Sub-10 nm features obtained from directed self-assembly of semicrystalline polycarbosilane-based block copolymer thin films

Selective sequential infiltration synthesis of ZnO in the liquid crystalline phase of silicon-containing rod-coil block copolymers

The combination of block copolymer (BCP) thin film self-assembly and selective infiltration synthesis of inorganic materials into one BCP block provides access to various organic-inorganic hybrids. Here, we apply sequential infiltration synthesis, a vapor-phase hybridization technique, to selectively introduce ZnO into the organic microdomains of silicon-containing rod-coil diblock copolymers and a triblock terpolymer, polydimethylsiloxane (PDMS)-b-poly{2,5-bis[(4-methoxyphenyl)-oxycarbonyl]styrene} (PDMS-b-PMPCS) and PDMS-b-polystyrene-b-PMPCS (PDMS-b-PS-b-PMPCS), in which the PMPCS rod block is a liquid crystalline polymer. The in-plane cylindrical PDMS-b-PMPCS and core-shell cylindrical and hexagonally perforated lamellar PDMS-b-PS-b-PMPCS films were infiltrated with ZnO with high selectivity to the PMPCS. The etching contrast between PDMS, PS and the ZnO-infused PMPCS enables the fabrication of ZnO/SiO_x binary composites by plasma etching and reveals the core-shell morphology of the triblock terpolymer.

Si containing block copolymers quickly assemble into sub-6 nm domains

The directed self-assembly (DSA) of block copolymers (BCPs) is a potential patterning technology for sub-7 nm lithography.

Machine Learning Predictions of Block Copolymer Self-Assembly

Directed self-assembly of block copolymers is a key enabler for nanofabrication of devices with sub-10 nm feature sizes, allowing patterning far below the resolution limit of conventional photolithography. Among all the process steps involved in block copolymer self-assembly, solvent annealing plays a dominant role in determining the film morphology and pattern quality, yet the interplay of the multiple parameters during solvent annealing, including the initial thickness, swelling, time, and solvent ratio, makes it difficult to predict and control the resultant self-assembled pattern. Here, machine learning tools are applied to analyze the solvent annealing process and predict the effect of process parameters on morphology and defectivity. Two neural networks are constructed and trained, yielding accurate prediction of the final morphology in agreement with experimental data. A ridge regression model is constructed to identify the critical parameters that determine the quality of line/space patterns. These results illustrate the potential of machine learning to inform nanomanufacturing processes.

Self-Directed Self-Assembly of 3D Tailored Block Copolymer Nanostructures

Directed self-assembly (DSA) of block copolymers (BCPs) provides a powerful tool to fabricate various 2D nanostructures. However, it still remains a challenge to extend DSA to make uniform and complex 3D nanostructures through BCP self-assembly. In this paper, we introduce a method to fabricate various nanostructures in 3D and test it using simulations. In particular, we employ dissipative particle dynamics (DPD) simulation to demonstrate that uniform multilayer nanostructures can be achieved by alternating the stacking of two "orthogonal" BCPs films, AB copolymer film and AC copolymer film, without the need to cross-link or etch any of the components. The assembly of a new layer occurs on top of the previous bottom layer, and thus the structural information from the substrate is propagated upward in the film, a process we refer to as self-directed self-assembly (SDSA). If this process is repeated many times, one can have tailored multilayer nanostructures. Furthermore, the natural (bulk) phases of the block copolymers in each layer do not need to be the same, so one can achieve complex 3D assemblies that are not possible with a single-phase 3D system. This method in conjunction with grapho (or chemo) epitaxy is able to evolve a surface pattern into a 3D nanostructure. Here we show several examples of nanostructures fabricated by this process, which include aligned cylinders, spheres on top of cylinders, and orthogonal nanomeshes. Our work should be useful for creating complex 3D nanostructures using self-assembly.

Vertical Lamellae Formed by Two-Step Annealing of a Rod-Coil Liquid Crystalline Block Copolymer Thin Film

Silicon-containing block copolymer thin films with high interaction parameter and etch contrast are ideal candidates to generate robust nanotemplates for advanced nanofabrication, but they typically form in-plane oriented microdomains as a result of the dissimilar surface energies of the blocks. Here, we describe a two-step annealing method to produce vertically aligned lamellar structures in thin film of a silicon-containing rod-coil thermotropic liquid crystalline block copolymer. The rod-coil block copolymer with the volume fraction of the Si-containing block of 0.22 presents an asymmetrical lamellar structure in which the rod block forms a hexatic columnar nematic liquid crystalline phase. A solvent vapor annealing step first produces well-ordered in-plane cylinders of the Si-containing block, then a subsequent thermal annealing promotes the phase transition from in-plane cylinders to vertical lamellae. The pathways of the order-order transition were examined by microscopy and in situ using grazing incidence small-angle X-ray scattering and wide-angle X-ray scattering.

Perpendicularly aligned nanodomains on versatile substrates via rapid thermal annealing assisted by liquid crystalline ordering in block copolymer films

The highly ordered perpendicularly aligned cylindrical and lamellar microdomains within block copolymer (BCP) films have important applications in diverse fields. However, the fast normal orientation of self-assembled nanostructures on arbitrary substrates without tedious pre- and postprocessing has been a challenging issue in manufacturing miniaturized devices. Here, we outline the potential for extending the hierarchical self-assembly within azobenzene-containing PS-b-PMA(Az) films to inherently assist in the formation of normally aligned domains using a rapid thermal annealing process (140 °C for 5 min). Liquid crystalline (LC) mesogens in PS-b-PMA(Az) films self-assemble to form a parallelly aligned sematic phase after thermal annealing, as confirmed by grazing-incidence small-angle X-ray scattering (GISAXS), wide-angle X-ray diffraction (WAXD) and ultraviolet-visible (UV-vis) spectra. This sub-phase contributes to broadening of the PS-cylinder-phase window (0.083 ≤ f _PS < 0.49) and ∼12 nm PS cylinder structures. Perpendicular cylinders or lamellae are observed on various substrates, such as silicon wafers, flexible polyethylene terephthalate (PET) sheets and conductive aluminum foils. Additionally, the good reactive ion etching (RIE) rate difference between the two blocks makes these BCPs more attractive for advancing the field of BCP lithographic applications for fabricating flexible microelectronic devices.

Periodic Bicontinuous Structures Formed on the Top Surface of Asymmetric Triblock Terpolymer Thick Films

The combination of the nonsolvent-induced phase separation (NIPS) process with a solvent vapor annealing (SVA) treatment is used to produce asymmetric and hydrophobic thick films having different long-range ordered network nanostructures, which are inaccessible via currently available membrane fabrication methods. We show that the disordered phase generated by NIPS on the material top surface can be transformed into a highly ordered bicontinuous network nanostructure during the SVA process without disrupting the substructure morphology. For instance, by using a straightforward blending approach, either a triply periodic alternating diamond (D^A) structure or a core-shell perforated lamellar (PL) phase was demonstrated on the skin layer of fully hydrophobic poly(1,1-dimethyl silacyclobutane)-block-polystyrene-block-poly(methyl methacrylate) (PDMSB-b-PS-b-PMMA) thick films. Such a material fabrication method, enabling the formation of a sponge-like substructure topped by a network phase having an excellent long-range order, provides an appealing strategy to facilitate the manufacture of next-generation membranes at large scale since these bicontinuous morphologies obviate the need of the nanochannel alignment.

Core-Shell and Zigzag Nanostructures from a Thin Film Silicon-Containing Conformationally Asymmetric Triblock Terpolymer

The self-assembly of multiblock copolymers generates diverse hierarchical nanostructures and greatly extends the range of microdomain geometries beyond those produced by diblock copolymers. We report the synthesis of a conformationally asymmetric ABC triblock terpolymer in which the end blocks are a mesogen-jacketed liquid crystalline polymer and poly(dimethylsiloxane), respectively, and its self-assembly under mixed solvent vapor annealing forms a range of sphere, cylinder, and perforated lamellar core-shell morphologies, as well as stacked multilevel structures. Sub-7 nm diameter SiO_x nanopatterns were generated by selective plasma etching of the small volume fraction Si-containing core block giving a line/space ratio of ∼1:4. Moreover, the conformational asymmetry of this terpolymer leads to zigzag cylinders on a flat substrate and stable cylinder alignment transverse to template sidewalls within lithographically patterned trenches.

Downsizing feature of microphase-separated structures via intramolecular crosslinking of block copolymers

A novel strategy for downsizing the feature of microphase-separated structures was developed via the intramolecular crosslinking reaction of block copolymers (BCPs) without changing the molecular weight. A series of BCPs consisting of poly[styrene-st-(p-3-butenyl styrene)] and poly(rac-lactide) (SBS-LA) was subjected to Ru-catalyzed olefin metathesis under highly diluted conditions to produce intramolecularly crosslinked BCPs (SBS(cl)-LAs). Small-angle X-ray scattering measurement and transmission electron microscopy observation of the SBS(cl)-LAs revealed feature size reduction in lamellar (LAM) and hexagonally close-packed cylinder (HEX) structures in the bulk state, which was surely due to the restricted chain dimensions of the intramolecularly crosslinked SBS block. Notably, the degree of size reduction was controllable by varying the crosslink density, with a maximum decrease of 22% in the LAM spacing. In addition, we successfully observed the downsizing of the HEX structure in the thin film state using atomic force microscopy, indicating the applicability of the present methodology to next-generation lithography technology.

The effect of chain architecture on the phase behavior of A4B4 miktoarm block copolymers

Well-defined miktoarm (polystyrene)₄-(polylactic acid)₄ ((PS)₄-(PLA)₄) block copolymers were synthesized and their phase behaviors were compared with linear PS-b-PLA block copolymers, in which the miktoarm architecture enhanced the phase segregation.

Self-assembly of a silicon-containing side-chain liquid crystalline block copolymer in bulk and in thin films: kinetic pathway of a cylinder to sphere transition

The self-assembly of a high-χ silicon-containing side-chain liquid crystalline block copolymer (LC BCP) in bulk and in thin films is reported, and the structural transition process from the hexagonally packed cylinder (HEX) to the body-centered cubic structure (BCC) in thin films was examined by both reciprocal and real space experimental methods. The block copolymer, poly(dimethylsiloxane-b-11-(4'-cyanobiphenyl-4-yloxy)undecylmethacrylate) (PDMS-b-P(4CNB11C)MA) with a molecular weight of 19.5 kg mol-1 and a volume fraction of PDMS 27% self-assembled in bulk into a hierarchical nanostructure of sub-20 nm HEX cylinders of PDMS with the P(4CNB11C)MA block exhibiting a smectic LC phase with a 1.61 nm period. The structure remained HEX as the P(4CNB11C)MA block transformed to an isotropic phase at ∼120 °C. In the thin films, the PDMS cylindrical microdomains were oriented in layers parallel to the substrate surface. The LC block formed a smectic LC phase which transformed to an isotropic phase at ∼120 °C, and the microphase-separated nanostructure transformed from HEX to BCC spheres at ∼160 °C. The hierarchical structure as well as the dynamic structural transition of the thin films were characterized using in situ grazing-incidence small-angle X-ray scattering and grazing-incidence wide-angle X-ray scattering. The transient morphologies from the HEX to BCC structure in thin films were captured by scanning electron microscopy and atomic force microscopy, and the transition pathway was described.

Bioinspired smart asymmetric nanochannel membranes

Bioinspired smart asymmetric nanochannel membranes (BSANM) have been explored extensively to achieve the delicate ionic transport functions comparable to those of living organisms. The abiotic system exhibits superior stability and robustness, allowing for promising applications in many fields. In view of the abundance of research concerning BSANM in the past decade, herein, we present a systematic overview of the development of the state-of-the-art BSANM system. The discussion is focused on the construction methodologies based on raw materials with diverse dimensions (i.e. 0D, 1D, 2D, and bulk). A generic strategy for the design and construction of the BSANM system is proposed first and put into context with recent developments from homogeneous to heterogeneous nanochannel membranes. Then, the basic properties of the BSANM are introduced including selectivity, gating, and rectification, which are associated with the particular chemical and physical structures. Moreover, we summarized the practical applications of BSANM in energy conversion, biochemical sensing and other areas. In the end, some personal opinions on the future development of the BSANM are briefly illustrated. This review covers most of the related literature reported since 2010 and is intended to build up a broad and deep knowledge base that can provide a solid information source for the scientific community.

Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns

We demonstrate the generation of block copolymer (BCP) line patterns oriented orthogonal to a very small (minimal) topographic trench pattern over arbitrarily large areas using solvent-vapor annealing. Increasing the thickness of BCP films induced an orthogonal alignment of the BCP cylindrical microdomains, where full orthogonal alignment of the cylindrical microdomains with respect to the trench direction was obtained at a film thickness corresponding to 1.70 L₀. A capillary flow of the solvent across the trenches was a critical factor in the alignment of the cylindrical microdomains. Grazing incidence small-angle X-ray scattering was used to determine the orientation function of the microdomains, with a value of 0.997 being found reflecting a nearly perfect orientation. This approach to produce orthogonally aligned BCP line patterns could be extended to the nanomanufacturing and fabrication of hierarchical nanostructures.

Molecular Tailoring of Poly(styrene-b-methyl methacrylate) Block Copolymer Toward Perpendicularly Oriented Nanodomains with Sub-10 nm Features

We demonstrate a novel approach for fabricating vertically orientated, sub-10 nm, block copolymer (BCP) nanodomains on a substrate via molecular tailoring of poly(styrene-b-methyl methacrylate) (PS-b-PMMA) BCP, one of the most widely used BCPs for nanopatterning. The idea is to incorporate a short middle block of self-attracting poly(methacrylic acid) (PMAA) between the PS and PMMA blocks, where the PMAA middle block promotes phase separation between PS and PMMA, while maintaining the domain orientation perpendicular to the substrate. The designed PS-b-PMAA-b-PMMA triblock copolymers, which were synthesized via well-controlled anionic polymerization, exhibited order-disorder transition temperatures higher than that of pristine PS-b-PMMA BCPs, indicating the promotion of phase separation by the middle PMAA block. For PS-b-PMAA-b-PMMA BCPs with total molecular weights of 21 and 18 kg/mol, the domain spacing corresponds to 19.3 and 16.7 nm, respectively, allowing us to fabricate sub-10 nm nanodomain structures. More importantly, it was demonstrated that the PMAA middle block, which has a higher surface energy than PS and PMMA, does not significantly alter lateral concentration fluctuations, which are responsible for phase-separation in the lateral direction. This enabled the vertical orientation of microdomains with sub-10 nm feature size on a PS-r-PMMA neutral surface without an additional neutral top layer. We anticipate that this approach provides an important platform for next-generation lithography and nanopatterning applications that require sub-10 nm features over large areas with simple process and reduced cost.

Straightforward Integration Flow of a Silicon-Containing Block Copolymer for Line-Space Patterning

A promising alternative for the next-generation lithography is based on the directed self-assembly of block copolymers (BCPs) used as a bottom-up tool for the definition of nanometric features. Herein, a straightforward integration flow for line-space patterning is reported for a silicon BCP system, that is, poly(1,1-dimethylsilacyclobutane)-b-poly(styrene) (PDMSB-b-PS), able to define sub 15 nm features. Both in-plane cylindrical (L₀ = 20.7 nm) and out-of-plane lamellar structures (L₀ = 23.2 nm) formed through a rapid thermal annealing-10 min at 180 °C-were successfully integrated using graphoepitaxy to provide a long-range ordering of the BCP structure without the use of underlayers or top coats. Subsequent deep transfer into the silicon substrate using the hardened oxidized PDMSB domains as a mask is demonstrated. Combining a rapid self-assembly behavior, straightforward integration, and an excellent etching contrast, PDMSB-b-PS may become a material of choice for the next-generation lithography.

Formation of Nanogrooves with Sub-5 nm Periodicity Using Local Silicification at the Interspace between a Si Substrate and Lyotropic Liquid Crystals

Bottom-up fabrication of nanopatterns with single nanometer-scale periodicity is quite challenging. In this study, we have focused on the use of the outermost convex surfaces of lyotropic liquid crystals (LLCs) as a template. Periodically arrayed single nanometer-scale nanogrooves consisting of silica are successfully formed on a Si substrate covered with LLCs composed of cylindrical micelles of cetyltrimethylammonium chloride. Soluble silicate species are generated from the Si substrate by a treatment with an NH₃-water vapor mixture, infilling the interspaces between the Si substrate and the LLCs. The cross section of the nanogrooves has a symmetrical sawtooth-like profile with a periodicity of 4.7 nm, and the depth of each nanogroove is around 2 nm. Uniaxial alignment of the nanogrooves can be achieved using micrometer-scale grooves fabricated by a focused ion beam technique. Although formed nanogrooves contain defects, such as bends and discontinuities, this successful concept provides a novel fabrication method of arrayed concave patterns with sub-5 nm periodicity on the surfaces of Si substrates.

Templated Sub-100-nm-Thick Double-Gyroid Structure from Si-Containing Block Copolymer Thin Films

The directed self-assembly of diblock copolymer chains (poly(1,1-dimethyl silacyclobutane)-block-polystyrene, PDMSB-b-PS) into a thin film double gyroid structure is described. A decrease of the kinetics of a typical double-wave pattern formation is reported within the 3D-nanostructure when the film thickness on mesas is lower than the gyroid unit cell. However, optimization of the solvent-vapor annealing process results in very large grains (over 10 µm²) with specific orientation (i.e., parallel to the air substrate) and direction (i.e., along the groove direction) of the characteristic (211) plane, demonstrated by templating sub-100-nm-thick PDMSB-b-PS films.

Highly Ordered Nanoring Arrays Formed by Templated Si-Containing Triblock Terpolymer Thin Films

Laterally ordered nanorings with a periodicity of 38 nm are produced from the directed self-assembly of poly(1,1-dimethylsilacyclobutane)-block-polystyrene-block-poly(methyl methacrylate) thin films on topographically patterned substrates. Such nanoscale arrays with vertically oriented rings are highly desired in technological applications including memory using magnetic recording, metamaterial, waveguide, etc.

Sub-5 nm Patterning by Directed Self-Assembly of Oligo(Dimethylsiloxane) Liquid Crystal Thin Films

Highly ordered nanopatterns are obtained at sub-5 nm periodicities by the graphoepitaxial directed self-assembly of monodisperse, oligo(dimethylsiloxane) liquid crystals. These hybrid organic/inorganic liquid crystals are of high interest for nanopatterning applications due to the combination of their ultrasmall feature sizes and their ability to be directed into highly ordered domains without additional annealing.

Archimedean Tilings and Hierarchical Lamellar Morphology Formed by Semicrystalline Miktoarm Star Terpolymer Thin Films

3-Miktoarm star terpolymer architecture provides a window of opportunity in the design of complex "three-colored" patterns at the nanometer scale. Here, the directed self-assembly (DSA) of 3-miktoarm star terpolymer (poly(1,1-dimethyl silacyclobutane)-arm-polystyrene-arm-poly(d,l-lactide acid)) (PDMSB-arm-PS-arm-PLA, noted hereafter 3 μ-DSL) into a hierarchical lamellar morphology is described. Excellent orientational order has been achieved by templating the asymmetric hierarchical lamellar morphology with topographical substrates. Increasing the PLA volume fraction leads to the formation of a hexagonal [6.6.6] Archimedean tiling which coexists with a metastable square symmetry [4.8.8] tiling stabilized by the step between terraces. Stability of the [6.6.6] tiling over the [4.8.8] one is also demonstrated with GISAXS measurements.

Sub-10 nm Silicon Nanopillar Fabrication Using Fast and Brushless Thermal Assembly of PS-b-PDMS Diblock Copolymer

A new approach to obtaining spherical nanodomains using polystyrene-block-polydimethylsiloxane (PS-b-PDMS) is proposed. To reduce drastically the process time, we blended a copolymer with cylindrical morphology with a PS homopolymer. Adding PS homopolymer into a low-molar-mass cylindrical morphology PS-b-PDMS system drives it toward a spherical morphology. Besides, by controlling the as-spun state, spherical PDMS nanodomains could be kept and thermally arranged. This PS-homopolymer addition allows not only an efficient, purely thermal arrangement process of spheres but also the ability to work directly on nontreated silicon substrates. Indeed, as shown by STEM measurements, no PS brush surface treatment was necessary in our study to avoid a PDMS wetting layer at the interface with the Si substrate. Our approach was compared to a sphere-forming diblock copolymer, which needs a longer thermal annealing. Furthermore, GISAXS measurements provided complete information on PDMS sphere features. Excellent long-range order spherical microdomains were therefore produced on flat surfaces and inside graphoepitaxy trenches with a period of 21 nm, as were in-plane spheres with a diameter of 8 nm with a 15 min thermal annealing. Finally, direct plasma-etching transfer into the silicon substrate was demonstrated, and 20 nm high silicon nanopillars were obtained, which are very promising results for various nanopatterning applications.

Micrometer-Scale Ordering of Silicon-Containing Block Copolymer Thin Films via High-Temperature Thermal Treatments

Block copolymer (BCP) self-assembly is expected to complement conventional optical lithography for the fabrication of next-generation microelectronic devices. In this regard, silicon-containing BCPs with a high Flory-Huggins interaction parameter (χ) are extremely appealing because they form high-resolution nanostructures with characteristic dimensions below 10 nm. However, due to their slow self-assembly kinetics and low thermal stability, these silicon-containing high-χ BCPs are usually processed by solvent vapor annealing or in solvent-rich ambient at a low annealing temperature, significantly increasing the complexity of the facilities and of the procedures. In this work, the self-assembly of cylinder-forming polystyrene-block-poly(dimethylsiloxane-random-vinylmethylsiloxane) (PS-b-P(DMS-r-VMS)) BCP on flat substrates is promoted by means of a simple thermal treatment at high temperatures. Homogeneous PS-b-P(DMS-r-VMS) thin films covering the entire sample surface are obtained without any evidence of dewetting phenomena. The BCP arranges in a single layer of cylindrical P(DMS-r-VMS) nanostructures parallel-oriented with respect to the substrate. By properly adjusting the surface functionalization, the heating rate, the annealing temperature, and the processing time, one can obtain correlation length values larger than 1 μm in a time scale fully compatible with the stringent requirements of the microelectronic industry.

Perpendicularly oriented sub-10-nm block copolymer lamellae by atmospheric thermal annealing for one minute

The directed self-assembly (DSA) of block co-polymers (BCPs) can realize next-generation lithography for semiconductors and a variety of soft materials. It is imperative to simultaneously achieve many requirements such as a high resolution, orientation control of micro-domains, etch selectivity, rapid and mild annealing, a low cost, and compatibility with manufacturing for developing suitable BCPs. Here, we describe a new design for modified polysiloxane-based BCPs targeted for sub-10-nm-wide lines, which are able to form perpendicularly oriented lamellar structures in thin films. The hydroxyl groups in the side chains introduced in the polysiloxane block provide a good balance with the polystyrene surface free energy, thereby leading to the perpendicular orientation. Moreover, this orientation can be completed in only one minute at 130 °C in an air atmosphere. Oxygen plasma etching for the thin films results in the achievement of a line width of 8.5 nm.

A Bioinspired Multifunctional Heterogeneous Membrane with Ultrahigh Ionic Rectification and Highly Efficient Selective Ionic Gating

A bioinspired multifunctional heterogeneous membrane composed of a block copolymer (PS-b-P4VP) membrane and a porous anodic alumina membrane is fabricated. The ionic rectification is so strong that the maximum ratio is ≈489, and the chemical actuation of the anion or cation gate from the "OFF" to the "ON" state promotes a 98.5% increase in the channel conductance.

Development of polycarbonate-containing block copolymers for thin film self-assembly applications

High quality block copolymers are needed for thin film self-assembly and directed self-assembly applications.

Laterally Ordered Sub-10 nm Features Obtained From Directed Self-Assembly of Si-Containing Block Copolymer Thin Films

Laterally ordered sub-10 nm features are produced from the directed self-assembly of poly(1,1-dimethyl silacyclo-butane)-block-poly(methyl methacrylate) (PDMSB-b-PMMA) thin films on sinusoidal azobenzene-containing patterns. The use of sinusoidal surface relief grating enables the formation of very large grain areas (over several µm(2) ) consisting of out-of-plane PMMA cylinders.

Enhanced Block Copolymer Phase Separation Using Click Chemistry and Ionic Junctions

In addition to the traditional parameters of chi (χ) and degree of polymerization (N), we demonstrate that the segregation strength of a diblock copolymer can be increased by introduction of an ionic unit at the junction of the two blocks. Compared to neutral linking groups, the electrostatic interactions between counterions of adjacent domain junctions leads to increased enthalpy, segregation strength, and phase separation. As a result, the order disorder transition temperatures of block copolymers with a 1,2,3-triazolium ionic junction were observed to be significantly higher than the corresponding neutral block copolymers. To demonstrate the potential of block copolymers with ionic junctions for nanopatterning, block copolymers were prepared by click coupling of homopolymers and then used to fabricate well-defined sub-10 nm line features. We believe that the concept of improved thin-film assembly through the introduction of ionic junctions is a powerful tool for block copolymer lithography and complements chi (χ) and degree of polymerization (N) in the design of macromolecular systems with enhanced phase separation.

Producing Small Domain Features Using Miktoarm Block Copolymers with Large Interaction Parameters

We demonstrate that small domain features (∼13 nm) can be obtained in a series of polystyrene (PS) and poly(lactic acid) (PLA) block copolymers, PS-(PLA)₂ and (PS)₂-(PLA)₂, that combine miktoarm molecular architectures with large interaction parameters. To supplement the experimental work, we used self-consistent field theory in tandem with the random phase approximation to explore and contrast the phase behavior of AB_n and A_nB_n types of miktoarm block copolymers. Specifically, AB₂ and A₂B₂ were found to be effective molecular architectures for inducing strong shifts in phase boundaries with copolymer composition and to simultaneously tune domain feature sizes. The performance of these systems is markedly different from the corresponding linear diblock copolymers and indicates the potential of macromolecular architecture control for future applications in lithography.

Thickness and Microdomain Orientation of Asymmetric PS-b-PMMA Block Copolymer Films Inside Periodic Gratings

The ordering process of asymmetric PS-b-PMMA block copolymers (BCPs) is investigated on flat SiO2 surfaces and on topographically patterned substrates. The topographic patterns consist of periodic gratings of 10 trenches defined by conventional top-down approaches and subsequently neutralized using a P(S-r-MMA) random copolymer (RCP). When the ordering process is accomplished on a flat surface at a temperature ranging between 180 and 230 °C, cylindrical microdomains perpendicularly oriented with respect to the substrate are observed irrespective of annealing temperature. In contrast, when the ordering process occurs on topographically patterned substrates, different phenomena have to be considered. The simultaneous effect of the flow around the gratings and the BCP flux from the zone located between adjacent trenches (mesa) into the inner part of the trenches results in significant thickness variations of the confined BCP film. Therefore, the amount of BCP inside the trenches depends on the width of the mesa region, which acts as a BCP reservoir. Moreover, within each trench group, the BCP thickness progressively decreases from the external to the central trenches composing the periodic grating. The thickness variation of the BCP film within the trenches strongly affects the ordering process, ultimately leading to different orientations of the microdomains within the trenches. In particular, when the annealing temperature is 190 °C a precise confinement of the BCP within the trenches featuring a perpendicular cylinder morphology is observed. At higher temperatures, mixed or parallel orientations of the microdomains are obtained depending on the width of the trenches in the periodic grating.