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Tawade BV, Apata IE, Pradhan N, Karim A, Raghavan D. Recent Advances in the Synthesis of Polymer-Grafted Low-K and High-K Nanoparticles for Dielectric and Electronic Applications. Molecules 2021; 26:2942. [PMID: 34063362 PMCID: PMC8157189 DOI: 10.3390/molecules26102942] [Citation(s) in RCA: 12] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/14/2021] [Revised: 05/07/2021] [Accepted: 05/10/2021] [Indexed: 11/29/2022] Open
Abstract
The synthesis of polymer-grafted nanoparticles (PGNPs) or hairy nanoparticles (HNPs) by tethering of polymer chains to the surface of nanoparticles is an important technique to obtain nanostructured hybrid materials that have been widely used in the formulation of advanced polymer nanocomposites. Ceramic-based polymer nanocomposites integrate key attributes of polymer and ceramic nanomaterial to improve the dielectric properties such as breakdown strength, energy density and dielectric loss. This review describes the "grafting from" and "grafting to" approaches commonly adopted to graft polymer chains on NPs pertaining to nano-dielectrics. The article also covers various surface initiated controlled radical polymerization techniques, along with templated approaches for grafting of polymer chains onto SiO2, TiO2, BaTiO3, and Al2O3 nanomaterials. As a look towards applications, an outlook on high-performance polymer nanocomposite capacitors for the design of high energy density pulsed power thin-film capacitors is also presented.
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Affiliation(s)
- Bhausaheb V. Tawade
- Department of Chemistry, Howard University, Washington, DC 20059, USA; (B.V.T.); (I.E.A.)
| | - Ikeoluwa E. Apata
- Department of Chemistry, Howard University, Washington, DC 20059, USA; (B.V.T.); (I.E.A.)
| | - Nihar Pradhan
- Department of Chemistry, Physics and Atmospheric Science, Jackson State University, Jackson, MS 39217, USA;
| | - Alamgir Karim
- Department of Chemical and Biomolecular Engineering, University of Houston, Houston, TX 77204, USA;
| | - Dharmaraj Raghavan
- Department of Chemistry, Howard University, Washington, DC 20059, USA; (B.V.T.); (I.E.A.)
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Jeong JW, Hwang HS, Choi D, Ma BC, Jung J, Chang M. Hybrid Polymer/Metal Oxide Thin Films for High Performance, Flexible Transistors. MICROMACHINES 2020; 11:mi11030264. [PMID: 32143449 PMCID: PMC7143309 DOI: 10.3390/mi11030264] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 02/05/2020] [Revised: 02/28/2020] [Accepted: 03/03/2020] [Indexed: 01/26/2023]
Abstract
Metal oxides (MOs) have garnered significant attention in a variety of research fields, particularly in flexible electronics such as wearable devices, due to their superior electronic properties. Meanwhile, polymers exhibit excellent mechanical properties such as flexibility and durability, besides enabling economic solution-based fabrication. Therefore, MO/polymer nanocomposites are excellent electronic materials for use in flexible electronics owing to the confluence of the merits of their components. In this article, we review recent developments in the synthesis and fabrication techniques for MO/polymer nanocomposite-based flexible transistors. In particular, representative MO/polymer nanocomposites for flexible and transparent channel layers and gate dielectrics are introduced and their electronic properties-such as mobilities and dielectric constant-are presented. Finally, we highlight the advances in interface engineering and its influence on device electronics.
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Affiliation(s)
- Jae Won Jeong
- Department of Polymer Engineering, Graduate School, Chonnam National University, Gwangju 61186, Korea;
| | - Hye Suk Hwang
- Alan G. MacDiarmid Energy Research Institute, Chonnam National University, Gwangju 61186, Korea;
| | - Dalsu Choi
- Department of Chemical Engineering, Myongji University, Yongin-si, Gyeonggido 17058, Korea;
| | - Byung Chol Ma
- School of Chemical Engineering, Chonnam National University, Gwangju 61186, Korea
- Correspondence: (B.C.M.); (J.J.); (M.C.); Tel.: +82-62-530-1815 (B.C.M.); +82-62-530-1771 (J.J. & M.C.)
| | - Jaehan Jung
- Department of Materials Science and Engineering, Hongik University, Sejong 30016, Korea
- Correspondence: (B.C.M.); (J.J.); (M.C.); Tel.: +82-62-530-1815 (B.C.M.); +82-62-530-1771 (J.J. & M.C.)
| | - Mincheol Chang
- Department of Polymer Engineering, Graduate School, Chonnam National University, Gwangju 61186, Korea;
- Alan G. MacDiarmid Energy Research Institute, Chonnam National University, Gwangju 61186, Korea;
- School of Polymer Science and Engineering, Chonnam National University, Gwangju 61186, Korea
- Correspondence: (B.C.M.); (J.J.); (M.C.); Tel.: +82-62-530-1815 (B.C.M.); +82-62-530-1771 (J.J. & M.C.)
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Alvarado-Beltrán C, Almaral-Sánchez JL, Mejia I, Quevedo-López MA, Ramirez-Bon R. Sol-Gel PMMA-ZrO 2 Hybrid Layers as Gate Dielectric for Low-Temperature ZnO-Based Thin-Film Transistors. ACS OMEGA 2017; 2:6968-6974. [PMID: 31457280 PMCID: PMC6645328 DOI: 10.1021/acsomega.7b00552] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/04/2017] [Accepted: 08/09/2017] [Indexed: 06/08/2023]
Abstract
We report a simple sol-gel process for the deposition of poly(methyl methacrylate) (PMMA)-ZrO2 organic-inorganic hybrid films at low temperature and studied their properties as a function of the molar ratios of the precursors in the hybrid sol-gel solution, which included zirconium propoxide as the inorganic (zirconia) source, methyl methacrylate as the organic source, and 3-trimethoxy-silyl-propyl-methacrylate (TMSPM) as the coupling agent to enhance the compatibility between the organic and inorganic phases. The hybrid thin-film deposition was done on glass slide substrates by the dip-coating method. After deposition, the films were heat-treated at 100 °C for 24 h. The analysis of the hybrid films included Fourier transform infrared spectroscopy to identify their chemical groups and thermogravimetric analysis to determine the content of their organic and inorganic components. In addition, capacitance-voltage (C-V) and current-voltage (I-V) curves in metal-insulator-metal structures, using gold as metal contacts, were measured to find the dielectric constant and leakage current of the PMMA-ZrO2 hybrid films. Finally, because of their adequate dielectric characteristics, single hybrid layers were deposited on indium tin oxide-coated glass substrates and were tested as gate dielectric in thin-film transistors (TFTs), using sputtered ZnO layers as the semiconductor active channel. We measured the output electrical response and transfer characteristics of these hybrid dielectric gate-based devices and determined their main electrical parameters as a function of the TMSPM content in the hybrid dielectric gate layer. The better TFT electrical behavior presents field effect mobility of 0.48 cm2/V s, low threshold voltage of 3.3 V, and on/off current ratio of 105, and it was obtained by using PMMA-ZrO2 with 0.3 TMSPM content as the gate dielectric layer. The values obtained for the electrical parameters show that PMMA-ZrO2 hybrid films are quite suitable for dielectric gate applications in TFTs.
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Affiliation(s)
- Clemente
G. Alvarado-Beltrán
- Centro
de Investigación y de Estudios Avanzados del IPN, Unidad Querétaro Apdo, Postal 1-798, 76001 Querétaro, Querétaro, México
- Universidad
Autónoma de Sinaloa, Fuente de Poseidón y Prol. Angel Flores, S.N., 81223 Los Mochis, Sinaloa, México
| | - Jorge L. Almaral-Sánchez
- Universidad
Autónoma de Sinaloa, Fuente de Poseidón y Prol. Angel Flores, S.N., 81223 Los Mochis, Sinaloa, México
| | - Israel Mejia
- Department
of Materials Science and Engineering, The
University of Texas at Dallas, 800 West Campbell Road, Richardson 75080, Texas, United States
| | - Manuel A. Quevedo-López
- Department
of Materials Science and Engineering, The
University of Texas at Dallas, 800 West Campbell Road, Richardson 75080, Texas, United States
| | - Rafael Ramirez-Bon
- Centro
de Investigación y de Estudios Avanzados del IPN, Unidad Querétaro Apdo, Postal 1-798, 76001 Querétaro, Querétaro, México
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Flores-Ruiz FJ, Espinoza-Beltrán FJ, Diliegros-Godines CJ, Siqueiros JM, Herrera-Gómez A. Atomic force acoustic microscopy: Influence of the lateral contact stiffness on the elastic measurements. ULTRASONICS 2016; 71:271-277. [PMID: 27428309 DOI: 10.1016/j.ultras.2016.07.003] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/12/2016] [Revised: 07/06/2016] [Accepted: 07/08/2016] [Indexed: 06/06/2023]
Abstract
Atomic force acoustic microscopy is a dynamic technique where the resonances of a cantilever, that has its tip in contact with the sample, are used to quantify local elastic properties of surfaces. Since the contact resonance frequencies (CRFs) monotonically increase with the tip-sample contact stiffness, they are used to evaluate the local elastic properties of the surfaces through a suitable contact mechanical model. The CRFs depends on both, normal and lateral contact stiffness, kN and kS respectively, where the last one is taken either as constant (kS<1), or as zero, leading to uncertainty in the estimation of the elastic properties of composite materials. In this work, resonance spectra for free and contact vibration were used in a finite element analysis of cantilevers to show the influence of kS in the resonance curves due to changes in the kS/kN ratio. These curves have regions for the different vibrational modes that are both, strongly and weakly dependent on kS, and they can be used in a selective manner to obtain a precise mapping of elastic properties.
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Affiliation(s)
- F J Flores-Ruiz
- Centro de Nanociencias y Nanotecnología, Universidad Nacional Autónoma de México, km. 107, Carretera Tijuana-Ensenada, 22860 Ensenada, B.C., Mexico; CINVESTAV Unidad Querétaro, Lib. Norponiente 2000, Real de Juriquilla, 76230 Querétaro, Qro., Mexico.
| | - F J Espinoza-Beltrán
- CINVESTAV Unidad Querétaro, Lib. Norponiente 2000, Real de Juriquilla, 76230 Querétaro, Qro., Mexico
| | - C J Diliegros-Godines
- Centro de Nanociencias y Nanotecnología, Universidad Nacional Autónoma de México, km. 107, Carretera Tijuana-Ensenada, 22860 Ensenada, B.C., Mexico
| | - J M Siqueiros
- Centro de Nanociencias y Nanotecnología, Universidad Nacional Autónoma de México, km. 107, Carretera Tijuana-Ensenada, 22860 Ensenada, B.C., Mexico
| | - A Herrera-Gómez
- CINVESTAV Unidad Querétaro, Lib. Norponiente 2000, Real de Juriquilla, 76230 Querétaro, Qro., Mexico
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