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For: Barry PR, Philipp P, Wirtz T, Kieffer J. Mechanisms of silicon sputtering and cluster formation explained by atomic level simulations. J Mass Spectrom 2014;49:185-194. [PMID: 24619544 DOI: 10.1002/jms.3317] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/19/2013] [Revised: 11/21/2013] [Accepted: 11/21/2013] [Indexed: 06/03/2023]
Number Cited by Other Article(s)
1
Defoort-Levkov GRN, Bahm A, Philipp P. Influence of water contamination on the sputtering of silicon with low-energy argon ions investigated by molecular dynamics simulations. BEILSTEIN JOURNAL OF NANOTECHNOLOGY 2022;13:986-1003. [PMID: 36225852 PMCID: PMC9520830 DOI: 10.3762/bjnano.13.86] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 03/17/2022] [Accepted: 09/06/2022] [Indexed: 06/16/2023]
2
Rzeznik L, Fleming Y, Wirtz T, Philipp P. Experimental and simulation-based investigation of He, Ne and Ar irradiation of polymers for ion microscopy. BEILSTEIN JOURNAL OF NANOTECHNOLOGY 2016;7:1113-28. [PMID: 27547629 PMCID: PMC4979758 DOI: 10.3762/bjnano.7.104] [Citation(s) in RCA: 7] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/11/2016] [Accepted: 07/14/2016] [Indexed: 05/28/2023]
3
Philipp P, Angerer TB, Sämfors S, Blenkinsopp P, Fletcher JS, Wirtz T. Significant enhancement of negative secondary ion yields by cluster ion bombardment combined with cesium flooding. Anal Chem 2015;87:10025-32. [PMID: 26378890 DOI: 10.1021/acs.analchem.5b02635] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
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