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Tan Z, Li K, Gu Y, Nan Z, Wang W, Sun L, Mao B, Yan J. Unconventional Electrochemical Behaviors of Cu Underpotential Deposition in a Chloride-Based Deep Eutectic Solvent: High Underpotential Shift and Low Coverage. Anal Chem 2023; 95:6458-6466. [PMID: 37027511 DOI: 10.1021/acs.analchem.3c00637] [Citation(s) in RCA: 2] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 04/09/2023]
Abstract
The (5 × 5) Moiré pattern resulting from coadsorption of Cu atoms and chloride ions on the Au(111) electrode is one of the most classical structures for underpotential deposition (UPD) in electrochemical surface science. Although two models have been proposed to describe the pattern, the details of the structure remain ambiguous and controversial, leading to a question that remains to be answered. In this work, we investigate the UPD behaviors of Cu on the Au(111) electrode in a chloride-based deep eutectic solvent ethaline by in situ scanning tunneling microscopy (STM). Benefiting from the properties of the ultraconcentrated electrolyte, we directly image not only Cu but also Cl adlayers by finely tuning tunneling conditions. The structure is unambiguously determined for both Cu and Cl adlayers, where an incommensurate Cu layer is adsorbed on the Au(111) surface with a Cu coverage of 0.64, while the Cl coverage is 0.32 (only half of the expected value); i.e., the atomic arrangement of the observed (5 × 5) Moiré pattern in ethaline matches neither of the models proposed in the literature. Meanwhile, STM results confirm the origin of the cathodic peak in the cyclic voltammogram, which indicates that the underpotential shift of Cu UPD in ethaline indeed increases by ca. 0.40 V compared to its counterpart in a sulfuric acid solution, resulting in a significant deviation from the linear relation between the underpotential shift and the difference in work functions proposed in the literature. The unconventional electrochemical behaviors of Cu UPD reveal the specialty of both the bulk and the interface in the chloride-based deep eutectic solvent.
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Affiliation(s)
- Zhuo Tan
- State Key Laboratory of Physical Chemistry of Solid Surfaces and Department of Chemistry, College of Chemistry and Chemical Engineering, Engineering Research Center of Electrochemical Technologies of Ministry of Education, Xiamen University, Xiamen 361005, China
| | - Kaixuan Li
- State Key Laboratory of Physical Chemistry of Solid Surfaces and Department of Chemistry, College of Chemistry and Chemical Engineering, Engineering Research Center of Electrochemical Technologies of Ministry of Education, Xiamen University, Xiamen 361005, China
| | - Yu Gu
- State Key Laboratory of Physical Chemistry of Solid Surfaces and Department of Chemistry, College of Chemistry and Chemical Engineering, Engineering Research Center of Electrochemical Technologies of Ministry of Education, Xiamen University, Xiamen 361005, China
| | - Ziang Nan
- State Key Laboratory of Physical Chemistry of Solid Surfaces and Department of Chemistry, College of Chemistry and Chemical Engineering, Engineering Research Center of Electrochemical Technologies of Ministry of Education, Xiamen University, Xiamen 361005, China
| | - Weiwei Wang
- State Key Laboratory of Physical Chemistry of Solid Surfaces and Department of Chemistry, College of Chemistry and Chemical Engineering, Engineering Research Center of Electrochemical Technologies of Ministry of Education, Xiamen University, Xiamen 361005, China
| | - Lan Sun
- State Key Laboratory of Physical Chemistry of Solid Surfaces and Department of Chemistry, College of Chemistry and Chemical Engineering, Engineering Research Center of Electrochemical Technologies of Ministry of Education, Xiamen University, Xiamen 361005, China
| | - Bingwei Mao
- State Key Laboratory of Physical Chemistry of Solid Surfaces and Department of Chemistry, College of Chemistry and Chemical Engineering, Engineering Research Center of Electrochemical Technologies of Ministry of Education, Xiamen University, Xiamen 361005, China
| | - Jiawei Yan
- State Key Laboratory of Physical Chemistry of Solid Surfaces and Department of Chemistry, College of Chemistry and Chemical Engineering, Engineering Research Center of Electrochemical Technologies of Ministry of Education, Xiamen University, Xiamen 361005, China
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Herrero E, Buller LJ, Abruña HD. Underpotential deposition at single crystal surfaces of Au, Pt, Ag and other materials. Chem Rev 2001; 101:1897-930. [PMID: 11710235 DOI: 10.1021/cr9600363] [Citation(s) in RCA: 468] [Impact Index Per Article: 20.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- E Herrero
- Department of Chemistry and Chemical Biology, Baker Laboratory, Cornell University, Ithaca, New York 14853-130, USA
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Palomar-Pardavé M, González I, Batina N. New Insights into Evaluation of Kinetic Parameters for Potentiostatic Metal Deposition with Underpotential and Overpotential Deposition Processes. J Phys Chem B 2000. [DOI: 10.1021/jp9931861] [Citation(s) in RCA: 68] [Impact Index Per Article: 2.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- Manuel Palomar-Pardavé
- Departamento de Materiales, Universidad Autónoma Metropolitana-Azcapotzalco, A.P. 16-306, C.P. 02000 México, D.F., México
| | - Ignacio González
- Departamento de Química, Universidad Autónoma Metropolitana-Iztapalapa, A.P. 55-534, 09340 México, D.F., México
| | - Nikola Batina
- Departamento de Química, Universidad Autónoma Metropolitana-Iztapalapa, A.P. 55-534, 09340 México, D.F., México
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