to compare the misfit strain and composition in a self-organized nanowire array in an InAs/GaSb superlattice with InSb interfacial bonds to a planar InAs/GaSb superlattice with GaAs interfacial bonds. It is found that the morphological instability that occurs in the nanowire array results from the large misfit strain that the InSb interfacial bonds have in the nanowire array. Based on this result, we propose that tailoring the type of interfacial bonds during the epitaxial growth of III-V semiconductor films provides a novel approach for producing the technologically important morphological instability in anomalously thin layers.