Energy dispersive electron probe microanalysis (ED-EPMA) of elemental composition and thickness of Fe-Ni alloy films

Ligand Size and Carbon-Chain Length Study of Silver Carboxylates in Focused Electron-Beam-Induced Deposition

Gas-assisted focused electron-beam-induced deposition is a versatile tool for the direct writing of complex-shaped nanostructures with unprecedented shape fidelity and resolution. While the technique is well-established for various materials, the direct electron beam writing of silver is still in its infancy. Here, we examine and compare five different silver carboxylates, three perfluorinated: [Ag₂(µ-O₂CCF₃)₂], [Ag₂(µ-O₂CC₂F₅)₂], and [Ag₂(µ-O₂CC₃F₇)₂], and two containing branched substituents: [Ag₂(µ-O₂CCMe₂Et)₂] and [Ag₂(µ-O₂C^tBu)₂], as potential precursors for focused electron-beam-induced deposition. All of the compounds show high sensitivity to electron dissociation and efficient dissociation of Ag-O bonds. The as-deposited materials have silver contents from 42 at.% to above 70 at.% and are composed of silver nano-crystals with impurities of carbon and fluorine between them. Precursors with the shortest carbon-fluorine chain ligands yield the highest silver contents. In addition, the deposited silver content depends on the balance of electron-induced ligand co-deposition and ligand desorption. For all of the tested compounds, low electron flux was related to high silver content. Our findings demonstrate that silver carboxylates constitute a promising group of precursors for gas-assisted focused electron beam writing of high silver content materials.

Nondestructive Microanalysis of Thin-Film Coatings on Historic Metal Threads

A new standards-based scanning electron microscopy with the energy-dispersive X-ray spectrometry (SEM-EDS) quantification method was used to analyze the thin-film coating of an 18th century French textile decorated with metal threads in variable pressure conditions. This analytical technique can allow for nondestructive quantitative characterization of the near surface of cultural heritage objects small enough to be placed in an SEM chamber that may contain corrosion products, without applying a conductive coating. A multivoltage analysis consisting of measurements taken at a series of electron beam energies was obtained and input into a film thickness and composition (FTC) computational model to characterize a layered Au on Ag reference material, in addition to a historic metal thread. Using the FTC computation, the thread coating was determined to be an alloy ≈ 80% Au 20% Ag on a nominally pure Ag substrate, and this composition matches a minimum gold standard allowed for goods around the time of manufacture. The computed gilding thicknesses range from single digit nm to 300 nm depending upon surface inhomogeneities formed during the production of the thread. Interaction volumes and X-ray spectra generated by Monte Carlo modeling are consistent with the measured gilding thicknesses and compositions. Validation of the FTC-computed gilding composition and thickness variations were obtained by cross-sectional analysis.

Measuring the Thickness of Metal Coatings: A Review of the Methods

Thickness dramatically affects the functionality of coatings. Accordingly, the techniques in use to determine the thickness are of utmost importance for coatings research and technology. In this review, we analyse some of the most appropriate methods for determining the thickness of metallic coatings. In doing so, we classify the techniques into two categories: (i) destructive and (ii) non-destructive. We report on the peculiarity and accuracy of each of these methods with a focus on the pros and cons. The manuscript also covers practical issues, such as the complexity of the procedure and the time required to obtain results. While the analysis focuses most on metal coatings, many methods are also applicable to films of other materials.

Focused Electron Beam-Induced Deposition and Post-Growth Purification Using the Heteroleptic Ru Complex (η3-C3H5)Ru(CO)3Br

Focused electron beam-induced deposition using the heteroleptic complex (η³-C₃H₅)Ru(CO)₃Br as a precursor resulted in deposition of material with Ru content of 23 at. %. Transmission electron microscopy images indicated a nanogranular structure of pure Ru nanocrystals, embedded into a matrix containing carbon, oxygen, and bromine. The deposits were purified by annealing in a reactive 98% N₂/2% H₂ atmosphere at 300 °C, resulting in a reduction of contaminants and an increase of the Ru content to 83 at. %. Although a significant volume loss of 79% was found, the shrinkage was observed mostly for vertical thickness (around 75%). The lateral dimensions decreased much less significantly (around 9%). Deposition results, in conjunction with previous gas-phase and condensed-phase surface studies on the electron-induced reactions of (η³-C₃H₅)Ru(CO)₃Br, provide insights into the behavior of allyl, carbonyl, and bromide ligands under identical electron beam irradiation.

New Approach on Quantification of Porosity of Thin Films via Electron-Excited X-ray Spectra

One of the crucial characteristics of functionalized thin films is their porosity (i.e., the ratio between the pore volume and the volume of the whole film). Due to the very low amount of material per coated area corresponding to thin films, it is a challenge for analytics to measure the film porosity. In this work, we present an approach to determine the porosity of thin films by means of electron probe microanalysis (EPMA) either by wavelength-dispersive X-ray spectrometry (WDX) or by energy-dispersive X-ray spectrometry (EDX) with a scanning electron microscope (SEM). The procedure is based on the calculation of the film mass deposition from electron-excited X-ray spectra. The mass deposition is converted into film density by division of measured film thickness. Finally, the film porosity is calculated from the measured film density and the density of bulk, nonporous film material. The general applicability of the procedure to determine the porosity is demonstrated on thin templated mesoporous TiO2 films, dip-coated on silicon wafer, with controlled porosity in the range of 15 to 50%. The high accuracy of the mass deposition as determined from X-ray spectra was validated with independent methods (ICP-OES and weighing). Furthermore, for the validation of the porosity results, ellipsometry, interference fringes method (IFM), and focused ion beam (FIB) cross sectioning were employed as independent techniques. Hence, the approach proposed in the present study is proven to be suited as a new analytical tool for accurate and relatively fast determination of the porosity of thin films.

New reference and test materials for the characterization of energy dispersive X-ray spectrometers at scanning electron microscopes

Checking the performance of energy dispersive X-ray spectrometers as well as validation of the results obtained with energy dispersive X-ray spectrometry (EDX) at a scanning electron microscope (SEM) involve the use of (certified) reference and dedicated test materials. This paper gives an overview on the test materials mostly employed by SEM/EDX users and accredited laboratories as well as on those recommended in international standards. The new BAM reference material EDS-CRM, which is currently in the process of certification, is specifically designed for the characterization of EDS systems at a SEM through calibration of the spectrometer efficiency in analytical laboratories in a simple manner. The certification of the spectra by means of a reference EDS is described. The focus is on the traceability of EDS efficiency which is ensured by measurements of the absolute detection efficiency of silicon drift detectors (SDD) and Si(Li) detectors at the laboratory of the PTB using the electron storage ring BESSY II as a primary X-ray source standard. A new test material in development at BAM for testing the performance of an EDS in the energy range below 1 keV is also briefly presented.

Performance of high-resolution SEM/EDX systems equipped with transmission mode (TSEM) for imaging and measurement of size and size distribution of spherical nanoparticles

The analytical performance of high-resolution scanning electron microscopy/energy dispersive X-ray spectroscopy (SEM/EDX) for accurate determination of the size, size distribution, qualitative elemental analysis of nanoparticles (NPs) was systematically investigated. It is demonstrated how powerful high-resolution SEM is by using both mono- and bi-modal distributions of SiO2 airborne NPs collected on appropriate substrates after their generation from colloidal suspension. The transmission mode of the SEM (TSEM) is systematically employed for NPs prepared on thin film substrates such as transmission electron microscopy grids. Measurements in the transmission mode were performed by using a "single-unit" TSEM transmission setup as manufactured and patented by Zeiss. This alternative to the "conventional" STEM detector consists of a special sample holder that is used in conjunction with the in-place Everhart-Thornley detector. In addition, the EDX capabilities for imaging NPs, highlighting the promising potential with respect to exploitation of the sensitivity of the new large area silicon drift detector energy dispersive X-ray spectrometers were also investigated. The work was carried out in the frame of a large prenormative VAMAS (Versailles Project on Advanced Materials and Standards) project, dedicated to finding appropriate methods and procedures for traceable characterization of NP size and size distribution.