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Wang H, Randeniya M, Houston A, Duscher G, Gu G. Ultraclean Suspended Graphene by Radiolysis of Adsorbed Water. NANO LETTERS 2024; 24:8866-8871. [PMID: 38976330 DOI: 10.1021/acs.nanolett.4c01440] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 07/10/2024]
Abstract
Access to intrinsic properties of a 2D material is challenging due to the absence of a bulk that would dominate over surface contamination, and this lack of bulk also precludes effective conventional cleaning methods that are almost always sacrificial. Suspended graphene and carbon contaminants represent the most salient challenge. This work has achieved ultraclean graphene, attested by electron energy loss (EEL) spectra unprecedentedly exhibiting fine-structure features expected from bonding and band structure. In the cleaning process in a transmission electron microscope, radicals generated by radiolysis of intentionally adsorbed water remove organic contaminants, which would otherwise be feedstock of the notorious electron irradiation induced carbon deposition. This method can be readily adapted to other experimental settings and other materials to enable previously inhibited undertakings that rely on the intrinsic properties or ultimate thinness of 2D materials. Importantly, the method is surprisingly simple and robust, easily implementable with common lab equipment.
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Affiliation(s)
- Hao Wang
- Min H. Kao Department of Electrical Engineering and Computer Science, The University of Tennessee, Knoxville, Tennessee 37916, United States
| | - Milinda Randeniya
- Department of Physics & Astronomy, The University of Tennessee, Knoxville, Tennessee 37916, United States
| | - Austin Houston
- Department of Materials Science and Engineering, The University of Tennessee, Knoxville, Tennessee 37916, United States
| | - Gerd Duscher
- Department of Materials Science and Engineering, The University of Tennessee, Knoxville, Tennessee 37916, United States
| | - Gong Gu
- Min H. Kao Department of Electrical Engineering and Computer Science, The University of Tennessee, Knoxville, Tennessee 37916, United States
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2
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Krasley A, Li E, Galeana JM, Bulumulla C, Beyene AG, Demirer GS. Carbon Nanomaterial Fluorescent Probes and Their Biological Applications. Chem Rev 2024; 124:3085-3185. [PMID: 38478064 PMCID: PMC10979413 DOI: 10.1021/acs.chemrev.3c00581] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [MESH Headings] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/16/2023] [Revised: 02/01/2024] [Accepted: 02/09/2024] [Indexed: 03/28/2024]
Abstract
Fluorescent carbon nanomaterials have broadly useful chemical and photophysical attributes that are conducive to applications in biology. In this review, we focus on materials whose photophysics allow for the use of these materials in biomedical and environmental applications, with emphasis on imaging, biosensing, and cargo delivery. The review focuses primarily on graphitic carbon nanomaterials including graphene and its derivatives, carbon nanotubes, as well as carbon dots and carbon nanohoops. Recent advances in and future prospects of these fields are discussed at depth, and where appropriate, references to reviews pertaining to older literature are provided.
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Affiliation(s)
- Andrew
T. Krasley
- Janelia
Research Campus, Howard Hughes Medical Institute, 19700 Helix Drive, Ashburn, Virginia 20147, United States
| | - Eugene Li
- Division
of Chemistry and Chemical Engineering, California
Institute of Technology, 1200 E. California Boulevard, Pasadena, California 91125, United States
| | - Jesus M. Galeana
- Division
of Chemistry and Chemical Engineering, California
Institute of Technology, 1200 E. California Boulevard, Pasadena, California 91125, United States
| | - Chandima Bulumulla
- Janelia
Research Campus, Howard Hughes Medical Institute, 19700 Helix Drive, Ashburn, Virginia 20147, United States
| | - Abraham G. Beyene
- Janelia
Research Campus, Howard Hughes Medical Institute, 19700 Helix Drive, Ashburn, Virginia 20147, United States
| | - Gozde S. Demirer
- Division
of Chemistry and Chemical Engineering, California
Institute of Technology, 1200 E. California Boulevard, Pasadena, California 91125, United States
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Dyck O, Lupini AR, Jesse S. A Platform for Atomic Fabrication and In Situ Synthesis in a Scanning Transmission Electron Microscope. SMALL METHODS 2023; 7:e2300401. [PMID: 37415539 DOI: 10.1002/smtd.202300401] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/05/2023] [Revised: 05/30/2023] [Indexed: 07/08/2023]
Abstract
The engineering of quantum materials requires the development of tools able to address various synthesis and characterization challenges. These include the establishment and refinement of growth methods, material manipulation, and defect engineering. Atomic-scale modification will be a key enabling factor for engineering quantum materials where desired phenomena are critically determined by atomic structures. Successful use of scanning transmission electron microscopes (STEMs) for atomic scale material manipulation has opened the door for a transformed view of what can be accomplished using electron-beam-based strategies. However, serious obstacles exist on the pathway from possibility to practical reality. One such obstacle is the in situ delivery of atomized material in the STEM to the region of interest for further fabrication processes. Here, progress on this front is presented with a view toward performing synthesis (deposition and growth) processes in a scanning transmission electron microscope in combination with top-down control over the reaction region. An in situ thermal deposition platform is presented, tested, and deposition and growth processes are demonstrated. In particular, it is shown that isolated Sn atoms can be evaporated from a filament and caught on the nearby sample, demonstrating atomized material delivery. This platform is envisioned to facilitate real-time atomic resolution imaging of growth processes and open new pathways toward atomic fabrication.
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Affiliation(s)
- Ondrej Dyck
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, 1 Bethel Valley Rd., Oak Ridge, TN, 37830, USA
| | - Andrew R Lupini
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, 1 Bethel Valley Rd., Oak Ridge, TN, 37830, USA
| | - Stephen Jesse
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, 1 Bethel Valley Rd., Oak Ridge, TN, 37830, USA
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Dyck O, Yeom S, Lupini AR, Swett JL, Hensley D, Yoon M, Jesse S. Top-Down Fabrication of Atomic Patterns in Twisted Bilayer Graphene. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2302906. [PMID: 37309684 DOI: 10.1002/adma.202302906] [Citation(s) in RCA: 3] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/29/2023] [Revised: 05/23/2023] [Indexed: 06/14/2023]
Abstract
Atomic-scale engineering typically involves bottom-up approaches, leveraging parameters such as temperature, partial pressures, and chemical affinity to promote spontaneous arrangement of atoms. These parameters are applied globally, resulting in atomic-scale features scattered probabilistically throughout the material. In a top-down approach, different regions of the material are exposed to different parameters, resulting in structural changes varying on the scale of the resolution. In this work, the application of global and local parameters is combined in an aberration-corrected scanning transmission electron microscope (STEM) to demonstrate atomic-scale precision patterning of atoms in twisted bilayer graphene. The focused electron beam is used to define attachment points for foreign atoms through the controlled ejection of carbon atoms from the graphene lattice. The sample environment is staged with nearby source materials such that the sample temperature can induce migration of the source atoms across the sample surface. Under these conditions, the electron-beam (top-down) enables carbon atoms in the graphene to be replaced spontaneously by diffusing adatoms (bottom-up). Using image-based feedback control, arbitrary patterns of atoms and atom clusters are attached to the twisted bilayer graphene with limited human interaction. The role of substrate temperature on adatom and vacancy diffusion is explored by first-principles simulations.
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Affiliation(s)
- Ondrej Dyck
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN, 37830, USA
| | - Sinchul Yeom
- Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37830, USA
| | - Andrew R Lupini
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN, 37830, USA
| | - Jacob L Swett
- Biodesign Institute, Arizona State University, Tempe, AZ, 87287, USA
| | - Dale Hensley
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN, 37830, USA
| | - Mina Yoon
- Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37830, USA
| | - Stephen Jesse
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN, 37830, USA
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Dyck O, Lupini AR, Jesse S. Atom-by-Atom Direct Writing. NANO LETTERS 2023; 23:2339-2346. [PMID: 36877825 DOI: 10.1021/acs.nanolett.3c00114] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/18/2023]
Abstract
Direct-write processes enable the alteration or deposition of materials in a continuous, directable, sequential fashion. In this work, we demonstrate an electron beam direct-write process in an aberration-corrected scanning transmission electron microscope. This process has several fundamental differences from conventional electron-beam-induced deposition techniques, where the electron beam dissociates precursor gases into chemically reactive products that bond to a substrate. Here, we use elemental tin (Sn) as a precursor and employ a different mechanism to facilitate deposition. The atomic-sized electron beam is used to generate chemically reactive point defects at desired locations in a graphene substrate. Temperature control of the sample is used to enable the precursor atoms to migrate across the surface and bond to the defect sites, thereby enabling atom-by-atom direct writing.
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Affiliation(s)
- Ondrej Dyck
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830, United States
| | - Andrew R Lupini
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830, United States
| | - Stephen Jesse
- Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830, United States
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