Low-Pressure Organometallic Chemical Vapor Deposition of Indium Nitride on Titanium Dioxide Nanoparticles

Role of hydroxyl groups in the NH(x) (x = 1-3) adsorption on the TiO2 anatase (101) surface determined by a first-principles study

A spin-polarized density functional theory calculation was carried out to study the adsorption of NH(x) species (x = 1-3) on a TiO2 anatase (101) surface with and without hydroxyl groups by using first-principles calculations. It was found that the present hydroxyl group has the effect of significantly enhancing the adsorption of monodentate adsorbates H2N-Ti(a) compared to that on a bare surface. The nature of the interaction between the adsorbate (NH(x)) and the hydroxylated or bare surface was analyzed by the Mulliken charge and density of states (DOS) calculations. This facilitation of NH2 is caused by the donation of coadsorbed H filling the nonbonding orbital of NH2, resulting in an electron gain in NH2 from the bonding. In addition, the upper valence band, which originally consisted of the mixing of O 2p and Ti 3d orbitals, has been broadened by the two adjacent H 1s and NH2 sigma(y)(b) orbitals joined to the bottom of the original TiO2 valence band. The results are important to understand the OH effect in heterogeneous catalysis.

Adsorption Configurations and Energetics of BClx (x = 0−3) on TiO2 Anatase (101) and Rutile (110) Surfaces

This study investigates the adsorption and reactions of boron trichloride and its fragments (BClx) on the TiO2 anatase (101) and rutile (110) surfaces by first-principles calculations. The results show that the possible absorbates on the TiO2 anatase and rutile surfaces are very similar. The single- and double-site adsorption configurations are found for both anatase and rutile surfaces. The particular adsorbate feature on the anatase surface is its in-plane double-site adsorption by Ti and O from its sawtooth surface. The potential energy surface shows that BCl3 can be adsorbed on the O site for both the anantase and rutile surfaces and the most of the BClx reaction on both anatase and rutile surfaces are endothermic, except for the dissociative reaction on the rutile surface. The energy levels of the BClx reactions between the anatase and rutile surfaces show that the rutile surface has lower energy levels than those of anatase surface. This result reveals that the BClx dissociative adsorption more easily occurs on rutile surface than on anatase surface.

Computational Study of Reaction Pathways for the Formation of Indium Nitride from Trimethylindium with HN3: Comparison of the Reaction with NH3 and That on TiO2 Rutile (110) Surface

The reactions of trimethylindium (TMIn) with HN3 and NH3 are relevant to the chemical vapor deposition of indium nitride thin film. The mechanisms and energetics of these reactions in the gas phase have been investigated by density functional theory and ab initio calculations using the CCSD(T)/Lanl2dz//B3LYP/Lanl2dz and CCSD(T)/Lanl2dz//MP2/Lanl2dz methods. The results of both methods are in good agreement for the optimized geometries and relative energies. These results suggest that the reaction with HN3 forms a new stable product, dimethylindiumnitride, CH3-In=N-CH3 via another stable In(CH3)2N3 (dimethylindium azide, DMInA) intermediate. DMInA may undergo unimolecular decomposition to form CH3InNCH3 by two main possible pathways: (1) a stepwise decomposition process through N2 elimination followed by CH3 migration from In to the remaining N atom and (2) a concerted process involving the concurrent CH3 migration and N2 elimination directly giving N2+CH3InNCH3. The reaction of TMIn with NH3 forms a most stable product DMInNH2 following the initial association and CH4-elimination reaction. The required energy barrier for the elimination of the second CH4 molecule from DMInNH2 is 74.2 kcal/mol. Using these reactions, we predict the heats of formation at 0 K for all the products and finally for InN which is 123+/-1 kcal/mol predicted by the two methods. The gas-phase reaction of HN3 with TMIn is compared with that occurring on rutile TiO2 (110). The most noticeable difference is the high endothermicity of the gas-phase reaction for InN production (53 kcal/mol) and the contrasting large exothermicity (195 kcal/mol) released by the low-barrier Langmuir-Hinshelwood type processes following the adsorption of TMIn and HN3 on the surface producing a horizontally adsorbed InN(a), Ti-NIn-O(a), and other products, CH4(g)+N2(g)+2CH3O(a) [J. Phys. Chem. B 2006, 110, 2263].

In situ and ex situ observations of the growth dynamics of single perylene nanocrystals in water

The growth dynamics of fluorescent perylene nanocrystals, which are fabricated by the reprecipitation method, was investigated using in situ and ex situ single-particle fluorescence measurements. A red shift in the emission maxima as the aging time increased was observed by single-particle fluorescence spectral measurements. The number and size of the nanocrystals increased with the increasing aging time in water. It was concluded that the metastable intermediates, such as clusters and initial nanoparticles, are relevant for the early stages of nucleation and growth of the perylene nanocrystals.

Density Functional Study of the Interfacial Electron Transfer Pathway for Monolayer-Adsorbed InN on the TiO2 Anatase (101) Surface

Density functional theory (DFT) in connection with ultrasoft pseudopotential (USP) and generalized gradient spin-polarized approximations (GGSA) is applied to calculate the adsorption energies and structures of monolayer-adsorbed InN on the TiO(2) anatase (101) surface and the corresponding electronic properties, that is, partial density of states (PDOS) for surface and bulk layers of the TiO(2) anatase (101) surface and monolayer-adsorbed InN, to shed light on the possible structural modes for initial photoexcitation within the UV/vis adsorption region followed by fast electron injection through the InN/TiO(2) interface for an InN/TiO(2)-based solar cell design. Our calculated adsorption energies found that the two most probable stable structural modes of monolayer-adsorbed InN on the TiO(2) anatase (101) surface are (1) an end-on structure with an adsorption energy of 2.52 eV through N binding to surface 2-fold coordinated O (O(cn2)), that is, InN-O(cn2), and (2) a side-on structure with an adsorption energy of 3.05 eV through both N binding to surface 5-fold coordinated Ti (Ti(cn5)) and In bridging two surface O(cn2), that is, (O(cn2))(2)-InN-Ti(cn5). Our calculated band gaps for both InN-O(cn2) and (O(cn2))2-InN-Ti(cn5) (including a 1.0-eV correction using a scissor operator) of monolayer-adsorbed InN on the TiO(2) anatase (101) surface are red-shifted to 1.7 eV (730 nm) and 2.3 eV (540 nm), respectively, which are within the UV/vis adsorption region similar to Gratzel's black dye solar cell. Our analyses of calculated PDOS for both surface and bulk layers of the TiO(2) anatase (101) surface and monolayer-adsorbed InN on the TiO(2) anatase (101) surface suggest that the (O(cn2))(2)-InN-Ti(n5) configuration of monolayer-adsorbed InN on the TiO(2) anatase (101) surface would provide a more feasible structural mode for the electron injection through the InN/TiO(2) interface. This is due to the presence of both occupied and unoccupied electronic states for monolayer-adsorbed InN within the band gap TiO(2) anatase (101) surface, which will allow the photoexcitation within the UV/vis adsorption region to take place effectively, and subsequently the photoexcited electronic states will overlap with the unoccupied electronic states around the lowest conduction band of the TiO(2) anatase (101) surface, which will ensure the electron injection through the InN/TiO(2) interface. Finally, another thing worth our attention is our preliminary study of double-layer-adsorbed InN on the TiO(2) anatase (101) surface, that is, (O(cn2))(2)-(InN)(2)-Ti(cn5), with a calculated band gap red-shifted to 2.6 eV (477 nm) and a different overlap of electronic states between double-layer-adsorbed InN and the TiO(2) anatase (101) surface qualitatively indicated that there is an effect of the thickness of adsorbed InN on the TiO(2) anatase (101) surface on both photoexcitation and electron injection processes involved in the photoinduced interfacial electron transfer through InN/TiO(2). A more thorough and comprehensive study of different layers of InN adsorbed in all possible different orientations on the TiO(2) anatase (101) surface is presently in progress.

Reactions of Hydrazoic Acid and Trimethylindium on TiO2 Rutile (110) Surface: A Computational Study on the Formation of the First Monolayer InN

This article reports the result of a computational study on the reaction of hydrazoic acid and trimethylindium (TMIn), coadsorbed on TiO2 rutile (110) surface. The adsorption geometries and energies of possible adsorbates including HN3-In(CH3)3(a) and its derivatives, HN3-In(CH3)2(a), N3-In(CH3)2(a), N3-In(CH3)(a), and N-In(a), have been predicted by first-principles calculations based on the density functional theory (DFT) and the pseudopotential method. The mechanisms of these surface reactions have also been explicitly elucidated with the computed potential energy surfaces. Starting from the interaction of three stable HN3 adsorbates, HN3-Ob(a), H(N2)N-Ob(a), and Ti-NN(H)N-Ob(a), where Ob is the bridged O site on the surface, with two stable intermediates from the adsorption and dissociative adsorption of TMIn, (H3C)3In-Ob(a) and (H3C)2In-Ob(a)+H3C-Ob(a), InN products can be formed exothermically via four reaction paths following the initial barrierless In-atom association with the N atom directly bonded to H, by CH4 elimination (with approximately 40 kcal/mol barriers), the InN-N bond breaking and the final CH3 elimination or migration (with <20 kcal/mol barriers). These Langmuir-Hinshelwood processes producing the two most stable InN(a) side-on adsorptions confirm that HN3 and TMIn are indeed very efficient precursors for the deposition of InN films on TiO2 nanoparticles. The result of similar calculations for the reactions occurring by the Rideal-Eley mechanism involving HN3(a)+TMIn(g) and HN3(g)+TMIn(a) indicates that they are energetically less favored and produce the less stable InN(a) with end-on configurations.

Reactions of Trimethylindium on TiO2 Nanoparticles: Experimental and Computational Study

This article reports the results of an experimental and computational study on the reaction of trimethylindium, In(CH3)(3), adsorbed on TiO2 nanoparticle films. Experimentally, Fourier transform infrared (FTIR) spectra have been measured by varying In(CH3)(3) dosing pressure, UV irradiation time in the absence and presence of oxygen, and surface annealing temperature on both "clean" and HO-covered TiO2 nanoparticle films. Computationally, adsorption energies, molecular structures, and vibrational frequencies of possible adsorbates have been predicted by first-principles calculations based on the density functional theory (DFT) and the pseudopotential method. Three important reactions involving CH3 elimination, CH4 elimination, and CH3 migration from the adsorbed trimethylindium have been elucidated in detail. CH(3 migration is the only exothermic process with the lowest reaction barrier. On the basis of experimental and computational results, the two sharpest peaks at 2979 and 2925 cm(-1), detected in the dosage and UV irradiation experiments in the absence of oxygen, are attributable to the asymmetric and symmetric C-H vibrations of methyl groups in In(CH3)3(a) and its derivatives, (H3C)2In(a), H3CIn(a), and H3CO(a). In the UV irradiation experiment in the presence of oxygen, the methyl groups attached to the In atom were quickly oxidized to the methoxy with the C-H vibrations at 2925 and 2822 cm(-1) and to the carboxyl group with vibrations at 2888 cm(-1) (vs(CH)), 1577 cm(-1) (va(OCO)), 1380 cm(-1) (delta(CH)), and 1355 cm(-1) (vs(OCO)). Finally, from the computed energies with vibrational analysis, the adsorbed structure of the carboxyl group was confirmed to involve two oxygen atoms doubly adsorbed on two surface Ti atoms.

Reactions of Hydrazoic Acid on TiO2 Nanoparticles: an Experimental and Computational Study

This article reports the results of a computational and experimental study on the reaction of hydrazoic acid, HN3, adsorbed on 15-20 nm TiO2 particle films. Experimentally, FTIR spectra of HN3(a) have been measured by varying HN3 dosage, UV irradiation time and surface annealing temperature. Three sharp peaks, related to v(a)(NNN) of HN3(a) and N3(a) with different configurations in the 2000-2200 cm(-1) region, and a broad band absorption, related to associated and isolated HN(a) and HO(a) adsorptions in the 3000-3800 cm(-1) region, have been detected. Computationally, molecular structures, vibrational frequencies and adsorption energies of possible adsorbates including HN3 and its derivatives, N3, N2, NH, and H, have been predicted by first-principles calculations based on the density functional theory (DFT) and the pseudopotential method. On the basis of the experimental and computational results, the peak appeared at 2075 cm(-1), which increases at a faster rate with HN3 exposure time, is attributed to a stable adsorbate, N3-Ti(a), with the predicted adsorption energy, E(ads) = 13 kcal/mol. The peak at 2118 cm(-1), which survives at the highest surface temperature in the heating experiment, is attributable to the most stable adsorbate, Ti-N2N(H)-O(a) with E(ads) = 36 kcal/mol. The peak at 2170 cm(-1), which vanishes most readily in all of the aforementioned experiments, is related to less stable molecular adsorbates, end-on HN3-Ti(a) with E(ads) = 5 kcal/mol and side-on HN(N2)-Ti(a) with E(ads) = 8 kcal/mol. A potential energy diagram for the formation of various absorbates with their transition states has been established for the HN3/TiO2 system. On the basis of the predicted desorption energies, the four most stable products of the HN3 reaction on TiO2 are H-O(a), 118 kcal/mol; HN-O(a), 85 kcal/mol; Ti-N2N(H)-O(a), 36 kcal/mol; and N3-O(a), 19 kcal/mol.