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For: Kirner R, Béguelin J, Eisner M, Noell W, Scharf T, Voelkel R. Improvements on the uniformity of large-area microlens arrays in Fused Silica. Opt Express 2019;27:6249-6258. [PMID: 30876213 DOI: 10.1364/oe.27.006249] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/03/2018] [Accepted: 02/11/2019] [Indexed: 06/09/2023]
Number Cited by Other Article(s)
1
Schlosser M, Tichelmann S, Schäffner D, de Mello DO, Hambach M, Schütz J, Birkl G. Scalable Multilayer Architecture of Assembled Single-Atom Qubit Arrays in a Three-Dimensional Talbot Tweezer Lattice. PHYSICAL REVIEW LETTERS 2023;130:180601. [PMID: 37204875 DOI: 10.1103/physrevlett.130.180601] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/25/2022] [Accepted: 03/27/2023] [Indexed: 05/21/2023]
2
Cunha J, Garcia IS, Santos JD, Fernandes J, González-Losada P, Silva C, Gaspar J, Cortez A, Sampaio M, Aguiam DE. Assessing tolerances in direct write laser grayscale lithography and reactive ion etching pattern transfer for fabrication of 2.5D Si master molds. MICRO AND NANO ENGINEERING 2023. [DOI: 10.1016/j.mne.2023.100182] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 04/09/2023]
3
Ito S, Omori T, Ando M, Yamazaki H, Nakagawa M. Plastic deformation of synthetic quartz nanopillars by nanoindentation for multi-scale and multi-level security artefact metrics. Sci Rep 2021;11:16550. [PMID: 34400705 PMCID: PMC8368106 DOI: 10.1038/s41598-021-95953-0] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/01/2021] [Accepted: 08/03/2021] [Indexed: 11/09/2022]  Open
4
Béguelin J, Noell W, Scharf T, Voelkel R. Tolerancing the surface form of aspheric microlenses manufactured by wafer-level optics techniques. APPLIED OPTICS 2020;59:3910-3919. [PMID: 32400660 DOI: 10.1364/ao.388453] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/21/2020] [Accepted: 03/27/2020] [Indexed: 06/11/2023]
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