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For: Masi M, Besana G, Canzi L, Carra S. Modeling of silicon nitride deposition by RF plasma-enhanced chemical vapor deposition. Chem Eng Sci 1994. [DOI: 10.1016/0009-2509(94)85013-5] [Citation(s) in RCA: 12] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Number Cited by Other Article(s)
1
Adomaitis RA, Schwarm A. Systems and control challenges in photovoltaic manufacturing processes: A modeling strategy for passivation and antireflection films. Comput Chem Eng 2013. [DOI: 10.1016/j.compchemeng.2012.06.043] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
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