Samudrala K, Akram MO, Dutton JL, Martin CD, Conley MP. Formation of Strong Boron Lewis Acid Sites on Silica.
Inorg Chem 2024;
63:4939-4946. [PMID:
38451151 PMCID:
PMC10951953 DOI:
10.1021/acs.inorgchem.3c04121]
[Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/21/2023] [Revised: 02/20/2024] [Accepted: 02/21/2024] [Indexed: 03/08/2024]
Abstract
Bis(1-methyl-ortho-carboranyl)borane (HBMeoCb2) is a very strong Lewis acid that reacts with the isolated silanols present on silica partially dehydroxylated at 700 °C (SiO2-700) to form the well-defined Lewis site MeoCb2B(OSi≡) (1) and H2. 11B{1H} magic-angle spinning (MAS) nuclear magnetic resonance (NMR) data of 1 are consistent with that of a three-coordinate boron site. Contacting 1 with O═PEt3 (triethylphosphine oxide TEPO) and measuring 31P{1H} MAS NMR spectra show that 1 preserves the strong Lewis acidity of HBMeoCb2. Hydride ion affinity and fluoride ion affinity calculations using small molecules analogs of 1 also support the strong Lewis acidity of the boron sites in this material. Reactions of 1 with Cp2Hf(13CH3)2 show that the Lewis sites are capable of abstracting methide groups from Hf to form [Cp2Hf-13CH3][H313C-B(MeoCb2)OSi≡], but with a low overall efficiency.
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