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For: Venkataiah S, Chandra SJ, Chalapathi U, Ramana C, Uthanna S. Oxygen partial pressure influenced stoichiometry, structural, electrical, and optical properties of DC reactive sputtered hafnium oxide films. SURF INTERFACE ANAL 2020. [DOI: 10.1002/sia.6902] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/12/2022]

For:	Venkataiah S, Chandra SJ, Chalapathi U, Ramana C, Uthanna S. Oxygen partial pressure influenced stoichiometry, structural, electrical, and optical properties of DC reactive sputtered hafnium oxide films. SURF INTERFACE ANAL 2020. [DOI: 10.1002/sia.6902] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/12/2022]

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(The first 100,000 artilces are displayed in RCA.)