Gaur R, Mishra L, Siddiqi MA, Atakan B. Ruthenium complexes as precursors for chemical vapor-deposition (CVD).
RSC Adv 2014. [DOI:
10.1039/c4ra04701j]
[Citation(s) in RCA: 18] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022] Open
Abstract
The progress in precursor chemistry for the chemical vapor deposition of ruthenium containing thin films is reviewed.
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