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Krysko M, Grzanka E, Domagala J, Leszczynski M. Influence of GaN substrate crystallographic quality on the intensity of AlGaN epitaxial layer X-ray diffraction peaks. CRYSTAL RESEARCH AND TECHNOLOGY 2015. [DOI: 10.1002/crat.201500051] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/11/2022]
Affiliation(s)
- M. Krysko
- Institute of High Pressure Physics, Polish Academy of Sciences; Sokolowska street 29/37, 01 142 Warsaw Poland
| | - E. Grzanka
- Institute of High Pressure Physics, Polish Academy of Sciences; Sokolowska street 29/37, 01 142 Warsaw Poland
- TopGaN Ltd; Sokolowska street 29/37, 01 142 Warsaw Poland
| | - J. Domagala
- Institute of Physics, Polish Academy of Sciences, Aleja Lotnikow 32/46, 02-668, Warsaw; Poland
| | - M. Leszczynski
- Institute of High Pressure Physics, Polish Academy of Sciences; Sokolowska street 29/37, 01 142 Warsaw Poland
- TopGaN Ltd; Sokolowska street 29/37, 01 142 Warsaw Poland
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Properties of Fe-doped, thick, freestanding GaN crystals grown by hydride vapor phase epitaxy. ACTA ACUST UNITED AC 2007. [DOI: 10.1116/1.2718962] [Citation(s) in RCA: 22] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/17/2022]
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