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Gu P, Yang S, Ma L, Yang T, Hou X, Mei Y, Ying L, Long H, Zhang B. Flexible GaN-based ultraviolet microdisk lasers on PET substrate. OPTICS LETTERS 2023; 48:4117-4120. [PMID: 37527132 DOI: 10.1364/ol.496680] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/01/2023] [Accepted: 07/09/2023] [Indexed: 08/03/2023]
Abstract
Flexible optoelectronics is a technique for fabricating optoelectronic devices on a flexible substrate. Compared with conventional devices, flexible optoelectronic devices can be used in more complex working environments benefiting from the mechanical flexibility. Herein, for the first time to the best of our knowledge, a flexible GaN-based microdisk laser on a polyethylene terephthalate (PET) substrate in the ultraviolet A (UVA) range was demonstrated by using thin film transfer process based on laser lift-off (LLO). The lasing wavelength is 370.5 nm with a linewidth of 0.15 nm and a threshold power density of 200 kW/cm2. Additionally, a distributed Bragg reflector (DBR) was deposited on the backside of the microdisk as the bottom mirror between GaN microdisk and PET substrate, which can provide better mode confinement inside the microdisk and increases the oscillation intensity. The lasing wavelength of the flexible laser shows a 2-nm redshift under different bending curvature of the substrate, which is promising for applications such as mechanical sensing.
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Zou C, Zhao Z, Xu M, Wang X, Liu Q, Chen K, He L, Gao F, Li S. GaN/Gr (2D)/Si (3D) Combined High-Performance Hot Electron Transistors. ACS NANO 2023; 17:8262-8270. [PMID: 37125852 DOI: 10.1021/acsnano.2c12435] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/10/2023]
Abstract
To overcome the problem of minority carrier storage time in bipolar transistors, a hot electron transistor (HET) has been proposed. This device has the advantage of high working speed and some complex logic functions can be completed by using one component. Here, we demonstrate a mixed-dimensional HET composed of GaN/AlN microwires, graphene (Gr), and Si. The electrons between GaN/AlN are injected into graphene by an F-N tunneling mechanism to achieve high speed hot electrons, then cross graphene by ballistic transport, and are collected in a nearly lossless manner through a low-barrier Si. Therefore, the device shows a record DC gain of 16.2, a collection efficiency close to the limit of 99.9% based on the graphene hot electron transistor (GHET), an emitter current density of about 68.7 A/cm2, and a high on/off current ratio reaching ∼107. Meanwhile, the current saturation range is wide, beyond those of most GHETs. It has potential applications as a power amplifier.
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Affiliation(s)
- Can Zou
- Guangdong Engineering Research Center of Optoelectronic Functional Materials and Devices, School of Semiconductor Science and Technology, South China Normal University, Guangzhou 510631, People's Republic of China
| | - Zixuan Zhao
- Guangdong Engineering Research Center of Optoelectronic Functional Materials and Devices, School of Semiconductor Science and Technology, South China Normal University, Guangzhou 510631, People's Republic of China
| | - Mingjun Xu
- Guangdong Engineering Research Center of Optoelectronic Functional Materials and Devices, School of Semiconductor Science and Technology, South China Normal University, Guangzhou 510631, People's Republic of China
| | - Xingfu Wang
- Guangdong Engineering Research Center of Optoelectronic Functional Materials and Devices, School of Semiconductor Science and Technology, South China Normal University, Guangzhou 510631, People's Republic of China
| | - Qing Liu
- Guangdong Engineering Research Center of Optoelectronic Functional Materials and Devices, School of Semiconductor Science and Technology, South China Normal University, Guangzhou 510631, People's Republic of China
| | - Kai Chen
- Guangdong Engineering Research Center of Optoelectronic Functional Materials and Devices, School of Semiconductor Science and Technology, South China Normal University, Guangzhou 510631, People's Republic of China
| | - Longfei He
- Institute of Semiconductors, Guangdong Academy of Sciences, Guangzhou 510650, People's Republic of China
| | - Fangliang Gao
- Guangdong Engineering Research Center of Optoelectronic Functional Materials and Devices, School of Semiconductor Science and Technology, South China Normal University, Guangzhou 510631, People's Republic of China
| | - Shuti Li
- Guangdong Engineering Research Center of Optoelectronic Functional Materials and Devices, School of Semiconductor Science and Technology, South China Normal University, Guangzhou 510631, People's Republic of China
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