Reaction of aniline with chemisorbed pyromellitic dianhydride on Cu(110): A model for controlled organic film growth

Surface chemistry for molecular layer deposition of organic and hybrid organic-inorganic polymers

The fabrication of many devices in modern technology requires techniques for growing thin films. As devices miniaturize, manufacturers will need to control thin film growth at the atomic level. Because many devices have challenging morphologies, thin films must be able to coat conformally on structures with high aspect ratios. Techniques based on atomic layer deposition (ALD), a special type of chemical vapor deposition, allow for the growth of ultra-thin and conformal films of inorganic materials using sequential, self-limiting reactions. Molecular layer deposition (MLD) methods extend this strategy to include organic and hybrid organic-inorganic polymeric materials. In this Account, we provide an overview of the surface chemistry for the MLD of organic and hybrid organic-inorganic polymers and examine a variety of surface chemistry strategies for growing polymer thin films. Previously, surface chemistry for the MLD of organic polymers such as polyamides and polyimides has used two-step AB reaction cycles using homo-bifunctional reactants. However, these reagents can react twice and eliminate active sites on the growing polymer surface. To avoid this problem, we can employ alternative precursors for MLD based on hetero-bifunctional reactants and ring-opening reactions. We can also use surface activation or protected chemical functional groups. In addition, we can combine the reactants for ALD and MLD to grow hybrid organic-inorganic polymers that should display interesting properties. For example, using trimethylaluminum (TMA) and various diols as reactants, we can achieve the MLD of alucone organic-inorganic polymers. We can alter the chemical and physical properties of these organic-inorganic polymers by varying the organic constituent in the diol or blending the alucone MLD films with purely inorganic ALD films to build a nanocomposite or nanolaminate. The combination of ALD and MLD reactants enlarges the number of possible sequential self-limiting surface reactions for film growth. Extensions to three-step ABC reaction cycles also offer many advantages to avoid the use of homo-bifunctional reactants and incorporate new functionality in the thin film. The advances in ALD have helped technological development in many areas, including semiconductor processing and magnetic disk-drive manufacturing. We expect that the advances in MLD will lead to innovations in polymeric thin-film products. Although there are remaining challenges, effective surface chemistry strategies are being developed for MLD that offer the opportunity for future advances in materials and device fabrication.