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Summary of ISO/TC 201 Standard: ISO 22415—Surface chemical analysis—Secondary ion mass spectrometry—Method for determining yield volume in argon cluster sputter depth profiling of organic materials. SURF INTERFACE ANAL 2019. [DOI: 10.1002/sia.6686] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/21/2023]
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Powell CJ, Shimizu R, Yoshihara K, Ichimura S. Development of standards for reliable surface analyses by ISO technical committee 201 on surface chemical analysis. SURF INTERFACE ANAL 2014. [DOI: 10.1002/sia.5684] [Citation(s) in RCA: 8] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/08/2022]
Affiliation(s)
- C. J. Powell
- Materials Measurement Science Division; National Institute of Standards and Technology; 100 Bureau Drive Gaithersburg MD 20899-8370 USA
| | - R. Shimizu
- Office for University-Industry Collaboration; Osaka University; 2-1, Yamada, Suita Osaka 565-0871 Japan
| | - K. Yoshihara
- Omicron NanoTechnology Japan, Inc.; 3-32-42, Higashi-Shinagawa, Shinagawa-ku Tokyo 140-0002 Japan
| | - S. Ichimura
- National Institute of Advanced Industrial Science and Technology; 1-1-1, Umezono Tsukuba Ibaraki 305-8568 Japan
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Development of certified reference materials of ion-implanted dopants in silicon for calibration of secondary ion mass spectrometers. ACTA ACUST UNITED AC 2007. [DOI: 10.1116/1.2759937] [Citation(s) in RCA: 16] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/17/2022]
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