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Tamski M, Blumenschein F, Roussel C, Ansermet JP. Probing charge transfer processes at p-GaAs electrodes under weak optical excitation. J Photochem Photobiol A Chem 2019. [DOI: 10.1016/j.jphotochem.2019.111894] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/26/2022]
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Zn Electrodeposition on Single-Crystal GaN(0001) Surface: Nucleation and Growth Mechanism. INTERNATIONAL JOURNAL OF ELECTROCHEMISTRY 2016. [DOI: 10.1155/2016/3212703] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/18/2022] Open
Abstract
The electrochemical deposition of zinc on single-crystaln-type GaN(0001) from a sulphate solution has been investigated on the basis of electrochemical techniques including cyclic voltammetry, chronoamperometry, and Tafel plot. The morphology and crystal structure of zinc deposits have been characterized by means of scanning electron microscopy, X-ray diffraction, and energy-dispersive X-ray analysis. The result has revealed that the deposition of Zn on GaN electrode commenced at a potential of −1.12 V versus Ag/AgCl. According to the Tafel plot, an exchange current density of ~0.132 mA cm−2was calculated. In addition, the current transient measurements have shown that Zn deposition process followed the instantaneous nucleation in 10 mM ZnSO4+ 0.5 M Na2SO4+ 0.5 M H3BO3(pH = 4).
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Zhao Y, Deng FX, Hu LF, Liu YQ, Pan GB. Electrochemical deposition of copper on single-crystal gallium nitride(0001) electrode: nucleation and growth mechanism. Electrochim Acta 2014. [DOI: 10.1016/j.electacta.2014.03.051] [Citation(s) in RCA: 14] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/25/2022]
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Epitaxial Growth of Metals on Semiconductors Via Electrodeposition. NANOFABRICATION 2012. [DOI: 10.1007/978-3-7091-0424-8_9] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/15/2022] Open
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Grujicic D, Pesic B. Reaction and nucleation mechanisms of copper electrodeposition from ammoniacal solutions on vitreous carbon. Electrochim Acta 2005. [DOI: 10.1016/j.electacta.2005.02.012] [Citation(s) in RCA: 110] [Impact Index Per Article: 5.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/25/2022]
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Tamura K, Oyanagi H, Kondo T, Koinuma M, Uosaki K. Structural Study of Electrochemically Deposited Cu on p-GaAs(100) in H2SO4 Solution by In Situ Surface-Sensitive X-ray Absorption Fine Structure Measurements. J Phys Chem B 2000. [DOI: 10.1021/jp0011286] [Citation(s) in RCA: 28] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- Kazuhisa Tamura
- Physical Chemistry Laboratory, Division of Chemistry, Graduate School of Science, Hokkaido University, Sapporo 060-0810, Japan, and Electrotechnical Laboratory, Tsukuba, Ibaraki, 305-8568, Japan
| | - Hiroyuki Oyanagi
- Physical Chemistry Laboratory, Division of Chemistry, Graduate School of Science, Hokkaido University, Sapporo 060-0810, Japan, and Electrotechnical Laboratory, Tsukuba, Ibaraki, 305-8568, Japan
| | - Toshihiro Kondo
- Physical Chemistry Laboratory, Division of Chemistry, Graduate School of Science, Hokkaido University, Sapporo 060-0810, Japan, and Electrotechnical Laboratory, Tsukuba, Ibaraki, 305-8568, Japan
| | - Michio Koinuma
- Physical Chemistry Laboratory, Division of Chemistry, Graduate School of Science, Hokkaido University, Sapporo 060-0810, Japan, and Electrotechnical Laboratory, Tsukuba, Ibaraki, 305-8568, Japan
| | - Kohei Uosaki
- Physical Chemistry Laboratory, Division of Chemistry, Graduate School of Science, Hokkaido University, Sapporo 060-0810, Japan, and Electrotechnical Laboratory, Tsukuba, Ibaraki, 305-8568, Japan
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Vereecken P, Strubbe K, Gomes W. An improved procedure for the processing of chronoamperometric data: Application to the electrodeposition of Cu upon (100) n-GaAs. J Electroanal Chem (Lausanne) 1997. [DOI: 10.1016/s0022-0728(97)00195-2] [Citation(s) in RCA: 21] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/27/2022]
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Sutter E, Mathieu C, Moulayat N, Etcheberry A. Effect of copper coating on the behaviour of p-InP electrodes. J Electroanal Chem (Lausanne) 1997. [DOI: 10.1016/s0022-0728(96)05020-6] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/27/2022]
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