Directed self-assembly of block copolymers on two-dimensional chemical patterns fabricated by electro-oxidation nanolithography

Confined Growth of DNA-Assembled Superlattice Films

We study the assembly of DNA-functionalized nanocubes under lateral confinement in microscale square trenches on a DNA-functionalized substrate. Microfocus small-angle X-ray scattering (SAXS) and scanning electron microscopy (SEM) are used to characterize the superlattices (SLs). The results indicate that nanocubes form simple-cubic SLs with square-prism morphology and a (100) out-of-plane orientation to maximize DNA bonding. In-plane, SLs align with the template, exposing their {100} side facets, and the degree of alignment depends on trench size. Interestingly, the distribution of in-plane orientations determined from SAXS and SEM do not agree, indicating that the internal and external structures of the SLs differ. To understand this discrepancy, X-ray ptychography is employed to image the internal structures of the SLs, revealing that SLs which appear to be single-crystalline in SEM may have subsurface grain boundaries, depending on trench size. SEM reveals that the SLs grow via nucleation and growth of randomly oriented domains, which then coalesce; this mechanism explains the observed dependence of alignment and defect structure on size. Interestingly, crystallization occurs via an unusual growth mode, whereby continuous SL layers grow on top of several misoriented islands. Overall, this work elucidates the effect of lateral confinement on the crystallization of DNA-functionalized nanoparticles and shows how X-ray ptychography can be used to gain insight into nanoparticle crystallization.

Probing morphology and chemistry in complex soft materials within situresonant soft x-ray scattering

Small angle scattering methodologies have been evolving at fast pace over the past few decades due to the ever-increasing demands for more details on the complex nanostructures of multiphase and multicomponent soft materials like polymer assemblies and biomaterials. Currently, element-specific and contrast variation techniques such as resonant (elastic) soft/tender x-ray scattering, anomalous small angle x-ray scattering, and contrast-matching small angle neutron scattering, or combinations of above are routinely used to extract the chemical composition and spatial arrangement of constituent elements at multiple length scales and examine electronic ordering phenomena. Here we present some recent advances in selectively characterizing structural architectures of complex soft materials, which often contain multi-components with a wide range of length scales and multiple functionalities, where novel resonant scattering approaches have been demonstrated to decipher a higher level of structural complexity that correlates to functionality. With the advancement of machine learning and artificial intelligence assisted correlative analysis, high-throughput and autonomous experiments would open a new paradigm of material research. Further development of resonant x-ray scattering instrumentation with crossplatform sample environments will enable multimodalin situ/operando characterization of the system dynamics with much improved spatial and temporal resolution.

Oriented thick films of block copolymer made by multiple successive coatings: perforated lamellae versus oriented lamellae

Building 3D ordered nanostructures by copolymer deposition on a substrate implies a full control beyond the thin film regime. We have used here block copolymers (BCPs) forming bulk lamellar phases to form thick, i.e. much thicker than the lamellar period, structured films on a substrate. Films are formed by a simple method of multiple successive coatings. The film structure is controlled using the combined action of surface templating and annealing time. Sections of the thick layers were characterized by scanning electron microscopy (SEM) after etching of one of the BCP moieties. We show that perfect hexagonally perforated films (HPL) with lamellae parallel to the substrate are formed for a wide thickness range up to 300 nm. Grazing incidence small angle X-ray scattering (GISAXS) confirms such an organization by revealing that perforations sit on a hexagonal lattice. A lamellar organization perpendicular to the substrate is shown to take over for thicker films. A scenario consistent with our observations is proposed, where the sequence of phases results from the balance between surface and stretching energy effects.

Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns

We demonstrate the generation of block copolymer (BCP) line patterns oriented orthogonal to a very small (minimal) topographic trench pattern over arbitrarily large areas using solvent-vapor annealing. Increasing the thickness of BCP films induced an orthogonal alignment of the BCP cylindrical microdomains, where full orthogonal alignment of the cylindrical microdomains with respect to the trench direction was obtained at a film thickness corresponding to 1.70 L₀. A capillary flow of the solvent across the trenches was a critical factor in the alignment of the cylindrical microdomains. Grazing incidence small-angle X-ray scattering was used to determine the orientation function of the microdomains, with a value of 0.997 being found reflecting a nearly perfect orientation. This approach to produce orthogonally aligned BCP line patterns could be extended to the nanomanufacturing and fabrication of hierarchical nanostructures.

Directed Self-Assembly of Asymmetric Block Copolymers in Thin Films Driven by Uniaxially Aligned Topographic Patterns

We present a simple, versatile approach to generate highly ordered nanostructures of block copolymers (BCPs) using rubbed surfaces. A block of poly(tetrafluoroethylene) (PTFE) was dragged across a flat substrate surface above the melting point of PTFE transferring a highly aligned PTFE topographic pattern to the substrate. Si wafer, glass, and polyimide films were used as substrates. Thin films of cylinder-forming asymmetric polystyrene-block-poly(2-vinylpyridine) copolymers (S2VPs) were solvent annealed on the surfaces having the transferred surface pattern to induce their directed self-assembly. Cylinders of P2VP oriented normal to the surface are markedly aligned along the rubbing direction and used as templates to generate extremely uniform arrays of various metallic nanoparticles of gold, silver, and platinum over a large area.

Nanochannel Arrays for Molecular Sieving and Electrochemical Analysis by Nanosphere Lithography Templated Graphoepitaxy of Block Copolymers

The ability to design, fabricate, and manipulate materials at the nanoscale is fundamental to the quest to develop technologies to assemble nanometer-scale pieces into larger-scale components and materials, thereby transferring unique nanometer-scale properties to macroscopic objects. In this work, we describe a new approach to the fabrication of highly ordered, ultrahigh density nanochannel arrays that employs nanosphere lithography to template the graphoepitaxy of polystyrene-polydimethylsiloxane, diblock copolymers. By optimizing the well-controlled solvent vapor annealing, overcoating conditions, and the subsequent reactive ion etching processes, silica nanochannel (SNC) arrays with areal densities, ρ_A, approaching 1000 elements μm^-2, are obtained over macroscopic scales. The integrity and functionality of the SNC arrays was tested by using them as permselective ion barriers to nanopore-confined disk electrodes. The nanochannels allow cations to pass to the disk electrode but reject anions, as demonstrated by cyclic voltammetry. This ion gating behavior can be reversed from cation-permselective to anion-permselective by chemically inverting the surface charge from negative to positive. Furthermore, the conformal SNC array structures obtained could easily be lifted, detached, and transferred to another substrate, preserving the hierarchical organization while transferring the nanostructure-derived properties to a different substrate. These results demonstrate how nanoscale behavior can be replicated over macroscale distances, using electrochemical analysis as a model.

Directed Self-Assembly on Photo-Crosslinked Polystyrene Sub-Layers: Nanopattern Uniformity and Orientation

A photo-crosslinked polystyrene (PS) thin film is investigated as a potential guiding sub-layer for polystyrene-block-poly (methyl methacrylate) block copolymer (BCP) cylindrical nanopattern formation via topographic directed self-assembly (DSA). When compared to a non-crosslinked PS brush sub-layer, the photo-crosslinked PS sub-layer provided longer correlation lengths of the BCP nanostructure, resulting in a highly uniform DSA nanopattern with a low number of BCP dislocation defects. Depending on the thickness of the sub-layer used, parallel or orthogonal orientations of DSA nanopattern arrays were obtained that covered the entire surface of patterned Si substrates, including both trench and mesa regions. The design of DSA sub-layers and guide patterns, such as hardening the sub-layer by photo-crosslinking, nano-structuring on mesas, the relation between trench/mesa width, and BCP equilibrium period, were explored with a view to developing defect-reduced DSA lithography technology.

Bioinspired multi-block molecules

Elaborately designed synthetic multiblock molecules and copolymers are able to undergo folding like biological macromolecules and form controlled and compartmentalized self-assemblies that exert characteristic functions in solution, the crystalline state, and membranous media.

Directed self-assembly of cylinder-forming diblock copolymers on sparse chemical patterns

Using both theory and experiment, we investigate the possibility of creating perfectly ordered block copolymer nanostructures on sparsely patterned substrates. Our study focuses on scrutinizing the appropriate pattern conditions to avoid undesired morphologies or defects when depositing cylinder-forming AB diblock copolymer thin films on the substrates which are mostly neutral with periodic stripe regions preferring the minority domain. By systematically exploring the parameter space using self-consistent field theory (SCFT), the optimal conditions for target phases are determined, and the effects of the chemical pattern period and the block copolymer film thickness on the target phase stability are also studied. Furthermore, as a sample experimental system, almost perfectly aligned polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymers are demonstrated. After the pattern transfer process, highly ordered Al nanodot arrays following the initial vertically aligned cylinder pattern are created. This systematic study demonstrates the ability to control the structure and the position of nanopatterns on sparse chemical patterns.

Anomalous rapid defect annihilation in self-assembled nanopatterns by defect melting

Molecular self-assembly commonly suffers from dense structural defect formation. Spontaneous defect annihilation in block copolymer (BCP) self-assembly is particularly retarded due to significant energy barrier for polymer chain diffusion and structural reorganization. Here we present localized defect melting induced by blending short neutral random copolymer chain as an unusual method to promote the defect annihilation in BCP self-assembled nanopatterns. Chemically neutral short random copolymer chains blended with BCPs are specifically localized and induce local disordered states at structural defect sites in the self-assembled nanopatterns. Such localized "defect melting" relieves the energy penalty for polymer diffusion and morphology reorganization such that spontaneous defect annihilation by mutual coupling is anomalously accelerated upon thermal annealing. Interestingly, neutral random copolymer chain blending also causes morphology-healing self-assembly behavior that can generate large-area highly ordered 10 nm scale nanopattern even upon poorly defined defective prepatterns. Underlying mechanisms of the unusual experimental findings are thoroughly investigated by three-dimensional self-consistent field theory calculation.

Sub-10 nm resistless nanolithography for directed self-assembly of block copolymers

The creation of highly efficient guiding patterns for the directed self-assembly of block copolymers by resistless nanolithography using atomic force microscopy (AFM) is demonstrated. It is shown that chemical patterns consisting of arrays of lines defined on a brush layer by AFM allow the alignment of the blocks of lamella-forming polymers. The main advantage of this method relies on the capability to create high-resolution (sub-10 nm line-width) guiding patterns and the reduction of the number of process steps compared to the state-of-the-art methods for creating guiding patterns by chemical surface modification. It is found that the guiding patterns induce the block alignment very efficiently, allowing the achievement of a density multiplication factor of 7 for block copolymers of 14 nm half-pitch, which is attributed to the combined effect of topographical and chemical modification.

Negative-tone block copolymer lithography by in situ surface chemical modification

Negative-tone block copolymer (BCP) lithography based on in situ surface chemical modification is introduced as a highly efficient, versatile self-assembled nanopatterning. BCP blends films consisting of end-functionalized low molecular weight poly(styrene-ran-methyl methacrylate) and polystyrene-block-Poly(methyl methacylate) can produce surface vertical BCP nanodomains on various substrates without prior surface chemical treatment. Simple oxygen plasma treatment is employed to activate surface functional group formation at various substrates, where the end-functionalized polymers can be covalently bonded during the thermal annealing of BCP thin films. The covalently bonded brush layer mediates neutral interfacial condition for vertical BCP nanodomain alignment. This straightforward approach for high aspect ratio, vertical self-assembled nanodomain formation facilitates single step, site-specific BCP nanopatterning widely useful for various substrates. Moreover, this approach is compatible with directed self-assembly approaches to produce device oriented laterally ordered nanopatterns.

Wrinkle-directed self-assembly of block copolymers for aligning of nanowire arrays

Highly aligned metal nanowire arrays with feature sizes approaching 10 nm are fabricated. This is made possible by the self-assembly of block copolymers (BCPs) on graphene-wrinkle arrays. Thickness-modulated BCP films confined on the wrinkled reduced graphene oxide (rGO) surface promote the strict alignment of the self-assembled BCP lamellae in the direction of the film thickness gradient.

Blossoming of nanosheet structures via a disturbed self-assembly

Nanofabrication has been critical in all kinds of nanotechnology, not only for achieving various nanostructures or nanosystems but also for the application of the nanotechnology. To achieve controllable but simple nanofabrication is one of the central aspirations for many research communities; here, for the first time, we report the growth of nanosheet structures simply by introducing internal disturbances (adding nanoparticles and surface tension) or external disturbances (deformations) to the self-assembly of copolymers induced by evaporation. Nanoparticles, curved surface, and deformations by such as writing or extension have been employed to demonstrate the sensitivity of the nanosheet structures to various disturbances. Finally, a physical model has been proposed to explain how the disturbances contribute to the formation of the nanosheet structures. These significant results indicate a scalable, writable, cost-effective and environmentally friendly nanotechnology that will stimulate new nanofabrication research.

Hybrid bulk heterojunction solar cells based on the cooperative interaction of liquid crystals within quantum dots and diblock copolymers

In this article, the conjugated rod-rod polythiophene diblock copolymers comprising a regioregular poly(3-hexylthiophene) (P3HT) segment and a side-chain liquid-crystalline polythiophene segment bearing cyanobiphenyl mesogenic pendants (PTcbp), polythiophene-b-poly{3-[10-(4'-cyanobiphenyloxy)decyl]thiophene} (P3HT-b-PTcbp), were rationally designed and synthesized. It was observed that the diblock copolymers could self-assemble into high crystalline and oriented nanofibrils upon 1,2-dichlorobenzene solvent vapor annealing, originating from the crystallization of two segments and the orientation of cyanobiphenyl side-chain mesogens. Hybrid bulk heterojunction (BHJ) solar cells were then fabricated using P3HT-b-PTcbp as electron donors and ZnO and CdS quantum dots (QDs) modified by 4'-hydroxy-[1,1'-biphenyl]-4-carbonitrile (cbp) liquid-crystalline ligands (cbp@ZnO and cbp@CdS) as electron acceptors. The interaction between the cbp ligands on the surface of ZnO and CdS QDs and cyanobiphenyl side-chain mesogens of diblock copolymers promoted the cooperative self-assembly and controllable well-dispersion of QDs in the polymer matrix and, as a consequence, yielded an intimately contacted polymer-QD nanocomposites. The power conversion efficiency (PCE) of the device based on P3HT-b-PTcbp/cbp@ZnO hybrids was improved by 2.6 times compared with that of P3HT/ZnO hybrids from 0.58 to 0.97. In addition, an overall PCE of a homologous device based on the P3HT-b-PTcbp/cbp@CdS hybrid active layer reached 2.3%. The research paved the way for the further development of high-efficiency hybrid BHJ solar cells by introducing block copolymer nanofibrils with favored crystalline domain orientations and liquid-crystalline organization properties.

Line patterns from cylinder-forming photocleavable block copolymers

A robust route for the preparation of nanoscopic line patterns from polystyrene-block-poly(ethylene oxide) featuring a photocleavable o-nitrobenzyl ester junction is demonstrated. After mild UV (λ = 365 nm) exposure and selective removal of the PEO microdomains, the polymer trench patterns are used as scaffold to fabricate highly ordered arrays of silica or Au line patterns.

Solvent-assisted directed self-assembly of spherical microdomain block copolymers to high areal density arrays

The fabrication process for 5 Tb/in(2) bit patterns using solvent-assisted directed self-assembly is investigated. The N-methyl-2-pyrrolidone solvent vapor-annealing method was used to achieve good long-range lateral ordering of low-molecular-weight polystyrene-block-polydimethylsiloxane with a lattice spacing of 11 nm on flat Si substrates, PS modified substrates and lithographically patterned substrates, respectively.

Directed assembly of P3HT:PCBM blend films using a chemical template with sub-300 nm features

Surface energy has been demonstrated as a means to direct interfacial-layer composition in polymer:fullerene blends utilized as active layers in organic photovoltaic devices. Combined with recent materials advances in the preparation of nanoscale chemical patterns, surface energy control of nanophase separation presents an opportunity to employ patterned surface energy templates to control the 3D blend morphology of polymer:fullerene blends. This report details the directed assembly of poly(3-hexylthiophene):phenyl-C61-butyric acid methyl ester (P3HT:PCBM) blends atop linear grating patterns with domains of alternating high and low surface energy of 50 to 600 nm in width prepared by nanoscale oxidative lithography of alkyl-terminated self-assembled monolayers on SiO2 and SiH surfaces. Tapping-, contact-, and current-sensing AFM studies demonstrated that chemical patterns were effective at directing the 3D morphology of P3HT:PCBM blends at dimensions of >200 nm. As the dimensionality of domains approached 100 nm, the chemical patterns were no longer able to direct phase segregation, evidence that a directed spinodal decomposition mechanism was responsible for the observed morphology. Surprisingly, the low surface energy component (P3HT) was found to be atop the high surface energy domains of the template, in conflict with current understanding of the role of surface energy directed assembly in polymer blends. These results suggest that the directed spinodal decomposition mechanism applies to conjugated polymer:fullerene blends, but that additional parameters unique to these types of systems will require refinement of the theory to adequately describe and predict the behavior of these scientifically and industrially interesting materials.

Orienting block copolymer microdomains with block copolymer brushes

A simple, rapid, and robust technique for controlling the self-assembly of block copolymers (BCPs) with a large segmental interaction parameter, χ, is described using a surface modified with anchored BCP brushes. End-functionalized poly(styrene-b-ethylene oxide)s (PS-b-PEOs), where the fraction of PS (f(PS)) was varied, end-functionalized neat PS, and end-functionalized neat PEO were end-grafted onto Si substrates modifying the surface with polymer brushes. Thin films of cylinder-forming PS-b-PEO were prepared on modified Si substrates and thermally annealed. When neat PS and PEO were used as the anchored brushes, the microdomains of the PS-b-PEO oriented parallel to the substrate upon thermal annealing due to the preferential interactions of one block to the anchored brushes. However, when end-functionalized PS-b-PEOs were used to modify the substrate, hexagonally packed cylindrical PEO microdomains oriented normal to the substrate, having long-range lateral ordering, were obtained over a very wide range of f(PS) (0.32 to 0.77).

Controlled orientation of block copolymers on defect-free faceted surfaces

The effect of a faceted surface geometry on controlling the direction of well-defined line patterns of block copolymer (BCP) microdomains over macroscopic areas is reported. Facets with asymmetric base angles can control the direction of BCP microdomains oriented either parallel or perpendicular to the facets depending on BCP film thickness.

Spontaneous propagation of self-assembly in a continuous medium

We report a mechanism in which self-assembly propagates spontaneously in a continuous medium, enabling the delivery of local order information to distance. In a large stable system a locally self-assembled structure as a precursor destabilizes its surrounding areas through a dipole interaction. The newly formed structures inherit the same order information from the precursor and further activate the self-assembly of their neighbors. This process causes spatial extension of self-assembly and replication of the order, producing extremely long-range ordered superlattice without defects.

Parallel- and serial-contact electrochemical metallization of monolayer nanopatterns: A versatile synthetic tool en route to bottom-up assembly of electric nanocircuits

Contact electrochemical transfer of silver from a metal-film stamp (parallel process) or a metal-coated scanning probe (serial process) is demonstrated to allow site-selective metallization of monolayer template patterns of any desired shape and size created by constructive nanolithography. The precise nanoscale control of metal delivery to predefined surface sites, achieved as a result of the selective affinity of the monolayer template for electrochemically generated metal ions, provides a versatile synthetic tool en route to the bottom-up assembly of electric nanocircuits. These findings offer direct experimental support to the view that, in electrochemical metal deposition, charge is carried across the electrode-solution interface by ion migration to the electrode rather than by electron transfer to hydrated ions in solution.

Fabrication of silicon oxide nanodots with an areal density beyond 1 teradots inch(-2)

The combination of solvent annealing, surface reconstruction, and a tone-reversal etching procedure provides an attractive approach to utilize block copolymer (BCP) lithography to fabricate highly ordered and densely packed silicon oxide nano-dots on a surface. The obtained silicon oxide nano-dots feature an areal density of 1.3 teradots inch(-2) .

Micellar transitions in solvent-annealed thin films of an amphiphilic block copolymer controlled with tunable surface fields

We investigated the response of symmetric poly(styrene-block-4vinylpyridine) P(S-b-4VP) diblock copolymer micelles to surface fields of variable strength at free surfaces and substrate interfaces when the micelles as spun were subjected to solvent annealing. Free surface interactions were controlled with solvent annealing in solvents of varied selectivity. On exposure to vapors of a solvent strongly selective for PS, the micelles retained their spherical shape but grew into cylindrical micelles or lamellar nanostructures via fusion on exposure to slightly selective or neutral solvent vapors. Giant 2D disks that completely wetted PS-grafted substrates resulted when spherical micelles were exposed to vapors of a highly selective solvent for P4VP. The interfacial interactions were controlled through subjecting them to UV/ozone (UVO) substrates initially coated with an end-grafted layer of short PS chains, with which the grafted PS chains became oxidized, degraded, or totally removed through UVO treatment for a controlled duration. When thin films were annealed in vapors of THF, the structural transition from spherical to cylindrical micelles depended on the interfacial field. On applying selective UVO exposure of optimal duration, we fabricated a substrate with two interfacial chemistries that promoted varied micellar species (spherical and cylindrical micelles) with a sharp boundary developed within thin films through solvent annealing for a controlled duration.

Circular nanopatterns over large areas from the self-assembly of block copolymers guided by shallow trenches

We report the fabrication of ultradense circular nanolines of block copolymer (BCP) microdomains over macroscopic areas. These lines were generated by the directed self-assembly (DSA) of BCPs on the topographically patterned substrates, where the trenches with circular shape are patterned on a flat substrate. The width of the trench and the distance between trenches are varied for commensurability issues, and difference BCPs are used to demonstrate the generality of this strategy. When a commensurability condition is satisfied, BCPs on the topographically patterned substrates undergo a DSA with solvent annealing, resulting in a flat film with an areal density amplification of the circular patterns over large areas. The methodology described here may provide an easy approach to high densities of circularly shaped nanopatterns for data storage device manufacturing.

Growing large nanostructured superlattices from a continuum medium by sequential activation of self-assembly

We propose a mechanism to grow a large superlattice of phase domains from a continuum homogenous binary film by sequential activation of self-assembly. Self-assembly was initiated in a small mobile region (where atoms could diffuse) to form a seed pattern, and then the mobile region was shifted gradually. This process led to a long-range ordered superlattice regardless whether the seed was perfect or not, since the pattern quickly improved to a perfect superlattice along with the sequential activation. At a bistable state the scanning velocity controlled the type of superlattice. Further exploration led to an intriguing finding that we call the self-activation of self-assembly, a domino effect where the self-assembly in a small region causes a long-range interaction that destabilizes its homogeneous neighbor and triggers the propagation of self-assembly to the entire system.

Directed Self-Assembly: Expectations and Achievements

Nanotechnology has been a revolutionary thrust in recent years of development of science and technology for its broad appeal for employing a novel idea for relevant technological applications in particular and for mass-scale production and marketing as common man commodity in general. An interesting aspect of this emergent technology is that it involves scientific research community and relevant industries alike. Top-down and bottom-up approaches are two broad division of production of nanoscale materials in general. However, both the approaches have their own limits as far as large-scale production and cost involved are concerned. Therefore, novel new techniques are desired to be developed to optimize production and cost. Directed self-assembly seems to be a promising technique in this regard; which can work as a bridge between the top-down and bottom-up approaches. This article reviews how directed self-assembly as a technique has grown up and outlines its future prospects.