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Citation(s) in
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For:
Chae KH
, Park JH.
A one-component negative photoresist based on an epoxy terpolymer containing oxime-urethane groups as a photobase generator.
Macromol Res
2004;
12
:352-8. [DOI:
10.1007/bf03218411
]
[
Citation(s) in
RCA
: 6
]
[
Impact Index Per Article: 0.3
]
[
Reference Citation Analysis
]
[
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[Indexed: 10/18/2022]
Number
Cited by Other Article(s)
1
Liu L
, Guo J, Wei J. Study on synthesis and photochemical behavior of carbamate photobase generators for fluorescence imaging.
J Appl Polym Sci
2014. [DOI:
10.1002/app.41058
]
[
Citation(s) in
RCA
: 2
]
[
Impact Index Per Article: 0.2
]
[
Reference Citation Analysis
]
[
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]
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[Indexed: 11/07/2022]
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Affiliation(s)
Lanlan Liu
College of Materials Science and Engineering; Beijing University of Chemical Technology; Beijing 100029 People's Republic of China
Jinbao Guo
College of Materials Science and Engineering; Beijing University of Chemical Technology; Beijing 100029 People's Republic of China
Jie Wei
College of Materials Science and Engineering; Beijing University of Chemical Technology; Beijing 100029 People's Republic of China
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2
Liu L
, Guo J, Li Z, Wei J. Photobase generating monomers: synthesis, evaluation and utilization for fabricating fluorescence patterns.
RSC Adv
2014. [DOI:
10.1039/c4ra00499j
]
[
Citation(s) in
RCA
: 4
]
[
Impact Index Per Article: 0.4
]
[
Reference Citation Analysis
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[Indexed: 12/17/2022]
Open
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3
Growth and survival of cells in biosynthetic poly vinyl alcohol–alginate IPN hydrogels for cardiac applications.
Colloids Surf B Biointerfaces
2013;
107
:137-45. [DOI:
10.1016/j.colsurfb.2013.01.069
]
[
Citation(s) in
RCA
: 66
]
[
Impact Index Per Article: 6.0
]
[
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[Received: 12/21/2012]
[Revised: 01/31/2013]
[Accepted: 01/31/2013]
[Indexed: 11/19/2022]
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4
Chae KH
, Cho HI, Kim YH, Yang UC. Photo-crosslinking and negative-type micropattern formation of a polymeric photobase generator containing phthalimido carbamate groups.
Eur Polym J
2012. [DOI:
10.1016/j.eurpolymj.2012.05.006
]
[
Citation(s) in
RCA
: 12
]
[
Impact Index Per Article: 1.0
]
[
Reference Citation Analysis
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[Indexed: 11/25/2022]
Abstract
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5
Chae KH
, Lee CS, Kim JH. One component photo-curing agent for epoxy resins based on multifunctional photobase generators containing oxime-urethane groups.
POLYM ADVAN TECHNOL
2009. [DOI:
10.1002/pat.1628
]
[
Citation(s) in
RCA
: 12
]
[
Impact Index Per Article: 0.8
]
[
Reference Citation Analysis
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[Indexed: 11/09/2022]
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6
Positive-type photosensitive polyimide based on a photobase generator containing oxime-urethane groups as a photosensitive compound.
Macromol Res
2006. [DOI:
10.1007/bf03219085
]
[
Citation(s) in
RCA
: 16
]
[
Impact Index Per Article: 0.9
]
[
Reference Citation Analysis
]
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[Indexed: 11/26/2022]
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