Exploring the Self-Assembly Capabilities of ABA-Type SBS, SIS, and Their Analogous Hydrogenated Copolymers onto Different Nanostructures Using Atomic Force Microscopy

In this work, the self-assembled morphologies obtained for poly(styrene-b-butadiene-b-styrene) (SBS) and poly(styrene-b-isoprene-b-styrene) (SIS) ABA-type copolymers were investigated before and after hydrogenation of the polydiene block, which led to poly(styrene-b-ethylene)/poly(ethylene-b-styrene) (SEES) and poly(styrene-b-ethylene)/poly(propylene-b-styrene) (SEPS) copolymers, respectively. The evaluation of different morphologies was carried out using atomic force microscopy (AFM), analyzing the effect of various parameters such as the solvent and polymer concentrations employed for film casting (toluene, cyclohexane, or tetrahydrofurane with concentrations of 1 and 3 wt%), together with that of the annealing treatment (thermal annealing at room temperature, and 60, 80, and 100 °C). The effect of these parameters in combination with the chemical nature of the polydiene block led to different morphologies with different topographic aspects affecting the roughness (Ra) of the film.

Effect of CdSe nanoparticle addition on nanostructuring of PS-b-P4VP copolymer via solvent vapor exposure

The surface morphology of poly(styrene-b-4 vinyl pyridine) (PS-b-P4VP) diblock copolymer thin films after solvent vapor annealing has been studied. Morphological features can be switched upon exposure to vapors of a solvent selective for one of the blocks. Self-assembled nanostructures such as hexagonal or striped morphologies were obtained varying vapor exposure time. In addition, the effect of the presence of CdSe nanoparticles located in the P4VP block on obtained nanostructures was analyzed. Atomic force microscopy (AFM) was used for morphological characterization of the block copolymer and the nanocomposites. AFM images showed that nanostructuring was different depending on the amount of CdSe nanoparticles, due to the decrease in P4VP chain mobility.