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For: Gu M, Zhong Q. Copper electrocrystallization from acidic sulfate electrolyte containing MPS additive. J APPL ELECTROCHEM 2011. [DOI: 10.1007/s10800-011-0293-0] [Citation(s) in RCA: 17] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/18/2022]
Number Cited by Other Article(s)
1
Li Z, Tan B, Luo J, Qin J, Yang G, Cui C, Pan L. Structural influence of nitrogen-containing groups on triphenylmethane-based levelers in super-conformal copper electroplating. Electrochim Acta 2022. [DOI: 10.1016/j.electacta.2021.139445] [Citation(s) in RCA: 5] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/27/2022]
2
Diao S, Wang Y, Jin H. Electronucleation mechanism of copper in wastewater by controlled electrodeposition analysis. RSC Adv 2020;10:38683-38694. [PMID: 35517557 PMCID: PMC9057282 DOI: 10.1039/d0ra07380f] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/28/2020] [Accepted: 10/01/2020] [Indexed: 11/21/2022]  Open
3
Stainless steel substrate pretreatment effects on copper nucleation and stripping during copper electrowinning. J APPL ELECTROCHEM 2020. [DOI: 10.1007/s10800-020-01485-2] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/23/2022]
4
Nucleation and growth mechanism of tellurium electrodeposited on tin-doped indium oxide substrate. J APPL ELECTROCHEM 2019. [DOI: 10.1007/s10800-019-01377-0] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/25/2022]
5
Chen TC, Tsai YL, Hsu CF, Dow WP, Hashimoto Y. Effects of Brighteners in a Copper Plating Bath on Throwing Power and Thermal Reliability of Plated Through Holes. Electrochim Acta 2016. [DOI: 10.1016/j.electacta.2016.07.007] [Citation(s) in RCA: 30] [Impact Index Per Article: 3.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
6
Advances in Copper Electrodeposition in Chloride Excess. A Theoretical and Experimental Approach. Electrochim Acta 2015. [DOI: 10.1016/j.electacta.2015.02.206] [Citation(s) in RCA: 23] [Impact Index Per Article: 2.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/19/2022]
7
Sulaymon AH, Mohammed SAM, Abbar AH. Preparation and Characterization of Electrodeposited Cadmium and Lead thin Films from a Diluted Chloride Solution. J ELECTROCHEM SCI TE 2014. [DOI: 10.33961/jecst.2014.5.4.115] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/24/2022]
8
Sulaymon AH, Mohammed SA, Abbar AH. Preparation and Characterization of Electrodeposited Cadmium and Lead thin Films from a Diluted Chloride Solution. J ELECTROCHEM SCI TE 2014. [DOI: 10.5229/jecst.2014.5.4.115] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/15/2022]
9
Sebastián P, Vallés E, Gómez E. Copper electrodeposition in a deep eutectic solvent. First stages analysis considering Cu(I) stabilization in chloride media. Electrochim Acta 2014. [DOI: 10.1016/j.electacta.2014.01.062] [Citation(s) in RCA: 28] [Impact Index Per Article: 2.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/25/2022]
10
Bolzán A. Electrodeposition of copper on glassy carbon electrodes in the presence of picolinic acid. Electrochim Acta 2013. [DOI: 10.1016/j.electacta.2013.09.132] [Citation(s) in RCA: 20] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/25/2022]
11
Inhibition effect of some aromatic amines on copper electrodeposition from acidic baths. J APPL ELECTROCHEM 2012. [DOI: 10.1007/s10800-012-0385-5] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/14/2022]
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