Integration of Oxygen-Vacancy-Rich NiFe-Layered Double Hydroxide onto Silicon as Photoanode for Enhanced Photoelectrochemical Water Oxidation

Scalable, highly stable Si-based metal-insulator-semiconductor photoanodes for water oxidation fabricated using thin-film reactions and electrodeposition

Metal-insulator-semiconductor (MIS) structures are widely used in Si-based solar water-splitting photoelectrodes to protect the Si layer from corrosion. Typically, there is a tradeoff between efficiency and stability when optimizing insulator thickness. Moreover, lithographic patterning is often required for fabricating MIS photoelectrodes. In this study, we demonstrate improved Si-based MIS photoanodes with thick insulating layers fabricated using thin-film reactions to create localized conduction paths through the insulator and electrodeposition to form metal catalyst islands. These fabrication approaches are low-cost and highly scalable, and yield MIS photoanodes with low onset potential, high saturation current density, and excellent stability. By combining this approach with a p⁺n-Si buried junction, further improved oxygen evolution reaction (OER) performance is achieved with an onset potential of 0.7 V versus reversible hydrogen electrode (RHE) and saturation current density of 32 mA/cm² under simulated AM1.5G illumination. Moreover, in stability testing in 1 M KOH aqueous solution, a constant photocurrent density of ~22 mA/cm² is maintained at 1.3 V versus RHE for 7 days.

Authors demonstrate Si-based MIS photoanodes using Al thin-film reactions to create localized conduction paths through the insulator and Ni electrodeposition to form metal catalyst islands. These approaches yielded low onset potential, high saturation current density, and excellent stability.

Electrodeposited Trimetallic NiFeW Hydroxide Electrocatalysts for Efficient Water Oxidation

Tungsten-doped Ni-Fe hydroxides fabricated on a three-dimensional nickel foam through cathodic electrodeposition are proposed as effective oxygen evolution reaction (OER) catalysts for alkaline water oxidation. Incorporating an adequate amount of W into Ni-Fe hydroxides modulates the electronic structure by changing the local environment of Ni and Fe and create oxygen vacancies, resulting in abundant active sites for the OER. The optimized electrocatalyst, with a substantial number of catalytic sites, is found to outperform the well-established 20 wt% Ir/C electrocatalyst. The catalyst only requires small overpotentials of 224 mV and 251 mV to generate current densities of 10 mA cm^-2 and 50 mA cm^-2 , respectively, at an extremely low Tafel slope. Surface study after long-term chronopotentiometry (ca. 30 h) reveals that the tungsten dopant undergoes reduction to stabilize the Ni and Fe active sites for predominant water oxidation. This research provides new insight to apply optimum amounts of tungsten doping to enable more significant electronic coupling within Ni-Fe for the chemisorption of hydroxy and oxygen intermediates and greatly improved OER activity.