Direct Nanopatterning of Silsesquioxane/Poly(ethylene glycol) Blends with High Stability and Nonfouling Properties

Multifunctional Structured Platforms: From Patterning of Polymer-Based Films to Their Subsequent Filling with Various Nanomaterials

There is an astonishing number of optoelectronic, photonic, biological, sensing, or storage media devices, just to name a few, that rely on a variety of extraordinary periodic surface relief miniaturized patterns fabricated on polymer-covered rigid or flexible substrates. Even more extraordinary is that these surface relief patterns can be further filled, in a more or less ordered fashion, with various functional nanomaterials and thus can lead to the realization of more complex structured architectures. These architectures can serve as multifunctional platforms for the design and the development of a multitude of novel, better performing nanotechnological applications. In this work, we aim to provide an extensive overview on how multifunctional structured platforms can be fabricated by outlining not only the main polymer patterning methodologies but also by emphasizing various deposition methods that can guide different structures of functional nanomaterials into periodic surface relief patterns. Our aim is to provide the readers with a toolbox of the most suitable patterning and deposition methodologies that could be easily identified and further combined when the fabrication of novel structured platforms exhibiting interesting properties is targeted.

Fluorinated silsesquioxane-based photoresist as an ideal high-performance material for ultraviolet nanoimprinting

A new kind of fluorinated silsesquioxane-based photoresist has been demonstrated for ultraviolet nanoimprint lithography (UV-NIL), which opens up a way to utilize simple but multi-functional component materials for developing photoresist with superior performance.