Fullerene-derivative-embedded nanogap field-effect-transistor and its nonvolatile memory application

Recent Advances of Flexible Data Storage Devices Based on Organic Nanoscaled Materials

Following the trend of miniaturization as per Moore's law, and facing the strong demand of next-generation electronic devices that should be highly portable, wearable, transplantable, and lightweight, growing endeavors have been made to develop novel flexible data storage devices possessing nonvolatile ability, high-density storage, high-switching speed, and reliable endurance properties. Nonvolatile organic data storage devices including memory devices on the basis of floating-gate, charge-trapping, and ferroelectric architectures, as well as organic resistive memory are believed to be favorable candidates for future data storage applications. In this Review, typical information on device structure, memory characteristics, device operation mechanisms, mechanical properties, challenges, and recent progress of the above categories of flexible data storage devices based on organic nanoscaled materials is summarized.

Single-crystal C60 needle/CuPc nanoparticle double floating-gate for low-voltage organic transistors based non-volatile memory devices

Low-voltage organic field-effect transistor memory devices exhibiting a wide memory window, low power consumption, acceptable retention, endurance properties, and tunable memory performance are fabricated. The performance is achieved by employing single-crystal C60 needles and copper phthalocyanine nanoparticles to produce an ambipolar (hole/electron) trapping effect in a double floating-gate architecture.

High-performance nonvolatile organic transistor memory devices using the electrets of semiconducting blends

Organic nonvolatile transistor memory devices of the n-type semiconductor N,N'-bis(2-phenylethyl)-perylene-3,4:9,10-tetracarboxylic diimide (BPE-PTCDI) were prepared using various electrets (i.e., three-armed star-shaped poly[4-(diphenylamino)benzyl methacrylate] (N(PTPMA)3) and its blends with 6,6-phenyl-C61-butyric acid methyl ester (PCBM), 6,13-bis(triisopropylsilylethynyl)pentacene (TIPS-pen) or ferrocene). In the device using the PCBM:N(PTPMA)3 blend electret, it changed its memory feature from a write-once-read-many (WORM) type to a flash type as the PCBM content increased and could be operated repeatedly based on a tunneling process. The large shifts on the reversible transfer curves and the hysteresis after implementing a gate bias indicated the considerable charge storage in the electret layer. On the other hand, the memory characteristics showed a flash type and a WORM characteristic, respectively, using the donor/donor electrets TIPS-pen:N(PTPMA)3 and ferrocene:N(PTPMA)3. The variation on the memory characteristics was attributed to the difference of energy barrier at the interface when different types of electret materials were employed. All the studied memory devices exhibited a long retention over 10(4) s with a highly stable read-out current. In addition, the afore-discussed memory devices by inserting another electret layer of poly(methacrylic acid) (PMAA) between the BPE-PTCDI layer and the semiconducting blend layer enhanced the write-read-erase-read (WRER) operation cycle as high as 200 times. This study suggested that the energy level and charge transfer in the blend electret had a significant effect on tuning the characteristics of nonvolatile transistor memory devices.

Solution processed molecular floating gate for flexible flash memories

Solution processed fullerene (C60) molecular floating gate layer has been employed in low voltage nonvolatile memory device on flexible substrates. We systematically studied the charge trapping mechanism of the fullerene floating gate for both p-type pentacene and n-type copper hexadecafluorophthalocyanine (F16CuPc) semiconductor in a transistor based flash memory architecture. The devices based on pentacene as semiconductor exhibited both hole and electron trapping ability, whereas devices with F16CuPc trapped electrons alone due to abundant electron density. All the devices exhibited large memory window, long charge retention time, good endurance property and excellent flexibility. The obtained results have great potential for application in large area flexible electronic devices.

Photoactive memory by a Si-nanowire field-effect transistor

A photoactive memory is implemented on a n-type and p-type double-gate silicon nanowire (Si-NW) field-effect transistor (FET) through the grafting of solution-processable [6,6]-phenyl-C(61)-butyric acid methyl ester (PCBM) in nanogaps. Despite integration with organic material, superior FET characteristics are observed. Lowered operation voltage is achieved through the use of an optical source and an efficient photon-absorbing structure. Due to the naturally separated gate structure for PCBM embedment, moreover, memory performances stemming from a photoactive property are notably improved by biasing asymmetric voltage to the separated gates, which are individually controlled. The development of photoactive Si-NW FET based on CMOS process can pave the way of optoelectronic applications with more degree of freedom in terms of overall device design.