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Well-ordered patterns of nanoparticles induced by an alternately-arranged binary micropillar array. JOURNAL OF POLYMER RESEARCH 2022. [DOI: 10.1007/s10965-022-03308-8] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/26/2022]
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Well-defined high molecular weight polyglycolide-b-poly(L-)lactide-b-polyglycolide triblock copolymers: synthesis, characterization and microstructural analysis. JOURNAL OF POLYMER RESEARCH 2020. [DOI: 10.1007/s10965-019-2001-4] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 10/24/2022]
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Wang C, Wang TM, Wang QH. Ultralow-dielectric, nanoporous poly(methyl silsesquioxanes) films templated by a self-assembled block copolymer upon solvent annealing. JOURNAL OF POLYMER RESEARCH 2018. [DOI: 10.1007/s10965-018-1650-z] [Citation(s) in RCA: 9] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/25/2022]
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Cummins C, Mokarian-Tabari P, Andreazza P, Sinturel C, Morris MA. Solvothermal Vapor Annealing of Lamellar Poly(styrene)-block-poly(d,l-lactide) Block Copolymer Thin Films for Directed Self-Assembly Application. ACS APPLIED MATERIALS & INTERFACES 2016; 8:8295-8304. [PMID: 26950246 DOI: 10.1021/acsami.6b00765] [Citation(s) in RCA: 12] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
Solvothermal vapor annealing (STVA) was employed to induce microphase separation in a lamellar forming block copolymer (BCP) thin film containing a readily degradable block. Directed self-assembly of poly(styrene)-block-poly(d,l-lactide) (PS-b-PLA) BCP films using topographically patterned silicon nitride was demonstrated with alignment over macroscopic areas. Interestingly, we observed lamellar patterns aligned parallel as well as perpendicular (perpendicular microdomains to substrate in both cases) to the topography of the graphoepitaxial guiding patterns. PS-b-PLA BCP microphase separated with a high degree of order in an atmosphere of tetrahydrofuran (THF) at an elevated vapor pressure (at approximately 40-60 °C). Grazing incidence small-angle X-ray scattering (GISAXS) measurements of PS-b-PLA films reveal the through-film uniformity of perpendicular microdomains after STVA. Perpendicular lamellar orientation was observed on both hydrophilic and relatively hydrophobic surfaces with a domain spacing (L0) of ∼32.5 nm. The rapid removal of the PLA microdomains is demonstrated using a mild basic solution for the development of a well-defined PS mask template. GISAXS data reveal the through-film uniformity is retained following wet etching. The experimental results in this article demonstrate highly oriented PS-b-PLA microdomains after a short annealing period and facile PLA removal to form porous on-chip etch masks for nanolithography application.
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Affiliation(s)
- Cian Cummins
- Materials Research Group, Department of Chemistry and Tyndall National Institute, University College Cork , T12 YN60 Cork, Ireland
- AMBER, CRANN, Trinity College Dublin, Dublin 2, Ireland
| | - Parvaneh Mokarian-Tabari
- Materials Research Group, Department of Chemistry and Tyndall National Institute, University College Cork , T12 YN60 Cork, Ireland
- AMBER, CRANN, Trinity College Dublin, Dublin 2, Ireland
| | - Pascal Andreazza
- Interfaces, Confinement, Matériaux et Nanostructures, ICMN, UMR 7374, CNRS/Université d'Orléans, 1b Rue de la Férollerie, 45071 Orléans, France
| | - Christophe Sinturel
- Interfaces, Confinement, Matériaux et Nanostructures, ICMN, UMR 7374, CNRS/Université d'Orléans, 1b Rue de la Férollerie, 45071 Orléans, France
| | - Michael A Morris
- Materials Research Group, Department of Chemistry and Tyndall National Institute, University College Cork , T12 YN60 Cork, Ireland
- AMBER, CRANN, Trinity College Dublin, Dublin 2, Ireland
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