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For: Liu J, Zheng X, Li H, Liu R, Mu Q, Liu X. Synthesis of novel branched UV-curable methacrylate copolymer and its application in negative photoresist. Polym Bull (Berl) 2015;72:523-33. [DOI: 10.1007/s00289-014-1289-9] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/25/2022]
Number Cited by Other Article(s)
1
Zhang G, Zhang L, Gao H, Konstantinov IA, Arturo SG, Yu D, Torkelson JM, Broadbelt LJ. A Combined Computational and Experimental Study of Copolymerization Propagation Kinetics for 1‐Ethylcyclopentyl methacrylate and Methyl methacrylate. MACROMOL THEOR SIMUL 2016. [DOI: 10.1002/mats201500072] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/08/2022]
2
Liu J, Liu Q, Zheng X, Liu R, Mu Q, Liu X. Synthesis of UV-curable polycarbonate diols (PCDL)-based polyurethane acrylate for negative photoresist. Polym Bull (Berl) 2015. [DOI: 10.1007/s00289-015-1511-4] [Citation(s) in RCA: 10] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/23/2022]
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