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Wang D, Xin C, Yang L, Wang L, Liu B, Wu H, Wang C, Pan D, Ren Z, Hu Y, Li J, Chu J, Wu D. Femtosecond Laser Fabrication of Three-Dimensional Bubble-Propelled Microrotors for Multicomponent Mechanical Transmission. NANO LETTERS 2024; 24:3176-3185. [PMID: 38436575 DOI: 10.1021/acs.nanolett.4c00037] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 03/05/2024]
Abstract
Inspired by the reverse thrust generated by fuel injection, micromachines that are self-propelled by bubble ejection are developed, such as microrods, microtubes, and microspheres. However, controlling bubble ejection sites to build micromachines with programmable actuation and further enabling mechanical transmission remain challenging. Here, bubble-propelled mechanical microsystems are constructed by proposing a multimaterial femtosecond laser processing method, consisting of direct laser writing and selective laser metal reduction. The polymer frame of the microsystems is first printed, followed by the deposition of catalytic platinum into the desired local site of the microsystems by laser reduction. With this method, a variety of designable microrotors with selective bubble ejection sites are realized, which enable excellent mechanical transmission systems composed of single and multiple mechanical components, including a coupler, a crank slider, and a crank rocker system. We believe the presented bubble-propelled mechanical microsystems could be extended to applications in microrobotics, microfluidics, and microsensors.
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Affiliation(s)
- Dawei Wang
- CAS Key Laboratory of Mechanical Behavior and Design of Materials, Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei, Anhui 230026, China
| | - Chen Xin
- CAS Key Laboratory of Mechanical Behavior and Design of Materials, Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei, Anhui 230026, China
- Department of Mechanical and Automation Engineering, The Chinese University of Hong Kong, Shatin, New Territories, Hong Kong 999077, China
| | - Liang Yang
- Suzhou Institute for Advanced Research, University of Science and Technology of China, Suzhou 215123, China
| | - Liu Wang
- CAS Key Laboratory of Mechanical Behavior and Design of Materials, Department of Modern Mechanics, University of Science and Technology of China, Hefei, Anhui 230026, China
| | - Bingrui Liu
- CAS Key Laboratory of Mechanical Behavior and Design of Materials, Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei, Anhui 230026, China
| | - Hao Wu
- CAS Key Laboratory of Mechanical Behavior and Design of Materials, Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei, Anhui 230026, China
| | - Chaowei Wang
- CAS Key Laboratory of Mechanical Behavior and Design of Materials, Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei, Anhui 230026, China
| | - Deng Pan
- Information Materials and Intelligent Sensing Laboratory of Anhui Province, Anhui University, 111 Jiu Long Road, Hefei 230601, China
| | - Zhongguo Ren
- CAS Key Laboratory of Mechanical Behavior and Design of Materials, Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei, Anhui 230026, China
| | - Yanlei Hu
- CAS Key Laboratory of Mechanical Behavior and Design of Materials, Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei, Anhui 230026, China
| | - Jiawen Li
- CAS Key Laboratory of Mechanical Behavior and Design of Materials, Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei, Anhui 230026, China
| | - Jiaru Chu
- CAS Key Laboratory of Mechanical Behavior and Design of Materials, Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei, Anhui 230026, China
| | - Dong Wu
- CAS Key Laboratory of Mechanical Behavior and Design of Materials, Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei, Anhui 230026, China
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Li Y, Zhang X, Zhang X, Zhang Y, Hou D. Recent Progress of the Vat Photopolymerization Technique in Tissue Engineering: A Brief Review of Mechanisms, Methods, Materials, and Applications. Polymers (Basel) 2023; 15:3940. [PMID: 37835989 PMCID: PMC10574968 DOI: 10.3390/polym15193940] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/24/2023] [Revised: 09/18/2023] [Accepted: 09/27/2023] [Indexed: 10/15/2023] Open
Abstract
Vat photopolymerization (VP), including stereolithography (SLA), digital light processing (DLP), and volumetric printing, employs UV or visible light to solidify cell-laden photoactive bioresin contained within a vat in a point-by-point, layer-by-layer, or volumetric manner. VP-based bioprinting has garnered substantial attention in both academia and industry due to its unprecedented control over printing resolution and accuracy, as well as its rapid printing speed. It holds tremendous potential for the fabrication of tissue- and organ-like structures in the field of regenerative medicine. This review summarizes the recent progress of VP in the fields of tissue engineering and regenerative medicine. First, it introduces the mechanism of photopolymerization, followed by an explanation of the printing technique and commonly used biomaterials. Furthermore, the application of VP-based bioprinting in tissue engineering was discussed. Finally, the challenges facing VP-based bioprinting are discussed, and the future trends in VP-based bioprinting are projected.
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Affiliation(s)
- Ying Li
- College of Chemistry and Materials Engineering, Beijing Technology and Business University, Beijing 100048, China
| | - Xueqin Zhang
- College of Chemistry and Materials Engineering, Beijing Technology and Business University, Beijing 100048, China
| | - Xin Zhang
- College of Chemistry and Materials Engineering, Beijing Technology and Business University, Beijing 100048, China
| | - Yuxuan Zhang
- FuYang Sineva Materials Technology Co., Ltd., Beijing 100176, China
| | - Dan Hou
- Chinese Academy of Meteorological Sciences, China National Petroleum Corporation, Beijing 102206, China
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Han J, Liu C, Bradford-Vialva RL, Klosterman DA, Cao L. Additive Manufacturing of Advanced Ceramics Using Preceramic Polymers. MATERIALS (BASEL, SWITZERLAND) 2023; 16:4636. [PMID: 37444949 DOI: 10.3390/ma16134636] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/21/2023] [Revised: 06/23/2023] [Accepted: 06/25/2023] [Indexed: 07/15/2023]
Abstract
Ceramic materials are used in various industrial applications, as they possess exceptional physical, chemical, thermal, mechanical, electrical, magnetic, and optical properties. Ceramic structural components, especially those with highly complex structures and shapes, are difficult to fabricate with conventional methods, such as sintering and hot isostatic pressing (HIP). The use of preceramic polymers has many advantages, such as excellent processibility, easy shape change, and tailorable composition for fabricating high-performance ceramic components. Additive manufacturing (AM) is an evolving manufacturing technique that can be used to construct complex and intricate structural components. Integrating polymer-derived ceramics and AM techniques has drawn significant attention, as it overcomes the limitations and challenges of conventional fabrication approaches. This review discusses the current research that used AM technologies to fabricate ceramic articles from preceramic feedstock materials, and it demonstrates that AM processes are effective and versatile approaches for fabricating ceramic components. The future of producing ceramics using preceramic feedstock materials for AM processes is also discussed at the end.
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Affiliation(s)
- Jinchen Han
- Department of Chemical and Materials Engineering, University of Dayton, Dayton, OH 45469, USA
| | - Chang Liu
- Technical Center, Nippon Paint Automotive Americas, Inc., Cleveland, OH 44102, USA
| | - Robyn L Bradford-Vialva
- Air Force Research Laboratory (AFRL/RXMD), Manufacturing & Industrial Technologies Division, Wright-Patterson AFB, Dayton, OH 45433, USA
| | - Donald A Klosterman
- Department of Chemical and Materials Engineering, University of Dayton, Dayton, OH 45469, USA
| | - Li Cao
- Department of Chemical and Materials Engineering, University of Dayton, Dayton, OH 45469, USA
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Cao C, Shen X, Chen S, He M, Wang H, Ding C, Zhu D, Dong J, Chen H, Huang N, Kuang C, Jin M, Liu X. High-Precision and Rapid Direct Laser Writing Using a Liquid Two-Photon Polymerization Initiator. ACS APPLIED MATERIALS & INTERFACES 2023. [PMID: 37316963 DOI: 10.1021/acsami.3c06601] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/16/2023]
Abstract
Two-photon polymerization based direct laser writing (DLW) is an emerging micronano 3D fabrication technology wherein two-photon initiators (TPIs) are a key component in photoresists. Upon exposure to a femtosecond laser, TPIs can trigger the polymerization reaction, leading to the solidification of photoresists. In other words, TPIs directly determine the rate of polymerization, physicochemical properties of polymers, and even the photolithography feature size. However, they generally exhibit extremely poor solubility in photoresist systems, severely inhibiting their application in DLW. To break through this bottleneck, we propose a strategy to prepare TPIs as liquids via molecular design. The maximum weight fraction of the as-prepared liquid TPI in photoresist significantly increases to 2.0 wt %, which is several times higher than that of commercial 7-diethylamino-3-thenoylcoumarin (DETC). Meanwhile, this liquid TPI also exhibits an excellent absorption cross section (64 GM), allowing it to absorb femtosecond laser efficiently and generate abundant active species to initiate polymerization. Remarkably, the respective minimum feature sizes of line arrays and suspended lines are 47 and 20 nm, which are comparable to that of the-state-of-the-art electron beam lithography. Besides, the liquid TPI can be utilized to fabricate various high-quality 3D microstructures and manufacture large-area 2D devices at a considerable writing speed (1.045 m s-1). Therefore, the liquid TPI would be one of the promising initiators for micronano fabrication technology and pave the way for future development of DLW.
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Affiliation(s)
- Chun Cao
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
| | - Xiaoming Shen
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
| | - Shixiong Chen
- Department of Polymer Materials, School of Materials Science and Engineering, Tongji University, 4800 Caoan Road, Shanghai 201804, P. R. China
| | - Minfei He
- State Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang University, Hangzhou 310027, P. R. China
| | - Hongqing Wang
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
| | - Chenliang Ding
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
| | - Dazhao Zhu
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
| | - Jianjie Dong
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
| | - Hongzheng Chen
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
- State Key Laboratory of Silicon and Advanced Semiconductor Materials, Department of Polymer Science and Engineering, Zhejiang University, Hangzhou 310027, P. R. China
| | - Ning Huang
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
- State Key Laboratory of Silicon and Advanced Semiconductor Materials, Department of Polymer Science and Engineering, Zhejiang University, Hangzhou 310027, P. R. China
| | - Cuifang Kuang
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
- State Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang University, Hangzhou 310027, P. R. China
| | - Ming Jin
- Department of Polymer Materials, School of Materials Science and Engineering, Tongji University, 4800 Caoan Road, Shanghai 201804, P. R. China
| | - Xu Liu
- Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou 311121, P. R. China
- State Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang University, Hangzhou 310027, P. R. China
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5
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Stinson VP, Shuchi N, McLamb M, Boreman GD, Hofmann T. Mechanical Control of the Optical Bandgap in One-Dimensional Photonic Crystals. MICROMACHINES 2022; 13:mi13122248. [PMID: 36557546 PMCID: PMC9785498 DOI: 10.3390/mi13122248] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/23/2022] [Revised: 12/07/2022] [Accepted: 12/16/2022] [Indexed: 05/27/2023]
Abstract
Over the last several years, two-photon polymerization has been a popular fabrication approach for photonic crystals due to its high spatial resolution. One-dimensional photonic crystals with photonic bandgap reflectivities over 90% have been demonstrated for the infrared spectral range. With the success of these structures, methods which can provide tunability of the photonic bandgap are being explored. In this study, we demonstrate the use of mechanical flexures in the design of one-dimensional photonic crystals fabricated by two-photon polymerization for the first time. Experimental results show that these photonic crystals provide active mechanically induced spectral control of the photonic bandgap. An analysis of the mechanical behavior of the photonic crystal is presented and elastic behavior is observed. These results suggest that one-dimensional photonic crystals with mechanical flexures can successfully function as opto-mechanical structures.
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Johnson JE, Chen Y, Xu X. Model for polymerization and self-deactivation in two-photon nanolithography. OPTICS EXPRESS 2022; 30:26824-26840. [PMID: 36236867 DOI: 10.1364/oe.461969] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/24/2022] [Accepted: 06/23/2022] [Indexed: 06/16/2023]
Abstract
A mathematical model is developed to describe the photochemical processes in two-photon nanolithography, including two-step absorption leading to initiation and self-deactivation of the photoinitiator by laser irradiance, polymer chain propagation, termination, inhibition, and inhibitor and photoinitiator diffusion. This model is solved numerically to obtain the concentrations of the reaction species as a function of time and space as a laser beam is scanned through a volume of photoresist, from which a voxel size or linewidth is determined. The most impactful process parameters are determined by fitting the model to experimentally measured linewidths for a range of laser powers and scanning speeds, while also obtaining effective nonlinearities that are similar to previously measured values. The effects and sensitivities of the different process parameters are examined. It is shown that the photopolymerization process is dominated by diffusion of photoinitiators and oxygen inhibitors, and that self-deactivation can lead to higher effective nonlinearities in two-photon nanolithography.
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Monti J, Concellón A, Dong R, Simmler M, Münchinger A, Huck C, Tegeder P, Nirschl H, Wegener M, Osuji CO, Blasco E. Two-Photon Laser Microprinting of Highly Ordered Nanoporous Materials Based on Hexagonal Columnar Liquid Crystals. ACS APPLIED MATERIALS & INTERFACES 2022; 14:33746-33755. [PMID: 35849651 DOI: 10.1021/acsami.2c10106] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
Nanoporous materials relying on supramolecular liquid crystals (LCs) are excellent candidates for size- and charge-selective membranes. However, whether they can be manufactured using printing technologies remained unexplored so far. In this work, we develop a new approach for the fabrication of ordered nanoporous microstructures based on supramolecular LCs using two-photon laser printing. In particular, we employ photo-cross-linkable hydrogen-bonded complexes, that self-assemble into columnar hexagonal (Colh) mesophases, as the base of our printable photoresist. The presence of photopolymerizable groups in the periphery of the molecules enables the printability using a laser. We demonstrate the conservation of the Colh arrangement and of the adsorptive properties of the materials after laser microprinting, which highlights the potential of the approach for the fabrication of functional nanoporous structures with a defined geometry. This first example of printable Colh LC should open new opportunities for the fabrication of functional porous microdevices with potential application in catalysis, filtration, separation, or molecular recognition.
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Affiliation(s)
- Joël Monti
- Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), Eggenstein-Leopoldshafen 76344, Germany
| | - Alberto Concellón
- Department of Chemistry, Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts 02139, United States
| | - Ruiqi Dong
- Department of Chemical and Biomolecular Engineering, The University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States
| | - Mira Simmler
- Institute of Mechanical Process Engineering and Mechanics (MVM), Karlsruhe Institute of Technology (KIT), Karlsruhe 76131, Germany
| | - Alexander Münchinger
- Institute of Applied Physics (APH), Karlsruhe Institute of Technology (KIT), Karlsruhe 76131, Germany
| | - Christian Huck
- Institute of Physical Chemistry, Heidelberg University, Heidelberg 69120, Germany
| | - Petra Tegeder
- Institute of Physical Chemistry, Heidelberg University, Heidelberg 69120, Germany
| | - Hermann Nirschl
- Institute of Mechanical Process Engineering and Mechanics (MVM), Karlsruhe Institute of Technology (KIT), Karlsruhe 76131, Germany
| | - Martin Wegener
- Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), Eggenstein-Leopoldshafen 76344, Germany
- Institute of Applied Physics (APH), Karlsruhe Institute of Technology (KIT), Karlsruhe 76131, Germany
| | - Chinedum O Osuji
- Department of Chemical and Biomolecular Engineering, The University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States
| | - Eva Blasco
- Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), Eggenstein-Leopoldshafen 76344, Germany
- Center for Advanced Materials (CAM), Heidelberg University, Heidelberg 69120, Germany
- Organic Chemistry Institute, Heidelberg University, Hedelberg 69120, Germany
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8
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Xie X, Li Y, Wang G, Bai Z, Yu Y, Wang Y, Ding Y, Lu Z. Femtosecond Laser Processing Technology for Anti-Reflection Surfaces of Hard Materials. MICROMACHINES 2022; 13:mi13071084. [PMID: 35888901 PMCID: PMC9322106 DOI: 10.3390/mi13071084] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 06/18/2022] [Revised: 07/05/2022] [Accepted: 07/06/2022] [Indexed: 01/25/2023]
Abstract
The anti-reflection properties of hard material surfaces are of great significance in the fields of infrared imaging, optoelectronic devices, and aerospace. Femtosecond laser processing has drawn a lot of attentions in the field of optics as an innovative, efficient, and green micro-nano processing method. The anti-reflection surface prepared on hard materials by femtosecond laser processing technology has good anti-reflection properties under a broad spectrum with all angles, effectively suppresses reflection, and improves light transmittance/absorption. In this review, the recent advances on femtosecond laser processing of anti-reflection surfaces on hard materials are summarized. The principle of anti-reflection structure and the selection of anti-reflection materials in different applications are elaborated upon. Finally, the limitations and challenges of the current anti-reflection surface are discussed, and the future development trend of the anti-reflection surface are prospected.
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Affiliation(s)
- Xiaofan Xie
- Center for Advanced Laser Technology, Hebei University of Technology, Tianjin 300401, China; (X.X.); (Z.B.); (Y.Y.); (Y.W.); (Z.L.)
- Hebei Key Laboratory of Advanced Laser Technology and Equipment, Tianjin 300401, China
| | - Yunfei Li
- Center for Advanced Laser Technology, Hebei University of Technology, Tianjin 300401, China; (X.X.); (Z.B.); (Y.Y.); (Y.W.); (Z.L.)
- Hebei Key Laboratory of Advanced Laser Technology and Equipment, Tianjin 300401, China
- Tianjin Key Laboratory of Electronic Materials and Devices, Tianjin 300401, China
- National Demonstration Center for Experimental (Electronic and Communication Engineering) Education, Hebei University of Technology, Tianjin 300401, China
- Correspondence: (Y.L.); (G.W.); (Y.D.)
| | - Gong Wang
- Center for Advanced Laser Technology, Hebei University of Technology, Tianjin 300401, China; (X.X.); (Z.B.); (Y.Y.); (Y.W.); (Z.L.)
- Hebei Key Laboratory of Advanced Laser Technology and Equipment, Tianjin 300401, China
- Tianjin Key Laboratory of Electronic Materials and Devices, Tianjin 300401, China
- National Demonstration Center for Experimental (Electronic and Communication Engineering) Education, Hebei University of Technology, Tianjin 300401, China
- Correspondence: (Y.L.); (G.W.); (Y.D.)
| | - Zhenxu Bai
- Center for Advanced Laser Technology, Hebei University of Technology, Tianjin 300401, China; (X.X.); (Z.B.); (Y.Y.); (Y.W.); (Z.L.)
- Hebei Key Laboratory of Advanced Laser Technology and Equipment, Tianjin 300401, China
- Tianjin Key Laboratory of Electronic Materials and Devices, Tianjin 300401, China
- National Demonstration Center for Experimental (Electronic and Communication Engineering) Education, Hebei University of Technology, Tianjin 300401, China
| | - Yu Yu
- Center for Advanced Laser Technology, Hebei University of Technology, Tianjin 300401, China; (X.X.); (Z.B.); (Y.Y.); (Y.W.); (Z.L.)
- Hebei Key Laboratory of Advanced Laser Technology and Equipment, Tianjin 300401, China
- Tianjin Key Laboratory of Electronic Materials and Devices, Tianjin 300401, China
- National Demonstration Center for Experimental (Electronic and Communication Engineering) Education, Hebei University of Technology, Tianjin 300401, China
| | - Yulei Wang
- Center for Advanced Laser Technology, Hebei University of Technology, Tianjin 300401, China; (X.X.); (Z.B.); (Y.Y.); (Y.W.); (Z.L.)
- Hebei Key Laboratory of Advanced Laser Technology and Equipment, Tianjin 300401, China
- Tianjin Key Laboratory of Electronic Materials and Devices, Tianjin 300401, China
- National Demonstration Center for Experimental (Electronic and Communication Engineering) Education, Hebei University of Technology, Tianjin 300401, China
| | - Yu Ding
- Science and Technology on Electro-Optical Information Security Control Laboratory, Tianjin 300308, China
- Correspondence: (Y.L.); (G.W.); (Y.D.)
| | - Zhiwei Lu
- Center for Advanced Laser Technology, Hebei University of Technology, Tianjin 300401, China; (X.X.); (Z.B.); (Y.Y.); (Y.W.); (Z.L.)
- Hebei Key Laboratory of Advanced Laser Technology and Equipment, Tianjin 300401, China
- Tianjin Key Laboratory of Electronic Materials and Devices, Tianjin 300401, China
- National Demonstration Center for Experimental (Electronic and Communication Engineering) Education, Hebei University of Technology, Tianjin 300401, China
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Wloka T, Gottschaldt M, Schubert US. From Light to Structure: Photo Initiators for Radical Two-Photon Polymerization. Chemistry 2022; 28:e202104191. [PMID: 35202499 PMCID: PMC9324900 DOI: 10.1002/chem.202104191] [Citation(s) in RCA: 11] [Impact Index Per Article: 5.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/22/2021] [Indexed: 11/06/2022]
Abstract
Two-photon polymerization (2PP) represents a powerful technique for the fabrication of precise three-dimensional structures on a micro- and nanometer scale for various applications. While many review articles are focusing on the used polymeric materials and their application in 2PP, in this review the class of two-photon photo initiators (2PI) used for radical polymerization is discussed in detail. Because the demand for highly efficient 2PI has increased in the last decades, different approaches in designing new efficient 2PIs occurred. This review summarizes the 2PIs known in literature and discusses their absorption behavior under one- and two-photon absorption (2PA) conditions, their two-photon cross sections (σTPA ) as well as their efficiency under 2PP conditions. Here, the photo initiators are grouped depending on their chromophore system (D-π-A-π-D, D-π-D, etc.). Their polymerization efficiencies are evaluated by fabrication windows (FW) depending on different laser intensities and writing speeds.
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Affiliation(s)
- Thomas Wloka
- Laboratory of Organic and Macromolecular Chemistry (IOMC)Friedrich Schiller Universität JenaHumboldtstraße 1007743JenaGermany
- Jena Center for Soft Matter (JCSM)Friedrich Schiller Universität JenaPhilosophenweg 707743JenaGermany
| | - Michael Gottschaldt
- Laboratory of Organic and Macromolecular Chemistry (IOMC)Friedrich Schiller Universität JenaHumboldtstraße 1007743JenaGermany
- Jena Center for Soft Matter (JCSM)Friedrich Schiller Universität JenaPhilosophenweg 707743JenaGermany
| | - Ulrich S. Schubert
- Laboratory of Organic and Macromolecular Chemistry (IOMC)Friedrich Schiller Universität JenaHumboldtstraße 1007743JenaGermany
- Jena Center for Soft Matter (JCSM)Friedrich Schiller Universität JenaPhilosophenweg 707743JenaGermany
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10
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Abstract
In conventional classification, soft robots feature mechanical compliance as the main distinguishing factor from traditional robots made of rigid materials. Recent advances in functional soft materials have facilitated the emergence of a new class of soft robots capable of tether-free actuation in response to external stimuli such as heat, light, solvent, or electric or magnetic field. Among the various types of stimuli-responsive materials, magnetic soft materials have shown remarkable progress in their design and fabrication, leading to the development of magnetic soft robots with unique advantages and potential for many important applications. However, the field of magnetic soft robots is still in its infancy and requires further advancements in terms of design principles, fabrication methods, control mechanisms, and sensing modalities. Successful future development of magnetic soft robots would require a comprehensive understanding of the fundamental principle of magnetic actuation, as well as the physical properties and behavior of magnetic soft materials. In this review, we discuss recent progress in the design and fabrication, modeling and simulation, and actuation and control of magnetic soft materials and robots. We then give a set of design guidelines for optimal actuation performance of magnetic soft materials. Lastly, we summarize potential biomedical applications of magnetic soft robots and provide our perspectives on next-generation magnetic soft robots.
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Affiliation(s)
- Yoonho Kim
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA
| | - Xuanhe Zhao
- Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA
- Department of Civil and Environmental Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA
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11
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Roels E, Terryn S, Iida F, Bosman AW, Norvez S, Clemens F, Van Assche G, Vanderborght B, Brancart J. Processing of Self-Healing Polymers for Soft Robotics. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2104798. [PMID: 34610181 DOI: 10.1002/adma.202104798] [Citation(s) in RCA: 39] [Impact Index Per Article: 19.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/23/2021] [Revised: 09/27/2021] [Indexed: 06/13/2023]
Abstract
Soft robots are, due to their softness, inherently safe and adapt well to unstructured environments. However, they are prone to various damage types. Self-healing polymers address this vulnerability. Self-healing soft robots can recover completely from macroscopic damage, extending their lifetime. For developing healable soft robots, various formative and additive manufacturing methods have been exploited to shape self-healing polymers into complex structures. Additionally, several novel manufacturing techniques, noted as (re)assembly binding techniques that are specific to self-healing polymers, have been created. Herein, the wide variety of processing techniques of self-healing polymers for robotics available in the literature is reviewed, and limitations and opportunities discussed thoroughly. Based on defined requirements for soft robots, these techniques are critically compared and validated. A strong focus is drawn to the reversible covalent and (physico)chemical cross-links present in the self-healing polymers that do not only endow healability to the resulting soft robotic components, but are also beneficial in many manufacturing techniques. They solve current obstacles in soft robots, including the formation of robust multi-material parts, recyclability, and stress relaxation. This review bridges two promising research fields, and guides the reader toward selecting a suitable processing method based on a self-healing polymer and the intended soft robotics application.
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Affiliation(s)
- Ellen Roels
- Brubotics, Vrije Universiteit Brussel (VUB) and Imec, Pleinlaan 2, Brussels, 1050, Belgium
- Physical Chemistry and Polymer Science (FYSC), Vrije Universiteit Brussel (VUB), Pleinlaan 2, Brussels, 1050, Belgium
| | - Seppe Terryn
- Brubotics, Vrije Universiteit Brussel (VUB) and Imec, Pleinlaan 2, Brussels, 1050, Belgium
- Physical Chemistry and Polymer Science (FYSC), Vrije Universiteit Brussel (VUB), Pleinlaan 2, Brussels, 1050, Belgium
| | - Fumiya Iida
- Machine Intelligence Lab, University of Cambridge, Trumpington Street, Cambridge, CB2 1PZ, UK
| | - Anton W Bosman
- SupraPolix B. V., Horsten 1.29, Eindhoven, 5612 AX, The Netherlands
| | - Sophie Norvez
- Chimie Moléculaire, Macromoléculaire, Matériaux, École Supérieure de Physique et de Chimie (ESPCI), 10 Rue Vauquelin, Paris, 75005, France
| | - Frank Clemens
- Laboratory for High Performance Ceramics, Swiss Federal Laboratories for Materials Science and Technology (EMPA), Überlandstrasse 129, Dübendorf, 8600, Switzerland
| | - Guy Van Assche
- Physical Chemistry and Polymer Science (FYSC), Vrije Universiteit Brussel (VUB), Pleinlaan 2, Brussels, 1050, Belgium
| | - Bram Vanderborght
- Brubotics, Vrije Universiteit Brussel (VUB) and Imec, Pleinlaan 2, Brussels, 1050, Belgium
| | - Joost Brancart
- Physical Chemistry and Polymer Science (FYSC), Vrije Universiteit Brussel (VUB), Pleinlaan 2, Brussels, 1050, Belgium
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Wang W, Mallouk TE. A Practical Guide to Analyzing and Reporting the Movement of Nanoscale Swimmers. ACS NANO 2021; 15:15446-15460. [PMID: 34636550 DOI: 10.1021/acsnano.1c07503] [Citation(s) in RCA: 15] [Impact Index Per Article: 5.0] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
The recent invention of nanoswimmers-synthetic, powered objects with characteristic lengths in the range of 10-500 nm-has sparked widespread interest among scientists and the general public. As more researchers from different backgrounds enter the field, the study of nanoswimmers offers new opportunities but also significant experimental and theoretical challenges. In particular, the accurate characterization of nanoswimmers is often hindered by strong Brownian motion, convective effects, and the lack of a clear way to visualize them. When coupled with improper experimental designs and imprecise practices in data analysis, these issues can translate to results and conclusions that are inconsistent and poorly reproducible. This Perspective follows the course of a typical nanoswimmer investigation from synthesis through to applications and offers suggestions for best practices in reporting experimental details, recording videos, plotting trajectories, calculating and analyzing mobility, eliminating drift, and performing control experiments, in order to improve the reliability of the reported results.
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Affiliation(s)
- Wei Wang
- School of Materials Science and Engineering, Harbin Institute of Technology (Shenzhen), Shenzhen 518055, China
| | - Thomas E Mallouk
- Department of Chemistry, University of Pennsylvania, Philadelphia, Pennsylvania 19104-6243, United States
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