UV photolysis of van der waals molecular films

Spectroscopy and Photoreactions of Organometallic Molecules on Surfaces

A study of the UV photochemistry of organometallic molecules in the vapor and adsorbed phases is discussed. The gas-phase spectra is interpreted on the basis of molecular orbital theory and experimental data. The absorption spectra of the surface adlayers are determined by computer subtraction of the gas-phase spectra and an intepretation is provided. The influence of metalsubstrate microstructure on UV photochemical reactions of metal alkyls is briefly discussed.

UV Photodecomposition for Metal Deposition: Gas Vs. Surface Phase Processes

Photodecomposition of organometallic gases has been shown to be potentially useful for high resolution direct metal deposition. However, a number of problems, particularly the low writing rates, must first be solved. An understanding of the deposition mechanism is essential to this task. In particular, the decomposition must be shown to occur either in the gas phase or in the adsorbed layer. This question can be resolved by the dependence of the writing rate on spot size. Measurements of the process show that once the deposition begins the bulk of the deposit occurs from decomposition in the gas phase.

Laser-Induced Chemistry for Microelectronics

Laser-controlled chemical reactions are being explored for use in all phases of the processing of semiconductor devices. Laser-induced chemical processing can produce submicrometer features without the aid of photolithography. Research is also providing new information on light-excited and light-enhanced interface reactions.

Optically induced microstructures in laser-photodeposited metal films

Regular 0.15- to 0.5-microm-period ripple structures have been seen in laser-photodeposited Cd and Zn films. Electron-microscope observations have established the evolution of these microstructures in the growing films.

Optical reflectance technique for observations of submonolayer adsorbed films

An optical technique is described for detecting and measuring thicknesses of adsorbed films with subangstrom sensitivity. The technique relies on optical interference from an antireflecting thin-film structure that is predeposited on a transparent cell window: the reflectivity of the window depends linearly on the thickness of the molecular layer adsorbed from the gas in the cell.