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For: Kumagai Y, Yamane T, Miyaji T, Murakami H, Kangawa Y, Koukitu A. Hydride vapor phase epitaxy of AlN: thermodynamic analysis of aluminum source and its application to growth. ACTA ACUST UNITED AC 2003. [DOI: 10.1002/pssc.200303360] [Citation(s) in RCA: 63] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/10/2022]
Number Cited by Other Article(s)
1
Kong S, Wei H, Yang S, Li H, Feng Y, Chen Z, Liu X, Wang L, Wang Z. Morphology and structure controlled growth of one-dimensional AlN nanorod arrays by hydride vapor phase epitaxy. RSC Adv 2014. [DOI: 10.1039/c4ra09590a] [Citation(s) in RCA: 6] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]  Open
2
Boichot R, Coudurier N, Mercier F, Claudel A, Baccar N, Milet A, Blanquet E, Pons M. CFD modeling of the high-temperature HVPE growth of aluminum nitride layers on c-plane sapphire: from theoretical chemistry to process evaluation. Theor Chem Acc 2013. [DOI: 10.1007/s00214-013-1419-8] [Citation(s) in RCA: 12] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
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