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Meng L, Xu Q, Zhang J, Wang X. Colloidal quantum dot materials for next-generation near-infrared optoelectronics. Chem Commun (Camb) 2024; 60:1072-1088. [PMID: 38174780 DOI: 10.1039/d3cc04315k] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/05/2024]
Abstract
Colloidal quantum dots (CQDs) are a promising class of materials for next-generation optoelectronic devices, such as displays, LEDs, lasers, photodetectors, and solar cells. CQDs can be obtained at low cost and in large quantities using wet chemistry. CQDs have also been produced using various materials, such as CdSe, InP, perovskites, PbS, PbSe, and InAs. Some of these CQD materials absorb and emit photons in the visible region, making them excellent candidates for displays and LEDs, while others interact with low-energy photons in the near-infrared (NIR) region and are intensively utilized in NIR lasers, NIR photodetectors, and solar cells. In this review, we have focused on NIR CQD materials and reviewed the development of CQD materials for solar cells, NIR lasers, and NIR photodetectors since the first set of reports on CQD materials in these particular applications.
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Affiliation(s)
- Lingju Meng
- Department of Applied Physics, Aalto University, Espoo, Finland
- Department of Chemistry and Materials Science, Micronova Nanofabrication Centre, Aalto University, Espoo, Finland
| | - Qiwei Xu
- Department of Electrical and Computer Engineering, University of Alberta, Edmonton, Canada.
| | - Jiangwen Zhang
- Department of Electrical and Computer Engineering, University of Alberta, Edmonton, Canada.
| | - Xihua Wang
- Department of Electrical and Computer Engineering, University of Alberta, Edmonton, Canada.
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Chen Z, Yang S, Huang J, Gu Y, Huang W, Liu S, Lin Z, Zeng Z, Hu Y, Chen Z, Yang B, Gui X. Flexible, Transparent and Conductive Metal Mesh Films with Ultra-High FoM for Stretchable Heating and Electromagnetic Interference Shielding. NANO-MICRO LETTERS 2024; 16:92. [PMID: 38252258 PMCID: PMC10803711 DOI: 10.1007/s40820-023-01295-z] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/10/2023] [Accepted: 11/21/2023] [Indexed: 01/23/2024]
Abstract
Despite the growing demand for transparent conductive films in smart and wearable electronics for electromagnetic interference (EMI) shielding, achieving a flexible EMI shielding film, while maintaining a high transmittance remains a significant challenge. Herein, a flexible, transparent, and conductive copper (Cu) metal mesh film for EMI shielding is fabricated by self-forming crackle template method and electroplating technique. The Cu mesh film shows an ultra-low sheet resistance (0.18 Ω □-1), high transmittance (85.8%@550 nm), and ultra-high figure of merit (> 13,000). It also has satisfactory stretchability and mechanical stability, with a resistance increases of only 1.3% after 1,000 bending cycles. As a stretchable heater (ε > 30%), the saturation temperature of the film can reach over 110 °C within 60 s at 1.00 V applied voltage. Moreover, the metal mesh film exhibits outstanding average EMI shielding effectiveness of 40.4 dB in the X-band at the thickness of 2.5 μm. As a demonstration, it is used as a transparent window for shielding the wireless communication electromagnetic waves. Therefore, the flexible and transparent conductive Cu mesh film proposed in this work provides a promising candidate for the next-generation EMI shielding applications.
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Affiliation(s)
- Zibo Chen
- State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-Sen University, Guangzhou, 510275, People's Republic of China
| | - Shaodian Yang
- State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-Sen University, Guangzhou, 510275, People's Republic of China
| | - Junhua Huang
- State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-Sen University, Guangzhou, 510275, People's Republic of China
| | - Yifan Gu
- State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-Sen University, Guangzhou, 510275, People's Republic of China
| | - Weibo Huang
- State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-Sen University, Guangzhou, 510275, People's Republic of China
| | - Shaoyong Liu
- State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-Sen University, Guangzhou, 510275, People's Republic of China
| | - Zhiqiang Lin
- Guangdong Provincial Key Laboratory of Materials for High Density Electronic Packing, Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, Shenzhen, 518055, Guangdong, People's Republic of China
| | - Zhiping Zeng
- School of Materials Science and Engineering, Sun Yat-Sen University, Guangzhou, 510275, People's Republic of China
| | - Yougen Hu
- Guangdong Provincial Key Laboratory of Materials for High Density Electronic Packing, Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, Shenzhen, 518055, Guangdong, People's Republic of China
| | - Zimin Chen
- State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-Sen University, Guangzhou, 510275, People's Republic of China
| | - Boru Yang
- State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-Sen University, Guangzhou, 510275, People's Republic of China.
| | - Xuchun Gui
- State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-Sen University, Guangzhou, 510275, People's Republic of China.
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Ge C, Liu Z, Zhu Y, Zhou Y, Jiang B, Zhu J, Yang X, Zhu Y, Yan S, Hu H, Song H, Li L, Chen C, Tang J. Insight into the High Mobility and Stability of In 2 O 3 :H Film. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024; 20:e2304721. [PMID: 37670209 DOI: 10.1002/smll.202304721] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/05/2023] [Revised: 08/26/2023] [Indexed: 09/07/2023]
Abstract
Wide bandgap semiconductors, particularly In2 O3 :Sn (ITO), are widely used as transparent conductive electrodes in optoelectronic devices. Nevertheless, due to the strohave beenng scattering probability of high-concentration oxygen vacancy (VO ) defects, the mobility of ITO is always lower than 40 cm2 V-1 s-1 . Recently, hydrogen-doped In2 O3 (In2 O3 :H) films have been proven to have high mobility (>100 cm2 V-1 s-1 ), but the origin of this high mobility is still unclear. Herein, a high-resolution electron microscope and theoretical calculations are employed to investigate the atomic-scale mechanisms behind the high carrier mobility in In2 O3 :H films. It is found that VO can cause strong lattice distortion and large carrier scattering probability, resulting in low carrier mobility. Furthermore, hydrogen doping can simultaneously reduce the concentration of VO , which accounts for high carrier mobility. The thermal stability and acid-base corrosion mechanism of the In2 O3 :H film are investigated and found that hydrogen overflows from the film at high temperatures (>250 °C), while acidic or alkaline environments can cause damage to the In2 O3 grains themselves. Overall, this work provides insights into the essential reasons for high carrier mobility in In2 O3 :H and presents a new research approach to the doping and stability mechanisms of transparent conductive oxides.
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Affiliation(s)
- Ciyu Ge
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information (SOEI), Huazhong University of Science and Technology, Wuhan, Hubei, 430074, P. R. China
| | - Zunyu Liu
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information (SOEI), Huazhong University of Science and Technology, Wuhan, Hubei, 430074, P. R. China
| | - Yongchen Zhu
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information (SOEI), Huazhong University of Science and Technology, Wuhan, Hubei, 430074, P. R. China
| | - Yilong Zhou
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information (SOEI), Huazhong University of Science and Technology, Wuhan, Hubei, 430074, P. R. China
| | - Borui Jiang
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information (SOEI), Huazhong University of Science and Technology, Wuhan, Hubei, 430074, P. R. China
| | - Jiaxing Zhu
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information (SOEI), Huazhong University of Science and Technology, Wuhan, Hubei, 430074, P. R. China
| | - Xuke Yang
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information (SOEI), Huazhong University of Science and Technology, Wuhan, Hubei, 430074, P. R. China
| | - Yongxin Zhu
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information (SOEI), Huazhong University of Science and Technology, Wuhan, Hubei, 430074, P. R. China
| | - Shuyu Yan
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information (SOEI), Huazhong University of Science and Technology, Wuhan, Hubei, 430074, P. R. China
| | - Haojun Hu
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information (SOEI), Huazhong University of Science and Technology, Wuhan, Hubei, 430074, P. R. China
| | - Haisheng Song
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information (SOEI), Huazhong University of Science and Technology, Wuhan, Hubei, 430074, P. R. China
| | - Luying Li
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information (SOEI), Huazhong University of Science and Technology, Wuhan, Hubei, 430074, P. R. China
| | - Chao Chen
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information (SOEI), Huazhong University of Science and Technology, Wuhan, Hubei, 430074, P. R. China
- Optics Valley Laboratory, Hubei, 430074, P. R. China
| | - Jiang Tang
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information (SOEI), Huazhong University of Science and Technology, Wuhan, Hubei, 430074, P. R. China
- Optics Valley Laboratory, Hubei, 430074, P. R. China
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Zhu M, Zhang Y, Lu S, Wang Z, Zhou J, Ma W, Zhu R, Chen G, Zhang J, Gao L, Yu J, Gao P, Tang J. Optical engineering of infrared PbS CQD photovoltaic cells for wireless optical power transfer systems. FRONTIERS OF OPTOELECTRONICS 2023; 16:15. [PMID: 37318647 DOI: 10.1007/s12200-023-00069-0] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/12/2023] [Accepted: 04/13/2023] [Indexed: 06/16/2023]
Abstract
Infrared photovoltaic cells (IRPCs) have attracted considerable attention for potential applications in wireless optical power transfer (WOPT) systems. As an efficient fiber-integrated WOPT system typically uses a 1550 nm laser beam, it is essential to tune the peak conversion efficiency of IRPCs to this wavelength. However, IRPCs based on lead sulfide (PbS) colloidal quantum dots (CQDs) with an excitonic peak of 1550 nm exhibit low short circuit current (Jsc) due to insufficient absorption under monochromatic light illumination. Here, we propose comprehensive optical engineering to optimize the device structure of IRPCs based on PbS CQDs, for 1550 nm WOPT systems. The absorption by the device is enhanced by improving the transmittance of tin-doped indium oxide (ITO) in the infrared region and by utilizing the optical resonance effect in the device. Therefore, the optimized device exhibited a high short circuit current density of 37.65 mA/cm2 under 1 sun (AM 1.5G) solar illumination and 11.91 mA/cm2 under 1550 nm illumination 17.3 mW/cm2. Furthermore, the champion device achieved a record high power conversion efficiency (PCE) of 7.17% under 1 sun illumination and 10.29% under 1550 nm illumination. The PbS CQDs IRPCs under 1550 nm illumination can even light up a liquid crystal display (LCD), demonstrating application prospects in the future.
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Affiliation(s)
- Mengqiong Zhu
- School of Materials, Shenzhen Campus of Sun Yat-Sen University, Shenzhen, 518107, China
| | - Yuanbo Zhang
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information, Huazhong University of Science and Technology (HUST), Wuhan, 430074, China
| | - Shuaicheng Lu
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information, Huazhong University of Science and Technology (HUST), Wuhan, 430074, China
| | - Zijun Wang
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information, Huazhong University of Science and Technology (HUST), Wuhan, 430074, China
| | - Junbing Zhou
- School of Materials, Shenzhen Campus of Sun Yat-Sen University, Shenzhen, 518107, China
| | - Wenkai Ma
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information, Huazhong University of Science and Technology (HUST), Wuhan, 430074, China
| | - Ruinan Zhu
- School of Materials, Shenzhen Campus of Sun Yat-Sen University, Shenzhen, 518107, China
| | - Guanyuan Chen
- School of Materials, Shenzhen Campus of Sun Yat-Sen University, Shenzhen, 518107, China
| | - Jianbing Zhang
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information, Huazhong University of Science and Technology (HUST), Wuhan, 430074, China
| | - Liang Gao
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information, Huazhong University of Science and Technology (HUST), Wuhan, 430074, China
| | - Jiancan Yu
- School of Materials, Shenzhen Campus of Sun Yat-Sen University, Shenzhen, 518107, China.
| | - Pingqi Gao
- School of Materials, Shenzhen Campus of Sun Yat-Sen University, Shenzhen, 518107, China
| | - Jiang Tang
- Wuhan National Laboratory for Optoelectronics (WNLO) and School of Optical and Electronic Information, Huazhong University of Science and Technology (HUST), Wuhan, 430074, China.
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Zhang L, Che Z, Shang J, Wang Q, Cao M, Zhou Y, Zhou Y, Liu F. Cerium-Doped Indium Oxide as a Top Electrode of Semitransparent Perovskite Solar Cells. ACS APPLIED MATERIALS & INTERFACES 2023; 15:10838-10846. [PMID: 36802466 DOI: 10.1021/acsami.2c22942] [Citation(s) in RCA: 3] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/18/2023]
Abstract
Semitransparent perovskite solar cells (ST-PSCs) play a very important role in high-efficiency tandem solar cells and building integrated photovoltaics (BIPV). One of the main challenges for high-performance ST-PSCs is to obtain suitable top-transparent electrodes by appropriate methods. Transparent conductive oxide (TCO) films, as the most widely used transparent electrodes, are also adopted in ST-PSCs. However, the possible ion bombardment damage during the TCO deposition and the relatively high postannealing temperature usually required for high-quality TCO films is not conducive to improving the performance of the perovskite solar cells with low ion bombardment and temperature tolerances. Herein, cerium-doped indium oxide (ICO) thin films are prepared by reactive plasma deposition (RPD) at substrate temperatures below 60 °C. A high carrier mobility of 50.26 cm2 V-1 s-1, a low resistivity of 7.18 × 10-4 Ω·cm, and an average transmittance of 86.53% in the wavelength range of 400-800 nm and 87.37% in the wavelength range of 800-1200 nm are achieved. The RPD-prepared ICO film is used as a transparent electrode on top of the ST-PSCs (band gap ∼1.68 eV), and photovoltaic conversion efficiency (PCE) of 18.96% is achieved on the champion device.
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Affiliation(s)
- Limeng Zhang
- Center of Materials Science and Opto-Electronics Engineering, College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 101409 China
| | - Zhigang Che
- Center of Materials Science and Opto-Electronics Engineering, College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 101409 China
| | - Jiacheng Shang
- Center of Materials Science and Opto-Electronics Engineering, College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 101409 China
| | - Qi Wang
- Center of Materials Science and Opto-Electronics Engineering, College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 101409 China
| | - Miaojia Cao
- Center of Materials Science and Opto-Electronics Engineering, College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 101409 China
| | - Yurong Zhou
- Center of Materials Science and Opto-Electronics Engineering, College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 101409 China
| | - Yuqin Zhou
- Center of Materials Science and Opto-Electronics Engineering, College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 101409 China
| | - Fengzhen Liu
- Center of Materials Science and Opto-Electronics Engineering, College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 101409 China
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