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For: Markwitz A, Baumann H, Michelmann RW, Meyer JD, Krimmel EF, Bethge K. Molecular ion implantation in silicon. Mikrochim Acta 1997;125:313-6. [DOI: 10.1007/bf01246204] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/24/2022]
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1
Markwitz A, Baumann H, Michelmann RW, Meyer JD, Krimmel EF, Bethge K. Nitrogen depth distribution, interface and structure analysis of SiNx layers produced by low-energy ion implantation. Mikrochim Acta 1997. [DOI: 10.1007/bf01246208] [Citation(s) in RCA: 6] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
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