Photoelectrochemistry of silicon in HF solution

Voltage- and Metal-assisted Chemical Etching of Micro and Nano Structures in Silicon: A Comprehensive Review

Sculpting silicon at the micro and nano scales has been game-changing to mold bulk silicon properties and expand, in turn, applications of silicon beyond electronics, namely, in photonics, sensing, medicine, and mechanics, to cite a few. Voltage- and metal-assisted chemical etching (ECE and MaCE, respectively) of silicon in acidic electrolytes have emerged over other micro and nanostructuring technologies thanks to their unique etching features. ECE and MaCE have enabled the fabrication of novel structures and devices not achievable otherwise, complementing those feasible with the deep reactive ion etching (DRIE) technology, the gold standard in silicon machining. Here, a comprehensive review of ECE and MaCE for silicon micro and nano machining is provided. The chemistry and physics ruling the dissolution of silicon are dissected and similarities and differences between ECE and MaCE are discussed showing that they are the two sides of the same coin. The processes governing the anisotropic etching of designed silicon micro and nanostructures are analyzed, and the modulation of etching profile over depth is discussed. The preparation of micro- and nanostructures with tailored optical, mechanical, and thermo(electrical) properties is then addressed, and their applications in photonics, (bio)sensing, (nano)medicine, and micromechanical systems are surveyed. Eventually, ECE and MaCE are benchmarked against DRIE, and future perspectives are highlighted.

Anisotropy of 3D Columnar Coatings in Mid-Infrared Spectral Range

Polarisation analysis in the mid-infrared fingerprint region was carried out on thin (∼1 μm) Si and SiO₂ films evaporated via glancing angle deposition (GLAD) method at 70∘ to the normal. Synchrotron-based infrared microspectroscopic measurements were carried out on the Infrared Microspectroscopy (IRM) beamline at Australian Synchrotron. Specific absorption bands, particularly Si-O-Si stretching vibration, was found to follow the angular dependence of ∼cos2θ, consistent with the absorption anisotropy. This unexpected anisotropy stems from the enhanced absorption in nano-crevices, which have orientation following the cos2θ angular dependence as revealed by Fourier transforming the image of the surface of 3D columnar films and numerical modeling of light field enhancement by sub-wavelength nano-crevices.

Hierarchical anti-reflective laser-induced periodic surface structures (LIPSSs) on amorphous Si films for sensing applications

Here, we applied direct laser-induced periodic surface structuring to drive the phase transition of amorphous silicon (a-Si) into nanocrystalline (nc) Si imprinted as regular arrangement of Si nanopillars passivated with a SiO2 layer. By varying the laser beam scanning speed at a fixed pulse energy, we successfully tailored the resulting unique surface morphology of the formed LIPSSs that change from ordered arrangement of conical protrusions to highly uniform surface gratings, where sub-wavelength scale ripples decorate the valleys between near-wavelength scale ridges. Along with the surface morphology, the nc-Si/SiO2 volume ratio can also be controlled via laser processing parameters allowing the tailoring of the optical properties of the produced textured surfaces to achieve anti-reflection performance or partial transmission in the visible spectral range. Diverse hierarchical LIPSSs can be fabricated and replicated over large-scale areas opening a pathway for various applications including optical sensors, nanoscale temperature management, and solar light harvesting. By taking advantage of good wettability, enlarged surface area and remarkable light-trapping characteristics of the produced hierarchical morphologies, we demonstrated the first LIPSS-based surface enhanced fluorescent sensor that allowed the identification of metal cations providing a sub-nM detection limit unachievable by conventional fluorescence measurements in solutions.

Black-Si as a Photoelectrode

The fabrication and characterization of photoanodes based on black-Si (b-Si) are presented using a photoelectrochemical cell in NaOH solution. B-Si was fabricated by maskless dry plasma etching and was conformally coated by tens-of-nm of TiO₂ using atomic layer deposition (ALD) with a top layer of CoOx cocatalyst deposited by pulsed laser deposition (PLD). Low reflectivity R<5% of b-Si over the entire visible and near-IR (λ<2 μm) spectral range was favorable for the better absorption of light, while an increased surface area facilitated larger current densities. The photoelectrochemical performance of the heterostructured b-Si photoanode is discussed in terms of the n-n junction between b-Si and TiO₂.

Towards Safer Primers: A Review

Primers are used to reliably initiate a secondary explosive in a wide range of industrial and defence applications. However, established primer technologies pose both direct and indirect risks to health and safety. This review analyses a new generation of primer materials and ignition control mechanisms that have been developed to address these risks in firearms. Electrically or optically initiated metal, oxide and semiconductor-based devices show promise as alternatives for heavy metal percussive primers. The prospects for wider use of low-cost, safe, reliable and non-toxic primers are discussed in view of these developments.