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Mishra S, Daniele S. Metal-Organic Derivatives with Fluorinated Ligands as Precursors for Inorganic Nanomaterials. Chem Rev 2015; 115:8379-448. [PMID: 26186083 DOI: 10.1021/cr400637c] [Citation(s) in RCA: 107] [Impact Index Per Article: 11.9] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 02/08/2023]
Affiliation(s)
- Shashank Mishra
- Institut de Recherches sur la Catalyse et l'Environnement de Lyon (IRCELYON), UMR 5256, Université Claude Bernard Lyon1 , 2 avenue Albert Einstein, 69626 Villeurbanne, France
| | - Stéphane Daniele
- Institut de Recherches sur la Catalyse et l'Environnement de Lyon (IRCELYON), UMR 5256, Université Claude Bernard Lyon1 , 2 avenue Albert Einstein, 69626 Villeurbanne, France
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Thompson JS, Zhang L, Wyre JP, Brill D, Li Z. Deposition of Copper Films with Surface-Activating Agents. Organometallics 2012. [DOI: 10.1021/om3005383] [Citation(s) in RCA: 9] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
Affiliation(s)
- Jeffery S. Thompson
- Central Research and Development
Department, E. I. du Pont de Nemours and Company, Wilmington, Delaware 19880-0500, United States
| | - Lei Zhang
- Central Research and Development
Department, E. I. du Pont de Nemours and Company, Wilmington, Delaware 19880-0500, United States
| | - John P. Wyre
- Central Research and Development
Department, E. I. du Pont de Nemours and Company, Wilmington, Delaware 19880-0500, United States
| | - Donald Brill
- Central Research and Development
Department, E. I. du Pont de Nemours and Company, Wilmington, Delaware 19880-0500, United States
| | - Zhigang Li
- Central Research and Development
Department, E. I. du Pont de Nemours and Company, Wilmington, Delaware 19880-0500, United States
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