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Schlosser M, Tichelmann S, Schäffner D, de Mello DO, Hambach M, Schütz J, Birkl G. Scalable Multilayer Architecture of Assembled Single-Atom Qubit Arrays in a Three-Dimensional Talbot Tweezer Lattice. PHYSICAL REVIEW LETTERS 2023; 130:180601. [PMID: 37204875 DOI: 10.1103/physrevlett.130.180601] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/25/2022] [Accepted: 03/27/2023] [Indexed: 05/21/2023]
Abstract
We report on the realization of a novel platform for the creation of large-scale 3D multilayer configurations of planar arrays of individual neutral-atom qubits: a microlens-generated Talbot tweezer lattice that extends 2D tweezer arrays to the third dimension at no additional costs. We demonstrate the trapping and imaging of rubidium atoms in integer and fractional Talbot planes and the assembly of defect-free atom arrays in different layers. The Talbot self-imaging effect for microlens arrays constitutes a structurally robust and wavelength-universal method for the realization of 3D atom arrays with beneficial scaling properties. With more than 750 qubit sites per 2D layer, these scaling properties imply that 10 000 qubit sites are already accessible in 3D in our current implementation. The trap topology and functionality are configurable in the micrometer regime. We use this to generate interleaved lattices with dynamic position control and parallelized sublattice addressing of spin states for immediate application in quantum science and technology.
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Affiliation(s)
- Malte Schlosser
- Technische Universität Darmstadt, Institut für Angewandte Physik, Schlossgartenstraße 7, 64289 Darmstadt, Germany
| | - Sascha Tichelmann
- Technische Universität Darmstadt, Institut für Angewandte Physik, Schlossgartenstraße 7, 64289 Darmstadt, Germany
| | - Dominik Schäffner
- Technische Universität Darmstadt, Institut für Angewandte Physik, Schlossgartenstraße 7, 64289 Darmstadt, Germany
| | - Daniel Ohl de Mello
- Technische Universität Darmstadt, Institut für Angewandte Physik, Schlossgartenstraße 7, 64289 Darmstadt, Germany
| | - Moritz Hambach
- Technische Universität Darmstadt, Institut für Angewandte Physik, Schlossgartenstraße 7, 64289 Darmstadt, Germany
| | - Jan Schütz
- Technische Universität Darmstadt, Institut für Angewandte Physik, Schlossgartenstraße 7, 64289 Darmstadt, Germany
| | - Gerhard Birkl
- Technische Universität Darmstadt, Institut für Angewandte Physik, Schlossgartenstraße 7, 64289 Darmstadt, Germany
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Cunha J, Garcia IS, Santos JD, Fernandes J, González-Losada P, Silva C, Gaspar J, Cortez A, Sampaio M, Aguiam DE. Assessing tolerances in direct write laser grayscale lithography and reactive ion etching pattern transfer for fabrication of 2.5D Si master molds. MICRO AND NANO ENGINEERING 2023. [DOI: 10.1016/j.mne.2023.100182] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 04/09/2023]
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Ito S, Omori T, Ando M, Yamazaki H, Nakagawa M. Plastic deformation of synthetic quartz nanopillars by nanoindentation for multi-scale and multi-level security artefact metrics. Sci Rep 2021; 11:16550. [PMID: 34400705 PMCID: PMC8368106 DOI: 10.1038/s41598-021-95953-0] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/01/2021] [Accepted: 08/03/2021] [Indexed: 11/09/2022] Open
Abstract
Individual authentication using artefact metrics has received increasing attention, as greater importance has been placed on the security of individual information. These artefact metrics must satisfy the requirements of individuality, measurement stability, durability, and clone resistance, in addition to possessing unique physical features. In this study, we proposed that nanostructures of synthetic quartz (SQ) deposited on an SQ plate may provide sophisticated artefact metrics if morphological changes could be intentionally introduced into the SQ nanostructures at certain positions. We fabricated SQ nanopillars using a mass-production method (ultraviolet nanoimprint lithography) and investigated their mechanical deformation using nanoindentation with a spheroid diamond tip through a loading and unloading cycle. The SQ nanopillars with an aspect ratio of 1 (i.e., diameters D of 100 and 200 nm with corresponding heights H of 100 and 200 nm, respectively) could be plastically deformed without collapsing within a specified pillar-array format at programmed positions. The plastically deformed SQ nanopillar arrays demonstrated multi-scale (sub-millimetre, micrometre, and nanometre) and multi-level (shape, area, diameter, and height) individuality authentication and clone resistance. Because SQ is physically and chemically stable and durable, individuality authentication can be a highly reliable tool on Earth and in space.
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Affiliation(s)
- Shunya Ito
- Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai, Miyagi, 980-8577, Japan
| | - Toshiyuki Omori
- Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai, Miyagi, 980-8577, Japan
| | - Masao Ando
- Specialty Chemicals Research Center, Shin-Etsu Chemical Co., Ltd., 28-1, Nishifukushima, Kubiki-ku, Joetsu-shi, Niigata, 942-8601, Japan
| | - Hiroyuki Yamazaki
- Specialty Chemicals Research Center, Shin-Etsu Chemical Co., Ltd., 28-1, Nishifukushima, Kubiki-ku, Joetsu-shi, Niigata, 942-8601, Japan
| | - Masaru Nakagawa
- Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai, Miyagi, 980-8577, Japan.
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Béguelin J, Noell W, Scharf T, Voelkel R. Tolerancing the surface form of aspheric microlenses manufactured by wafer-level optics techniques. APPLIED OPTICS 2020; 59:3910-3919. [PMID: 32400660 DOI: 10.1364/ao.388453] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/21/2020] [Accepted: 03/27/2020] [Indexed: 06/11/2023]
Abstract
Tolerancing is an important step toward the fabrication of high-quality and cost-effective lens surfaces. It is critical for wafer-level optics, when up to tens of thousands microlenses are fabricated in parallel and whose surfaces cannot be formed individually. However, approaches developed for macro-optics cannot be directly transposed for microlenses because of differences in fabrication and testing techniques. In particular, microlens surfaces are usually limited to conical surfaces. Here, we study the connection between the microlens optical performance and the form of its surface, suggesting surface form representations suited for tolerancing purposes. Then, we compare them with common representations for tolerancing real optical systems. Measured surface forms of microlenses are also provided to make the tolerancing procedure realistic. In addition, we propose term definitions for micro-optics, complements to typical terms for macro-optics, to ease the communication between optical designers and manufacturers. Based on the results presented in this paper, guidelines are proposed for tolerancing microlenses. We suggest applying them as a first step toward a more effective and comprehensive tolerancing procedure.
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