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For: Kuo KH, Chiu WY, Don TM. Synthesis of UV-curable/alkali-soluble dispersants used for black photoresist with a high loading of carbon black. J Appl Polym Sci 2010. [DOI: 10.1002/app.31304] [Citation(s) in RCA: 7] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/12/2022]
Number Cited by Other Article(s)
1
Mensov SN, Polushtaytsev YV. Single‐stage optical formation of planar light‐guides in a layer of photopolymerizable composition. J Appl Polym Sci 2021. [DOI: 10.1002/app.50187] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/24/2022]
2
Mensov SN, Abakumov GA, Arsenyev MV, Baten'kin MA, Chesnokov SA, Konev AN, Polushtaytsev YV, Shurygina MP, Zakharina MY. Use of photodegradable inhibitors in UV‐curable compositions to form polymeric 2D‐structures by visible light. J Appl Polym Sci 2020. [DOI: 10.1002/app.48976] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/24/2022]
3
Gonçalves Bardi MA, Leite Munhoz MDM, Oliveira HAD, Auras R, Machado LDB. Behavior of UV-cured print inks on LDPE and PBAT/TPS blend substrates during curing, postcuring, and accelerated degradation. J Appl Polym Sci 2014. [DOI: 10.1002/app.41116] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/06/2022]
4
Karatsu T, Narusawa M, Yagai S, Kitamura A, Suzuki H, Okamura H. Effect of Alkyl Group on the Photocrosslinking of Alkyl Methacrylate Based Copolymers. J PHOTOPOLYM SCI TEC 2013. [DOI: 10.2494/photopolymer.26.259] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
5
Karatsu T, Yoshimura Y, Miura S, Yagai S, Kitamura A, Ozaki J, Okamoto H. Functionalized Cyclohexyl methacrylate based Copolymers for Negative Resist. J PHOTOPOLYM SCI TEC 2011. [DOI: 10.2494/photopolymer.24.535] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
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