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For: Tabei E, Mori S, Okada F, Tajima S, Ogino K, Tanabe H, Tobita S. Metastable ion study of organosilicon compounds VI—triethoxymethylsilane and tetraethoxysilane. ACTA ACUST UNITED AC 1993. [DOI: 10.1002/oms.1210280425] [Citation(s) in RCA: 8] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
Number Cited by Other Article(s)
1
Perentes A, Hoffmann P. Focused Electron Beam Induced Deposition of Si-Based Materials From SiOxCy to Stoichiometric SiO2: Chemical Compositions, Chemical-Etch Rates, and Deep Ultraviolet Optical Transmissions. ACTA ACUST UNITED AC 2007. [DOI: 10.1002/cvde.200606583] [Citation(s) in RCA: 43] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/11/2022]
2
Metastable ion study of organosilicon compounds. Part X. o-CH3C6H4COOSi(CH3)3 and o-CF3C6H4COOSi(CH3)3. ACTA ACUST UNITED AC 1997. [DOI: 10.1016/s0168-1176(96)04471-0] [Citation(s) in RCA: 11] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/24/2022]
3
Mori S, Okada F, Sekiguchi O, Fujishige M, Koitabashi R, Tajima S. Metastable ion study of organosilicon compounds. Part IX. CH3COOSi(CH3)3 and CF3COOSi(CH3)3. J Organomet Chem 1997. [DOI: 10.1016/s0022-328x(96)06241-9] [Citation(s) in RCA: 8] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/18/2022]
4
Metastable ion study of organosilicon compounds VIII. Dimethoxydiphenylsilane. J Organomet Chem 1995. [DOI: 10.1016/0022-328x(95)05598-7] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
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