Maßgeschneiderte Adsorbentien im Anwendungsspektrum Bio-, Medizin- und Umwelttechnik

Recovery Process for Critical Metals: Selective Adsorption of Nickel(II) from Cobalt(II) at Acidic Condition and Elevated Temperature

Effective and sustainable separation processes for critical metals, especially for the physicochemically similar elements nickel and cobalt in battery recycling, are of great interest in the future. Selective adsorption represents a highly potential process for this purpose. In this publication, a silica adsorbent functionalized with an amino-polycarboxylate derivate (HSU331) was investigated regarding the selective adsorption of Ni(II) in the presence of Co(II) in acidic solution (pH range at equilibrium 1.8–2.3) at elevated temperature. Comparable maximum equilibrium loadings ( $q_{\max }$ ) for Ni(II) and Co(II) of 0.59 μmol(Ni(II)) · μmol(Ligand)-1 (18.3 mg(Ni(II)) · g(Adsorbent)-1), and 0.52 μmol(Co(II)) · μmol(Ligand)-1 (16.0 mg(Co(II)) · g(Adsorbent)-1), respectively, were achieved at T = 50°C in single-component experiments. Under competitive conditions, the Ni(II) loading remained constant at 0.60 μmol(Ni(II)) · μmol(Ligand)-1 (18.4 mg(Ni(II)) · g(Adsorbent)-1), while the Co(II) loading drastically decreased to 0.09 μmol(Co(II)) · μmol(Ligand)-1 (2.7 mg(Co(II)) · g(Adsorbent)-1) in an equimolar dual-component system. Calculated stability constants of 3 · 103 and 0.7 · 103 L · mol-1, respectively, for the formed metal ion complexes of Ni(II) and Co(II) onto the adsorbent HSU331, clarify the clear selectivity of the adsorbent towards Ni(II) in the presence of Co(II) even at elevated temperature (T = 50°C).

Molecular imprinting science and technology: a survey of the literature for the years 2004-2011

Herein, we present a survey of the literature covering the development of molecular imprinting science and technology over the years 2004-2011. In total, 3779 references to the original papers, reviews, edited volumes and monographs from this period are included, along with recently identified uncited materials from prior to 2004, which were omitted in the first instalment of this series covering the years 1930-2003. In the presentation of the assembled references, a section presenting reviews and monographs covering the area is followed by sections describing fundamental aspects of molecular imprinting including the development of novel polymer formats. Thereafter, literature describing efforts to apply these polymeric materials to a range of application areas is presented. Current trends and areas of rapid development are discussed.