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Assi DS, Huang H, Karthikeyan V, Theja VCS, de Souza MM, Roy VAL. Topological Quantum Switching Enabled Neuroelectronic Synaptic Modulators for Brain Computer Interface. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2306254. [PMID: 38532608 DOI: 10.1002/adma.202306254] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/28/2023] [Revised: 03/06/2024] [Indexed: 03/28/2024]
Abstract
Aging and genetic-related disorders in the human brain lead to impairment of daily cognitive functions. Due to their neural synaptic complexity and the current limits of knowledge, reversing these disorders remains a substantial challenge for brain-computer interfaces (BCI). In this work, a solution is provided to potentially override aging and neurological disorder-related cognitive function loss in the human brain through the application of the authors' quantum synaptic device. To illustrate this point, a quantum topological insulator (QTI) Bi2Se2Te-based synaptic neuroelectronic device, where the electric field-induced tunable topological surface edge states and quantum switching properties make them a premier option for establishing artificial synaptic neuromodulation approaches, is designed and developed. Leveraging these unique quantum synaptic properties, the developed synaptic device provides the capability to neuromodulate distorted neural signals, leading to the reversal of age-related disorders via BCI. With the synaptic neuroelectronic characteristics of this device, excellent efficacy in treating cognitive neural dysfunctions through modulated neuromorphic stimuli is demonstrated. As a proof of concept, real-time neuromodulation of electroencephalogram (EEG) deduced distorted event-related potentials (ERP) is demonstrated by modulation of the synaptic device array.
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Affiliation(s)
- Dani S Assi
- School of Science and Technology, Hong Kong Metropolitan University, Ho Man Tin, Hong Kong, China
| | - Hongli Huang
- Electronics and Nanoscale Engineering, James Watt School of Engineering, University of Glasgow, Glasgow, G12 8QQ, U.K
| | - Vaithinathan Karthikeyan
- School of Science and Technology, Hong Kong Metropolitan University, Ho Man Tin, Hong Kong, China
| | - Vaskuri C S Theja
- Department of Mechanical Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong, China
| | - Maria Merlyne de Souza
- Electronics and Electrical Engineering, The University of Sheffield, Sheffield, S3 7HQ, U.K
| | - Vellaisamy A L Roy
- School of Science and Technology, Hong Kong Metropolitan University, Ho Man Tin, Hong Kong, China
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Liu L, Wang D, Wang D, Sun Y, Lin H, Gong X, Zhang Y, Tang R, Mai Z, Hou Z, Yang Y, Li P, Wang L, Luo Q, Li L, Xing G, Liu M. Domain wall magnetic tunnel junction-based artificial synapses and neurons for all-spin neuromorphic hardware. Nat Commun 2024; 15:4534. [PMID: 38806482 PMCID: PMC11133408 DOI: 10.1038/s41467-024-48631-4] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/25/2023] [Accepted: 05/06/2024] [Indexed: 05/30/2024] Open
Abstract
We report a breakthrough in the hardware implementation of energy-efficient all-spin synapse and neuron devices for highly scalable integrated neuromorphic circuits. Our work demonstrates the successful execution of all-spin synapse and activation function generator using domain wall-magnetic tunnel junctions. By harnessing the synergistic effects of spin-orbit torque and interfacial Dzyaloshinskii-Moriya interaction in selectively etched spin-orbit coupling layers, we achieve a programmable multi-state synaptic device with high reliability. Our first-principles calculations confirm that the reduced atomic distance between 5d and 3d atoms enhances Dzyaloshinskii-Moriya interaction, leading to stable domain wall pinning. Our experimental results, supported by visualizing energy landscapes and theoretical simulations, validate the proposed mechanism. Furthermore, we demonstrate a spin-neuron with a sigmoidal activation function, enabling high operation frequency up to 20 MHz and low energy consumption of 508 fJ/operation. A neuron circuit design with a compact sigmoidal cell area and low power consumption is also presented, along with corroborated experimental implementation. Our findings highlight the great potential of domain wall-magnetic tunnel junctions in the development of all-spin neuromorphic computing hardware, offering exciting possibilities for energy-efficient and scalable neural network architectures.
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Affiliation(s)
- Long Liu
- Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China
- University of Chinese Academy of Sciences, Beijing, 100049, China
| | - Di Wang
- Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China
- University of Chinese Academy of Sciences, Beijing, 100049, China
| | - Dandan Wang
- Hubei Jiufengshan Laboratory, Wuhan, Hubei, 430206, China.
| | - Yan Sun
- Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang, 110016, China
| | - Huai Lin
- Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China
- University of Chinese Academy of Sciences, Beijing, 100049, China
| | - Xiliang Gong
- Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang, 110016, China
| | - Yifan Zhang
- Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China
- University of Chinese Academy of Sciences, Beijing, 100049, China
| | - Ruifeng Tang
- Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China
- University of Chinese Academy of Sciences, Beijing, 100049, China
| | - Zhihong Mai
- Hubei Jiufengshan Laboratory, Wuhan, Hubei, 430206, China
| | - Zhipeng Hou
- Institute for Advanced Materials, South China Normal University, Guangzhou, 510006, China
| | - Yumeng Yang
- School of Information Science and Technology, ShanghaiTech University, Shanghai, 201210, China
| | - Peng Li
- School of Microelectronics, University of Science and Technology of China, Hefei, 230026, China
| | - Lan Wang
- Lab of Low Dimensional Magnetism and Spintronic Devices, School of Physics, Hefei University of Technology, Hefei, 230009, Anhui, China
| | - Qing Luo
- Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China
- University of Chinese Academy of Sciences, Beijing, 100049, China
| | - Ling Li
- Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China
- University of Chinese Academy of Sciences, Beijing, 100049, China
| | - Guozhong Xing
- Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China.
- University of Chinese Academy of Sciences, Beijing, 100049, China.
| | - Ming Liu
- Key Lab of Fabrication Technologies for Integrated Circuits, Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China.
- Frontier Institute of Chip and System, State Key Laboratory of Integrated Chips and Systems, Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai, 200433, China.
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Wang D, Tang R, Lin H, Liu L, Xu N, Sun Y, Zhao X, Wang Z, Wang D, Mai Z, Zhou Y, Gao N, Song C, Zhu L, Wu T, Liu M, Xing G. Spintronic leaky-integrate-fire spiking neurons with self-reset and winner-takes-all for neuromorphic computing. Nat Commun 2023; 14:1068. [PMID: 36828856 PMCID: PMC9957988 DOI: 10.1038/s41467-023-36728-1] [Citation(s) in RCA: 10] [Impact Index Per Article: 10.0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/28/2022] [Accepted: 02/14/2023] [Indexed: 02/26/2023] Open
Abstract
Neuromorphic computing using nonvolatile memories is expected to tackle the memory wall and energy efficiency bottleneck in the von Neumann system and to mitigate the stagnation of Moore's law. However, an ideal artificial neuron possessing bio-inspired behaviors as exemplified by the requisite leaky-integrate-fire and self-reset (LIFT) functionalities within a single device is still lacking. Here, we report a new type of spiking neuron with LIFT characteristics by manipulating the magnetic domain wall motion in a synthetic antiferromagnetic (SAF) heterostructure. We validate the mechanism of Joule heating modulated competition between the Ruderman-Kittel-Kasuya-Yosida interaction and the built-in field in the SAF device, enabling it with a firing rate up to 17 MHz and energy consumption of 486 fJ/spike. A spiking neuron circuit is implemented with a latency of 170 ps and power consumption of 90.99 μW. Moreover, the winner-takes-all is executed with a current ratio >104 between activated and inhibited neurons. We further establish a two-layer spiking neural network based on the developed spintronic LIFT neurons. The architecture achieves 88.5% accuracy on the handwritten digit database benchmark. Our studies corroborate the circuit compatibility of the spintronic neurons and their great potential in the field of intelligent devices and neuromorphic computing.
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Affiliation(s)
- Di Wang
- Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics, Chinese Academy of Sciences, 100029, Beijing, China
- University of Chinese Academy of Sciences, 100049, Beijing, China
| | - Ruifeng Tang
- Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics, Chinese Academy of Sciences, 100029, Beijing, China
- University of Chinese Academy of Sciences, 100049, Beijing, China
| | - Huai Lin
- Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics, Chinese Academy of Sciences, 100029, Beijing, China
- University of Chinese Academy of Sciences, 100049, Beijing, China
| | - Long Liu
- Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics, Chinese Academy of Sciences, 100029, Beijing, China
- University of Chinese Academy of Sciences, 100049, Beijing, China
| | - Nuo Xu
- Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, 94720, USA
| | - Yan Sun
- Institute of Metal Research, Chinese Academy of Sciences, Shenyang, 110016, China
| | - Xuefeng Zhao
- Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics, Chinese Academy of Sciences, 100029, Beijing, China
- School of Microelectronics, University of Science and Technology of China, Hefei, 230026, Anhui, China
| | - Ziwei Wang
- Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics, Chinese Academy of Sciences, 100029, Beijing, China
- University of Chinese Academy of Sciences, 100049, Beijing, China
| | - Dandan Wang
- Jiufengshan Laboratory, Wuhan, 430206, Hubei, China
| | - Zhihong Mai
- Jiufengshan Laboratory, Wuhan, 430206, Hubei, China
| | - Yongjian Zhou
- Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, 100084, Beijing, China
| | - Nan Gao
- School of Microelectronics, University of Science and Technology of China, Hefei, 230026, Anhui, China
| | - Cheng Song
- Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, 100084, Beijing, China
| | - Lijun Zhu
- State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, 100083, Beijing, China
| | - Tom Wu
- Department of Applied Physics, The Hong Kong Polytechnic University, Kowloon, Hong Kong, China
| | - Ming Liu
- Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics, Chinese Academy of Sciences, 100029, Beijing, China
- University of Chinese Academy of Sciences, 100049, Beijing, China
| | - Guozhong Xing
- Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics, Chinese Academy of Sciences, 100029, Beijing, China.
- University of Chinese Academy of Sciences, 100049, Beijing, China.
- School of Microelectronics, University of Science and Technology of China, Hefei, 230026, Anhui, China.
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Xue Z, Wang Z, Li Q, Wang D, Xiang L, Mai Z, Du P, Sun H, Xing G. Tailored Plasmonic Ru/O V-MoO 2 on TiO 2 Catalysts via Solid-Phase Interface Engineering: Toward Highly Efficient Photoassisted Li-O 2 Batteries with Enhanced Cycling Reliability. ACS APPLIED MATERIALS & INTERFACES 2022; 14:44251-44260. [PMID: 36126181 DOI: 10.1021/acsami.2c08834] [Citation(s) in RCA: 4] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
The photoassisted electrochemical reactions are considered an effective method to reduce the overpotential of Li-O2 batteries. However, achieving long-term cell cycling stability remains a challenge. Here, we report a solid-phase interfacial reaction (SPIR) strategy that introduces both oxygen vacancies (OV) and metal centers (Ru) into the MoO2 to synthesize the surface plasmon (i.e., Ru/OV-MoO2). Then, Ru/OV-MoO2 can be uniformly loaded on the TiO2 nanowires by the hydrothermal method. The plasma effect of Ru/OV-MoO2 demonstrates the effective reduction of the photoexcited electron and hole recombination to improve visible light-harvesting ability. The lifetime of electrons and holes can be extended by Ru nanoparticles, which is beneficial for promoting the formation and decomposition of Li2O2. In addition, the generated OV further enhanced the migration of electrons and Li+, thus improving the ORR performance. The Ru/OV-MT/CC cathode corroborates excellent stability and catalytic performance in the photoassisted Li-O2 battery, with an overpotential value of 0.47 V, achieving the highest energy efficiency of 93.94%, retaining at 89.13% after 800 h. This work offers a platform for preparing a stable, bifunctional catalyst with the high total activity of a photoassisted Li-O2 battery.
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Affiliation(s)
- Zhichao Xue
- School of Science, Shenyang Jianzhu University, Shenyang 110168, P. R. China
| | - Zhizhe Wang
- School of Mechanical Engineering, Shenyang Jianzhu University, Shenyang 110168, P. R. China
| | - Qiang Li
- School of Mechanical Engineering, Shenyang Jianzhu University, Shenyang 110168, P. R. China
| | - Dandan Wang
- Hubei JiuFengShan Laboratory, Wuhan, Hubei 420000, P. R. China
| | - Lei Xiang
- Hubei JiuFengShan Laboratory, Wuhan, Hubei 420000, P. R. China
| | - Zhihong Mai
- Hubei JiuFengShan Laboratory, Wuhan, Hubei 420000, P. R. China
| | - Peng Du
- Department of Microelectronic Science and Engineering, School of Physical Science and Technology, Ningbo University, Ningbo 315211, Zhejiang, P. R. China
| | - Hong Sun
- School of Mechanical Engineering, Shenyang Jianzhu University, Shenyang 110168, P. R. China
| | - Guozhong Xing
- Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China
- University of Chinese Academy of Sciences, Beijing 100049, China
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