The creation of nanostructures on an Au111 electrode by tip-induced iron deposition from an ionic liquid

How a Transition-Metal(II) Chloride Interacts with a Eutectic AlCl3 -Based Ionic Liquid: Insights into the Speciation of the Electrolyte and Electrodeposition of Magnetic Materials

Electrostatic interactions are characteristic of ionic liquids (ILs) and play a pivotal role in determining the formation of species when solutes are dissolved in them. The formation of new species/complexes has been investigated for certain ILs. However, such investigations have not yet focused on eutectic liquids, which are a promising class of ILs. These liquids (or liquid coordination complexes, LCCs) are rather new and are composed of cationic and anionic chloro complexes of metals. To date, these liquids have been employed as electrolytes to deposit metals and as solvents for catalysis. The present study deals with a liquid that is prepared by mixing a 1.2:1 mol ratio of AlCl₃ and 1-butylpyrrolidine. An attempt has been made to understand the interactions of FeCl₂ with the organic molecule using spectroscopy. It was found that dissolved Fe(II) species interact mainly with the IL anion and such interactions can lead to changes in the cation of the electrolyte. Furthermore, the viability of depositing thick magnetic films of Fe and Fe-Al has been explored.

Electrochemical micro/nano-machining: principles and practices

Micro/nano-machining (MNM) is becoming the cutting-edge of high-tech manufacturing because of the ever increasing industrial demands for super smooth surfaces and functional three-dimensional micro/nano-structures in miniaturized and integrate devices, and electrochemistry plays an irreplaceable role in MNM.

Electrolithography--A New and Versatile Process for Nano Patterning

We report a new lithography technique based on electromigration driven material transport for drawing patterns at nanometer scales in ambient conditions. We use a thin metal film as a masking layer and a polymer layer beneath it as a pattern transfer layer. The desired pattern is drawn in the metal layer by etching the metal with a conducting scanning probe assisted by liquid electromigration. The pattern drawn on the metal layer is transferred to the polymer layer by etching the polymer with an appropriate solvent. Subsequently, the pattern is transferred to the desired material layer using a film deposition technique followed by conventional lift-off process. Using this simple technique, we have achieved pattern resolutions of 9 nm on the polymer and 40 nm on transferring the pattern to another material. Based on the ease of use and process costs, this technique promises to be competitive to e-beam lithography that employs high energy and ultra-high vacuum, or the industrial standard ultra-violet light photolithography that employs extremely expensive implements to reach nano-scale resolutions. We also demonstrate direct mask writing using this technique and explain the fundamentals behind the workings of the developed method.

Advanced scanning probe lithography

The nanoscale control afforded by scanning probe microscopes has prompted the development of a wide variety of scanning-probe-based patterning methods. Some of these methods have demonstrated a high degree of robustness and patterning capabilities that are unmatched by other lithographic techniques. However, the limited throughput of scanning probe lithography has prevented its exploitation in technological applications. Here, we review the fundamentals of scanning probe lithography and its use in materials science and nanotechnology. We focus on robust methods, such as those based on thermal effects, chemical reactions and voltage-induced processes, that demonstrate a potential for applications.