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Yun GT, Kim Y, Ahn H, Kim M, Jang GM, Im SG, Jung WB, Jung HT. Toward Advanced Superomniphobicity: Hierarchical Insights from Serif-T Nanostructures to Microscale Wrinkles. ACS NANO 2024. [PMID: 38315048 DOI: 10.1021/acsnano.3c11182] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 02/07/2024]
Abstract
Developing a superomniphobic surface that exceeds the static and dynamic repellency observed in nature's springtails for various liquids presents a significant challenge in the realm of surface and interface science. However, progress in this field has been particularly limited when dealing with low-surface-tension liquids. This is because dynamic repellency values are typically at least 2 orders of magnitude lower than those observed with water droplets. Our study introduces an innovative hierarchical topography demonstrating exceptional dynamic repellency to low-surface-tension liquids. Inspired by the structural advantages found in springtails, we achieve a static contact angle of >160° and the complete rebound of droplet impact with a Weber number (We) of ∼104 using ethanol. These results surpass all existing benchmarks that have been reported thus far, including those of natural surfaces. The key insight from our research is the vital role of the microscale air pocket size, governed by wrinkle wavelength, in both static and dynamic repellency. Additionally, nanoscale air pockets within serif-T nanostructures prove to be essential for achieving omniphobicity. Our investigations into the wetting dynamics of ethanol droplets further reveal aspects such as the reduction in contact time and the occurrence of a fragmentation phenomenon beyond We ∼ 350, which has not been previously observed.
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Affiliation(s)
- Geun-Tae Yun
- KAIST-UCBerkeley-Vietnam National University Climate Change Research Center, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, South Korea
- National Laboratory for Organic Optoelectronic Materials, Department of Chemical and Biomolecular Engineering (BK-21 plus), Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, South Korea
- National Nanofab Center (NNFC), Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, South Korea
| | - Yesol Kim
- KAIST-UCBerkeley-Vietnam National University Climate Change Research Center, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, South Korea
- National Laboratory for Organic Optoelectronic Materials, Department of Chemical and Biomolecular Engineering (BK-21 plus), Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, South Korea
- Saudi Aramco-KAIST CO2 Management Center, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, South Korea
| | - Hyunah Ahn
- KAIST-UCBerkeley-Vietnam National University Climate Change Research Center, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, South Korea
- National Laboratory for Organic Optoelectronic Materials, Department of Chemical and Biomolecular Engineering (BK-21 plus), Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, South Korea
| | - Minki Kim
- KAIST-UCBerkeley-Vietnam National University Climate Change Research Center, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, South Korea
- National Laboratory for Organic Optoelectronic Materials, Department of Chemical and Biomolecular Engineering (BK-21 plus), Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, South Korea
| | - Gyu Min Jang
- Hydrogen and Low-Carbon Energy R&D Lab, Posco Holdings, Pohang 37637, South Korea
| | - Sung Gap Im
- Functional Thin Film Laboratory (FTFL), Department of Chemical and Biomolecular Engineering (BK-21 plus), Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, South Korea
| | - Woo-Bin Jung
- John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, United States
| | - Hee-Tae Jung
- KAIST-UCBerkeley-Vietnam National University Climate Change Research Center, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, South Korea
- National Laboratory for Organic Optoelectronic Materials, Department of Chemical and Biomolecular Engineering (BK-21 plus), Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, South Korea
- Saudi Aramco-KAIST CO2 Management Center, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, South Korea
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Jung WB, Chae OB, Kim M, Kim Y, Hong YJ, Kim JY, Choi S, Kim DY, Moon S, Suk J, Kang Y, Wu M, Jung HT. Effect of Highly Periodic Au Nanopatterns on Dendrite Suppression in Lithium Metal Batteries. ACS APPLIED MATERIALS & INTERFACES 2021; 13:60978-60986. [PMID: 34918912 DOI: 10.1021/acsami.1c15196] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
Despite the extremely high energy density of the lithium metal, dendritic lithium growth caused by nonuniform lithium deposition can result in low Coulombic efficiency and safety hazards, thereby inhibiting its practical applications. Here, we report a new strategy for adopting a nanopatterned gold (Au) seed on a copper current collector for uniform lithium deposition. We find that Au nanopatterns enhance lithium metal battery performance, which is strongly affected by the feature dimensions of Au nanopatterns (diameter and height). Ex situ scanning electron microscopy images confirm that this can be attributed to the perfectly selective lithium nucleation and uniform growth resulting from the spatial confinement effect. The spatial arrangement of Au dot seeds homogenizes the Li+ flux and electric field, and the size-controlled Au seeds prevent both seed-/substrate-induced agglomeration and interseed-induced lithium growth, leading to uniform lithium deposition. This dendrite-free lithium deposition results in the improvement of electrochemical performance, and the system showed cyclic stability over 300 cycles at 0.5 mA cm-2 and 200 cycles at 1.0 mA cm-2 (1 mA h cm-2) and a high rate capability. This study provides in-depth insights into the more complicated and diverse seed geometry control of seed materials for the development of high-performance lithium metal batteries.
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Affiliation(s)
- Woo-Bin Jung
- Department of Chemical and Biomolecular Engineering (BK21 four), Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Korea
- KAIST Institute for Nanocentury, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, South Korea
- School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, United States
| | - Oh B Chae
- Department of Chemistry, University of Rhode Island, Kingston, Rhode Island 02881, United States
| | - Minki Kim
- Department of Chemical and Biomolecular Engineering (BK21 four), Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Korea
- KAIST Institute for Nanocentury, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, South Korea
| | - Yesol Kim
- Department of Chemical and Biomolecular Engineering (BK21 four), Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Korea
- KAIST Institute for Nanocentury, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, South Korea
| | - Yu Jin Hong
- Advanced Materials Division, Korea Research Institute of Chemical Technology, Yuseong-gu, Daejeon 34114, Korea
| | - Ju Ye Kim
- Department of Chemical and Biomolecular Engineering (BK21 four), Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Korea
- Chemical & Process Technology Division, Korea Research Institute of Chemical Technology, Yuseong-gu, Daejeon 34114, Korea
| | - Sungho Choi
- Advanced Materials Division, Korea Research Institute of Chemical Technology, Yuseong-gu, Daejeon 34114, Korea
| | - Do Youb Kim
- Advanced Materials Division, Korea Research Institute of Chemical Technology, Yuseong-gu, Daejeon 34114, Korea
| | - San Moon
- Advanced Materials Division, Korea Research Institute of Chemical Technology, Yuseong-gu, Daejeon 34114, Korea
| | - Jungdon Suk
- Advanced Materials Division, Korea Research Institute of Chemical Technology, Yuseong-gu, Daejeon 34114, Korea
| | - Yongku Kang
- Advanced Materials Division, Korea Research Institute of Chemical Technology, Yuseong-gu, Daejeon 34114, Korea
- Department of Chemical Convergence Materials, University of Science and Technology (UST), Yuseong-gu, Daejeon 34113, Korea
| | - Mihye Wu
- Department of Chemical and Biomolecular Engineering (BK21 four), Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Korea
- KAIST Institute for Nanocentury, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, South Korea
- Advanced Materials Division, Korea Research Institute of Chemical Technology, Yuseong-gu, Daejeon 34114, Korea
| | - Hee-Tae Jung
- Department of Chemical and Biomolecular Engineering (BK21 four), Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Korea
- KAIST Institute for Nanocentury, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, South Korea
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Zhang Y, Yang W, Gu M, Wei Q, Lv P, Li M, Liu D, Zhao W, Broer DJ, Zhou G. Versatile homeotropic liquid crystal alignment with tunable functionality prepared by one-step method. J Colloid Interface Sci 2021; 608:2290-2297. [PMID: 34774317 DOI: 10.1016/j.jcis.2021.10.159] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/22/2021] [Revised: 09/18/2021] [Accepted: 10/25/2021] [Indexed: 12/15/2022]
Abstract
Alignment layers are vital to the function of numerous devices based on liquid crystal (LC) materials. The pursue of versatile, effective and even flexible alignment layers, preferably prepared by simple methods, is still actively ongoing. Herein, we propose a facile one-step method by mixing silanes into the starting LC mixtures, which in contact with a glass substrate secede and self-assemble in-situ to form a stable and highly effective homeotropic alignment layer at the interface. Tetradecyldimethyl(3-trimethoxysilylpropyl)ammonium chloride (TDTA) is selected as the example to demonstrate the method, although a number of other silanes can produce similar results. With only 0.05 vol% of TDTA added to a mixture of liquid crystals and reactive mesogens, a uniform monolayer is chemically attached to the substrate, which automatically aligns the LCs homeotropically. Furthermore, by blending the TDTA with acrylate functionalized silanes like 3-(trimethoxysilyl)propyl methacrylate (A174), additional reactive functional groups can be easily introduced into the alignment layer, therefore offering opportunities to adjust the interface properties. An electro-responsive smart window based on the polymer stabilized liquid crystals (PSLCs) is successfully prepared using a one-step method, demonstrating excellent electro-optic performances and notably enhanced adhesion between the substrate and the in-situ formed polymer network. These findings are valuable especially for the development of flexible LC devices.
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Affiliation(s)
- Yang Zhang
- SCNU-TUE Joint Lab of Device Integrated Responsive Materials (DIRM), National Center for International Research on Green Optoelectronics, South China Normal University, No 378, West Waihuan Road, Guangzhou Higher Education Mega Center, 510006 Guangzhou, China; Solar Energy Research Institute, Yunnan Normal University, Kunming 650500, China
| | - Weiping Yang
- Solar Energy Research Institute, Yunnan Normal University, Kunming 650500, China
| | - Minzhao Gu
- SCNU-TUE Joint Lab of Device Integrated Responsive Materials (DIRM), National Center for International Research on Green Optoelectronics, South China Normal University, No 378, West Waihuan Road, Guangzhou Higher Education Mega Center, 510006 Guangzhou, China
| | - Qunmei Wei
- SCNU-TUE Joint Lab of Device Integrated Responsive Materials (DIRM), National Center for International Research on Green Optoelectronics, South China Normal University, No 378, West Waihuan Road, Guangzhou Higher Education Mega Center, 510006 Guangzhou, China
| | - Pengrong Lv
- SCNU-TUE Joint Lab of Device Integrated Responsive Materials (DIRM), National Center for International Research on Green Optoelectronics, South China Normal University, No 378, West Waihuan Road, Guangzhou Higher Education Mega Center, 510006 Guangzhou, China
| | - Ming Li
- Solar Energy Research Institute, Yunnan Normal University, Kunming 650500, China.
| | - Danqing Liu
- SCNU-TUE Joint Lab of Device Integrated Responsive Materials (DIRM), National Center for International Research on Green Optoelectronics, South China Normal University, No 378, West Waihuan Road, Guangzhou Higher Education Mega Center, 510006 Guangzhou, China; Stimuli-responsive Functional Materials and Devices, Department of Chemical Engineering and Chemistry, Eindhoven University of Technology, Den Dolech 2, Eindhoven 5600 MB, the Netherlands
| | - Wei Zhao
- SCNU-TUE Joint Lab of Device Integrated Responsive Materials (DIRM), National Center for International Research on Green Optoelectronics, South China Normal University, No 378, West Waihuan Road, Guangzhou Higher Education Mega Center, 510006 Guangzhou, China; Guangdong Provincial Key Laboratory of Optical Information Materials and Technology & Institute of Electronic Paper Displays, South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, China.
| | - Dirk J Broer
- SCNU-TUE Joint Lab of Device Integrated Responsive Materials (DIRM), National Center for International Research on Green Optoelectronics, South China Normal University, No 378, West Waihuan Road, Guangzhou Higher Education Mega Center, 510006 Guangzhou, China; Stimuli-responsive Functional Materials and Devices, Department of Chemical Engineering and Chemistry, Eindhoven University of Technology, Den Dolech 2, Eindhoven 5600 MB, the Netherlands
| | - Guofu Zhou
- SCNU-TUE Joint Lab of Device Integrated Responsive Materials (DIRM), National Center for International Research on Green Optoelectronics, South China Normal University, No 378, West Waihuan Road, Guangzhou Higher Education Mega Center, 510006 Guangzhou, China; Guangdong Provincial Key Laboratory of Optical Information Materials and Technology & Institute of Electronic Paper Displays, South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, China; Shenzhen Guohua Optoelectronics Tech. Co. Ltd., Shenzhen 518110, China
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Jung WB, Jang S, Cho SY, Jeon HJ, Jung HT. Recent Progress in Simple and Cost-Effective Top-Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2020; 32:e1907101. [PMID: 32243015 DOI: 10.1002/adma.201907101] [Citation(s) in RCA: 32] [Impact Index Per Article: 8.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/30/2019] [Revised: 12/20/2019] [Indexed: 05/24/2023]
Abstract
The development of a simple and cost-effective method for fabricating ≈10 nm scale nanopatterns over large areas is an important issue, owing to the performance enhancement such patterning brings to various applications including sensors, semiconductors, and flexible transparent electrodes. Although nanoimprinting, extreme ultraviolet, electron beams, and scanning probe litho-graphy are candidates for developing such nanopatterns, they are limited to complicated procedures with low throughput and high startup cost, which are difficult to use in various academic and industry fields. Recently, several easy and cost-effective lithographic approaches have been reported to produce ≈10 nm scale patterns without defects over large areas. This includes a method of reducing the size using the narrow edge of a pattern, which has been attracting attention for the past several decades. More recently, secondary sputtering lithography using an ion-bombardment technique was reported as a new method to create high-resolution and high-aspect-ratio structures. Recent progress in simple and cost-effective top-down lithography for ≈10 nm scale nanopatterns via edge and secondary sputtering techniques is reviewed. The principles, technical advances, and applications are demonstrated. Finally, the future direction of edge and secondary sputtering lithography research toward issues to be resolved to broaden applications is discussed.
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Affiliation(s)
- Woo-Bin Jung
- Department of Chemical and Biomolecular Engineering (BK-21 Plus), Korea Advanced Institute of Science and Technology (KAIST), Yuseong-gu, Daejeon, 34141, Republic of Korea
- KAIST Institute for NanoCentury, Korea Advanced Institute of Science and Technology (KAIST), Yuseong-gu, Daejeon, 34141, Republic of Korea
| | - Sungwoo Jang
- Semiconductor R&D Center, Samsung Electronics Co., Ltd, 1, Samsungjeonja-ro, Hwaseong-si, Gyeonggi-do, 18448, Republic of Korea
| | - Soo-Yeon Cho
- Department of Chemical and Biomolecular Engineering (BK-21 Plus), Korea Advanced Institute of Science and Technology (KAIST), Yuseong-gu, Daejeon, 34141, Republic of Korea
- KAIST Institute for NanoCentury, Korea Advanced Institute of Science and Technology (KAIST), Yuseong-gu, Daejeon, 34141, Republic of Korea
- Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA
| | - Hwan-Jin Jeon
- Department of Chemical Engineering and Biotechnology, Korea Polytechnic University, Siheung-si, Gyeonggi-do, 15073, Republic of Korea
| | - Hee-Tae Jung
- Department of Chemical and Biomolecular Engineering (BK-21 Plus), Korea Advanced Institute of Science and Technology (KAIST), Yuseong-gu, Daejeon, 34141, Republic of Korea
- KAIST Institute for NanoCentury, Korea Advanced Institute of Science and Technology (KAIST), Yuseong-gu, Daejeon, 34141, Republic of Korea
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Zhang Y, Wang C, Zhao W, Li M, Wang X, Yang X, Hu X, Yuan D, Yang W, Zhang Y, Lv P, He J, Zhou G. Polymer Stabilized Liquid Crystal Smart Window with Flexible Substrates Based on Low-Temperature Treatment of Polyamide Acid Technology. Polymers (Basel) 2019; 11:E1869. [PMID: 31766151 PMCID: PMC6918311 DOI: 10.3390/polym11111869] [Citation(s) in RCA: 10] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/15/2019] [Revised: 11/06/2019] [Accepted: 11/07/2019] [Indexed: 11/16/2022] Open
Abstract
Polymer stabilized liquid crystal (PSLC) devices can be used as smart privacy windows that switch between transparent and opaque states. The polyimide alignment layer of a PSLC device is usually obtained by the treatment of polyamide acid (PAA) with temperatures over 200 °C. This hinders the fabrication of PSLC devices on flexible substrates, which melt at these high temperatures. In this work, the fabrication of a PSLC alignment layer using a lower temperature that is compatible with most flexible substrates, is demonstrated. It was found that the treatment of PAA at 150 °C could generate the same alignment for liquid crystals. Based on this, a PSLC device was successfully fabricated on a flexible polyethylene terephthalate (PET) substrate, demonstrating excellent electro-optic performances.
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Affiliation(s)
- Yang Zhang
- Solar Energy Research Institute, Yunnan Normal University, Kunming 650500, China; (Y.Z.); (W.Y.)
| | - Changrui Wang
- SCNU-TUE Joint Lab of Device Integrated Responsive Materials (DIRM), National Center for International Research on Green Optoelectronics, South China Normal University, No. 378, West Waihuan Road, Guangzhou Higher Education Mega Center, Guangzhou 510006, China; (C.W.); (X.W.); (X.Y.); (X.H.); (D.Y.); (Y.Z.); (P.L.); (J.H.); (G.Z.)
| | - Wei Zhao
- SCNU-TUE Joint Lab of Device Integrated Responsive Materials (DIRM), National Center for International Research on Green Optoelectronics, South China Normal University, No. 378, West Waihuan Road, Guangzhou Higher Education Mega Center, Guangzhou 510006, China; (C.W.); (X.W.); (X.Y.); (X.H.); (D.Y.); (Y.Z.); (P.L.); (J.H.); (G.Z.)
| | - Ming Li
- Solar Energy Research Institute, Yunnan Normal University, Kunming 650500, China; (Y.Z.); (W.Y.)
| | - Xiao Wang
- SCNU-TUE Joint Lab of Device Integrated Responsive Materials (DIRM), National Center for International Research on Green Optoelectronics, South China Normal University, No. 378, West Waihuan Road, Guangzhou Higher Education Mega Center, Guangzhou 510006, China; (C.W.); (X.W.); (X.Y.); (X.H.); (D.Y.); (Y.Z.); (P.L.); (J.H.); (G.Z.)
| | - Xiulan Yang
- SCNU-TUE Joint Lab of Device Integrated Responsive Materials (DIRM), National Center for International Research on Green Optoelectronics, South China Normal University, No. 378, West Waihuan Road, Guangzhou Higher Education Mega Center, Guangzhou 510006, China; (C.W.); (X.W.); (X.Y.); (X.H.); (D.Y.); (Y.Z.); (P.L.); (J.H.); (G.Z.)
| | - Xiaowen Hu
- SCNU-TUE Joint Lab of Device Integrated Responsive Materials (DIRM), National Center for International Research on Green Optoelectronics, South China Normal University, No. 378, West Waihuan Road, Guangzhou Higher Education Mega Center, Guangzhou 510006, China; (C.W.); (X.W.); (X.Y.); (X.H.); (D.Y.); (Y.Z.); (P.L.); (J.H.); (G.Z.)
- Guangdong Provincial Key Laboratory of Optical Information Materials and Technology & Institute of Electronic Paper Displays, South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, China
| | - Dong Yuan
- SCNU-TUE Joint Lab of Device Integrated Responsive Materials (DIRM), National Center for International Research on Green Optoelectronics, South China Normal University, No. 378, West Waihuan Road, Guangzhou Higher Education Mega Center, Guangzhou 510006, China; (C.W.); (X.W.); (X.Y.); (X.H.); (D.Y.); (Y.Z.); (P.L.); (J.H.); (G.Z.)
- Guangdong Provincial Key Laboratory of Optical Information Materials and Technology & Institute of Electronic Paper Displays, South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, China
| | - Weiping Yang
- Solar Energy Research Institute, Yunnan Normal University, Kunming 650500, China; (Y.Z.); (W.Y.)
| | - Yi Zhang
- SCNU-TUE Joint Lab of Device Integrated Responsive Materials (DIRM), National Center for International Research on Green Optoelectronics, South China Normal University, No. 378, West Waihuan Road, Guangzhou Higher Education Mega Center, Guangzhou 510006, China; (C.W.); (X.W.); (X.Y.); (X.H.); (D.Y.); (Y.Z.); (P.L.); (J.H.); (G.Z.)
| | - Pengrong Lv
- SCNU-TUE Joint Lab of Device Integrated Responsive Materials (DIRM), National Center for International Research on Green Optoelectronics, South China Normal University, No. 378, West Waihuan Road, Guangzhou Higher Education Mega Center, Guangzhou 510006, China; (C.W.); (X.W.); (X.Y.); (X.H.); (D.Y.); (Y.Z.); (P.L.); (J.H.); (G.Z.)
| | - Jialin He
- SCNU-TUE Joint Lab of Device Integrated Responsive Materials (DIRM), National Center for International Research on Green Optoelectronics, South China Normal University, No. 378, West Waihuan Road, Guangzhou Higher Education Mega Center, Guangzhou 510006, China; (C.W.); (X.W.); (X.Y.); (X.H.); (D.Y.); (Y.Z.); (P.L.); (J.H.); (G.Z.)
| | - Guofu Zhou
- SCNU-TUE Joint Lab of Device Integrated Responsive Materials (DIRM), National Center for International Research on Green Optoelectronics, South China Normal University, No. 378, West Waihuan Road, Guangzhou Higher Education Mega Center, Guangzhou 510006, China; (C.W.); (X.W.); (X.Y.); (X.H.); (D.Y.); (Y.Z.); (P.L.); (J.H.); (G.Z.)
- Guangdong Provincial Key Laboratory of Optical Information Materials and Technology & Institute of Electronic Paper Displays, South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, China
- Shenzhen Guohua Optoelectronics Tech. Co. Ltd., Shenzhen 518110, China
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Jung WB, Cho SY, Suh BL, Yoo HW, Jeon HJ, Kim J, Jung HT. Polyelemental Nanolithography via Plasma Ion Bombardment: From Fabrication to Superior H 2 Sensing Application. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2019; 31:e1805343. [PMID: 30549106 DOI: 10.1002/adma.201805343] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/16/2018] [Revised: 11/25/2018] [Indexed: 06/09/2023]
Abstract
The development of complex nanostructures containing a homo- and heteromixture of two or more metals is a considerable challenge in nanotechnology. However, previous approaches are considerably limited to the number of combinations of metals depending on the compatibility of elements, and to the complex shape control of the nanostructure. In this study, a significant step is taken toward resolving these limitations via the utilization of a low-energy argon-ion bombardment. The multilayer films are etched and re-sputtered on the sidewall of the pre-pattern, which is a secondary sputtering phenomenon. In contrast to the precursor mixing method, most metallic combinations can be fabricated. The degree of mixing is tuned by the control of the sequence and thickness of multilayers. In addition, the feature shape and dimensions are controlled by changing the pre-pattern or by controlling the ion-beam angle. Using this method, the shortest response time (2 s to 1% H2 ) in comparison with those of Pd-based H2 sensors reported previously and a limit of detection below 1 parts per million (ppm) for Pd/Au and Pd/Pt bimetallic line arrays are achieved. This study is expected to realize a family of polyelements that can be used in various applications.
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Affiliation(s)
- Woo-Bin Jung
- Department of Chemical and Biomolecular Engineering (BK-21 Plus), Korea Advanced Institute of Science and Technology (KAIST), Yuseong-gu, Daejeon, 34141, Republic of Korea
- KAIST Institute for NanoCentury, Korea Advanced Institute of Science and Technology (KAIST), Yuseong-gu, Daejeon, 34141, Republic of Korea
| | - Soo-Yeon Cho
- Department of Chemical and Biomolecular Engineering (BK-21 Plus), Korea Advanced Institute of Science and Technology (KAIST), Yuseong-gu, Daejeon, 34141, Republic of Korea
- KAIST Institute for NanoCentury, Korea Advanced Institute of Science and Technology (KAIST), Yuseong-gu, Daejeon, 34141, Republic of Korea
| | - Bong Lim Suh
- Department of Chemical and Biomolecular Engineering (BK-21 Plus), Korea Advanced Institute of Science and Technology (KAIST), Yuseong-gu, Daejeon, 34141, Republic of Korea
| | - Hae-Wook Yoo
- The 4th R&D Institute, Agency for Defense Development, Daejeon, 34186, Republic of Korea
| | - Hwan-Jin Jeon
- Department of Chemical Engineering and Biotechnology, Korea Polytechnic University, Gyeonggi-do, Siheung-si, 15073, Republic of Korea
| | - Jihan Kim
- Department of Chemical and Biomolecular Engineering (BK-21 Plus), Korea Advanced Institute of Science and Technology (KAIST), Yuseong-gu, Daejeon, 34141, Republic of Korea
| | - Hee-Tae Jung
- Department of Chemical and Biomolecular Engineering (BK-21 Plus), Korea Advanced Institute of Science and Technology (KAIST), Yuseong-gu, Daejeon, 34141, Republic of Korea
- KAIST Institute for NanoCentury, Korea Advanced Institute of Science and Technology (KAIST), Yuseong-gu, Daejeon, 34141, Republic of Korea
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